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JP2000332145A - Circuit material for resin-sealed semiconductor device, the resin sealed semiconductor device using the same and manufacturing method for the circuit material - Google Patents

Circuit material for resin-sealed semiconductor device, the resin sealed semiconductor device using the same and manufacturing method for the circuit material

Info

Publication number
JP2000332145A
JP2000332145A JP13670399A JP13670399A JP2000332145A JP 2000332145 A JP2000332145 A JP 2000332145A JP 13670399 A JP13670399 A JP 13670399A JP 13670399 A JP13670399 A JP 13670399A JP 2000332145 A JP2000332145 A JP 2000332145A
Authority
JP
Japan
Prior art keywords
terminal
resin
die pad
outer frame
circuit member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13670399A
Other languages
Japanese (ja)
Other versions
JP3983930B2 (en
Inventor
Masahito Sasaki
将人 佐々木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP13670399A priority Critical patent/JP3983930B2/en
Publication of JP2000332145A publication Critical patent/JP2000332145A/en
Application granted granted Critical
Publication of JP3983930B2 publication Critical patent/JP3983930B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/30107Inductance

Landscapes

  • Lead Frames For Integrated Circuits (AREA)

Abstract

PROBLEM TO BE SOLVED: To enhance occupancy ratio of semiconductor elements to improve the packing density on a circuit board by placing an outer frame, an independently disposed package, terminals independently disposed inside the frame, and electrically insulative resin members interposed between them. SOLUTION: A circuit material 1 comprises an outer frame 2, a die pad 3 independently disposed inside the frame 2, a plurality of terminals 4 mutually independently disposed on approximately the same plane inside the frame 2, and electrically insulative resin members 5 interposed between the frame 2, the die pad 3 and each terminal 4. The die pad 3 is covered with the resin member 5 over half of the front surface 3A and with half of the back surface 3B exposed to the back surface of the circuit member 1. The terminals 4 have inner terminals 4A on the front surface and outer terminals 4B integrally on the back surface, and each inner terminal 4A is exposed so as to form a recess between the resin members 5.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は半導体素子を搭載し
た樹脂封止型の半導体装置とそれに用いられる回路部材
および樹脂封止型半導体装置の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a resin-sealed semiconductor device having a semiconductor element mounted thereon, a circuit member used therein, and a method of manufacturing the resin-sealed semiconductor device.

【0002】[0002]

【従来の技術】近年、半導体装置は、高集積化や小型化
技術の進歩、電気機器の高性能化と軽薄短小化の傾向
(時流)から、LSIのASICに代表されるように、
ますます高集積化、高機能化が進んできている。このよ
うに高集積化、高機能化された半導体装置においては、
信号の高速処理を行うために、チップの発熱、および、
パッケージ内のインダクタンスが無視できない状況にな
ってきている。このため、サーマルビアを配設してチッ
プの熱をパッケージ外に逃がしたり、電源、グランドの
接続端子数を多くして実質的なインダクタンスを下げ、
パッケージ内のインダクタンスを低減することで対応が
なされている。このように、半導体装置の高集積化、高
機能化は、外部端子(ピン)の総和の増加を来すととも
に、更なる多端子(ピン)化が要請されている。
2. Description of the Related Art In recent years, semiconductor devices have been typified by LSI ASICs due to advances in high integration and miniaturization technologies, and the trend toward higher performance and lighter, thinner and smaller electric appliances (current trend).
Higher integration and higher functionality are being increasingly achieved. In such a highly integrated and highly functional semiconductor device,
In order to perform high-speed signal processing, heat generation of the chip and
The inductance in the package cannot be ignored. For this reason, thermal vias are provided to allow the heat of the chip to escape to the outside of the package, and the number of power and ground connection terminals is increased to lower the substantial inductance.
This is addressed by reducing the inductance in the package. As described above, as the degree of integration and function of a semiconductor device increases, the total number of external terminals (pins) increases, and more terminals (pins) are required.

【0003】上記のような多端子(ピン)化の要請に応
えるものとして、多端子(ピン)IC、特にゲートアレ
イやスタンダードセルに体表されるASIC、あるい
は、DSP(Digital Signal Proc
essor)等の半導体装置の製造においてリードフレ
ームを用いたものがある。具体的には、QFP(Qua
d Flat Package)等の表面実装型パッケ
ージがあり、QFPでは、300ピンクラスのものまで
実用化されている。
[0003] In response to the demand for the multi-terminal (pin) as described above, a multi-terminal (pin) IC, particularly an ASIC represented in a gate array or a standard cell, or a DSP (Digital Signal Proc).
In some cases, a lead frame is used in the manufacture of a semiconductor device such as an e.s. Specifically, QFP (Qua
d Flat Package) and the like, and the QFP has been put into practical use to a 300-pin class.

【0004】しかし、近年の半導体素子の信号処理の高
速化および高性能(機能)化は、更に多くの端子を必要
としている。QFPでは、外部端子ピッチを狭めること
により更なる多端子化に対応できるが、外部端子を狭ピ
ッチ化した場合、外部端子自体の幅も狭める必要があ
り、外部端子強度の低下を来すことになる。その結果、
端子形成(ガルウイング化)の位置精度あるいは平坦精
度において問題を生じることになる。また、QFPで
は、外部端子のピッチが0.3〜0.4mmへと更に狭
くなるにつれて、実装工程が難しくなり、高度なボード
実装技術を実現する必要がある等の障害(問題)を生じ
ている。
However, in recent years, higher speed and higher performance (function) of signal processing of a semiconductor element require more terminals. In the QFP, it is possible to cope with further increase in the number of terminals by reducing the pitch of the external terminals. However, when the pitch of the external terminals is reduced, it is necessary to reduce the width of the external terminals themselves. Become. as a result,
A problem occurs in the positional accuracy or flatness accuracy of the terminal formation (gull wing formation). Further, in the QFP, as the pitch of the external terminals is further narrowed to 0.3 to 0.4 mm, the mounting process becomes difficult, and obstacles (problems) such as necessity of realizing advanced board mounting technology occur. I have.

【0005】また、リードフレームを用いた封止型の半
導体装置に対する小型化・薄型化の要請から、その開発
のトレンドが、QFPやSOJ(Small Outl
ine J−Leaded Package)のような
表面実装型のパッケージを経て、TSOP(Thin
Small Outline Package)の開発
による薄型化を主軸としたパッケージの小型化へ、さら
にはパッケージ内部の3次元化によるチップ収納効率向
上を目的としたLOC(Lead On Chip)の
構造へと進展してきた。
[0005] In addition, due to the demand for miniaturization and thinning of a sealed type semiconductor device using a lead frame, the trend of the development is QFP and SOJ (Small Outl).
TSOP (Thin) through a surface mount type package such as an ine J-Leaded Package).
The development of Small Outline Packages has led to the development of smaller packages with the main axis being thinner, and the LOC (Lead On Chip) structure for the purpose of improving chip storage efficiency by making the package three-dimensional.

【0006】[0006]

【発明が解決しようとする課題】しかし、上記従来のパ
ッケージにおいても半導体素子外周部分のリードの引き
回しがあるため、パッケージの小型化に限界が見えてき
た。また、TSOP等の小型パッケージにおいては、リ
ードの引き回し、ピンピッチの点で、多ピン化に対して
も限界が見えてきた。
However, even in the above-mentioned conventional package, there is a limit to miniaturization of the package due to the routing of leads on the outer peripheral portion of the semiconductor element. Further, in a small package such as TSOP, there is a limit to the number of pins in terms of lead routing and pin pitch.

【0007】本発明は、上記のような事情に鑑みてなさ
れたものであり、半導体素子の占有率が高く小型化が可
能で、回路基板への実装密度を向上させることができ、
さらに、多ピン化、薄型化への対応が可能な樹脂封止型
半導体装置と、これに用いられる回路部材およびその製
造方法を提供することを目的とする。
SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and has a high occupancy rate of a semiconductor element, can be reduced in size, and can improve a mounting density on a circuit board.
It is still another object of the present invention to provide a resin-encapsulated semiconductor device capable of coping with an increase in the number of pins and a reduction in thickness, a circuit member used therefor, and a method of manufacturing the same.

