JP2000327370A - Partition wall-forming material and glass composition for plasma display panel - Google Patents
Partition wall-forming material and glass composition for plasma display panelInfo
- Publication number
- JP2000327370A JP2000327370A JP14506299A JP14506299A JP2000327370A JP 2000327370 A JP2000327370 A JP 2000327370A JP 14506299 A JP14506299 A JP 14506299A JP 14506299 A JP14506299 A JP 14506299A JP 2000327370 A JP2000327370 A JP 2000327370A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- plasma display
- partition wall
- glass powder
- display panel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011521 glass Substances 0.000 title claims abstract description 54
- 239000000463 material Substances 0.000 title claims abstract description 30
- 238000005192 partition Methods 0.000 title claims abstract description 25
- 239000000203 mixture Substances 0.000 title claims abstract description 15
- 239000000843 powder Substances 0.000 claims abstract description 41
- 239000000919 ceramic Substances 0.000 claims abstract description 15
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 6
- 229910000272 alkali metal oxide Inorganic materials 0.000 claims description 4
- 239000000470 constituent Substances 0.000 claims description 3
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 abstract description 14
- 239000000758 substrate Substances 0.000 abstract description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 8
- 229910052783 alkali metal Inorganic materials 0.000 abstract description 4
- 150000001340 alkali metals Chemical class 0.000 abstract description 4
- 238000001035 drying Methods 0.000 abstract description 4
- 239000000377 silicon dioxide Substances 0.000 abstract description 3
- 238000004898 kneading Methods 0.000 abstract description 2
- 229910011255 B2O3 Inorganic materials 0.000 abstract 2
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Inorganic materials [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract 2
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 abstract 2
- 235000012239 silicon dioxide Nutrition 0.000 abstract 2
- 229910052682 stishovite Inorganic materials 0.000 abstract 2
- 229910052905 tridymite Inorganic materials 0.000 abstract 2
- 238000000034 method Methods 0.000 description 13
- 239000004014 plasticizer Substances 0.000 description 10
- 229920005992 thermoplastic resin Polymers 0.000 description 9
- 239000002904 solvent Substances 0.000 description 8
- 230000000694 effects Effects 0.000 description 6
- 230000004888 barrier function Effects 0.000 description 5
- 239000011787 zinc oxide Substances 0.000 description 5
- 238000002156 mixing Methods 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- IRIAEXORFWYRCZ-UHFFFAOYSA-N Butylbenzyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCC1=CC=CC=C1 IRIAEXORFWYRCZ-UHFFFAOYSA-N 0.000 description 2
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Natural products CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 2
- 239000001856 Ethyl cellulose Substances 0.000 description 2
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- 229920001249 ethyl cellulose Polymers 0.000 description 2
- 235000019325 ethyl cellulose Nutrition 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000004576 sand Substances 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 229940116411 terpineol Drugs 0.000 description 2
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- SIXWIUJQBBANGK-UHFFFAOYSA-N 4-(4-fluorophenyl)-1h-pyrazol-5-amine Chemical compound N1N=CC(C=2C=CC(F)=CC=2)=C1N SIXWIUJQBBANGK-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 102100031083 Uteroglobin Human genes 0.000 description 1
- 108090000203 Uteroglobin Proteins 0.000 description 1
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 229910052878 cordierite Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- JSKIRARMQDRGJZ-UHFFFAOYSA-N dimagnesium dioxido-bis[(1-oxido-3-oxo-2,4,6,8,9-pentaoxa-1,3-disila-5,7-dialuminabicyclo[3.3.1]nonan-7-yl)oxy]silane Chemical compound [Mg++].[Mg++].[O-][Si]([O-])(O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2)O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2 JSKIRARMQDRGJZ-UHFFFAOYSA-N 0.000 description 1
- RLRMXWDXPLINPJ-UHFFFAOYSA-N dioctan-2-yl benzene-1,2-dicarboxylate Chemical compound CCCCCCC(C)OC(=O)C1=CC=CC=C1C(=O)OC(C)CCCCCC RLRMXWDXPLINPJ-UHFFFAOYSA-N 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920001490 poly(butyl methacrylate) polymer Polymers 0.000 description 1
- 229920001483 poly(ethyl methacrylate) polymer Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- -1 polyethylene terephthalate Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 238000004017 vitrification Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052844 willemite Inorganic materials 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/14—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
- C03C8/04—Frit compositions, i.e. in a powdered or comminuted form containing zinc
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
- Gas-Filled Discharge Tubes (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明はプラズマディスプレ
ーパネル用隔壁形成材料に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a material for forming a partition for a plasma display panel.
