JP2000310772A - Manufacture of color filter - Google Patents

Abstract

PROBLEM TO BE SOLVED: To simply and accurately form a spacer part for keeping thickness of a liquid crystal layer (a cell gap) at a fixed interval. SOLUTION: In the method for manufacturing a color filter, a spacer part is formed by going through a step for forming a photosensitive resin composition layer with a first color selected from a group of three primary colors red, green and blue, which is preliminarily formed on a temporary supporting body, on a substrate with transferring, exposing and developing it through a photomask, and forming a pattern with the first color on a supporting body, a step to form a pattern with a color different from the first color with a similar method and a step to form a pattern with a color different from the first and the second colors and by partially laminating the photosensitive resin composition layers having at least two colors respectively. Also a spacer part is formed by similarly laminating a pattern with a color selected from the group of three primary colors and a black photosensitive resin composition layer.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a method for producing a color filter suitable for use in a liquid crystal color display or the like.

[0002]

2. Description of the Related Art Conventionally, a liquid crystal display device has a predetermined particle size between two substrates consisting of a color filter substrate and a counter electrode substrate in order to maintain the thickness (cell gap) of a liquid crystal layer at a constant interval. Spacer beads such as plastic beads and ceramic beads are scattered to bond the two substrates together. However, in the method described above,
There is a problem that it is difficult to uniformly disperse the spacer beads, and the cell gap cannot be made constant over the entire display area. Also, when a large amount of spacer beads is used, the cell gap is kept constant, but the aperture ratio of the liquid crystal layer portion decreases due to the spacer existing in the display area.
At the time of laminating two substrates, there was a problem that the alignment film and the transparent electrode were damaged by spacer beads and display defects occurred.

In order to solve such a problem, JP-A-63-8254 and JP-A-5-196946 propose that a spacer is formed by laminating two or three colored layers of a color filter substrate. ing. In this method, in order to form a spacer having a thickness corresponding to the required thickness (cell gap) of the liquid crystal layer, sufficient thickness and thickness accuracy of each colored layer are required.

[0004] As a method of forming a color filter,
1) printing method, 2) ink jet method, 3) micelle electrodeposition method,
4) A pigment dispersion method and the like are known. However, in the printing method, there is a concern that overlaying with high accuracy is difficult,
The problem with the ink jet method is that it is difficult to stably control the height of the overlapping portion of the colored layers. There is a concern that the micelle electrodeposition method requires a step of forming an electrodeposition pattern, and that it is difficult to stably produce a pigment-charged micelle dispersion solution and to stably manufacture a color filter.

At present, the most common method is the pigment dispersion method. The pigment dispersion method is carried out by repeating the application, exposure and development of a colored photosensitive resin liquid, and the thickness of the colored layer usually produced by this method makes it possible to obtain the required height of the spacer even by superposition. I can't. In addition, if the coating thickness of the colored layer is increased, unevenness in the thickness of the substrate in the central portion and the peripheral portion tends to occur.
Since the application of the second and subsequent colors is applied on the pattern of the color that has already been formed, unevenness in the thickness is likely to occur, and uniform control of the thickness is difficult.

In order to solve these problems, JP-A-9-43425 and JP-A-10-177109 disclose a method of laminating a colored layer composed of three primary colors on a resin matrix composed of a resin and a light-shielding agent. In addition, a method of laminating a resist layer and the like have been proposed, but all require a lamination of four or more layers, and it is difficult to precisely control the height of the spacer.

[0007]

SUMMARY OF THE INVENTION It is an object of the present invention to provide a method of manufacturing a color filter which can easily and accurately form a spacer portion on which a colored layer is laminated in view of the above problems. It is in.

