JP2000227589A - Liquid crystal display device and its manufacture - Google Patents

Abstract

PROBLEM TO BE SOLVED: To increase a margin for allowable deviation in forming a light shielding layer with exposure and besides to prevent an effective pixel area from decreasing. SOLUTION: The outermost gate bus line 46 and the outermost source bus line 48, located on the outermost side of an effective display region 45, are formed with breadths wider than those of gate bus lines 44 and source bus lines 47. Furthermore, dummy gate bus lines and dummy source bus lines with wide breadths are formed along the edges adjacent to pixels and distant from the gate bus lines or the source bus lines in the effective display region 45. Then, edges of a light shielding film 54 are formed overlapping the outermost gate bus line 46, the outermost source bus line 48, the dummy gate bus line and the dummy source bus line. Consequently a margin for positional deviation in forming the light shielding layer 54 can be increased corresponding to the overlapping part and a light leakage and a decrease in the effective pixel area due to the positional deviation in forming the light shielding layer 54 is prevented.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] The present invention relates to a liquid crystal display device and a method of manufacturing the same.

[0002]

2. Description of the Related Art Conventionally, an active matrix liquid crystal display device having a longitudinal section as shown in FIG. 8 has been known as one of the liquid crystal display devices. In the active matrix liquid crystal display device shown in FIG. 8, a liquid crystal 3 is sealed between a color filter substrate 1 and an active matrix substrate 2,
It is formed by sealing with a sealing material 4.

In the color filter substrate 1, a color layer 6 of each of the three primary colors (RGB) is formed on an insulating substrate 5, and a light-shielding layer 7 is provided between the color layers 6 of RGB. The upper surface is smoothed by a top coat material 8, and a transparent electrode 9 is further provided on the upper surface. On the other hand, the active matrix substrate 2 is configured by providing a driving transparent electrode 11 on an insulating substrate 10.

Since the active matrix liquid crystal display device having the above-described structure is formed by bonding the color filter substrate 1 and the active matrix substrate 2 so as to face each other, positional accuracy of bonding is required. Therefore, it is necessary to design the light shielding layer 7 of the color filter substrate 1 to be large in consideration of the bonding accuracy, and there is a problem that the coloring layer 6 becomes relatively narrow and the aperture ratio decreases. .

In order to solve the above-mentioned problem, a method of forming a color filter on the active matrix substrate is disclosed in Japanese Patent Application Laid-Open No. 64-21481. Hereinafter, this forming method will be described with reference to FIGS. 9 and 10 (a cross-sectional view taken along the line AA in FIG. 9).

On an insulating substrate 21, an insulating film 22, a TFT (thin film transistor) 23 as a switching element, and a gate bus wiring 2 electrically connected to the TFT 23
4. A source bus wiring 25 and a color filter forming electrode (functioning as a pixel electrode) 26 are formed. Next, a dyeing resist for forming a light-shielding layer is applied to the entire surface of the substrate, and patterned by exposure and development steps so as to overlap with the electrode 26 for forming a color filter. Layer (shaded area in FIG. 9)
27 are formed. As described above, by forming the edge of the light shielding layer 27 so as to overlap the color filter forming electrode (pixel electrode) 26, light is prevented from leaking from around the pixel electrode 26.

Next, a voltage is applied to the gate bus wiring 24 and the source bus wiring 25 to operate the TFT 23, and the desired electrode 2 for color filter formation is formed by electrodeposition.
A color filter (white area in FIG. 9) 28 is formed by coloring on the surface 6. Further, an alignment film 29 made of polyimide or the like is further formed thereon and subjected to an alignment process.

On the other hand, a counter substrate facing the active matrix substrate formed as described above is formed as follows. That is, the counter electrode 3 is placed on the insulating substrate 31.
2 and an alignment film 33 made of polyimide or the like is formed thereon.
To form Then, an alignment process is performed on the alignment film 33 by rubbing or the like.

Then, as described above, the color filter 28
The insulating substrate 21 on which the light shielding layer 27 is formed and the insulating substrate 31 on which the counter electrode 32 is formed are scattered between the two substrates by a process of spraying plastic beads or the like for maintaining a constant gap between the two substrates. With a sealant via a spacer made of A liquid crystal 34 is provided between the two substrates.
Is injected and sealed to form an active matrix liquid crystal display device.

[0010]

However, the method for manufacturing a color filter disclosed in the above-mentioned conventional Japanese Patent Application Laid-Open No. 64-21481 has the following problems. That is, when forming the light-shielding layer 27 on the insulating substrate 21, the light-shielding layer forming dyeing resist is applied to the entire surface of the substrate, and is patterned by exposure and development steps.
Portions other than the color filter forming electrode (pixel electrode) 26 are dyed black.

However, when the light shielding layer 27 is formed by the above-described method, the exposure mask is displaced during exposure. For this reason, the light-shielded portion is not shaded and light leakage occurs, or a region where the color filter 28 is to be formed later (the color filter forming electrode 26).
Area), there is a problem that the light-shielding layer is applied to the area, and the pixel effective area is reduced.