【0002】[0002]
【従来の技術】プラズマディスプレーパネルは、自己発
光型のフラットディスプレーであり、軽量薄型、高視野
角等の優れた特性を備えており、また大画面化が可能で
あることから、最も将来性のある表示装置の一つとして
注目されている。2. Description of the Related Art A plasma display panel is a self-luminous type flat display, has excellent characteristics such as light weight and thinness, a wide viewing angle, and the like, and is capable of realizing a large screen. It is receiving attention as one of certain display devices.
【0003】プラズマディスプレーパネルは、一般に前
面ガラス基板と背面ガラス基板とが対向して設けられて
おり、これら基板の間の空間には、ガス放電部を区切る
ための多数の隔壁(バリアリブ、障壁ともいう)が形成
されている。隔壁を形成する材料としては、ガラス粉末
とセラミック粉末を混合した材料が広く用いられてい
る。この隔壁形成材料には、ガラス基板の変形を防止す
るために600℃以下で焼成できることが必要であり、
それゆえガラス粉末には、軟化点が630℃以下のガラ
スが使用されている。[0003] A plasma display panel is generally provided with a front glass substrate and a rear glass substrate facing each other. In a space between these substrates, a large number of partition walls (barrier ribs and barriers) for separating a gas discharge portion are provided. ) Is formed. As a material for forming the partition, a material obtained by mixing glass powder and ceramic powder is widely used. This partition wall forming material needs to be able to be fired at 600 ° C. or lower in order to prevent deformation of the glass substrate.
Therefore, glass having a softening point of 630 ° C. or less is used for the glass powder.
【0004】[0004]
【発明が解決しようとする課題】一般に軟化点が630
℃以下のガラスは、軟化点を低下させる成分としてPb
Oやアルカリ金属酸化物が含まれており、上記した隔壁
形成材料に用いられるガラス粉末にもこの種のガラスが
採用されている。Generally, the softening point is 630.
C. or lower glass has Pb as a component for lowering the softening point.
O and alkali metal oxides are contained, and this kind of glass is also used for the glass powder used for the above-mentioned partition wall forming material.
【0005】しかしながらPbOを含むガラスは、ガラ
ス粉末を作製する際の人体への影響や、廃棄物の処理が
問題となっている。またアルカリ金属成分は、電子部品
に対して悪影響を与えることが知られており、プラズマ
ディスプレーパネル用材料としても、できる限りアルカ
リ金属成分を含まないものが好まれている。However, the glass containing PbO has a problem of affecting the human body when producing glass powder and treating waste. Further, it is known that the alkali metal component has an adverse effect on electronic components, and as a material for a plasma display panel, a material containing as little alkali metal component as possible is preferred.
【0006】本発明の目的は、PbO及びアルカリ金属
成分を含有しなくても、600℃以下の温度で焼成可能
なプラズマディスプレーパネル用隔壁形成材料及びガラ
ス組成物を提供することである。An object of the present invention is to provide a partition wall forming material and a glass composition for a plasma display panel which can be fired at a temperature of 600 ° C. or less without containing PbO and an alkali metal component.
【0007】[0007]
【課題を解決するための手段】本発明者等は種々検討を
行ったところ、PbOやアルカリ金属酸化物を用いなく
とも、BaO、ZnO、B2O3を主成分とするガラス系
において、軟化点が630℃以下になる組成範囲が存在
することを見いだし、本発明として提案するものであ
る。The present inventors have made various studies and found that even if PbO or alkali metal oxide was not used, the glass based on BaO, ZnO, and B 2 O 3 was softened. The present inventors have found that there is a composition range where the point is 630 ° C. or lower, and propose the present invention.
【0008】即ち、本発明のプラズマディスプレーパネ
ル用隔壁形成材料は、モル%でBaO 5〜40%、Z
nO 20〜55%、B2O3 15〜50%、SiO2
0〜25%の組成を有するガラス粉末を構成成分とし
て含むことを特徴とする。That is, the material for forming a partition wall for a plasma display panel according to the present invention comprises 5 to 40%
nO 20~55%, B 2 O 3 15~50%, SiO 2
It is characterized by containing glass powder having a composition of 0 to 25% as a constituent.
【0009】また本発明の隔壁形成材料用ガラス組成物
は、モル%でBaO 5〜40%、ZnO 20〜55
%、B2O3 15〜50%、SiO2 0〜25%の組
成を有することを特徴とする。Further, the glass composition for a barrier rib forming material of the present invention comprises 5 to 40% of BaO and 20 to 55 of ZnO in mol%.
%, B 2 O 3 15~50% , and having a composition of SiO 2 0 to 25%.