[0008]

In order to achieve the above object, a method for manufacturing a color filter according to claim 1 includes the following steps: (1) a method of forming a red, green, and blue color filter formed on a temporary support; Forming a photosensitive resin composition layer having a first color selected from the group of primary colors on a substrate by transfer, exposing it to a predetermined pattern, developing it, and developing the pattern having the first color on the substrate; And (2) forming, by transfer, a photosensitive resin composition layer having a color different from the first color on the substrate on which the pattern of the first color is formed, and After exposure, developing to form a pattern having the second color on the substrate; and (3) forming the first and second patterns on the substrate on which the first and second color patterns are formed. A photosensitive resin composition layer having a color different from the second color is formed by transfer, and a predetermined pattern is formed. In After exposure, it has a step of forming a pattern having a color of the third to the developed substrate on, and
It is characterized in that a spacer portion is formed by partially laminating the photosensitive resin composition layers of at least two colors selected from the group of the three primary colors. Further, the dynamic viscosity (η ′) of the photosensitive resin composition layer formed on the temporary support is 4 × 10 ² <η ′ <at the temperature at which the photosensitive resin composition is transferred onto the substrate. It is preferably 1 × 10 ⁶ (poise). Furthermore, it is desirable to form a spacer portion on which a photosensitive resin composition layer of at least two colors selected from the group of three primary colors is partially laminated on a substrate on which thin film transistors are arranged. Further, the method for producing a color filter according to claim 4 includes: (1) a photosensitive material having a first color selected from the group consisting of three primary colors of red, green, and blue and black formed on a temporary support. Forming a resin composition layer on a substrate by transfer, exposing the resin composition layer to a predetermined pattern, developing the resin composition layer, and forming a pattern having the first color on the substrate; and (2) forming a pattern of the first color on the substrate. On a substrate on which a pattern is formed, a photosensitive resin composition layer having a color different from the first color is formed by transfer, and after exposure with a predetermined pattern, development is performed and the second color is formed on the substrate. And (3) forming a photosensitive resin composition layer having a color different from the first and second colors on the substrate on which the patterns of the first and second colors are formed. It is formed by transfer, exposed to light in a predetermined pattern, developed, and provided with the third color on the substrate. (4) forming a photosensitive pattern having a color different from the first, second and third colors on the substrate on which the first, second and third color patterns have been formed; After forming the resin composition layer by transfer and exposing in a predetermined pattern,
Developing a pattern having a fourth color on the substrate, and a photosensitive resin composition layer of at least one color selected from the group of the three primary colors and a black photosensitive resin composition It is characterized in that a spacer portion in which material layers are partially laminated is formed.

[0009]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be described below with reference to the drawings. First, the transfer material for a color filter of the present invention will be described. The transfer material for a color filter is an image forming material in which a colored photosensitive resin composition layer is provided on a temporary support. It is necessary that the temporary support for the colored photosensitive resin composition layer used in the present invention has flexibility and does not cause significant deformation, shrinkage or elongation even under pressure or under pressure and heat. It is. Examples of such a support include a polyethylene terephthalate film, a cellulose triacetate film, a polystyrene film, and a polycarbonate film. Biaxially oriented polyethylene terephthalate films are particularly preferred.

On the temporary support, a colored photosensitive resin composition layer is desirably provided directly or via an intermediate layer having ultraviolet transmittance and low oxygen permeability. Further, it is preferable to provide a thermoplastic resin layer for the purpose of avoiding air bubbles during transfer. In that case, it is preferable to laminate the temporary support, the thermoplastic resin layer, the intermediate layer, and the photosensitive resin composition layer in this order. These layers can be produced by dissolving the material constituting the layers in an appropriate solvent, and applying and drying the same. At this time, in the case of multi-layer coating on an already formed layer, it is necessary that the solvent does not attack the lower layer, but these solvents can be appropriately selected by those skilled in the art. .

[0011] The intermediate layer, after the colored photosensitive resin composition layer is brought into close contact with the transparent substrate, the temporary support is peeled off, and when the pattern exposure is performed, the photocuring reaction in the colored photosensitive resin composition layer is performed. It is provided as a barrier layer for preventing diffusion of oxygen from the air, which hinders the diffusion, and for preventing the thermoplastic resin layer and the photosensitive resin composition layer from being mixed when three layers are laminated. For this reason, it is preferable that the photosensitive resin composition layer is not mechanically peeled off from the colored photosensitive resin composition layer and has high oxygen blocking ability.