【0008】[0008]

【課題を解決するための手段】このような目的を達成す
るために、本発明の樹脂封止型半導体装置用の回路部材
は、外枠部材と、該外枠部材の内側に独立して配設され
たダイパッドと、表面側に内部端子を裏面側に外部端子
を表裏一体的に有し前記外枠部材より内側の略一平面上
に相互に独立して配設された複数の端子部と、前記外枠
部材と前記ダイパッドと各端子部との間に介在する電気
絶縁性の樹脂部材とを備えるような構成とした。
In order to achieve the above object, a circuit member for a resin-encapsulated semiconductor device according to the present invention is provided with an outer frame member and independently disposed inside the outer frame member. Provided die pad, and a plurality of terminal portions independently disposed on substantially one plane inside the outer frame member, having an internal terminal on the front side and an external terminal on the back side integrally on the back side. And an electrically insulating resin member interposed between the outer frame member and the die pad and each terminal portion.

【0009】また、本発明の回路部材は、前記端子部の
内部端子面が前記樹脂部材間に凹部を形成するように露
出しているような構成、あるいは、前記端子部の外部端
子面が前記樹脂部材間に凹部を形成するように露出して
いるような構成とした。
The circuit member according to the present invention may be configured such that an internal terminal surface of the terminal portion is exposed so as to form a concave portion between the resin members, or an external terminal surface of the terminal portion may be such that It was configured to be exposed so as to form a concave portion between the resin members.

【0010】また、本発明の回路部材は、前記ダイパッ
ドが前記外枠部材に比べて薄肉であるような構成とし
た。
Further, the circuit member of the present invention is configured such that the die pad is thinner than the outer frame member.

【0011】さらに、本発明の回路部材は、前記端子部
の外部端子面が半田からなる外部電極部材を備えるよう
な構成、あるいは、前記端子部の外部端子面が貴金属め
っき層を備えるような構成とした。
Further, in the circuit member according to the present invention, the external terminal surface of the terminal portion may be provided with an external electrode member made of solder, or the external terminal surface of the terminal portion may be provided with a noble metal plating layer. And

【0012】本発明の樹脂封止型半導体装置は、上述の
ような回路部材のダイパッドの表面側に半導体素子を電
気的に絶縁して搭載し、該半導体素子の端子と回路部材
の端子部の内部端子とをワイヤにて電気的に接続し、少
なくとも各端子部の外部端子の一部を外部に露出させる
ように全体を樹脂封止した状態で回路部材の外枠部材を
除去したような構成とした。
In the resin-encapsulated semiconductor device of the present invention, a semiconductor element is electrically insulated and mounted on the surface side of the die pad of the circuit member, and the terminals of the semiconductor element and the terminal of the circuit member are formed. A structure in which the outer frame member of the circuit member is removed in a state where the internal terminals are electrically connected by wires and at least a part of the external terminals of each terminal portion is resin-sealed so as to be exposed to the outside. And

【0013】本発明の樹脂封止型半導体装置用の回路部
材の製造方法は、(A)導電性基板の表面をエッチング
して、表面側に内部端子を裏面側に外部端子を表裏一体
的に有する複数の端子部と、ダイパッドと、前記端子部
と前記ダイパッドの外側に位置する外枠部材とを、裏面
側で連結された状態で備える外形加工部材を作成する第
1の工程と、(B)前記外形加工部材のエッチングがな
された表面側に電気絶縁性の樹脂層を設ける第2の工程
と、(C)各端子部の内部端子面を露出させるように前
記樹脂層を除去するとともに、前記外形加工部材の裏面
をエッチングして外枠部材と各端子部とダイパッドとを
電気的に独立させる第3の工程と、を備えるような構成
とした。
The method of manufacturing a circuit member for a resin-encapsulated semiconductor device according to the present invention comprises the steps of: (A) etching the surface of a conductive substrate to integrally form internal terminals on the front side and external terminals on the back side; A first step of preparing an externally processed member including a plurality of terminal portions, a die pad, and an outer frame member located outside the terminal portion and the die pad in a state of being connected on the back surface side; A) a second step of providing an electrically insulating resin layer on the etched surface of the externally processed member; and (C) removing the resin layer so as to expose the internal terminal surfaces of the respective terminal portions; A third step of etching the back surface of the outer shape processing member to electrically insulate the outer frame member, each terminal portion, and the die pad from each other.

【0014】また、本発明の樹脂封止型半導体装置用の
回路部材の製造方法は、(A)導電性基板の裏面をエッ
チングして、表面側に内部端子を裏面側に外部端子を表
裏一体的に有する複数の端子部と、ダイパッドと、前記
端子部と前記ダイパッドの外側に位置する外枠部材と
を、表面側で連結された状態で備える外形加工部材を作
成する第1の工程と、(B)前記外形加工部材のエッチ
ングがなされた裏面側に電気絶縁性の樹脂層を設ける第
2の工程と、(C)各端子部の外部端子面を露出させる
ように前記樹脂層を除去するとともに、前記外形加工部
材の表面をエッチングして外枠部材と各端子部とダイパ
ッドとを電気的に独立させる第3の工程と、を備えるよ
うな構成とした。
Further, the method of manufacturing a circuit member for a resin-encapsulated semiconductor device according to the present invention comprises the steps of: (A) etching the back surface of the conductive substrate to integrate the internal terminals on the front surface and the external terminals on the back surface; A plurality of terminal portions, a die pad, and an outer frame member positioned outside the terminal portion and the die pad, a first step of creating an outer shape processing member provided in a state of being connected on the surface side, (B) a second step of providing an electrically insulating resin layer on the etched back side of the externally processed member; and (C) removing the resin layer so as to expose the external terminal surfaces of the respective terminal portions. And a third step of etching the surface of the outer shape processing member to electrically separate the outer frame member, each terminal portion, and the die pad from each other.

【0015】さらに、本発明の樹脂封止型半導体装置用
の回路部材の製造方法は、内部端子面に貴金属めっき層
を形成する工程を有するような構成、外部端子面に半田
からなる外部電極部材を形成する工程を有するような構
成とした。
Further, the method of manufacturing a circuit member for a resin-encapsulated semiconductor device according to the present invention has a structure including a step of forming a noble metal plating layer on an internal terminal surface, and an external electrode member made of solder on an external terminal surface. Was formed.

【0016】このような本発明では、回路部材にリード
の引き回しがなく、樹脂封止型半導体装置の小型化が可
能であり、回路部材に設けられている樹脂部材は微細な
端子部をダイパッドや外枠部材から電気的に独立して保
持する作用とともに、回路部材に強度を付与する作用も
なし、さらに、外部端子に外部電極を形成することによ
り、BGA(Ball Grid Array)タイプ
の半導体装置が可能となり取扱性、ショート防止性が向
上する。
According to the present invention, the circuit member does not lead the lead, and the resin-encapsulated semiconductor device can be miniaturized. The semiconductor device of the BGA (Ball Grid Array) type can be realized by forming an external electrode on an external terminal together with an operation of imparting strength to a circuit member together with an operation of electrically holding the semiconductor device electrically independent of the outer frame member. It becomes possible to improve handling and short-circuit prevention.

【0017】[0017]

【発明の実施の形態】以下、本発明の実施の形態につい
て図面を参照して説明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0018】回路部材 図1は本発明の回路部材の一実施形態を示す平面図であ
り、図2は図1に示される回路部材のA−A線における
縦断面図である。尚、図1および図2では、説明を容易
にするために端子数を少なくして簡略化している。
Circuit Member FIG. 1 is a plan view showing an embodiment of the circuit member of the present invention, and FIG. 2 is a longitudinal sectional view taken along line AA of the circuit member shown in FIG. In FIGS. 1 and 2, the number of terminals is reduced and simplified for ease of explanation.

【0019】図1および図2において、本発明の回路部
材1は、外枠部材2と、この外枠部材の内側に独立して
配設されたダイパッド3と、外枠部材2の内側の略一平
面上に相互に独立して配設された複数の端子部4と、外
枠部材2とダイパッド3と各端子部4との間に介在する
電気絶縁性の樹脂部材5とを備えるものである。
Referring to FIGS. 1 and 2, a circuit member 1 of the present invention comprises an outer frame member 2, a die pad 3 independently disposed inside the outer frame member, and a substantially inner portion of the outer frame member 2. It comprises a plurality of terminal portions 4 arranged independently on one plane, and an electrically insulating resin member 5 interposed between the outer frame member 2, the die pad 3 and each terminal portion 4. is there.