Accordingly, an object of the present invention is to increase the alignment margin when exposing and forming a light shielding layer, and
It is an object of the present invention to provide a position of a liquid crystal display layer that can prevent a decrease in a pixel effective area, and a method of manufacturing the same.

[0013]

According to a first aspect of the present invention, there is provided a switching element connected to each of pixel electrodes arranged in a matrix, and the switching elements arranged between the pixel electrodes. A first substrate on which a wiring including a signal line for supplying a signal to each switching element is formed; a second substrate on which a counter electrode is formed; and a liquid crystal layer sealed between the first and second substrates The liquid crystal display device further includes a light-shielding layer formed in a non-display area of the first substrate and blocking light passing through the liquid crystal layer to set an effective display area. It is characterized in that it overlaps on the outermost wiring in the region.

According to the above configuration, the edge of the light shielding layer for setting the effective display area overlaps the outermost wiring in the effective display area. Therefore, when the light-shielding layer is formed by the photolithography method, the alignment margin of the exposure mask can be increased by the overlap.

According to a second aspect of the present invention, in the liquid crystal display device of the first aspect, at least one of the outermost wirings in the effective display area is a gate bus wiring or a source bus wiring. It is characterized by wiring.

According to the above configuration, the use of a gate bus line or a source bus line as a signal line for supplying a signal to each of the switching elements makes it possible to easily and inexpensively increase the alignment margin when forming the light shielding layer. Can be

According to a third aspect of the present invention, in the liquid crystal display device of the first aspect of the present invention, the liquid crystal display device further comprises an auxiliary capacitance line formed on the first substrate, and an outermost line in the effective display area. At least one of the located wires is
The storage device is characterized in that it is an auxiliary capacitance connection line for electrically connecting the auxiliary capacitance lines.

According to the above configuration, when the outermost bus wiring in the effective display area is located inside the outermost pixel in the area, the outermost bus wiring is located outside the effective display area. By locating the edge of the light-shielding layer on the auxiliary capacitance connection wiring disposed outside and in the vicinity of the pixel column located at the outermost pixel column, the outermost pixel column is not covered by the light-shielding layer. .

According to a fourth aspect of the present invention, in the liquid crystal display device according to the first aspect of the present invention, at least one of the outermost wirings in the effective display area is provided when the signal line is damaged. It is characterized by being redundant wiring used for repair.

According to the above configuration, when the outermost bus line in the effective display area is located inside the outermost pixel in the area, the outermost bus line is located outside the effective display area. By arranging the edge of the light-shielding layer on the redundant wiring disposed outside the vicinity of the pixel column located in the pixel row, the outermost pixel column is not covered by the light-shielding layer.

According to a fifth aspect of the present invention, in the liquid crystal display device according to any one of the first to fourth aspects of the present invention, the line width of the outermost wiring in the effective display region is The width is wider than the line widths of the gate bus line and the source bus line located at the center in the effective display area.

According to the above configuration, the alignment margin when forming the light-shielding layer is further increased, and the resistance value of the outermost wiring in the effective display area is reduced.

According to a sixth aspect of the present invention, there is provided a switching element connected to each of the pixel electrodes arranged in a matrix, and a signal line arranged between the pixel electrodes for supplying a signal to each of the switching elements. In a method of manufacturing a liquid crystal display device having a liquid crystal layer having a liquid crystal layer, at least on the insulating substrate on which the wiring is formed, covering the non-display area and blocking light passing through the liquid crystal layer to form an effective display area. A step of forming the light-shielding layer to be set such that an edge of the light-shielding layer overlaps an outermost wiring in the effective display area.

According to the above configuration, in the step of forming the light-shielding layer for setting the effective display area, when the light-shielding layer is formed by photolithography, the alignment margin of the exposure mask is set between the wiring and the light-shielding layer edge. It grows by the overlap. Thus, the formation of the light shielding layer is easily and accurately performed.

According to a seventh aspect of the present invention, in the method for manufacturing a liquid crystal display device according to the sixth aspect of the present invention, at least on the insulating substrate on which the wiring is formed, the transparent substrate is formed prior to the formation of the light shielding layer. A step of forming an insulating layer, a step of forming a color filter forming electrode patterned on the transparent insulating layer so as to have an edge overlapping each signal line around each pixel, and And a step of forming a color filter, wherein the light-shielding layer is formed on the transparent insulating layer.

According to the above arrangement, the color filter forming electrode functioning as the pixel electrode is formed so that its edge overlaps with each signal line around each pixel, and the color filter is formed thereon. Therefore, even when the light-shielding layer is formed so that its edge overlaps the outermost wiring in the effective display area, light does not leak from around the color filter. That is, the light-shielding layer can be formed so that its edge overlaps the outermost wiring in the effective display area. further,
The color filter is formed on the same insulating substrate as the pixel electrodes, switching elements, and signal lines. Therefore, only the opposing electrode is formed on the opposing substrate facing the insulating substrate, and the alignment margin when the two substrates are opposed to each other and bonded is increased. As a result, the two substrates are easily and reliably bonded to each other.