Such an intermediate layer is formed by applying a solution of a polymer directly onto a temporary support or through a thermoplastic resin layer. Suitable polymers for use in the intermediate layer include JP-B-46-32714 and JP-B-5640.
No. 824, polyvinyl ether / maleic anhydride polymers, water-soluble salts of carboxyalkyl cellulose, water-soluble cellulose ethers, water-soluble salts of carboxyalkyl starch, polyvinyl alcohol, polyvinyl pyrrolidone, various types Polyacrylamides, various water-soluble polyamides, water-soluble salts of polyacrylic acid, gelatin, ethylene oxide polymers, water-soluble salts of the group consisting of various starches and the like, copolymers of styrene / maleic acid, And maleate resins, and two of these
Combinations of more than one species are mentioned. Particularly preferred is a combination of polyvinyl alcohol and polyvinyl pyridone, and polyvinyl alcohol having a saponification rate of 80% or more is preferred.

The content of the polymer such as polyvinylpyrrolidone is preferably 1% by weight to 75% by weight of the solid content of the intermediate layer.
It is more preferably 1% to 60% by weight, and still more preferably 10% to 50% by weight. If it is less than 1% by weight, sufficient adhesion to the photosensitive resin layer cannot be obtained, and if it exceeds 75% by weight, the oxygen barrier ability is reduced. The thickness of the intermediate layer is very thin, about 0.1-5 μm, especially 0.2-μm. When the thickness of the intermediate layer is less than 0.1 μm, the oxygen permeability of the intermediate layer is too high, and when it exceeds 5 μm, it takes too much time during development or removal of the intermediate layer.

The resin constituting the thermoplastic resin layer preferably has a substantial softening point of 80 ° C. or less. As the alkali-soluble thermoplastic resin having a softening point of 80 ° C. or less,
Saponified product of copolymer of ethylene and acrylate, saponified product of styrene and (meth) acrylate copolymer, saponified product of vinyltoluene and (meth) acrylate copolymer, poly (meth) acrylic acid Preferably, at least one is selected from esters, saponified (meth) acrylate copolymers such as butyl (meth) acrylate and vinyl acetate, and the like. Edited by the Plastic Molding Industry Federation, published by the Industrial Research Council, October 1968
Among the organic polymers having a softening point of about 80 ° C. or lower, which are soluble in an aqueous alkali solution, can be used. Also, in the case of an organic polymer substance having a softening point exceeding 80 ° C., various plasticizers compatible with the polymer substance are added to the organic polymer substance to increase the substantial softening point to 80 ° C.
It is also possible to lower the temperature below ° C.

In order to control the adhesive strength between these organic high molecular substances and the temporary support, a substantial softening point is required.
It is possible to add various polymers, supercooled substances, adhesion improvers or surfactants, release agents and the like within a range not exceeding ℃. Specific examples of preferred plasticizers include polypropylene glycol, polyethylene glycol, dioctyl phthalate, diheptyl phthalate, dibutyl phthalate, tricresyl phosphate, cresyl diphenyl phosphate, and biphenyl diphenyl phosphate. The thickness of the thermoplastic resin layer is 6μ
m or more is preferable. The reason for this is that if the thickness of the thermoplastic resin layer is less than 6 μm, it is not possible to completely absorb the irregularities of the substrate having a thickness of 1 μm or more, and air bubbles are easily generated between the substrate and the substrate during transfer. The upper limit is 100 μm or less, preferably 50 μm, from the viewpoint of developability and manufacturing suitability.
m or less.