【0020】外枠部材2は、図示例では外形形状および
内側開口形状が矩形であるが、外形形状が帯状の連続体
であり、矩形の内側開口が所定の間隔で設けられたもの
であってもよい。
Although the outer frame member 2 has a rectangular outer shape and an inner opening shape in the illustrated example, the outer frame member 2 is a continuous body having a band-like outer shape, and rectangular inner openings are provided at predetermined intervals. Is also good.

【0021】ダイパッド3は、外枠部材2の内側開口の
略中央に位置し、表面3A側の半分を樹脂部材5により
覆われ、裏面3B側の半分が回路部材1の裏面側に露出
している。
The die pad 3 is located substantially at the center of the inner opening of the outer frame member 2, and the half of the front surface 3 A is covered with the resin member 5, and the half of the back surface 3 B is exposed to the back surface of the circuit member 1. I have.

【0022】端子部4は、表面側に内部端子4Aを裏面
側に外部端子4Bを表裏一体的に有し、図示例では、ダ
イパッド3を囲むように各端子部4が配列されている。
また、各内部端子4A面は、樹脂部材5の間に凹部を形
成するように露出しており、このような各内部端子4A
面と各外部端子4B面は、それぞれ同一平面上に位置し
ている。
The terminal portion 4 has an internal terminal 4A on the front surface side and an external terminal 4B on the back surface integrally on the front and back sides. In the illustrated example, the terminal portions 4 are arranged so as to surround the die pad 3.
Also, the surface of each internal terminal 4A is exposed so as to form a concave portion between the resin members 5, and such an internal terminal 4A
The surface and the surface of each external terminal 4B are located on the same plane.

【0023】このような回路部材1の材質は、42合金
(Ni41%のFe合金)、銅、銅合金等とすることが
できる。
The material of the circuit member 1 can be 42 alloy (Fe alloy of 41% Ni), copper, copper alloy or the like.

【0024】また、樹脂部材5は、ポリイミド樹脂、エ
ポキシ系のソルダーレジスト等のような電気絶縁性樹脂
を用いることができる。樹脂部材5の厚みは20〜10
0μm程度が好ましい。
The resin member 5 can be made of an electrically insulating resin such as a polyimide resin or an epoxy solder resist. The thickness of the resin member 5 is 20 to 10
About 0 μm is preferable.

【0025】本発明の回路部材1は、ダイパッド3の表
面3Aを覆う樹脂部材5上に電気絶縁性の両面接着テー
プを設けたものであってもよい。使用する両面接着テー
プとしては、電気絶縁性のベースフィルムの両面に接着
剤層を備えたもの、例えば、ユーピレックス(宇部興産
(株)製の電気絶縁性のベースフィルム)の両面にRX
F((株)巴川製紙所製の接着剤)層を備えたUXIW
((株)巴川製紙所製)のような両面接着テープを挙げ
ることができる。
The circuit member 1 of the present invention may be one in which an electrically insulating double-sided adhesive tape is provided on a resin member 5 covering the surface 3A of the die pad 3. As a double-sided adhesive tape to be used, an electrically insulating base film provided with an adhesive layer on both sides thereof, for example, RX on both sides of Upilex (an electrically insulating base film manufactured by Ube Industries, Ltd.)
UXIW with F (adhesive manufactured by Tomoegawa Paper Mill) layer
(Manufactured by Hamakawa Paper Mills).

【0026】また、本発明の回路部材1は、図3に示さ
れるように、端子部4の外部端子4B面に半田からなる
外部電極部材7を備えるものであってもよい。
Further, as shown in FIG. 3, the circuit member 1 of the present invention may include an external electrode member 7 made of solder on the surface of the external terminal 4B of the terminal portion 4.

【0027】さらに、本発明の回路部材1は、図4に示
されるように、ダイパッド3の厚みが外枠部材2の厚み
よりも薄い薄肉形状であってもよく、図示例ではダイパ
ッド3の裏面3B側のみが回路部材1の裏面側に露出し
たものとなっている。また、本発明の回路部材1は、図
4に示されるように、端子部4の外部端子4B面に貴金
属めっき層8を備えるものであってもよい。
Further, as shown in FIG. 4, the circuit member 1 of the present invention may have a thin shape in which the thickness of the die pad 3 is thinner than the thickness of the outer frame member 2. Only the 3B side is exposed on the back side of the circuit member 1. Further, the circuit member 1 of the present invention may include a noble metal plating layer 8 on the surface of the external terminal 4B of the terminal portion 4, as shown in FIG.

【0028】尚、上述の回路部材1における端子数、端
子配列等は例示であり、本発明がこれに限定されないこ
とは勿論である。
It should be noted that the number of terminals, terminal arrangement, and the like in the above-described circuit member 1 are merely examples, and it is a matter of course that the present invention is not limited to this.

【0029】回路部材 図5は本発明の回路部材の他の実施形態を示す平面図で
あり、図6は図5に示される回路部材のB−B線におけ
る縦断面図である。尚、図5および図6では、説明を容
易にするために端子数を少なくして簡略化している。
Circuit Member FIG. 5 is a plan view showing another embodiment of the circuit member of the present invention, and FIG. 6 is a longitudinal sectional view of the circuit member shown in FIG. In FIGS. 5 and 6, the number of terminals is reduced and simplified for ease of explanation.

【0030】図5および図6において、本発明の回路部
材11は、外枠部材12と、この外枠部材の内側に独立
して配設されたダイパッド13と、外枠部材12の内側
の略一平面上に相互に独立して配設された複数の端子部
14と、外枠部材12とダイパッド13と各端子部14
との間に介在する電気絶縁性の樹脂部材15とを備える
ものである。
5 and 6, a circuit member 11 of the present invention includes an outer frame member 12, a die pad 13 independently disposed inside the outer frame member, and a substantially inner portion of the outer frame member 12. A plurality of terminal portions 14 arranged independently on one plane, an outer frame member 12, a die pad 13 and each terminal portion 14;
And an electrically insulating resin member 15 interposed therebetween.

【0031】外枠部材12は、図示例では外形形状およ
び内側開口形状が矩形であるが、外形形状が帯状の連続
体であり、矩形の内側開口が所定の間隔で設けられたも
のであってもよい。
The outer frame member 12 has a rectangular outer shape and an inner opening shape in the illustrated example. However, the outer frame member 12 is a continuous body having a belt-like outer shape, and rectangular inner openings are provided at predetermined intervals. Is also good.

【0032】ダイパッド13は、外枠部材12の内側開
口の略中央に位置し、裏面13B側の半分を樹脂部材1
5により覆われ、表面13B側の半分が回路部材11の
表面側に露出している。
The die pad 13 is located substantially at the center of the inner opening of the outer frame member 12, and the half on the back surface 13 B side is made of the resin member 1.
5 and the half of the surface 13 </ b> B is exposed on the surface side of the circuit member 11.

【0033】端子部14は、表面側に内部端子14Aを
裏面側に外部端子14Bを表裏一体的に有し、図示例で
は、ダイパッド13を囲むように各端子部14が配列さ
れている。そして、各外部端子14B面は、樹脂部材1
5の間に凹部を形成するように露出しており、また、各
内部端子14A面と各外部端子14B面は、それぞれ同
一平面上に位置している。
The terminal portion 14 has an internal terminal 14A on the front surface side and an external terminal 14B on the back surface integrally on the front and back sides. In the illustrated example, the terminal portions 14 are arranged so as to surround the die pad 13. The surface of each external terminal 14B is
5, the inner terminals 14A and the outer terminals 14B are located on the same plane.

【0034】このような回路部材11の材質、樹脂部材
15の材質は、上述の回路部材1、樹脂部材5と同様の
ものとすることができる。また、樹脂部材15の厚みは
20〜100μm程度が好ましい
The material of the circuit member 11 and the material of the resin member 15 can be the same as those of the circuit member 1 and the resin member 5 described above. Further, the thickness of the resin member 15 is preferably about 20 to 100 μm.