According to an eighth aspect of the present invention, there is provided a method of manufacturing a liquid crystal display device according to the sixth or seventh aspect, wherein the wiring is formed on the insulating substrate. Forming an outermost wiring in an area serving as an effective display area wider than line widths of a gate bus wiring and a source bus wiring located in a central portion of the effective display area. And

According to the above configuration, the alignment margin in the light shielding layer forming step is further increased, and the resistance value of the outermost wiring in the effective display area is reduced.

According to a ninth aspect of the present invention, in the method for manufacturing a liquid crystal display device according to any one of the sixth to eighth aspects, the method further comprises a step of forming a plurality of auxiliary capacitance lines. The wiring located on the outermost side in the effective display area is an auxiliary capacitance connection wiring for electrically connecting the plurality of auxiliary capacitance wirings.

According to the above configuration, when the outermost bus wiring in the effective display area is located inside the outermost pixel in the area, the light-shielding layer of the light-shielding layer can be used. In the forming step, the light-shielding layer is formed so that an edge is located on an auxiliary capacitance connection line that is disposed outside the vicinity of the outermost pixel column and electrically connects the auxiliary capacitance lines. You. As a result, the pixel columns are not covered with the light-shielding layer.

The invention according to claim 10 is the invention according to claim 6.
In the method for manufacturing a liquid crystal display device according to any one of claims 8 to 10, the outermost wiring in the effective display area is a redundant wiring used for repairing when the signal line is damaged. It is characterized by:

According to the above configuration, when the outermost bus wiring in the effective display area is located inside the outermost pixel in the area, the light-shielding layer of the light-shielding layer is provided. In the forming step, the light-shielding layer is arranged outside the vicinity of the outermost pixel column and formed so that an edge is located on a redundant wiring used for repairing when the signal line is damaged. As a result, the outermost pixel column is not covered with the light shielding layer.

[0033]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail with reference to the illustrated embodiments. <First Embodiment> FIG. 1 shows a plan view of a main part of a liquid crystal panel in a liquid crystal display device of the present embodiment. 2 is an enlarged view of four pixels in FIG. 1, and FIG. 3 is a cross-sectional view taken along the line BB in FIG. Hereinafter, the liquid crystal display device of the present embodiment will be described with reference to FIGS.

The liquid crystal display of this embodiment is formed as follows. On the insulating substrate 41, an insulating film 42,
A TFT 43, gate bus lines 44 and 46, and source bus lines 47 and 48 are formed. Here, the gate bus wiring 44,
46, the outermost gate bus wiring 46 of the effective display area 45 is referred to as an outermost gate bus wiring, and the outermost one of the source bus wirings 47 and 48 is the source bus wiring 48 of the effective display area 45. Outer source bus wiring. The gate bus wiring 44, the outermost gate bus wiring 46, the source bus wiring 47, and the outermost source bus wiring 48 are electrically connected to the TFT 43. still,
As shown in FIG. 1, with respect to sides C and D where pixels exist without bus wiring in the effective display area 45,
A dummy gate bus line 49 or a dummy source bus line 50 is formed outside the outermost pixel.

The line width of each wiring is 10 μm for the gate bus wiring 44 and 15 μm for the outermost gate bus wiring 46.
μm, the source bus line 47 is 8 μm, the outermost source bus line 48 is 13 μm, the dummy gate bus line 49 is 15 μm, and the dummy source bus line 50 is 50 μm.
Is 13 μm.

Subsequently, a photosensitive organic resin protective film 51 made of an acrylic resin is applied to the entire surface of the substrate by a spinner. Then, the organic resin protective film 51 is irradiated with ultraviolet rays by a photolithography method through a light-shielding mask, exposed to light, and etched to form a contact hole 52 immediately above the drain electrode 43a of the TFT 43.
Next, an ITO (indium tin oxide) film is formed by a sputtering method, and each of the wirings 44, 46,
Patterning is performed so that edges overlap 47, 48, 49, and 50, and a color filter forming electrode 53 also serving as a pixel electrode is formed. As a result, the color filter forming electrode 53 and the drain electrode 42a of the TFT 43 are electrically connected via the contact hole 52 formed in the organic resin protective film 51.

As described above, in the present embodiment, the color filter forming electrode 53 is
It is formed on top. Therefore, the color filter forming electrode 53 can be formed to cover the area of the gate bus wiring 44 and the source bus wiring 47. As a result, the aperture area of each pixel can be extended to the edges of the gate bus lines 44 and 46 and the source bus lines 47 and 48 to achieve a high aperture ratio. On the other hand, in the conventional method for manufacturing a color filter disclosed in Japanese Patent Application Laid-Open No. Sho 64-21481, as shown in FIG. Formed on top. Therefore, the color filter forming electrode 26 cannot be formed to cover the area of the gate bus wiring 24 and the source bus wiring 25.