The photosensitive resin composition layer preferably has a dynamic viscosity (η ') within a certain range at a temperature (T ° C.) at which the photosensitive resin composition layer is transferred to a substrate.
The temperature at which the normal photosensitive resin composition layer is transferred to the substrate is 3
0 ° C <T <200 ° C, preferably 50 ° C <T <1
60 ° C. At such a transfer temperature, the dynamic viscosity (η ′) of the photosensitive resin composition is 4 × 10 ² <
η ′ <5 × 10 ⁶ (poise) is preferable, and more preferably 5 × 10 ² <η ′ <1 × 10 ⁶ (poise). When the dynamic viscosity (η ′) is smaller than 4 × 10 ² (poise), the photosensitive resin composition layer easily flows when the photosensitive resin composition layer is transferred to a substrate, and has a predetermined thickness. It is difficult to form the photosensitive resin composition layer of (1). On the other hand, when the dynamic viscosity (η ′) is greater than 5 × 10 ² (poise), when the photosensitive resin composition layer is transferred to the substrate,
The fluidity of the photosensitive resin composition layer becomes extremely low, and voids tend to be generated between the lower layer and the lower layer.

Most of the photosensitive resin composition layer using the known photopolymerizable composition has this property (dynamic viscosity), but a part of the known photosensitive resin composition layer has a thermoplastic viscosity. It can be further modified by adding a binder or a compatible plasticizer. As the material of the photosensitive resin composition layer of the present invention, all known photosensitive resins described in, for example, Japanese Patent Application No. 82262/1990 can be used. Specific examples include a photosensitive resin composition comprising a negative diazo resin and a binder, a photopolymerizable composition, a photosensitive resin composition comprising an azide compound and a binder, and a cinnamic acid type photosensitive resin composition. Among them, a photopolymerizable resin is particularly preferable. The photopolymerizable resin contains a photopolymerization initiator, a photopolymerizable monomer and a binder as basic components.

As the photosensitive resin composition, those which can be developed with an aqueous alkali solution and those which can be developed with an organic solvent are known, but from the viewpoint of preventing pollution and ensuring labor safety, an aqueous alkali solution is preferred. Those that can be developed are preferred.

Red, green, and blue pigments, which are the constituent colors of the color filter, are further added to the photosensitive resin composition layer. Preferred examples thereof include carmine 6B.
(C.I. 12490), phthalocyanine green (C.I. 74260), phthalocyanine blue (C.I.
I. 74160). The content of the pigment in the colored photosensitive resin composition is 1 to 30% by weight.
It is preferred that More preferably 5 to 20% by weight
It is.

The thickness of the photosensitive resin composition layer depends on the structure of the spacer portion finally formed on the color filter, the cell gap, and the film thickness in the steps from transfer of the photosensitive resin composition to post-baking. Is determined by the rate of decrease. In consideration of the color depth and developability of each colored layer, the thickness of each colored layer is preferably from 0.5 to 5 μm, more preferably from 1.5 to 4 μm.

Next, a method of manufacturing a color filter using the image forming material (transfer material for color filter) prepared by the above method will be described. A photosensitive resin composition layer formed on a temporary support is bonded to a glass substrate having a thickness of about 1 mm under pressure and heat. Conventionally known laminators and vacuum laminators can be used for lamination, and an auto-cut laminator can be used to further increase productivity. Thereafter, after the temporary support is peeled off, exposure and development are performed through a predetermined photomask, a thermoplastic resin layer, and an intermediate layer. Further, it is possible to perform exposure before peeling off the temporary support, and then peel off the temporary support for development. However, in order to obtain high resolution, it is preferable to peel off before exposure.

The development is carried out in a known manner by immersing in a solvent or aqueous developer, especially an aqueous alkaline solution, spraying the developer with a spray, rubbing with a brush, or irradiating with an ultrasonic wave. It is done by that.