【0035】また、本発明の回路部材11は、ダイパッ
ド13の表面13A上に電気絶縁性の両面接着テープを
設けたものであってもよい。使用する両面接着テープと
しては、上述の回路部材1の場合と同様である。
The circuit member 11 of the present invention may be one in which an electrically insulating double-sided adhesive tape is provided on the surface 13A of the die pad 13. The double-sided adhesive tape to be used is the same as in the case of the circuit member 1 described above.

【0036】また、本発明の回路部材11は、図7に示
されるように、端子部14の外部端子14B面に半田か
らなる外部電極部材17を備えるものであってもよい。
Further, as shown in FIG. 7, the circuit member 11 of the present invention may include an external electrode member 17 made of solder on the surface of the external terminal 14B of the terminal portion 14.

【0037】さらに、本発明の回路部材11は、図8に
示されるように、ダイパッド13の厚みが外枠部材12
の厚みよりも薄い薄肉形状であってもよく、図示例では
表面13A側のみが回路部材11の表面側に露出したも
のとなっている。また、本発明の回路部材11は、図8
に示されるように、端子部14の外部端子14B面に貴
金属めっき層18を備えるものであってもよい。尚、上
述の回路部材1における端子数、端子配列等は例示であ
り、本発明がこれに限定されないことは勿論である。
Further, as shown in FIG. 8, the circuit member 11 of the present invention has a die pad 13 having a thickness equal to that of the outer frame member 12.
May be thinner than the thickness of the circuit member 11, and only the surface 13A side is exposed to the surface side of the circuit member 11 in the illustrated example. Further, the circuit member 11 of the present invention has
As shown in (1), a noble metal plating layer 18 may be provided on the surface of the external terminal 14B of the terminal portion 14. Note that the number of terminals, the terminal arrangement, and the like in the above-described circuit member 1 are merely examples, and it is a matter of course that the present invention is not limited to this.

【0038】樹脂封止型半導体装置用の回路部材の製造
方法 次に、本発明の回路部材の製造方法について説明する。
Production of circuit members for resin-encapsulated semiconductor devices
Method Next, a method for manufacturing a circuit member according to the present invention will be described.

【0039】図9および図10は、図1および図2に示
される回路部材1を例とした本発明の回路部材の製造方
法の一実施形態を示す工程図である。各工程は、上記の
図2に対応する樹脂封止型半導体装置の縦断面図で示し
てある。
FIGS. 9 and 10 are process diagrams showing one embodiment of a method for manufacturing a circuit member of the present invention using the circuit member 1 shown in FIGS. 1 and 2 as an example. Each step is shown in a longitudinal sectional view of the resin-sealed semiconductor device corresponding to FIG. 2 described above.

【0040】まず、第1の工程として、導電性基板21
の表裏に感光性レジストを塗布、乾燥して感光性レジス
ト層31を形成し(図9(A))、これを所望のフォト
マスクを介して露光した後、現像してレジストパターン
31A,31Bを形成する(図9(B))。導電性基板
21としては、上述のように42合金(Ni41%のF
e合金)、銅、銅合金等の金属基板(厚み100〜25
0μm)を使用することができ、この導電性基板21
は、両面を脱脂等を行い洗浄処理を施したものを使用す
ることが好ましい。また、感光性レジストとしては、従
来公知のもの、例えば、東京応化工業(株)製OFPR
1305等を使用することができる。
First, as a first step, the conductive substrate 21
A photosensitive resist is applied on the front and back surfaces of the photosensitive resist layer and dried to form a photosensitive resist layer 31 (FIG. 9A), which is exposed through a desired photomask, and then developed to form resist patterns 31A and 31B. It is formed (FIG. 9B). As described above, the conductive substrate 21 is made of a 42 alloy (Ni 41% F
e alloy), copper, copper alloy or other metal substrate (thickness 100 to 25)
0 μm) can be used.
It is preferable to use a material which has been subjected to a cleaning treatment after degreasing both surfaces. Further, as the photosensitive resist, conventionally known ones, for example, OFPR manufactured by Tokyo Ohka Kogyo Co., Ltd.
1305 etc. can be used.

【0041】次に、レジストパターン31Bが形成され
た導電性基板21の裏面を、耐エッチング性を有するフ
ィルム32で覆い、レジストパターン31Aを耐腐蝕膜
として導電性基板21の表面側から腐蝕液でエッチング
を行う(図9(C))。腐蝕液は、通常、塩化第二鉄水
溶液を使用し、導電性基板21の表面へのスプレーエッ
チングにて行う。このエッチング工程におけるエッチン
グ量は、導電性基板21の厚み方向に貫通しない程度に
調整する。これにより、ダイパッド23と、内部端子2
4Aを表面にもつ複数の端子部24と、これらの外側に
位置する外枠部材22とを、裏面側で連結した状態で備
える外形加工部材21′が得られる。
Next, the back surface of the conductive substrate 21 on which the resist pattern 31B is formed is covered with an etching-resistant film 32, and the resist pattern 31A is used as a corrosion-resistant film from the front side of the conductive substrate 21 with a corrosion liquid. Etching is performed (FIG. 9C). The etching solution is usually an aqueous solution of ferric chloride, and is spray-etched on the surface of the conductive substrate 21. The amount of etching in this etching step is adjusted so as not to penetrate the conductive substrate 21 in the thickness direction. Thereby, the die pad 23 and the internal terminal 2
An outer shape processing member 21 'having a plurality of terminal portions 24 having 4A on the front surface and outer frame members 22 located outside thereof in a state of being connected on the back surface side is obtained.

【0042】次いで、第2の工程として、レジストパタ
ーン31Aを剥離して除去した後、外形加工部材21′
の表面(エッチング加工がなされた面)側の外枠部材2
2を除いた領域に電気絶縁性の樹脂層25を形成する
(図9(D))。電気絶縁性の樹脂は、従来公知の樹脂
を使用することができ、例えば、熱硬化型ポリイミドペ
ースト330(宇部興産(株)製ユピタイトUPAシリ
ーズ)等を挙げることができる。樹脂層25は、例え
ば、スクリーン印刷法により塗布し、必要に応じて硬化
処理を施して形成することができ、厚みは10〜100
μm程度とすることが好ましい。
Next, as a second step, after removing and removing the resist pattern 31A, the outer shape processing member 21 'is formed.
Outer frame member 2 on the surface (the surface that has been subjected to the etching process)
An electrically insulating resin layer 25 is formed in a region excluding the region 2 (FIG. 9D). As the electrically insulating resin, a conventionally known resin can be used, and examples thereof include a thermosetting polyimide paste 330 (Upitite UPA series manufactured by Ube Industries, Ltd.). The resin layer 25 can be formed by, for example, applying a screen printing method and performing a curing process as needed, and has a thickness of 10 to 100.
It is preferable that the thickness be about μm.

【0043】次いで、第3の工程として、各端子部24
の内部端子24Aを露出させるように上記の樹脂層25
を除去して開口部25aを形成する(図10(A))。
この樹脂層25の除去は、例えば、レーザー照射により
行うことができる。形成する開口部25aの大きさは、
既に形成した端子部24に応じて適宜設定することがで
きる。次に、樹脂層25を覆うように外形加工部材2
1′の表面を耐エッチング性を有するフィルム33で覆
い、また、裏面のフィルム32を取り去る(図10
(B))。次いで、レジストパターン31Bを耐腐蝕膜
として導電性基板21の裏面側から腐蝕液でエッチング
を行う。腐蝕液は、上記のエッチングと同様であり、外
形加工部材21′の裏面へのスプレーエッチングにて行
う。このエッチング工程におけるエッチング量は、導電
性基板21の厚み方向で上記の樹脂層25(外枠部材2
2とダイパッド23と各端子部24の間に介在する樹脂
層)が露出する程度に調整する。その後、レジストパタ
ーン31Bを剥離して除去し、上記のフィルム33も除
去することにより、本発明の回路部材1が得られる(図
10(C))。尚、得られた回路部材1の端子部4の内
部端子4Aと外部端子4Bに金めっき層6を形成するこ
とも可能である(図10(D))。また、外部端子4B
に半田からなる外部電極部材7を形成することにより、
図3に示される回路部材1が得られる。
Next, as a third step, each terminal 24
Of the resin layer 25 so as to expose the internal terminals 24A.
Is removed to form an opening 25a (FIG. 10A).
The removal of the resin layer 25 can be performed by, for example, laser irradiation. The size of the opening 25a to be formed is
It can be set appropriately according to the terminal portion 24 already formed. Next, the outer shape processing member 2 is covered so as to cover the resin layer 25.
1 'is covered with a film 33 having etching resistance, and the film 32 on the back is removed (FIG. 10).
(B)). Next, the resist pattern 31B is etched with a corrosion liquid from the back surface side of the conductive substrate 21 as a corrosion resistant film. The etching liquid is similar to the above-described etching, and is performed by spray etching on the back surface of the outer shape processing member 21 '. The amount of etching in this etching step depends on the resin layer 25 (the outer frame member 2) in the thickness direction of the conductive substrate 21.
2 is adjusted to such an extent that the resin layer interposed between the die pad 23 and each terminal portion 24 is exposed. Thereafter, the resist pattern 31B is peeled off and removed, and the above-mentioned film 33 is also removed, whereby the circuit member 1 of the present invention is obtained (FIG. 10C). The gold plating layer 6 can be formed on the internal terminals 4A and the external terminals 4B of the terminal portion 4 of the obtained circuit member 1 (FIG. 10D). In addition, external terminal 4B
By forming the external electrode member 7 made of solder on
The circuit member 1 shown in FIG. 3 is obtained.