Next, a light shielding layer 54 is formed around the effective display area 45 as follows. That is, a resist agent (color resist CK: manufactured by Fuji Hunt Electronics Technology Co., Ltd.) containing an ultraviolet curable resin and a black pigment is applied on the organic resin protective film 51 by a spinner, and then baked at 80 ° C. for 15 minutes. Thereafter, a predetermined position is exposed through a mask by an exposure device having an alignment function, developed with an alkali developer, washed with pure water, and further baked at 200 ° C. for 100 minutes. Thus, the edge of the light-shielding layer 54 is positioned so as to overlap the outermost gate bus wiring 46, the outermost source bus wiring 48, the dummy gate bus wiring 49, and the dummy source bus wiring 50 located on the outermost side of the effective display area 45. Let it do.

Here, in the conventional method for manufacturing a color filter disclosed in Japanese Patent Application Laid-Open No. Sho 64-21481, as described above, the color filter forming electrode 26 is formed.
A gap is generated between the gate bus line 24 and the source bus line 25. Therefore, in order to prevent light leakage from the gap, it is necessary to set the edge of the light shielding layer 27 on the color filter forming electrode 26 in the pixel, which causes a decrease in aperture ratio.

On the other hand, the color filter forming electrode 53 and the gate bus lines 44 and 46 in this embodiment are used.
There is no gap between the source bus lines 47 and 48. Therefore, by locating the edge of the light-shielding layer 54 so as to overlap the outermost gate bus wiring 46, the outermost source bus wiring 48, the dummy gate bus wiring 49, and the dummy source bus wiring 50, the leakage light can be sufficiently shielded. It is.

Subsequently, the color filter forming electrode 5 is formed.
3, color filters 55 of three colors RGB are formed as follows. In this case, as a method of forming a filter, a surfactant (micelleizing agent), pigment particles, and the like are dispersed in an aqueous medium, and electrolysis is performed using an electrode formed on a substrate. A micellar electrolysis method for precipitating pigment particles is used. Hereinafter, description will be made sequentially.

First, as described above, the insulating film 42, TF
T43, gate bus wiring 44, outermost gate bus wiring 46,
The insulating substrate 41 on which the source bus wiring 47, the outermost source bus wiring 48, the dummy gate bus wiring 49, the dummy source bus wiring 50, the organic resin protective film 51, the color filter forming electrode 53 and the light shielding layer 54 are sequentially formed. , Red pigment particles
(Lithol Scarlet K3700: BASF) and the like. Then, the TFT 43 corresponding to the red pixel
The source bus wiring 47 or the outermost source bus wiring 48 connected to the source electrode 43b is electrically selected, a SUS plate is used as a counter electrode, and a silver / silver chloride electrode is used as a reference electrode for measuring voltage. The electrolysis is performed at a voltage of 0.5 V and a temperature of 25 ° C. for 30 minutes. Thereafter, the substrate is washed with pure water and baked at 180 ° C. for 1 hour to obtain a red color filter (colored layer) 55.

The same electrolytic treatment was carried out using a green pigment (Meliogen Gr.
een L9361: manufactured by BASF) and a color dispersion including a blue pigment (Meliogen Blue B7080: manufactured by BASF) and the like are repeatedly used to form a green and blue color filter (colored layer) 55. Form.

In the present embodiment, the color filter 55 is formed on the color filter forming electrode 53 by the above-described micelle electrolysis method, but the present invention is not limited to this. For example, it may be formed by an electrodeposition method.

As described above, the TFT 43 and the light shielding layer 54
Substrate 41 on which color filters 55 are formed
An alignment film 56 made of polyimide is formed thereon, and an alignment process is performed on the surface of the alignment film 56 by rubbing or the like to enable alignment of liquid crystal molecules.

Finally, the IT substrate is placed on an insulating substrate 57 facing the insulating substrate 41 on which the alignment film 56 is formed.
An opposing electrode 58 made of O is formed, and an alignment film 59 made of polyimide is further formed thereon. Then, an alignment process is performed on the surface of the alignment film 59 by rubbing or the like.

As described above, the TFT is formed on the insulating substrate 41.
43, an active matrix substrate formed with a color filter 55 and a light shielding layer 54, and an insulating substrate 57.
A counter electrode substrate having a counter electrode 58 formed thereon;
Plastic beads or the like for keeping the gap between the two substrates constant are adhered with a sealing agent via spacers scattered between the two substrates by a spraying process. Then, the liquid crystal 60 is injected and sealed between the two substrates to obtain an active matrix type liquid crystal display device.

As described above, in the present embodiment,
The gate bus lines and the source bus lines located outside the effective display area 45 in the liquid crystal panel are formed wider than the other gate bus lines 44 and the source bus lines 47, and the outermost gate bus lines 46 and The outermost source bus wiring 48 is formed. Further, the color filter forming electrode 53 is formed to cover the area of the gate bus wiring 44 and the source bus wiring 47. Then, the edge of the light shielding film 54 formed around the effective display area 45 is
The outermost gate bus wiring 46 and the outermost source bus wiring 48 are overlapped.