The method for producing a color filter of the present invention comprises:
Using the transfer material for a color filter described above, a step of forming three primary color patterns by a transfer method is provided, and a spacer portion in which at least two of these color patterns are stacked is formed. For color filters, usually, 1) after forming a black matrix,
After forming a color pattern or 2) forming a color pattern, a black matrix is formed, but the formation of the black matrix is omitted in the figure. In the present invention,
The black matrix is not necessarily limited to the transfer method using the transfer material for a color filter of the present invention, and can be formed by applying the following method. These methods include, for example, 1) a method in which a metal thin film is formed by a sputtering method, a vacuum evaporation method, or the like, and the thin film is patterned to form a black matrix. 2) Light-shielding particles such as carbon black are contained. A method of forming a resin layer and patterning the resin layer to form a black matrix 3) forming a photosensitive resin layer containing light-shielding particles such as carbon black and patterning the photosensitive resin layer To form a black matrix. Among these methods, in the method 3), the method of forming the photosensitive resin composition layer on the substrate by the transfer method using the transfer material for a color filter of the present invention is simple and the thickness of the black matrix is small. It is particularly preferable in terms of control and the like.

[0024] Hereinafter, a method of manufacturing the spacer portion of the color filter will be described with reference to the drawings. FIG. 1 is a process chart showing a preferred embodiment of the method for producing a color filter of the present invention. First, a photosensitive resin composition layer (R) 10 laminated on a temporary support (not shown) is laminated on a substrate 12 on the surface where the black matrix is formed, and the temporary support is It is peeled off from the composition layer 10. In this state, pattern exposure is performed via the photomask 14.

Next, as shown in FIG. 1B, when the surface side of the photosensitive resin composition layer (R) 10 is developed, the first color pattern (R pattern) formed in the exposed area 16
Is formed. Thereafter, as shown in FIG. 1C, a photosensitive resin composition layer (G) 18 laminated on a temporary support (not shown) is laminated on a first color pattern (R pattern) 16. The temporary support is a photosensitive resin composition layer (G) 1
8 is peeled off. In this state, pattern exposure is performed through a photomask.

Next, as shown in FIG. 1D, when the surface side of the photosensitive resin composition layer (G) 18 is developed, a second color pattern (G pattern) formed in the exposed area 20
Is formed. Thereafter, as shown in FIG. 1E, a photosensitive resin composition layer (B) 22 laminated on a temporary support (not shown) is laminated on a second color pattern (G pattern) 20. The temporary support is a photosensitive resin composition layer (B) 2
Peeled from 2. When pattern exposure is performed through a photomask in this state, a third color pattern (B pattern) 24 is formed as shown in FIG.

In this manner, the R pattern 16, the G pattern 20, and the B pattern 24 are respectively formed, and the spacer portion (indicated by S in the drawing) in which these patterns are partially laminated is formed on the surface of the color filter. Are formed at predetermined intervals. In the drawing, an example of the spacer portion (s) in which the R pattern 16, the G pattern 20, and the B pattern 24 are partially laminated is shown.
Is arbitrarily selected depending on the thickness of the liquid crystal layer. Therefore, depending on the thickness of the liquid crystal layer, the spacer portion may be formed by two of the R pattern 16, the G pattern 20, and the B pattern 24. . Also, the present invention
Although not particularly shown, R pattern 16, G pattern 2
A method of manufacturing a color filter in which a spacer portion is formed by laminating one of the 0 and B patterns 24 and a black photosensitive resin composition layer is also included.

The method for producing a color filter according to the present invention comprises:
Since a photosensitive resin composition layer can be formed on a substrate by a transfer method, a color filter having a spacer portion in which patterns of each color are partially laminated is also formed on a substrate as shown in FIG. Can be. In FIG. 2, a gate 32, an insulating film 34, a semiconductor layer 36, a source 38, a drain 40, and a source electrode 4 are formed on a transparent substrate 30.
2, a drain electrode 44 and a source electrode 46 are provided, and a column electrode (source wiring) 48 and a column electrode (source wiring) 50
, And an interlayer insulating film (planarization layer) 52 is formed on these surfaces. On the surface of the interlayer insulating film (planarization layer) 52, an R pattern, a G pattern, and a B pattern are formed by a transfer method, and a spacer portion in which these patterns are partially laminated is formed. In addition,
In FIG. 2, 54 is a pixel electrode (transparent electrode), 56 is an alignment film,
58 is a liquid crystal layer and 60 is a counter electrode.