【0010】[0010]
【発明の実施の形態】本発明のプラズマディスプレーパ
ネル用隔壁形成材料は、BaO−ZnO−B 2O3系のガ
ラス粉末を主たる構成成分として含む。この系のガラス
は、B2O3が50モル%以下の範囲において、軟化点が
630℃以下となる組成領域が存在する。またこの領域
では熱膨張係数が高くなる傾向があるため、ZnO量を
比較的多く含有させて、ガラス基板に適合した熱膨張係
数に調整したものである。DESCRIPTION OF THE PREFERRED EMBODIMENTS A plasma display according to the present invention.
The material for forming the barrier ribs for the tunnel is BaO-ZnO-B. TwoOThreeMoth of system
Contains lath powder as the main constituent. Glass of this system
Is BTwoOThreeIs within the range of 50 mol% or less, the softening point is
There is a composition region where the temperature is 630 ° C. or lower. Also this area
, The coefficient of thermal expansion tends to be high,
Includes relatively large amount of thermal expansion agent suitable for glass substrate
Adjusted to numbers.
【0011】以下に、ガラス粉末組成を上記のように限
定した理由を述べる。The reason why the glass powder composition is limited as described above will be described below.
【0012】BaOは軟化点を下げる成分であり、その
含有量は5〜40%、好ましくは10〜30%である。
BaOが5%より少ないとその効果が十分でなく、40
%より多いと熱膨張係数が高くなり、ガラス基板のそれ
と適合しなくなるため好ましくない。BaO is a component for lowering the softening point, and its content is 5 to 40%, preferably 10 to 30%.
If the content of BaO is less than 5%, the effect is not sufficient, and
%, The coefficient of thermal expansion becomes high, which is not preferable because it becomes incompatible with that of the glass substrate.
【0013】ZnOは軟化点を下げるとともに、熱膨張
係数を低下させる成分であり、その含有量は20〜55
%、好ましくは30〜50%である。ZnOが20%よ
り少ないと上記効果を得ることができず、55%より多
いとガラス中に結晶が析出して緻密な焼結体が得られな
くなるため好ましくない。ZnO is a component which lowers the softening point and lowers the coefficient of thermal expansion.
%, Preferably 30 to 50%. If the content of ZnO is less than 20%, the above effects cannot be obtained. If the content is more than 55%, crystals are precipitated in the glass and a dense sintered body cannot be obtained, which is not preferable.
【0014】B2O3はガラスの骨格を構成する成分であ
り、その含有量は15〜50%、好ましくは20〜50
%である。B2O3が15%より少ないとガラス化が困難
となる。一方、B2O3が50%より多いと軟化点が63
0℃以下にならないために600℃以下の温度で焼成す
ると緻密な焼結体を得られなくなり、パネル特性が低下
してしまう。B 2 O 3 is a component constituting the skeleton of glass, and its content is 15 to 50%, preferably 20 to 50%.
%. If B 2 O 3 is less than 15%, vitrification becomes difficult. On the other hand, if B 2 O 3 is more than 50%, the softening point is 63.
If it is fired at a temperature of 600 ° C. or less so that the temperature does not become 0 ° C. or less, a dense sintered body cannot be obtained, and the panel characteristics deteriorate.
【0015】SiO2はガラスの骨格を形成する成分で
あり、その含有量は0〜25%、好ましくは2〜15%
である。SiO2 が25%より多いと軟化点が630℃
以下にならないために600℃以下の温度で焼成すると
緻密な焼結体を得られなくなり、パネル特性が低下して
しまう。SiO 2 is a component forming a skeleton of glass, and its content is 0 to 25%, preferably 2 to 15%.
It is. If the content of SiO 2 is more than 25%, the softening point is 630 ° C.
If it is fired at a temperature of 600 ° C. or less, a dense sintered body cannot be obtained, and the panel characteristics will be reduced.
【0016】また上記成分の他にも、本発明の効果を損
なわない範囲で他の成分を添加することができる。例え
ば耐水性や耐薬品性を向上させるためにMgO、Ca
O、SrO等のアルカリ土類金属酸化物や、Al2O3、
ZrO2、TiO2を、またガラス安定化のためにP2O5
を添加してもよい。なお他成分の添加量は20モル%以
下、好ましくは15モル%以下に制限すべきである。In addition to the above components, other components can be added as long as the effects of the present invention are not impaired. For example, to improve water resistance and chemical resistance, MgO, Ca
Alkaline earth metal oxides such as O and SrO, Al 2 O 3 ,
ZrO 2 , TiO 2 and P 2 O 5 for glass stabilization
May be added. The addition amount of other components should be limited to 20 mol% or less, preferably 15 mol% or less.