【0044】上述の図4に示されるようなダイパッド3
の厚みが外枠部材2の厚みよりも薄い薄肉形状である回
路部材も、裏面に形成するレジストパターン31Bのパ
ターン形状を変える(ダイパッドの形成位置にあたる部
位にレジストパターンを設けない)ことにより、上述と
同様に作製することができる。
The die pad 3 as shown in FIG.
The circuit member whose thickness is thinner than the thickness of the outer frame member 2 is also changed by changing the pattern shape of the resist pattern 31B formed on the back surface (no resist pattern is provided at the position corresponding to the formation position of the die pad). It can be manufactured in the same manner as described above.

【0045】樹脂封止型半導体装置用の回路部材の製造
方法 図11および図12は、図5および図6に示される回路
部材11を例とした本発明の回路部材の製造方法の他の
実施形態を示す工程図である。各工程は、上記の図6に
対応する樹脂封止型半導体装置の縦断面図で示してあ
る。
Production of circuit members for resin-encapsulated semiconductor devices
Method FIGS. 11 and 12 are process diagrams showing another embodiment of the method for manufacturing a circuit member of the present invention using the circuit member 11 shown in FIGS. 5 and 6 as an example. Each step is shown in a vertical sectional view of the resin-sealed semiconductor device corresponding to FIG.

【0046】まず、第1の工程として、導電性基板41
の表裏に感光性レジストを塗布、乾燥して感光性レジス
ト層51を形成し(図11(A))、これを所望のフォ
トマスクを介して露光した後、現像してレジストパター
ン51A,51Bを形成する(図11(B))。使用す
る導電性基板41、感光性レジストは、上述の製造方法
と同様とすることができる。
First, as a first step, the conductive substrate 41
The photosensitive resist layer 51 is formed by applying a photosensitive resist on the front and back surfaces of the resist pattern and drying it (FIG. 11A), exposing it through a desired photomask, and developing it to form the resist patterns 51A and 51B. It is formed (FIG. 11B). The conductive substrate 41 and the photosensitive resist used can be the same as those in the above-described manufacturing method.

【0047】次に、レジストパターン51Aが形成され
た導電性基板41の表面を、耐エッチング性を有するフ
ィルム52で覆い、レジストパターン51Bを耐腐蝕膜
として導電性基板41の裏面側から腐蝕液でエッチング
を行う(図11(C))。使用する腐蝕液、エッチング
方法は上述の製造方法と同様とすることができる。この
エッチング工程におけるエッチング量は、導電性基板4
1の厚み方向に貫通しない程度に調整する。これによ
り、ダイパッド43と、外部端子44Bを裏面にもつ複
数の端子部44と、これらの外側に位置する外枠部材4
2とを、表面側で連結した状態で備える外形加工部材4
1′が得られる。
Next, the surface of the conductive substrate 41 on which the resist pattern 51A is formed is covered with an etching-resistant film 52, and the resist pattern 51B is used as a corrosion-resistant film from the back side of the conductive substrate 41 with a corrosion liquid. Etching is performed (FIG. 11C). The etchant used and the etching method can be the same as those described above. The amount of etching in this etching step depends on the conductive substrate 4
1 is adjusted so as not to penetrate in the thickness direction. Thereby, the die pad 43, the plurality of terminal portions 44 having the external terminals 44B on the back surface, and the outer frame member 4 located outside these are provided.
2 with the outer shape processing member 2 connected to the front side
1 'is obtained.

【0048】次いで、第2の工程として、レジストパタ
ーン51Bを剥離して除去した後、外形加工部材41′
の裏面(エッチング加工がなされた面)側の外枠部材4
2を除いた領域に電気絶縁性の樹脂層45を形成する
(図11(D))。使用する電気絶縁性の樹脂、樹脂層
25の形成方法、厚み等は、上述の製造方法と同様とす
ることができる。
Next, as a second step, after removing and removing the resist pattern 51B, the outer shape processing member 41 'is formed.
Outer frame member 4 on the back surface (the surface that has been etched) of
An electrically insulating resin layer 45 is formed in a region excluding the region 2 (FIG. 11D). The electrically insulating resin used, the method of forming the resin layer 25, the thickness, and the like can be the same as those in the above-described manufacturing method.

【0049】次いで、第3の工程として、各端子部44
の外部端子44Bを露出させるように上記の樹脂層45
を除去して開口部45aを形成する(図12(A))。
この樹脂層45の除去は、例えば、レーザー照射により
行うことができ、形成する開口部45aの大きさは、既
に形成した端子部44に応じて適宜設定することができ
る。次に、樹脂層45を覆うように外形加工部材41′
の裏面を耐エッチング性を有するフィルム53で覆い、
また、表面に存在するフィルム52を取り去る(図12
(B))。次いで、レジストパターン51Aを耐腐蝕膜
として導電性基板41の表面側から腐蝕液でエッチング
を行う。腐蝕液は、上記のエッチングと同様であり、外
形加工部材41′の裏面へのスプレーエッチングにて行
う。このエッチング工程におけるエッチング量は、導電
性基板41の厚み方向で上記の樹脂層45(外枠部材4
2とダイパッド43と各端子部44の間に介在する樹脂
層)が露出する程度に調整する。その後、レジストパタ
ーン51Aを剥離して除去し、上記のフィルム53も除
去することにより、本発明の回路部材11が得られる
(図12(C))。尚、得られた回路部材11の端子部
14の内部端子14Aと外部端子14Bに金めっき層1
6を形成することも可能である(図12(D))。ま
た、外部端子14Bに半田からなる外部電極部材17を
形成することにより、図7に示される回路部材11が得
られる。
Next, as a third step, each terminal 44
Resin layer 45 so as to expose the external terminals 44B.
Is removed to form an opening 45a (FIG. 12A).
The removal of the resin layer 45 can be performed by, for example, laser irradiation, and the size of the opening 45a to be formed can be appropriately set according to the terminal 44 already formed. Next, the outer shape processing member 41 ′ is covered so as to cover the resin layer 45.
Is covered with a film 53 having etching resistance,
Further, the film 52 existing on the surface is removed (FIG. 12).
(B)). Next, etching is performed from the surface side of the conductive substrate 41 with a corrosion liquid using the resist pattern 51A as a corrosion resistant film. The etching liquid is similar to the above-described etching, and is performed by spray etching on the back surface of the outer shape processing member 41 '. The amount of etching in this etching step depends on the resin layer 45 (outer frame member 4) in the thickness direction of the conductive substrate 41.
2 is adjusted to such an extent that the resin layer interposed between the die pad 43 and each terminal portion 44 is exposed. Thereafter, the resist pattern 51A is peeled off and removed, and the film 53 is also removed, whereby the circuit member 11 of the present invention is obtained (FIG. 12C). The inner terminal 14A and the outer terminal 14B of the terminal portion 14 of the obtained circuit member 11 are provided with the gold plating layer 1.
6 can also be formed (FIG. 12D). Also, by forming the external electrode member 17 made of solder on the external terminal 14B, the circuit member 11 shown in FIG. 7 is obtained.