In the color filter in which the thin film transistors (TFTs) are arranged, it is easy to control the height of the spacer portion, and since the spacer portion does not exist in the pixel portion, the area of the display region is reduced. And the spacer portion has a light-shielding property, so that the contrast ratio does not decrease.

Further, a light-shielding layer is formed of a metal thin film on a transparent substrate, patterned in a matrix by photolithography, and then the colored photosensitive resin layer provided on the temporary support is transferred onto the metal thin film layer. By repeating pattern exposure and development, a color filter with no light leakage and a smooth surface can be manufactured by a simple process. Accordingly, it is possible to obtain a color filter in which disconnection of the transparent electrode hardly occurs and which is free from uneven gap and short-circuit due to contact with the counter substrate even in a narrow gap such as a ferroelectric liquid crystal panel.

Further, if necessary, a protective layer for physical and chemical protection and flattening of the surface of the color filter may be laminated on the color filter. As the protective layer, an acrylic, urethane or silicone resin film or a highly transparent film such as a metal oxide such as silicon oxide is used. The resin film is formed by spin coating. , A roll coating, a printing method, and the like, and can also be formed by transfer like the image forming material described above. In addition, an inorganic coating such as a metal oxide can be provided by a sputtering method, a vacuum evaporation method, or the like.

As described above, the light-shielding layer is formed of a metal thin film and the color filter is formed by transfer from the image forming material, so that there is no light leakage between the light-shielding layer and the color filter. A color filter having a small step at the overlapping portion of the layer and the color filter can be manufactured by a simple process.

[0033]

Example 1 A coating liquid having the following formulation H1 was applied on a polyethylene terephthalate film temporary support having a thickness of 75 μm and dried to form a thermoplastic resin layer having a dry film thickness of 20 μm.

Thermoplastic resin layer formulation H1: Methyl methacrylate / 2-ethylhexyl acrylate / benzyl methacrylate / methacrylic acid copolymer (copolymer composition ratio (molar ratio) = 55 / 28.8 / 11.7 / 4.5) , Weight average molecular weight = 90000) 15 parts by weight Polypropylene glycol diacrylate (average molecular weight = 822) 6.5 parts by weight Tetraethylene glycol dimethacrylate 1.5 parts by weight p-toluenesulfonamide 0.5 parts by weight Benzophenone 1.0 parts by weight Parts methyl ethyl ketone 30 parts by weight

Next, the following formulation B1 was placed on the thermoplastic resin layer.
Was applied and dried to form an intermediate layer.

Intermediate layer formulation B1: 130 parts by weight of polyvinyl alcohol (PVA 205 manufactured by Kuraray Co., Ltd., saponification ratio = 80%) 60 parts by weight of polyvinyl pyrrolidone (PVP, K-90 manufactured by GAF Corporation) Fluorinated surfactant (Asahi Glass) Surflon S-131 manufactured by Corporation) 10 parts by weight Distilled water 3350 parts by weight

On the temporary support having the thermoplastic resin layer and the intermediate layer, a red (R
Layers), green (for the G layer), and blue (for the B layer) photosensitive solutions of three colors are applied and dried to a dry film thickness of 2.25 μm.
To form a colored photosensitive resin composition layer.

[0038]

[Table 1]

The thickness and thickness unevenness (50 cm) of the photosensitive resin composition layers of the three colors of R, G, and B thus prepared.
× 50 cm area) respectively, R: 2.7 ± 0.0
8 μm, G: 2.8 ± 0.09 μm, B: 2.8 ± 0.
08 μm.