【0017】本発明のプラズマディスプレーパネル用隔
壁形成材料は、形状維持の目的で上記ガラス粉末に加え
てセラミック粉末を含有することが好ましい。この場
合、その混合割合はガラス粉末50〜95重量%、セラ
ミック粉末5〜50重量%、特にガラス粉末60〜90
重量%、セラミック粉末10〜40重量%であることが
望ましい。セラミック粉末が50%より多いと焼結性が
不十分となって緻密な隔壁を形成することが困難にな
り、5%より少ないと形状維持効果が小さくなる。なお
セラミック粉末としては、例えばアルミナ、ジルコニ
ア、ジルコン、チタニア、コージエライト、ムライト、
シリカ、ウイレマイト、酸化錫、酸化亜鉛等を1種又は
2種以上組み合わせて使用することができる。The partition wall forming material for a plasma display panel of the present invention preferably contains a ceramic powder in addition to the above glass powder for the purpose of maintaining the shape. In this case, the mixing ratio is 50 to 95% by weight of glass powder, 5 to 50% by weight of ceramic powder, especially 60 to 90% by weight of glass powder.
% By weight and 10 to 40% by weight of ceramic powder. If the amount of the ceramic powder is more than 50%, the sinterability becomes insufficient and it is difficult to form a dense partition wall. If the amount is less than 5%, the shape maintaining effect is reduced. As the ceramic powder, for example, alumina, zirconia, zircon, titania, cordierite, mullite,
Silica, willemite, tin oxide, zinc oxide and the like can be used alone or in combination of two or more.
【0018】次に、本発明のプラズマディスプレーパネ
ル用隔壁形成材料の使用方法を説明する。本発明の材料
は、例えばペーストやグリーンシートなどの形態で使用
することができる。Next, a method for using the material for forming a partition wall for a plasma display panel of the present invention will be described. The material of the present invention can be used in the form of, for example, a paste or a green sheet.
【0019】ペーストの形態で使用する場合、上述した
ガラス粉末、及び必要に応じてセラミック粉末と共に、
熱可塑性樹脂、可塑剤、溶剤等を使用する。ガラス粉末
及びセラミック粉末のペースト中の含有量としては、3
0〜90重量%程度が一般的である。When used in the form of a paste, together with the above-mentioned glass powder and, if necessary, ceramic powder,
Use thermoplastic resin, plasticizer, solvent, etc. The content of the glass powder and the ceramic powder in the paste is 3
It is generally about 0 to 90% by weight.
【0020】熱可塑性樹脂は、乾燥後の膜強度を高め、
また柔軟性を付与する成分であり、その含有量は、0.
1〜20重量%程度が一般的である。熱可塑性樹脂とし
てはポリブチルメタアクリレート、ポリビニルブチラー
ル、ポリメチルメタアクリレート、ポリエチルメタアク
リレート、エチルセルロース等が使用可能であり、これ
らを単独あるいは混合して使用する。The thermoplastic resin increases the film strength after drying,
Further, it is a component that imparts flexibility, and its content is 0.1%.
It is generally about 1 to 20% by weight. As the thermoplastic resin, polybutyl methacrylate, polyvinyl butyral, polymethyl methacrylate, polyethyl methacrylate, ethyl cellulose and the like can be used, and these can be used alone or in combination.
【0021】可塑剤は、乾燥速度をコントロールすると
共に、乾燥膜に柔軟性を与える成分であり、その含有量
は0〜10重量%程度が一般的である。可塑剤としては
ブチルベンジルフタレート、ジオクチルフタレート、ジ
イソオクチルフタレート、ジカプリルフタレート、ジブ
チルフタレート等が使用可能であり、これらを単独ある
いは混合して使用する。The plasticizer is a component that controls the drying speed and imparts flexibility to the dried film. The content of the plasticizer is generally about 0 to 10% by weight. As the plasticizer, butylbenzyl phthalate, dioctyl phthalate, diisooctyl phthalate, dicapryl phthalate, dibutyl phthalate, and the like can be used, and these can be used alone or in combination.
【0022】溶剤は材料をペースト化するための材料で
あり、その含有量は10〜30重量%程度が一般的であ
る。溶剤としては、例えばターピネオール、ジエチレン
グリコールモノブチルエーテルアセテート、2,2,4
−トリメチル−1,3−ペンタジオールモノイソブチレ
ート等を単独または混合して使用することができる。The solvent is a material for making the material into a paste, and its content is generally about 10 to 30% by weight. Examples of the solvent include terpineol, diethylene glycol monobutyl ether acetate, 2,2,4
-Trimethyl-1,3-pentadiol monoisobutyrate or the like can be used alone or in combination.
【0023】ペーストの作製は、ガラス粉末、セラミッ
ク粉末、熱可塑性樹脂、可塑剤、溶剤等を用意し、これ
を所定の割合で混練することによりペーストとすること
ができる。The paste can be prepared by preparing a glass powder, a ceramic powder, a thermoplastic resin, a plasticizer, a solvent, and the like, and kneading them at a predetermined ratio to form a paste.