【0050】さらに、上述の図8に示されるようなダイ
パッド13の厚みが外枠部材12の厚みよりも薄い薄肉
形状である回路部材も、表面に形成するレジストパター
ン51Aのパターン形状を変える(ダイパッドの形成位
置にあたる部位にレジストパターンを設けない)ことに
より、上述と同様に作製することができる。
Further, as shown in FIG. 8, the thickness of the die pad 13 is thinner than that of the outer frame member 12, and the circuit member having a thin wall shape also changes the pattern shape of the resist pattern 51A formed on the surface (die pad). (A resist pattern is not provided at a position corresponding to the formation position of (1)), thereby making it possible to manufacture in the same manner as described above.

【0051】樹脂封止型半導体装置 次に、本発明の樹脂封止型半導体装置を、その製造方法
を示しながら説明する。
Next, a resin-sealed semiconductor device of the present invention will be described with reference to a method of manufacturing the same.

【0052】図1および図2に示される本発明の回路部
材1を用いた樹脂封止型半導体装置について図13を参
照しながら説明する。
A resin-sealed semiconductor device using the circuit member 1 of the present invention shown in FIGS. 1 and 2 will be described with reference to FIG.

【0053】まず、本発明の回路部材1のダイパッド3
の表面側に半導体素子65を接着剤66を用いて搭載す
る(図13(A))。この場合、半導体素子65は樹脂
部材5を介してダイパッド3上に搭載されている。
First, the die pad 3 of the circuit member 1 of the present invention
The semiconductor element 65 is mounted on the surface side of the substrate using an adhesive 66 (FIG. 13A). In this case, the semiconductor element 65 is mounted on the die pad 3 via the resin member 5.

【0054】次いで、搭載した半導体素子65の端子6
5aと、回路部材1の端子部4の内部端子4Aとを、ワ
イヤ67で電気的に接続する(図13(B))。
Next, the terminal 6 of the mounted semiconductor element 65
5a and the internal terminals 4A of the terminal portions 4 of the circuit member 1 are electrically connected by wires 67 (FIG. 13B).

【0055】次に、外部端子4Bおよびダイパッドの裏
面3Bを外部に露出させるようにして、ダイパッド3、
端子部4、樹脂部材5、半導体素子65およびワイヤ6
7を封止部材68で封止する(図13(C))。
Next, the external terminal 4B and the back surface 3B of the die pad are exposed to the outside so that the die pad 3
Terminal part 4, resin member 5, semiconductor element 65 and wire 6
7 is sealed with a sealing member 68 (FIG. 13C).

【0056】次いで、回路部材1の外枠部材2を除去し
て、本発明の半導体装置61とする(図13(D))。
また、外部に露出している外部端子4Bに半田からなる
外部電極69を形成することができる(図13
(E))。これにより、BGA(Ball Grid
Array)タイプの半導体装置となっている。
Next, the outer frame member 2 of the circuit member 1 is removed to obtain a semiconductor device 61 of the present invention (FIG. 13D).
Further, external electrodes 69 made of solder can be formed on the external terminals 4B exposed to the outside (FIG. 13).
(E)). Thereby, BGA (Ball Grid)
(Array) type semiconductor device.

【0057】図3および図4に示される回路部材を用い
ても、上記と同様に本発明の樹脂封止型半導体装置を作
製することができる。尚、上述の樹脂封止型半導体装置
1における端子数、端子配列等は例示であり、本発明が
これに限定されないことは勿論である。
Even when the circuit members shown in FIGS. 3 and 4 are used, the resin-sealed semiconductor device of the present invention can be manufactured in the same manner as described above. Note that the number of terminals, terminal arrangement, and the like in the above-described resin-sealed semiconductor device 1 are merely examples, and the present invention is not limited thereto.

【0058】樹脂封止型半導体装置 次に、図5および図6に示される本発明の回路部材11
を用いた樹脂封止型半導体装置について図14を参照し
ながら説明する。
Resin-sealed semiconductor device Next, the circuit member 11 of the present invention shown in FIGS.
Will be described with reference to FIG.

【0059】まず、本発明の回路部材11のダイパッド
13上に半導体素子75を電気絶縁性の両面接着テープ
76を用いて搭載する(図14(A))。
First, a semiconductor element 75 is mounted on the die pad 13 of the circuit member 11 of the present invention using an electrically insulating double-sided adhesive tape 76 (FIG. 14A).

【0060】次いで、搭載した半導体素子75の端子7
5aと、回路部材11の端子部14の内部端子14Aと
を、ワイヤ77で電気的に接続する(図14(B))。
Next, the terminal 7 of the mounted semiconductor element 75 is
5a and the internal terminal 14A of the terminal portion 14 of the circuit member 11 are electrically connected by a wire 77 (FIG. 14B).

【0061】次に、外部端子14Bと樹脂部材15の裏
面15Bを外部に露出させるようにして、ダイパッド1
3、端子部14、樹脂部材15、半導体素子75および
ワイヤ77を封止部材78で封止する(図14
(C))。
Next, the die pad 1 is exposed so that the external terminals 14B and the back surface 15B of the resin member 15 are exposed to the outside.
3. The terminal portion 14, the resin member 15, the semiconductor element 75, and the wire 77 are sealed with a sealing member 78 (FIG. 14).
(C)).

【0062】次いで、回路部材11の外枠部材12を除
去して、本発明の半導体装置71とする(図14
(D))。また、外部に露出している外部端子14Bに
半田からなる外部電極79を形成することができる(図
14(E))。これにより、BGA(Ball Gri
d Array)タイプの半導体装置となっている。
Next, the outer frame member 12 of the circuit member 11 is removed to obtain a semiconductor device 71 of the present invention (FIG. 14).
(D)). Further, an external electrode 79 made of solder can be formed on the external terminal 14B exposed to the outside (FIG. 14E). Thereby, BGA (Ball Gri)
d Array) type semiconductor device.

【0063】図7および図8に示される回路部材を用い
ても、上記と同様に本発明の樹脂封止型半導体装置を作
製することができる。尚、上述の樹脂封止型半導体装置
1における端子数、端子配列等は例示であり、本発明が
これに限定されないことは勿論である。
Even if the circuit members shown in FIGS. 7 and 8 are used, the resin-sealed semiconductor device of the present invention can be manufactured in the same manner as described above. Note that the number of terminals, terminal arrangement, and the like in the above-described resin-sealed semiconductor device 1 are merely examples, and the present invention is not limited thereto.

【0064】[0064]

【実施例】次に、具体的な実施例を挙げて本発明を更に
詳細に説明する。
Next, the present invention will be described in more detail with reference to specific examples.

【0065】回路部材の作製 導電性基板として厚み0.125mmの銅合金板(古河
電気工業(株)製EFTEC64T−1/2H)を準備
し、脱脂処理、洗浄処理を行った後、この銅合金板の両
面に紫外線硬化型レジスト(東京応化工業(株)製OF
PR1305)を掛け流し法により塗布して乾燥した。
次いで、表面側および裏面側のレジスト層をそれぞれ所
定のフォトマスクを介して露光した後、現像してレジス
トパターンを形成した。次に、裏面を耐エッチング性を
もつフィルム(日立化成(株)製ヒタレックス)で被覆
し、その後、銅合金板の両面から塩化第二鉄水溶液を使
用してスプレーエッチングを行った。このエッチング
は、銅合金板の厚み方向で貫通しない程度とした。次い
で、洗浄後、有機アルカリ溶液を用いて表面側のレジス
トパターンを剥離除去した。これにより、ダイパッド
と、内部端子を表面にもつ複数の端子部と、これらの外
側に位置する外枠部材とを、裏面側で連結した状態で備
える外形加工部材が得られた。
Preparation of Circuit Member A copper alloy plate (EFTEC64T-1 / 2H manufactured by Furukawa Electric Co., Ltd.) having a thickness of 0.125 mm was prepared as a conductive substrate, degreased and cleaned, and then this copper alloy UV curable resist on both sides of the plate (OF of Tokyo Ohka Kogyo Co., Ltd.)
PR1305) was applied by a pouring method and dried.
Next, the resist layers on the front side and the back side were respectively exposed through a predetermined photomask, and then developed to form a resist pattern. Next, the back surface was covered with an etching-resistant film (Hitalex manufactured by Hitachi Chemical Co., Ltd.), and then spray etching was performed on both surfaces of the copper alloy plate using an aqueous ferric chloride solution. This etching was performed so as not to penetrate in the thickness direction of the copper alloy plate. Next, after washing, the resist pattern on the surface side was peeled off using an organic alkali solution. As a result, there was obtained an externally processed member provided with the die pad, the plurality of terminal portions having the internal terminals on the front surface, and the outer frame member located outside of the die pads connected on the back surface side.