Therefore, the light-shielding layer 54 is provided by the overlap.
A large displacement margin of the exposure mask at the time of formation can be obtained. As a result, the alignment at the time of forming the light shielding layer 54 can be performed easily and correctly, and the light shielding layer 5 can be formed.
It is possible to reduce light leakage when the edge of No. 4 shifts to the adjacent effective display area side and decrease in the pixel effective area when the edge of the light shielding layer 54 shifts into the effective display area 45. That is, according to the present embodiment, it is possible to improve the production efficiency of the active matrix liquid crystal display device.

In this case, if there is no gate bus line 44 or source bus line 47 on the outermost side of the effective display area 45 and there is a pixel column, the gate bus line 44 or the source located on the outermost side of the effective display area 45 When the edge of the light-shielding film 54 is overlapped on the bus wiring 47 (all the wirings are inside the outermost pixel column), one row of pixels outside the above-mentioned wiring are hidden by the light-shielding layer 54. , This pixel column cannot be used.

Therefore, in the present embodiment, the outermost gate bus wiring 46 and the outermost gate bus wiring 46 are arranged along the sides C and D where there is no gate bus wiring or source bus wiring on the outermost side of the effective display area 45 and pixels are present. A dummy gate bus line 49 and a dummy source bus line 50 having the same width as the source bus line 48 are formed. Then, the effective display area 45
Of the light-shielding film 54 formed around the dummy gate bus line 49 and the dummy source bus line 50. Therefore, similarly to the case of the outermost gate bus wiring 46 or the outermost source bus wiring 48, the positional deviation margin of the exposure mask when the light shielding layer 54 is formed can be increased by the amount of the overlap. Further, the dummy gate bus wiring 49 or the dummy source bus wiring 50 can be used for correcting a disconnection of the gate bus wiring 44 or the source bus wiring 47 or the like.

<Second Embodiment> FIG. 4 is an enlarged view of four pixels of a liquid crystal panel in a liquid crystal display device of the present embodiment, and FIG. 5 is a sectional view taken along the line EE in FIG. .
The external view of the liquid crystal panel is the same as FIG. Hereinafter, the liquid crystal display device of the present embodiment will be described with reference to FIGS.

The liquid crystal display of this embodiment is formed as follows. An insulating film 6 is formed on an insulating substrate 61.
2, TFT 63, gate bus wiring 64, outermost gate bus wiring 66, source bus wiring 67, outermost source bus wiring
(See FIG. 2), an auxiliary capacitance line 68 is formed. The gate bus line 64, the outermost gate bus line 66, the source bus line 67, and the outermost source bus line
63 is electrically connected.

In the present embodiment, the effective display area 6
5 is a side where the pixel exists without the wiring, and a side F parallel to the source bus wiring 67, the auxiliary capacitance wiring 68 is electrically connected and the auxiliary capacitance parallel to the source bus wiring 67 is connected. The connection wiring 69 is formed. By doing so, the outermost pixel row can be positioned and used effectively in the effective display area 65, and a decrease in the area of the effective display area 65 can be prevented. Further, a side (corresponding to side D in FIG. 1) of the effective display area 65 where pixels are present without wiring and parallel to the gate bus wiring 68 will be described later when the light shielding film 74 is formed. Next, a dummy gate bus wiring (not shown) is formed outside the outermost pixel as a wiring that overlaps the edge of the light shielding film 74. The auxiliary capacitance line 68 and the auxiliary capacitance connection line 69 are electrically connected via a contact hole 70 formed in the insulating film 62.

The line width of each wiring is 10 μm for the gate bus wiring 64 and 15 μm for the outermost gate bus wiring 66.
μm, the source bus wiring 67 is 8 μm, the outermost source bus wiring is 13 μm, and the auxiliary capacitance wiring 68
Is 25 μm, and the dummy gate bus wiring is 15 μm.
And the auxiliary capacitance connection wiring 69 is 25 μm. still,
Although the line width of the auxiliary capacitance connection wiring 69 is set to 25 μm, it is possible to increase the margin of the above-mentioned displacement and to reduce the resistance value of the auxiliary capacitance connection wiring 69 by further increasing the line width.

Hereinafter, in the same manner as in the first embodiment,
An organic resin protective film 71, a color filter forming electrode (pixel electrode) 73, a light shielding layer 74, a color filter 75, and an alignment film 76 are sequentially formed. Hereinafter, a brief description will be given.

First, a photosensitive organic resin protective film 71 made of an acrylic resin is applied on the substrate on which each wiring is formed as described above by a spinner, and photo-etched using a light-shielding mask to make contact. A hole 72 is formed. Then, a color filter forming electrode 73 also serving as a pixel electrode is formed by the ITO film, and the color filter forming electrode 73 and the drain electrode 63 a of the TFT 63 are electrically connected through the contact hole 72. Next, a light shielding layer 74 is formed around the effective display area 65.
In this case, the edge of the light shielding layer 74 is made to overlap the outermost gate bus wiring 66, the outermost source bus wiring, the dummy gate bus wiring, and the auxiliary capacitance connection wiring 69.
Subsequently, color filters 75 of three colors RGB are formed on the color filter forming electrode 73 by a micellar electrolysis method, an electrodeposition method, or the like. Then, an orientation film 76 made of polyimide is formed on the entire substrate, and the surface is subjected to an orientation treatment such as rubbing to obtain an active matrix substrate.