【0024】このようなペーストを用いて、隔壁を形成
するには、まずこれらのペーストをスクリーン印刷法や
一括コート法等を用いて塗布し、所定の膜厚の塗布層を
形成した後、乾燥させ、次いでレジスト膜を形成し、露
光・現像する。続いてサンドブラスト法を用いて不要な
部分を除去した後、焼成して所定形状の隔壁を得る。In order to form barrier ribs using such a paste, first, these pastes are applied by a screen printing method, a batch coating method, or the like, and a coating layer having a predetermined thickness is formed. Then, a resist film is formed, and exposed and developed. Subsequently, unnecessary portions are removed by using a sand blast method, followed by firing to obtain a partition having a predetermined shape.
【0025】本発明の材料をグリーンシートの形態で使
用する場合、上記ガラス粉末及びセラミック粉末と共
に、熱可塑性樹脂、可塑剤等を使用する。When the material of the present invention is used in the form of a green sheet, a thermoplastic resin, a plasticizer and the like are used together with the glass powder and the ceramic powder.
【0026】ガラス粉末及びセラミックフィラーのグリ
ーンシート中の含有量は、60〜80重量%程度が一般
的である。The content of the glass powder and the ceramic filler in the green sheet is generally about 60 to 80% by weight.
【0027】熱可塑性樹脂及び可塑剤としては、上記ペ
ーストの調製の際に用いられるのと同様の熱可塑性樹脂
及び可塑剤を用いることができ、熱可塑性樹脂の混合割
合としては、5〜30重量%程度が一般的であり、可塑
剤の混合割合としては、0〜10重量%程度が一般的で
ある。As the thermoplastic resin and the plasticizer, the same thermoplastic resin and plasticizer as those used in the preparation of the paste can be used. The mixing ratio of the thermoplastic resin is 5 to 30% by weight. %, And the mixing ratio of the plasticizer is generally about 0 to 10% by weight.
【0028】グリーンシートを作製する一般的な方法と
しては、上記ガラス粉末、セラミック粉末、熱可塑性樹
脂、可塑剤等とを用意し、これらにトルエン等の主溶媒
や、イソプロピルアルコール等の補助溶媒を添加してス
ラリーとし、このスラリーをドクターブレード法によっ
て、ポリエチレンテレフタレート(PET)等のフィル
ムの上にシート成形する。シート成形後、乾燥させるこ
とによって溶媒や溶剤を除去し、グリーンシートとする
ことができる。As a general method for producing a green sheet, the above glass powder, ceramic powder, thermoplastic resin, plasticizer, etc. are prepared, and a main solvent such as toluene and an auxiliary solvent such as isopropyl alcohol are added thereto. The slurry is added to form a slurry, and the slurry is formed into a sheet on a film such as polyethylene terephthalate (PET) by a doctor blade method. After forming the sheet, the solvent and the solvent are removed by drying to obtain a green sheet.
【0029】以上のようにして得られたグリーンシート
を、ガラス層を形成すべき箇所に熱圧着し、その後焼成
することによって、ガラス層を形成することができる。
隔壁を形成する場合には、熱圧着して塗布層を形成した
後に、上述のペーストの場合と同様にして所定の隔壁の
形状に加工する。The green sheet obtained as described above is thermocompression-bonded to a place where a glass layer is to be formed, and then fired to form a glass layer.
In the case of forming a partition, after forming a coating layer by thermocompression bonding, it is processed into a predetermined partition shape in the same manner as in the case of the paste described above.
【0030】上記の説明においては、隔壁形成方法とし
て、ペーストまたはグリーンシートを用いたサンドブラ
スト法を例にして説明しているが、本発明のプラズマデ
ィスプレーパネル用隔壁形成材料は、これらの方法に限
定されるものではなく、印刷積層法、リフトオフ法、感
光性ペースト法、感光性グリーンシート法、プレス成形
法などその他の形成方法にも適用され得る材料である。In the above description, the partition wall forming method is described by taking the sand blast method using a paste or a green sheet as an example. However, the partition wall forming material for a plasma display panel of the present invention is not limited to these methods. It is a material that can be applied to other forming methods such as a printing lamination method, a lift-off method, a photosensitive paste method, a photosensitive green sheet method, and a press molding method.
【0031】[0031]
【実施例】以下、実施例に基づいて本発明を説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below based on embodiments.
【0032】表1は、本発明の実施例(試料No.1〜
4)及び比較例(試料No.5)を示している。Table 1 shows examples of the present invention (samples No. 1 to No. 1).
4) and a comparative example (sample No. 5).