【0066】次に、上記の外形加工部材の表面側の外枠
部材を除いた領域に、熱硬化型ポリイミドペースト33
0(宇部興産(株)製)をスクリーン印刷法に塗布(厚
み50μm)し、熱硬化して樹脂層を形成した。
Next, a thermosetting polyimide paste 33 was applied to the above-mentioned outer shape processing member except for the outer frame member on the surface side.
No. 0 (manufactured by Ube Industries, Ltd.) was applied by screen printing (thickness: 50 μm) and thermally cured to form a resin layer.

【0067】次いで、上記の樹脂層のうち、各端子部の
内部端子に相当する位置にレーザーを照射して、直径
0.25mmの開口を形成することにより、内部端子を
露出させた。
Next, a portion of the resin layer corresponding to the internal terminal of each terminal portion was irradiated with a laser to form an opening having a diameter of 0.25 mm, thereby exposing the internal terminal.

【0068】次に、樹脂層を覆うように上記と同じ耐エ
ッチング性フィルムを外形加工部材の表面に重ね、ま
た、裏面側を覆っている耐エッチング性フィルムを剥離
した。その後、裏面側のレジストパターンを耐腐蝕膜と
して銅合金板の裏面側からエッチングを行った。次い
で、洗浄後、有機アルカリ溶液を用いて裏面側のレジス
トパターンを剥離除去するとともに、表面側の耐エッチ
ング性フィルムを剥離除去して、本発明の回路部材を得
た。さらに、この回路部材の内部端子面と外部端子面に
金めっき層(厚み約5μm)を形成した。
Next, the same etching resistant film as described above was overlaid on the surface of the externally processed member so as to cover the resin layer, and the etching resistant film covering the back side was peeled off. Thereafter, etching was performed from the back side of the copper alloy plate using the resist pattern on the back side as a corrosion resistant film. Next, after washing, the resist pattern on the back side was peeled off and removed using an organic alkali solution, and the etching resistant film on the front side was peeled off to obtain a circuit member of the present invention. Further, a gold plating layer (about 5 μm in thickness) was formed on the internal terminal surface and the external terminal surface of this circuit member.

【0069】樹脂封止型半導体装置の作製 上述のように作製した本発明の回路部材のダイパッドを
覆う樹脂部材(ポリイミド樹脂)上に、ダイアタッチ剤
(エイブルスティック(株)製 エイブルボンド839
0)を用いて半導体素子(厚み約0.25mm)の回路
形成面の反対側を圧着して搭載した。
Fabrication of Resin-Encapsulated Semiconductor Device On a resin member (polyimide resin) covering the die pad of the circuit member of the present invention produced as described above, a die attach agent (Able Bond 839 manufactured by Able Stick Co., Ltd.)
0), the other side of the circuit forming surface of the semiconductor element (about 0.25 mm thick) was mounted by crimping.

【0070】次いで、回路部材の内部端子上の金めっき
層と、搭載した半導体素子の端子とを金ワイヤー(田中
電子工業(株)製 FA−30)により結線した。その
後、外部端子面を外部に露出させるようにして、端子
部、ダイパッド、半導体素子および金ワイヤーを樹脂材
料(日東電工(株)製MP−7400)で封止した。
Next, the gold plating layer on the internal terminal of the circuit member and the terminal of the mounted semiconductor element were connected by a gold wire (FA-30 manufactured by Tanaka Electronics Industry Co., Ltd.). Thereafter, the terminal portion, the die pad, the semiconductor element, and the gold wire were sealed with a resin material (MP-7400 manufactured by Nitto Denko Corporation) so that the external terminal surface was exposed to the outside.

【0071】次に、回路部材の外枠部材をプレスにより
除去し、外部に露出している外部端子に半田からなるボ
ール(直径0.3mm)を固着して外部電極を形成し
た。
Next, the outer frame member of the circuit member was removed by pressing, and a ball (0.3 mm in diameter) made of solder was fixed to an external terminal exposed outside to form an external electrode.

【0072】このようにして作製した樹脂封止型半導体
装置は外部電極数が60ピンであり、その外形寸法は5
mm四方と小型であり、非常に小型の樹脂封止型半導体
装置が実現できた。
The resin-encapsulated semiconductor device manufactured in this manner has 60 external electrodes and an external dimension of 5 pins.
A very small resin-encapsulated semiconductor device that is as small as mm square was realized.

【0073】[0073]

【発明の効果】以上詳述したように、本発明によれば回
路部材にリードの引き回しがないので半導体素子の占有
率が高くなり小型化が可能となって回路基板への実装密
度を向上させることができ、また、回路部材に設けられ
ている樹脂部材により回路部材が補強されているので、
微細化による回路部材の変形が防止され、さらに、外部
端子に外部電極を形成することにより、BGA(Bal
l Grid Array)タイプの半導体装置が可能
となり、本発明の樹脂封止型半導体装置は実装作業性、
ショート防止性が向上するとともにさらに、多ピン化へ
の対応が可能となり、本発明の回路部材は、本発明の製
造方法により簡便に製造することができる。
As described above in detail, according to the present invention, since the circuit member does not have lead routing, the occupancy of the semiconductor element is increased, the size is reduced, and the mounting density on the circuit board is improved. Since the circuit member is reinforced by the resin member provided on the circuit member,
Deformation of circuit members due to miniaturization is prevented, and furthermore, by forming external electrodes on external terminals, BGA (Bal
l Grid Array) type semiconductor device becomes possible.
The short-circuit prevention property is improved, and furthermore, it is possible to cope with the increase in the number of pins, and the circuit member of the present invention can be easily manufactured by the manufacturing method of the present invention.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の回路部材の一実施形態を示す平面図で
ある。
FIG. 1 is a plan view showing one embodiment of a circuit member of the present invention.

【図2】図1に示される回路部材のA−A線における縦
断面図である。
FIG. 2 is a longitudinal sectional view of the circuit member shown in FIG. 1 taken along line AA.

【図3】本発明の回路部材の他の実施形態を示す縦断面
図である。
FIG. 3 is a longitudinal sectional view showing another embodiment of the circuit member of the present invention.

【図4】本発明の回路部材の他の実施形態を示す縦断面
図である。
FIG. 4 is a longitudinal sectional view showing another embodiment of the circuit member of the present invention.

【図5】本発明の回路部材の他の実施形態を示す平面図
である。
FIG. 5 is a plan view showing another embodiment of the circuit member of the present invention.

【図6】図5に示される回路部材のB−B線における縦
断面図である。
6 is a vertical sectional view of the circuit member shown in FIG. 5, taken along line BB.

【図7】本発明の回路部材の他の実施形態を示す縦断面
図である。
FIG. 7 is a longitudinal sectional view showing another embodiment of the circuit member of the present invention.

【図8】本発明の回路部材の他の実施形態を示す縦断面
図である。
FIG. 8 is a longitudinal sectional view showing another embodiment of the circuit member of the present invention.

【図9】本発明の回路部材の製造方法の一実施形態を示
す工程図である。
FIG. 9 is a process chart showing one embodiment of a method for manufacturing a circuit member of the present invention.

【図10】本発明の回路部材の製造方法の一実施形態を
示す工程図である。
FIG. 10 is a process chart showing one embodiment of a method for manufacturing a circuit member of the present invention.

【図11】本発明の回路部材の製造方法の他の実施形態
を示す工程図である。
FIG. 11 is a process chart showing another embodiment of the method for manufacturing a circuit member of the present invention.

【図12】本発明の回路部材の製造方法の他の実施形態
を示す工程図である。
FIG. 12 is a process chart showing another embodiment of the method for producing a circuit member of the present invention.

【図13】本発明の樹脂封止型半導体装置の一実施形態
を説明するための製造工程図である。
FIG. 13 is a manufacturing process diagram for describing one embodiment of a resin-sealed semiconductor device of the present invention.