On the other hand, as in the first embodiment, the counter electrode substrate facing the active matrix substrate is formed on the insulating substrate 77 by the counter electrode 7 made of ITO.
An alignment film 79 made of polyimide and polyimide is formed, and the surface is subjected to an alignment treatment by rubbing or the like.

Then, the active matrix substrate and the counter electrode substrate formed as described above are separated through spacers interspersed between the two substrates by a process of spraying plastic beads or the like for keeping the gap between the two substrates constant. Paste with sealant. Then, a liquid crystal 80 is injected and sealed between the two substrates, and an active matrix liquid crystal display device is obtained.

As described above, in the case of an active matrix display device in which the auxiliary capacitance wiring 68 is formed independently of the gate bus wiring 64, there is no wiring in the effective display area 65 and there is a pixel. On a side F parallel to the source bus line 67, an auxiliary capacitance connection line 69 for electrically connecting the auxiliary capacitance lines 68 is formed wider than the source bus line 67. Then, the edge of the light shielding film 74 is overlapped on the auxiliary capacitance connection wiring 69. Therefore, the positional deviation margin of the exposure mask at the time of forming the light shielding layer 74 can be increased by the overlap.
As a result, it is possible to reduce the light leakage and the decrease in the effective pixel area due to the displacement during the formation of the light-shielding layer 74, thereby improving the production efficiency. Also, the auxiliary capacitance connection wiring 69
By increasing the line width, the margin for the above-described positional shift can be increased, and the resistance value of the auxiliary capacitance connection wiring 69 can be reduced.

<Third Embodiment> FIG. 6 is an enlarged view of four pixels of a display panel in a liquid crystal display device of the present embodiment, and FIG. 7 is a sectional view taken along the line HH in FIG. .
The appearance of the display panel is the same as FIG. Hereinafter, the liquid crystal display device of the present embodiment will be described with reference to FIGS.

The liquid crystal display of this embodiment is formed as follows. On an insulating substrate 81, an insulating film 82,
TFT 83, gate bus wiring 84, outermost gate bus wiring
(Not shown), source bus wiring 87, outermost source bus wiring
(Not shown). Then, this gate bus wiring 8
4. The outermost gate bus wiring, the source bus wiring 87, and the outermost source bus wiring are electrically connected to the TFT 83.

In the present embodiment, the effective display area 8
5 is a side where the pixel exists without the wiring, and the side I parallel to the gate bus wiring 84 is provided below the source bus wiring 87 via the insulating film 82 via the redundant wiring 8.
9 is formed. By doing so, the outermost pixel row can be positioned and used effectively in the effective display area 85, and a decrease in the effective display area can be prevented. The side of the effective display area 85 where the pixel exists without the wiring and which is parallel to the source bus wiring 87 will be described later when the light shielding film 94 is formed.
A dummy source bus wiring (not shown: corresponding to the dummy source bus wiring 50 in FIG. 1) is formed outside the outermost pixel as a wiring for overlapping the edge of No. 4.

The source bus line 87, the outermost source bus line, and the redundant line 89 are insulated from each other by an insulating film 82, but the data is not transferred to the source bus line 87 or the outermost source bus line due to disconnection or the like. When a signal cannot be input, the intersection between the source bus wiring 87 or the outermost source bus wiring and the redundant wiring 89 is irradiated with a laser beam or the like, so that the source bus wiring 87 or the outermost source bus wiring can be connected. The redundant wiring 89 can be electrically connected, and a data signal can be input through the redundant wiring 89.

The line width of each wiring is 10 μm for the gate bus wiring 84 and 15 μm for the outermost gate bus wiring.
μm, the source bus wiring 87 is 8 μm, the outermost source bus wiring is 13 μm, the dummy source bus wiring is 13 μm, and the redundant wiring 89 is 25 μm. Although the line width of the redundant wiring 89 is set to 25 μm, it is possible to increase the margin of the positional deviation and reduce the resistance value of the auxiliary capacitance connecting wiring 69 by further increasing the line width.

Hereinafter, in the same manner as in the first embodiment,
An organic resin protective film 91, a color filter forming electrode (pixel electrode) 93, a light shielding layer 94, a color filter 95, and an alignment film 96 are sequentially formed. Hereinafter, a brief description will be given.

First, a photosensitive organic resin protective film 91 made of an acrylic resin is applied on the substrate on which each wiring is formed as described above by a spinner, and the contact is formed by photoetching using a light shielding mask. A hole 92 is formed. Then, a color filter forming electrode 93 also serving as a pixel electrode is formed by the ITO film, and the color filter forming electrode 93 and the drain electrode 83 a of the TFT 83 are electrically connected through a contact hole 92. Next, a light shielding layer 94 is formed around the effective display area 85.
In this case, the edge of the light shielding layer 94 is made to overlap the outermost gate bus wiring, the outermost source bus wiring, the dummy source bus wiring, and the redundant wiring 89. continue,
A color filter 95 of three colors RGB is formed on the color filter forming electrode 93 by a micellar electrolysis method, an electrodeposition method, or the like. Then, an alignment film 96 made of polyimide is formed on the entire substrate.
Is formed and the surface is subjected to an alignment treatment such as rubbing to obtain an active matrix substrate.