【0033】[0033]
【表1】 [Table 1]
【0034】各試料は次のようにして調製した。まず表
に示す組成となるように各種酸化物、炭酸塩等のガラス
原料を調合し、均一に混合した後、白金坩堝に入れて1
250℃で2時間溶融して均一なガラス体を得た。次い
でこれをアルミナボールミルで粉砕し、目開き53μm
の網篩で分級した。Each sample was prepared as follows. First, glass materials such as various oxides and carbonates are prepared so as to have the compositions shown in the table, and after uniformly mixed, put into a platinum crucible and put in a platinum crucible.
Melting was performed at 250 ° C. for 2 hours to obtain a uniform glass body. Next, this was pulverized by an alumina ball mill, and the aperture was 53 μm.
And classified with a sieve.
【0035】得られたガラス粉末について熱膨張係数及
び軟化点を測定した。その結果、No.1〜4の各試料
は熱膨張係数が77.6〜87.1×10-7/℃、軟化
点が615℃以下であった。これに対してNo.5の試
料は、軟化点が653℃と高かった。The thermal expansion coefficient and softening point of the obtained glass powder were measured. As a result, no. Samples 1 to 4 had a coefficient of thermal expansion of 77.6 to 87.1 × 10 −7 / ° C. and a softening point of 615 ° C. or less. On the other hand, No. Sample No. 5 had a high softening point of 653 ° C.
【0036】次にガラス粉末試料と各種のセラミック粉
末を、表に示す割合で混合し、隔壁形成材料とした。得
られた試料について焼結性を評価した。Next, a glass powder sample and various ceramic powders were mixed in the proportions shown in the table to obtain a partition wall forming material. The sinterability of the obtained sample was evaluated.
【0037】その結果、本発明の実施例であるNo.1
〜4の各試料は、600℃の焼成で良好な焼結性を示し
た。これに対して比較例であるNo.5の試料は、60
0℃で焼成すると緻密な焼結体が得られなかった。As a result, in the embodiment of the present invention, No. 1
Each of the samples Nos. To 4 exhibited good sinterability when fired at 600 ° C. On the other hand, in Comparative Example No. The sample of 5 is 60
When fired at 0 ° C., a dense sintered body could not be obtained.
【0038】なお熱膨張係数は、各試料を粉末プレス成
型し、焼成した後、直径4mm、長さ40mmの円柱状
に研磨加工し、JIS R3102に基づいて測定した
後、30〜300℃の温度範囲における値を求めた。ガ
ラスの軟化点はマクロ型示差熱分析計を用いて測定し、
第四の変曲点の値を軟化点とした。焼結性は、以下のよ
うにして評価した。まず各試料をエチルセルロースの5
%ターピネオール溶液に混合し、3本ロールミルにて混
練してペースト化した。次いでこのペーストを窓板ガラ
ス板(熱膨張係数85×10-7/℃)の上にスクリーン
印刷法で塗布し、膜厚200μmの塗布膜を形成した。
続いて、電気炉にて600℃で10分間焼成してガラス
膜を得た。さらに得られたガラス膜の上に油性インクを
塗りつけた後、アルコールで拭き取り、インクが良好に
拭き取れるものを「○」、インクが染み込んで拭き取り
困難なものを「×」として表中に示した。The coefficient of thermal expansion of each sample was determined by powder press molding and firing, followed by polishing to a column having a diameter of 4 mm and a length of 40 mm, and measuring the temperature in accordance with JIS R3102. The values in the range were determined. The softening point of the glass is measured using a macro-type differential thermal analyzer,
The value of the fourth inflection point was taken as the softening point. The sinterability was evaluated as follows. First, each sample was treated with ethyl cellulose 5
% Terpineol solution and kneaded with a three-roll mill to form a paste. Next, this paste was applied on a window glass plate (coefficient of thermal expansion: 85 × 10 −7 / ° C.) by a screen printing method to form a coating film having a thickness of 200 μm.
Subsequently, it was baked at 600 ° C. for 10 minutes in an electric furnace to obtain a glass film. Furthermore, after the oily ink was applied on the obtained glass film, it was wiped off with alcohol, and those that could be wiped off satisfactorily with the ink were indicated as “O”, and those that were difficult to wipe off with the ink soaked were indicated as “x” in the table. .
【0039】[0039]
【発明の効果】以上説明したように、本発明のプラズマ
ディスプレーパネル用隔壁形成材料は、600℃以下の
焼成温度で緻密な隔壁を形成することが可能である。し
かもPbOやアルカリ金属酸化物を含まないガラス粉末
を使用するため、環境上の問題を起こしたり、プラズマ
ディスプレーパネルの性能に悪影響を与えることがな
い。As described above, the partition wall forming material for a plasma display panel of the present invention can form a dense partition wall at a firing temperature of 600 ° C. or less. Moreover, since glass powder containing no PbO or alkali metal oxide is used, there is no environmental problem or adverse effect on the performance of the plasma display panel.