【図14】本発明の樹脂封止型半導体装置の他の実施形
態を説明するための製造工程図である。
FIG. 14 is a manufacturing process diagram for explaining another embodiment of the resin-sealed semiconductor device of the present invention.

【符号の説明】[Explanation of symbols]

1,11…回路部材 2,12…外枠部材 3,13…ダイパッド 4,14…端子部 4A,14A…内部端子 4B,14B…外部端子 5,15…樹脂部材 24A…内部端子 44B…外部端子 21,41…導電性基板 21′,41′…外形加工部材 25,45…樹脂層 61,71…樹脂封止型半導体装置 65,75…半導体素子 65a,75a…端子 67,77…ワイヤ 68,78…封止部材 69,79…外部電極 1,11 ... Circuit member 2,12 ... Outer frame member 3,13 ... Die pad 4,14 ... Terminal part 4A, 14A ... Internal terminal 4B, 14B ... External terminal 5,15 ... Resin member 24A ... Internal terminal 44B ... External terminal 21, 41 ... conductive substrate 21 ', 41' ... outer shape processing member 25, 45 ... resin layer 61, 71 ... resin-sealed semiconductor device 65, 75 ... semiconductor element 65a, 75a ... terminal 67, 77 ... wire 68, 78: sealing member 69, 79: external electrode

Claims (11)

【特許請求の範囲】[Claims] 【請求項1】 樹脂封止型半導体装置用の回路部材にお
いて、 外枠部材と、該外枠部材の内側に独立して配設されたダ
イパッドと、表面側に内部端子を裏面側に外部端子を表
裏一体的に有し前記外枠部材より内側の略一平面上に相
互に独立して配設された複数の端子部と、前記外枠部材
と前記ダイパッドと各端子部との間に介在する電気絶縁
性の樹脂部材とを備えることを特徴とする回路部材。
1. A circuit member for a resin-encapsulated semiconductor device, comprising: an outer frame member, a die pad independently disposed inside the outer frame member, an internal terminal on a front side, and an external terminal on a back side. A plurality of terminal portions which are integrally provided on the front and back sides and are arranged independently on a substantially flat surface inside the outer frame member, and interposed between the outer frame member, the die pad, and each terminal portion. A circuit member comprising: an electrically insulating resin member;
【請求項2】 前記端子部の内部端子面は、前記樹脂部
材間に凹部を形成するように露出していることを特徴と
する請求項1に記載の回路部材。
2. The circuit member according to claim 1, wherein an internal terminal surface of the terminal portion is exposed so as to form a concave portion between the resin members.
【請求項3】 前記端子部の外部端子面は、前記樹脂部
材間に凹部を形成するように露出していることを特徴と
する請求項1に記載の回路部材。
3. The circuit member according to claim 1, wherein the external terminal surface of the terminal portion is exposed so as to form a concave portion between the resin members.
【請求項4】 前記ダイパッドは、前記外枠部材に比べ
て薄肉であることを特徴とする請求項1乃至請求項3の
いずれかに記載の回路部材。
4. The circuit member according to claim 1, wherein the die pad is thinner than the outer frame member.
【請求項5】 前記端子部の外部端子面は、半田からな
る外部電極部材を備えることを特徴とする請求項1乃至
請求項4のいずれかに記載の回路部材。
5. The circuit member according to claim 1, wherein the external terminal surface of the terminal portion includes an external electrode member made of solder.
【請求項6】 前記端子部の外部端子面は、貴金属めっ
き層を備えることを特徴とする請求項1乃至請求項4の
いずれかに記載の回路部材。
6. The circuit member according to claim 1, wherein an external terminal surface of the terminal portion includes a noble metal plating layer.
【請求項7】 請求項1乃至請求項6のいずれかに記載
の回路部材のダイパッドの表面側に半導体素子を電気的
に絶縁して搭載し、該半導体素子の端子と回路部材の端
子部の内部端子とをワイヤにて電気的に接続し、少なく
とも各端子部の外部端子の一部を外部に露出させるよう
に全体を樹脂封止した状態で回路部材の外枠部材を除去
したことを特徴とする樹脂封止型半導体装置。
7. A semiconductor element is electrically insulated and mounted on the surface side of the die pad of the circuit member according to claim 1, and a terminal of the semiconductor element and a terminal part of the circuit member are provided. The inner terminal is electrically connected to the internal terminal by a wire, and the outer frame member of the circuit member is removed in a state where the whole is resin-sealed so that at least a part of the external terminal of each terminal portion is exposed to the outside. Resin-encapsulated semiconductor device.
【請求項8】 樹脂封止型半導体装置用の回路部材の製
造方法において、 (A)導電性基板の表面をエッチングして、表面側に内
部端子を裏面側に外部端子を表裏一体的に有する複数の
端子部と、ダイパッドと、前記端子部と前記ダイパッド
の外側に位置する外枠部材とを、裏面側で連結された状
態で備える外形加工部材を作成する第1の工程と、 (B)前記外形加工部材のエッチングがなされた表面側
に電気絶縁性の樹脂層を設ける第2の工程と、 (C)各端子部の内部端子面を露出させるように前記樹
脂層を除去するとともに、前記外形加工部材の裏面をエ
ッチングして外枠部材と各端子部とダイパッドとを電気
的に独立させる第3の工程と、を備えることを特徴とす
る回路部材の製造方法。
8. A method of manufacturing a circuit member for a resin-encapsulated semiconductor device, comprising: (A) etching the surface of a conductive substrate to integrally have internal terminals on the front side and external terminals on the back side; (B) a first step of preparing an externally processed member including a plurality of terminal portions, a die pad, and an outer frame member located outside the terminal portion and the die pad, connected on a back surface side; A second step of providing an electrically insulating resin layer on the etched surface of the outer shape processing member; and (C) removing the resin layer so as to expose the internal terminal surfaces of the respective terminal portions; A third step of etching the back surface of the outer shape processing member to electrically separate the outer frame member, each terminal portion, and the die pad from each other.
【請求項9】 樹脂封止型半導体装置用の回路部材の製
造方法において、 (A)導電性基板の裏面をエッチングして、表面側に内
部端子を裏面側に外部端子を表裏一体的に有する複数の
端子部と、ダイパッドと、前記端子部と前記ダイパッド
の外側に位置する外枠部材とを、表面側で連結された状
態で備える外形加工部材を作成する第1の工程と、 (B)前記外形加工部材のエッチングがなされた裏面側
に電気絶縁性の樹脂層を設ける第2の工程と、 (C)各端子部の外部端子面を露出させるように前記樹
脂層を除去するとともに、前記外形加工部材の表面をエ
ッチングして外枠部材と各端子部とダイパッドとを電気
的に独立させる第3の工程と、を備えることを特徴とす
る回路部材の製造方法。
9. A method of manufacturing a circuit member for a resin-encapsulated semiconductor device, comprising: (A) etching a back surface of a conductive substrate to integrally have internal terminals on a front surface side and external terminals on a back surface side; (B) a first step of preparing an externally processed member including a plurality of terminal portions, a die pad, and an outer frame member located outside the terminal portion and the die pad, connected to each other on a front surface side; A second step of providing an electrically insulating resin layer on the etched back surface side of the outer shape processing member; and (C) removing the resin layer so as to expose an external terminal surface of each terminal portion; A third step of etching the surface of the outer shape processing member to electrically isolate the outer frame member, each terminal portion, and the die pad from each other.
【請求項10】 内部端子面に貴金属めっき層を形成す
る工程を有することを特徴とする請求項8または請求項
9に記載の回路部材の製造方法。
10. The method according to claim 8, further comprising the step of forming a noble metal plating layer on the internal terminal surface.
【請求項11】 外部端子面に半田からなる外部電極部
材を形成する工程を有することを特徴とする請求項8乃
至請求項10のいずれかに記載の回路部材の製造方法。
11. The method according to claim 8, further comprising the step of forming an external electrode member made of solder on the external terminal surface.
JP13670399A 1999-05-18 1999-05-18 Circuit member manufacturing method Expired - Fee Related JP3983930B2 (en)

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JP2000332145A true JP2000332145A (en) 2000-11-30
JP3983930B2 JP3983930B2 (en) 2007-09-26

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