On the other hand, as in the first embodiment, the counter electrode substrate facing the active matrix substrate is a counter electrode 9 made of ITO on an insulating substrate 97.
An alignment film 99 made of No. 8 and polyimide is formed, and the surface is subjected to an alignment treatment by rubbing or the like.

Then, the active matrix substrate and the counter electrode substrate formed as described above are interposed through spacers interspersed between the two substrates by a process of spraying plastic beads or the like for maintaining a constant gap between the two substrates. Paste with sealant. The liquid crystal 100 is placed between the two substrates.
Is injected and sealed to obtain an active matrix type liquid crystal display device.

As described above, in the present embodiment,
A redundant wiring 89 is formed wider on the side I parallel to the gate bus wiring 84 where the pixel is present without the wiring in the effective display area 85 than the gate bus wiring 84. Then, the edge of the light-shielding film 94 is overlapped on the redundant wiring 89. Therefore, a margin for displacement of the exposure mask when the light shielding layer 94 is formed can be increased by the overlap. As a result, it is possible to reduce defects such as light leakage and a decrease in the pixel effective area due to a positional shift when the light shielding layer 94 is formed,
Production efficiency can be improved. Also, the redundant wiring 8
By increasing the line width of the line 9, it is possible to increase the margin of the above-mentioned positional deviation and to reduce the resistance value of the redundant wiring 89.

[0071]

As is apparent from the above description, the liquid crystal display device according to the first aspect of the present invention is characterized in that the edge of the light shielding layer formed in the non-display area of the liquid crystal panel and setting the effective display area is aligned with the effective display area. When the light-shielding layer is formed by photolithography, a margin for aligning the exposure mask can be made larger by the overlap when the light-shielding layer is formed by photolithography.

Therefore, according to the present invention, the alignment at the time of forming the light-shielding layer can be easily and correctly performed, and the light leakage and the reduction of the effective pixel area due to the positional shift at the time of forming the light-shielding layer are defective. , And production efficiency can be improved.

In the liquid crystal display device according to the second aspect of the present invention, a special measure is taken because a gate bus line or a source bus line is used as one of the outermost lines in the effective display area. Therefore, it is possible to easily and inexpensively increase the alignment margin in forming the light shielding layer.

Further, in the liquid crystal display device according to the third aspect of the present invention, as one of the outermost wirings in the effective display area, an auxiliary capacitance connection wiring for electrically connecting the auxiliary capacitance wirings is used. Therefore, when the outermost bus line in the effective display area is located inside the outermost pixel in the area, the bus line is located outside the vicinity of the outermost pixel column. By locating the edge of the light-shielding layer on the storage capacitor connection wiring, the pixel column can be prevented from being covered with the light-shielding layer. Therefore, according to the present invention, unnecessary reduction of the pixel effective area can be prevented.

Further, in the liquid crystal display device according to the fourth aspect of the present invention, as one of the outermost wirings in the effective display area, a redundant wiring used for repairing when the signal line is damaged is used. In the case where the outermost bus wiring in the effective display area is located inside the outermost pixel in the area, the bus wiring is located outside the vicinity of the outermost pixel column. By positioning the edge of the light-shielding layer on the arranged redundant wiring, it is possible to prevent the pixel columns from being covered with the light-shielding layer. Therefore,
According to the present invention, unnecessary reduction of the pixel effective area can be prevented.

According to a fifth aspect of the present invention, in the liquid crystal display device, the line width of the outermost wiring in the effective display area is reduced by changing the line width of the gate bus wiring and the source located in the center of the effective display area. Because it was wider than the line width of the bus wiring,
The alignment margin when forming the light-shielding layer can be further increased, and the resistance of the outermost wiring in the effective display area can be reduced.

According to a sixth aspect of the present invention, in the method of manufacturing a liquid crystal display device, a light-shielding layer for setting an effective display area is formed on at least the insulating substrate on which the wiring is formed. Since the light shielding layer is formed so as to overlap on the outermost wiring in the effective display area, the alignment margin of the exposure mask when the light shielding layer is formed by photolithography can be increased by the overlap. Therefore, the formation of the light-shielding layer can be easily and accurately performed, and light leakage and defective pixel effective area reduction due to displacement during the formation of the light-shielding layer are reduced, thereby improving production efficiency. be able to.

According to a seventh aspect of the present invention, in the method of manufacturing a liquid crystal display device, a transparent insulating layer is formed on the insulating substrate on which the wiring is formed, and the transparent insulating layer is formed on the transparent insulating layer around each pixel. An electrode for forming a color filter, which is patterned to have an edge overlapping each signal line, is formed, and a color filter is formed on the electrode for forming a color filter. It can be formed so as to overlap on the wiring on the outside.
Further, the color filter can be formed on the same insulating substrate as the pixel electrodes, switching elements, and signal lines. Therefore, it is possible to increase the alignment margin when bonding the insulating substrate and the opposing substrate on which only the opposing electrode is formed. That is, according to the present invention, the two substrates can be easily and reliably bonded to each other.