【0040】それゆえプラズマディスプレーパネルの隔
壁形成材料として好適である。Therefore, it is suitable as a partition wall forming material for a plasma display panel.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 波多野 和夫 滋賀県大津市晴嵐2丁目7番1号 日本電 気硝子株式会社内 Fターム(参考) 4G062 AA08 AA09 BB01 BB08 CC10 DA01 DA02 DA03 DA04 DB01 DC04 DC05 DD01 DE04 DE05 DE06 DF01 EA01 EB01 EC01 ED01 EE01 EF01 EG03 EG04 EG05 FA01 FA10 FB01 FC01 FD01 FE01 FF01 FG01 FH01 FJ01 FK01 FL01 GA01 GA10 GB01 GC01 GD01 GE01 HH01 HH03 HH05 HH07 HH09 HH11 HH13 HH15 HH17 HH20 JJ01 JJ03 JJ05 JJ07 JJ10 KK01 KK03 KK05 KK07 KK10 MM07 MM12 NN26 NN30 NN32 PP01 PP02 PP03 PP04 PP05 PP13 PP14 PP15 PP16 5C040 GF18 KA08 KA11 KB02 KB11 ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Kazuo Hatano 2-7-1 Hararashi, Otsu-shi, Shiga F-term in Nippon Electric Glass Co., Ltd. 4G062 AA08 AA09 BB01 BB08 CC10 DA01 DA02 DA03 DA04 DB01 DC04 DC05 DD01 DE04 DE05 DE06 DF01 EA01 EB01 EC01 ED01 EE01 EF01 EG03 EG04 EG05 FA01 FA10 FB01 FC01 FD01 FE01 FF01 FG01 FH01 FJ01 FK01 FL01 GA01 GA10 GB01 GC01 GD01 GE01 HH01 HH03 HHH HH HH HH HH HH HH HH HH HH HH HH KK07 KK10 MM07 MM12 NN26 NN30 NN32 PP01 PP02 PP03 PP04 PP05 PP13 PP14 PP15 PP16 5C040 GF18 KA08 KA11 KB02 KB11
Claims (4)
20〜55%、B2O3 15〜50%、SiO2 0〜
25%の組成を有するガラス粉末を構成成分として含む
ことを特徴とするプラズマディスプレーパネル用隔壁形
成材料。(1) 5 to 40% of BaO in mole%, ZnO
20~55%, B 2 O 3 15~50 %, SiO 2 0~
A partition wall forming material for a plasma display panel, comprising a glass powder having a composition of 25% as a constituent.
酸化物を実質的に含有しないことを特徴とする請求項1
のプラズマディスプレーパネル用隔壁形成材料。2. The glass powder according to claim 1, wherein the glass powder contains substantially no PbO and no alkali metal oxide.
For forming partition walls for plasma display panels.
末5〜50%からなることを特徴とする請求項1のプラ
ズマディスプレーパネル用隔壁形成材料。3. The material for forming a partition wall for a plasma display panel according to claim 1, comprising 50 to 95% of glass powder and 5 to 50% of ceramic powder.
20〜55%、B2O3 15〜50%、SiO2 0〜
25%の組成を有することを特徴とする隔壁形成用ガラ
ス組成物。4. The composition according to claim 4, wherein the molar percentage of BaO is 5 to 40%, and that of ZnO is
20~55%, B 2 O 3 15~50 %, SiO 2 0~
A glass composition for forming a partition wall having a composition of 25%.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14506299A JP4135259B2 (en) | 1999-05-25 | 1999-05-25 | Bulkhead forming material for plasma display panel |
TW89118580A TW561136B (en) | 1999-05-25 | 2000-09-11 | Composition containing lead-oxide free glass powder of low softening point useful for barrier rib in PDP |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14506299A JP4135259B2 (en) | 1999-05-25 | 1999-05-25 | Bulkhead forming material for plasma display panel |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2000327370A true JP2000327370A (en) | 2000-11-28 |
JP4135259B2 JP4135259B2 (en) | 2008-08-20 |
Family
ID=15376510
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14506299A Expired - Fee Related JP4135259B2 (en) | 1999-05-25 | 1999-05-25 | Bulkhead forming material for plasma display panel |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP4135259B2 (en) |
TW (1) | TW561136B (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1122220A1 (en) * | 2000-01-18 | 2001-08-08 | Central Glass Company, Limited | Low-melting glass for covering substrate |
KR100438916B1 (en) * | 2001-12-04 | 2004-07-03 | 엘지전자 주식회사 | Barrier rib material of Plasma Display Panel and Method of Fabricating Barrier Rib |
KR100444520B1 (en) * | 2002-02-01 | 2004-08-16 | 엘지전자 주식회사 | Barrier Rib Material of Plasma Display Panel and Method of Fabricating Barrier Rib |
WO2004074198A1 (en) * | 2003-02-19 | 2004-09-02 | Yamato Electronic Co., Ltd. | Lead-free glass material for use in sealing and, sealed article and method for sealing using the same |