Further, a polypropylene (12 μm thick) covering sheet was pressed on the photosensitive resin composition layer to prepare red, blue, green and black image forming materials. Using this image forming material, a color filter was prepared by the following method. 1.1mm thick, 400mm x 300m
m, a transparent glass substrate (Corning # 7059) was washed, and a silane coupling agent (Shin-Etsu Chemical KBM-603) was used.
After being immersed in a 1% aqueous solution for 3 minutes, it was washed with pure water for 30 seconds to remove excess silane coupling agent, drained, and heat-treated in an oven at 110 ° C. for 20 minutes. The coating sheet of the red image forming material was peeled off, and the photosensitive resin composition layer surface was treated with a silane coupling agent on a transparent glass substrate.
24) was applied under pressure (10 kg / cm), heated and bonded, and then peeled off at the interface between the temporary support and the thermoplastic resin layer to remove the temporary support. Next, after exposing through a predetermined photomask, developing, and removing unnecessary portions, ultraviolet rays are irradiated at 300 mj / cm ² from the opposite side of the color filter forming surface using an ultra-high pressure mercury lamp, so that the transparent glass substrate A red pixel pattern was formed. Subsequently, a green image forming material was adhered to the glass substrate on which the red pixel pattern was formed in the same manner as described above, and peeled, exposed, developed, and post-exposed to form a green pixel pattern. The same process was repeated with a blue image forming material to form a color filter on a transparent glass substrate. The conditions for transfer, exposure, development, and post-exposure are as shown in Table 2.

[0041]

[Table 2]

Other conditions and supplementary explanation of Table 2 are as follows. 1. Development 1 is development for dissolving and removing the thermoplastic resin layer and the intermediate layer.
Shower development was performed at 33 ° C. using an aqueous solution. 2. In development 2, the colored photosensitive resin composition layer was developed, and a color mosaic developer CD-1000 (manufactured by Fuji Hunt Electronics Technology) 1% aqueous solution was used as a developer, and shower development was performed at 33 ° C. The color filter formed under the above-mentioned conditions has no missing pixels (white spots), small side etch of each pixel,
It had sufficient performance as a color filter. Further, heat treatment was performed at 250 ° C. for 1 hour. The spacer portion produced by laminating three colored layers of R, G, and B on the color filter thus produced was a column having a diameter of 20 μm and a height of 4.55 μm.

Example 2 A color filter was prepared in the same manner as in Example 1 except that the composition of the colored photosensitive resin composition layer was changed to the composition shown in the following table.

[0044]

[Table 3]

Comparative Example A transparent glass substrate (# 7059, manufactured by Corning Incorporated) having a thickness of 1.1 mm and a size of 400 mm × 300 mm was washed and dried in an oven at 110 ° C. for 20 minutes. A photosensitive resin composition (Color Mosaic, manufactured by Fuji Film Orin Co., Ltd.) in which a black pigment was dispersed was applied and dried by a spin coater on this substrate, and exposed and developed through a photomask to form a black matrix. Finally at 200 ° C 2
Post-baked for 0 minutes. A red, green, and blue pattern is formed on a substrate on which a black matrix is formed by using a three-color photosensitive coloring material (a color mosaic manufactured by Fuji Film Ohlin Co., Ltd.) in which red, green, and blue pigments are dispersed in the following procedure. Formed.

First, a red photosensitive coloring material is applied on a glass substrate with a spin coater at a rotation speed of 500 rpm.
A colored layer having a dry film thickness of 1.5 μm was provided. After drying at 100 ° C. for 2 minutes, 200 mj / cm ² through a photomask.
Exposure. Next, a developer (CD: pure water = 1: 4 diluent)
For 1 minute. After washing with pure water,
After drying at 200 ° C. for 10 minutes, a red colored pattern and a spacer pattern were formed on the black matrix. Next, using a green photosensitive material, a green spacer pattern was laminated on a green pattern and a red spacer pattern formed on a black matrix in the same manner. Perform blue pattern formation in the same way, red, green,
A color filter having a spacer portion in which three colors of blue were laminated was produced.

Hereinafter, the height of the spacer portion of the color filters obtained by the methods of Examples 1 and 2 and Comparative Example was measured at 30 points using a surface shape measuring device [Surfcom 570A-3DF (Tokyo Seimitsu Co., Ltd.)]. Table 4 shows the results. Table 4 shows the results obtained by measuring the dynamic viscosity of the photosensitive resin composition layers of Examples 1 and 2 using a liquid meter MR-3 (manufactured by Rheology).