WO2005000755A1 (en) * | 2003-06-27 | 2005-01-06 | Yamato Electronic Co., Ltd. | Lead-free glass material for use in sealing and, sealed article and method for sealing using the same |
JP2008150269A (en) * | 2006-12-20 | 2008-07-03 | Central Glass Co Ltd | Insulating protective coating material |
KR100883786B1 (en) * | 2007-06-15 | 2009-02-18 | 건국대학교 산학협력단 | Spherical glass powder for dielectrics and its manufacturing method |
EP2083436A1 (en) * | 2008-01-23 | 2009-07-29 | Samsung SDI Co., Ltd. | Plasma display panel |
JP2013139370A (en) * | 2011-12-07 | 2013-07-18 | Sumita Optical Glass Inc | Glaze composition for glass lining |
CN110590336A (en) * | 2019-10-08 | 2019-12-20 | 河南鼎天新材料有限公司 | Inorganic powder material with self-healing sintering function and preparation method and application thereof |
-
1999
- 1999-05-25 JP JP14506299A patent/JP4135259B2/en not_active Expired - Fee Related
-
2000
- 2000-09-11 TW TW89118580A patent/TW561136B/en not_active IP Right Cessation
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1122220A1 (en) * | 2000-01-18 | 2001-08-08 | Central Glass Company, Limited | Low-melting glass for covering substrate |
US6475605B2 (en) | 2000-01-18 | 2002-11-05 | Central Glass Company, Limited | Low-melting glass for covering substrate |
KR100438916B1 (en) * | 2001-12-04 | 2004-07-03 | 엘지전자 주식회사 | Barrier rib material of Plasma Display Panel and Method of Fabricating Barrier Rib |
KR100444520B1 (en) * | 2002-02-01 | 2004-08-16 | 엘지전자 주식회사 | Barrier Rib Material of Plasma Display Panel and Method of Fabricating Barrier Rib |
US7425518B2 (en) | 2003-02-19 | 2008-09-16 | Yamato Electronic Co., Ltd. | Lead-free glass material for use in sealing and, sealed article and method for sealing using the same |
WO2004074198A1 (en) * | 2003-02-19 | 2004-09-02 | Yamato Electronic Co., Ltd. | Lead-free glass material for use in sealing and, sealed article and method for sealing using the same |
EP1595856A4 (en) * | 2003-02-19 | 2009-09-16 | Yamato Electronic Co Ltd | Lead-free glass material for use in sealing and, sealed article and method for sealing using the same |
KR100981620B1 (en) * | 2003-02-19 | 2010-09-10 | 야마토 덴시 가부시키가이샤 | Lead-free glass materials for sealing processing, sealing processed materials and sealing processing methods using the same |
WO2005000755A1 (en) * | 2003-06-27 | 2005-01-06 | Yamato Electronic Co., Ltd. | Lead-free glass material for use in sealing and, sealed article and method for sealing using the same |
CN100372792C (en) * | 2003-06-27 | 2008-03-05 | 大和电子株式会社 | Lead-free glass material for use in sealing and, sealed article and method for sealing using the same |
US7585798B2 (en) | 2003-06-27 | 2009-09-08 | Yamato Electronic Co., Ltd. | Lead-free glass material for use in sealing and, sealed article and method for sealing using the same |
JP2008150269A (en) * | 2006-12-20 | 2008-07-03 | Central Glass Co Ltd | Insulating protective coating material |
KR100883786B1 (en) * | 2007-06-15 | 2009-02-18 | 건국대학교 산학협력단 | Spherical glass powder for dielectrics and its manufacturing method |
EP2083436A1 (en) * | 2008-01-23 | 2009-07-29 | Samsung SDI Co., Ltd. | Plasma display panel |
JP2013139370A (en) * | 2011-12-07 | 2013-07-18 | Sumita Optical Glass Inc | Glaze composition for glass lining |
CN110590336A (en) * | 2019-10-08 | 2019-12-20 | 河南鼎天新材料有限公司 | Inorganic powder material with self-healing sintering function and preparation method and application thereof |
CN110590336B (en) * | 2019-10-08 | 2021-10-19 | 河南鼎天新材料有限公司 | Inorganic powder material with self-healing sintering function and preparation method and application thereof |
Also Published As
Publication number | Publication date |
---|---|
TW561136B (en) | 2003-11-11 |
JP4135259B2 (en) | 2008-08-20 |
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