[0048]

[Table 4]

From the results shown in Table 4, it can be seen that the color filters obtained by the method of the present invention can form spacer portions having uniform heights of the respective spacer portions and good height accuracy.

[0050]

According to the present invention, the photosensitive resin composition layers of each color formed on the temporary support are transferred onto the substrate by transfer to form each color pattern and at least two layers.
Since the spacer portion is formed by laminating the photosensitive resin composition layers of two colors, the height of the spacer portion can be controlled according to the required thickness of the liquid crystal layer, so that a uniform liquid crystal layer can be formed, A color filter having excellent display quality of luminance unevenness and color unevenness can be manufactured.

[Brief description of the drawings]

FIG. 1 is a process chart showing a preferred embodiment of a method for producing a color filter of the present invention.

FIG. 2 is a cross-sectional configuration diagram illustrating an embodiment of a color filter obtained by the manufacturing method of the present invention.

[Explanation of symbols]

 Reference Signs List 10 photosensitive resin composition layer (R) 12 substrate 14 photomask 16 R pattern 18 photosensitive resin composition layer (G) 20 G pattern 22 photosensitive resin composition layer (B) 24 B pattern S spacer portion

 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2H048 BA45 BB02 BB07 BB14 BB42 2H089 HA10 LA09 LA11 MA04X MA05X NA01 NA12 NA14 PA05 QA12 QA14 TA05 TA09 TA13 2H091 FA02Y FA35Y FB02 FC01 FC18 FD04 FD05 GA07 GA08 GA13 GA16

Claims (4)

[Claims] (1) A photosensitive resin composition layer having a first color selected from a group of three primary colors of red, green and blue formed on a temporary support is formed on a substrate by transfer. Forming a pattern having the first color on the substrate after exposing with a predetermined pattern, and (2) forming the first color pattern on the substrate on which the pattern of the first color is formed. (3) forming a photosensitive resin composition layer having a color different from the above color by transfer, exposing it to a predetermined pattern, developing it, and forming a pattern having the second color on the substrate; The first and second colors are formed on the substrate on which the patterns of the first and second colors are formed.
Forming a photosensitive resin composition layer having a color different from the color by transfer, exposing in a predetermined pattern, and then developing to form a pattern having the third color on the substrate, And forming a spacer portion in which photosensitive resin composition layers of at least two colors selected from the three primary colors are partially laminated. 2. The photosensitive resin composition layer formed on the temporary support has a dynamic viscosity (η ′) of 4 × 10 ² <4 at the temperature at which the photosensitive resin composition is transferred onto a substrate. 2. The method for producing a color filter according to claim 1, wherein η ′ <1 × 10 ⁶ (poise). 3. At least two selected from the group of the three primary colors.
3. The method for producing a color filter according to claim 1, wherein a spacer portion in which a photosensitive resin composition layer of one color is partially laminated is formed on a substrate on which thin film transistors are arranged. (1) A photosensitive resin composition layer having a first color selected from the group consisting of three primary colors of red, green and blue and black and formed on a temporary support is transferred onto a substrate by transfer. Forming, exposing with a predetermined pattern, developing and forming a pattern having the first color on the substrate; and (2) forming a pattern on the substrate on which the pattern of the first color is formed, Forming a photosensitive resin composition layer having a color different from the first color by transfer, exposing in a predetermined pattern, and then developing to form a pattern having the second color on the substrate; 3) A photosensitive resin composition layer having a color different from the first and second colors is formed by transfer on the substrate on which the patterns of the first and second colors are formed, and is exposed in a predetermined pattern. And then developing to form a pattern having the third color on the substrate; and A photosensitive resin composition layer having a color different from the first, second, and third colors is formed by transfer on a substrate on which patterns of the second and third colors are formed, and is exposed in a predetermined pattern. And then developing to form a pattern having a fourth color on the substrate, and a photosensitive resin composition layer of at least one color selected from the group of the three primary colors and a black photosensitive layer. A method for producing a color filter, comprising forming a spacer portion in which a conductive resin composition layer is partially laminated.