Further, in the method of manufacturing a liquid crystal display device according to the present invention, a gate for positioning an outermost wiring in an area which will be the effective display area later in the center of the effective display area. Since the width is formed wider than the line width of the bus wiring and the source bus wiring, the positioning margin when the light shielding layer is formed can be further increased. Further, the resistance value of the outermost wiring in the effective display area can be reduced.

According to a ninth aspect of the present invention, in the method for manufacturing a liquid crystal display device, the auxiliary capacitance connection wiring for electrically connecting the plurality of auxiliary capacitance wirings is located at the outermost position in the effective display area. Therefore, when the outermost bus line in the effective display area is located inside the outermost pixel in the area, the outermost pixel row of the outermost pixel row in the effective display area is located in the effective display area. The light-shielding layer can be formed with the edge positioned on the auxiliary capacitance connection wiring disposed on the outer side in the vicinity. Therefore, it is possible to prevent the pixel column from being covered with the light-shielding layer and unnecessary area of the effective pixel from decreasing.

In the method for manufacturing a liquid crystal display device according to the tenth aspect of the present invention, the redundant wiring used for repairing when the signal line is damaged is used as the wiring positioned at the outermost side in the effective display area. When the outermost bus line in the effective display area is located inside the outermost pixel in the area, the outermost bus line is located outside the vicinity of the outermost pixel column. The light-shielding layer can be formed with the edge positioned on the arranged redundant wiring. Therefore, it is possible to prevent the pixel column from being covered with the light-shielding layer and unnecessary area of the effective pixel from decreasing.

[Brief description of the drawings]

FIG. 1 is a diagram showing a liquid crystal panel in a liquid crystal display device of the present invention.

FIG. 2 is an enlarged view of four pixels in FIG.

FIG. 3 is a sectional view taken along line BB in FIG. 2;

FIG. 4 is an enlarged view of a liquid crystal panel different from FIG.

FIG. 5 is a sectional view taken along the line EE in FIG. 4;

FIG. 6 is an enlarged view of a liquid crystal panel different from FIGS. 2 and 4;

FIG. 7 is a sectional view taken along the line HH in FIG. 6;

FIG. 8 is a diagram showing a vertical section of a panel in a conventional active matrix liquid crystal display device.

FIG. 9 is a diagram showing a conventional liquid crystal panel disclosed in Japanese Patent Application Laid-Open No. 64-21481.

FIG. 10 is a cross-sectional view of the liquid crystal panel shown in FIG.

[Explanation of symbols]

41, 57, 61, 77, 81, 97 ... insulating substrate, 43, 6
3,83 ... TFT, 44, 64, 84 ... gate bus wiring, 45, 65, 85 ... effective display area, 4
6, 66 ... outermost gate bus wiring, 47, 67, 87 ... source bus wiring, 48 ... outermost source bus wiring, 49 ... dummy gate bus wiring, 50 ... dummy source bus wiring, 51, 71, 91 ... organic resin Protective film, 53, 73, 9
3. Color filter forming electrodes (pixel electrodes), 54, 74,
94: light shielding layer, 55, 75, 95: color filter, 56, 59, 76, 79, 96, 99: alignment film, 5
8,78,98… Counter electrode, 60,80,100
... liquid crystal, 68 ... auxiliary capacitance wiring, 69 ...
Auxiliary capacitance connection wiring, 89 ... redundant wiring.

 ──────────────────────────────────────────────────続 き Continued on front page F-term (reference) 2H091 FA02Y FA35Y FC06 FC26 FD05 FD06 GA02 GA07 GA13 LA12 LA16 LA18 2H092 JA24 JA27 JB02 JB04 JB23 JB24 JB26 JB32 JB33 JB35 JB52 JB56 JB64 JB69 JB73 KB25 MA07 5G435 AA17 BB12 CC09 EE33 EE41 FF13 GG12 KK05

Claims (10)

[Claims] 1. A first circuit comprising: a switching element connected to each of pixel electrodes arranged in a matrix; and a wiring line including a signal line arranged between the pixel electrodes and supplying a signal to each of the switching elements. In a liquid crystal display device having a substrate, a second substrate on which a counter electrode is formed, and a liquid crystal layer sealed between the first and second substrates, the liquid crystal display device is formed in a non-display region of the first substrate,
A light-shielding layer that blocks light passing through the liquid crystal layer to set an effective display area, wherein an edge of the light-shielding layer overlaps an outermost wiring in the effective display area. Liquid crystal display. 2. The liquid crystal display device according to claim 1, wherein at least one of the outermost wirings in the effective display area is a gate bus wiring or a source bus wiring. Display device. 3. The liquid crystal display device according to claim 1, further comprising an auxiliary capacitance line formed on the first substrate, wherein at least one of an outermost line in the effective display area is provided. A liquid crystal display device, which is an auxiliary capacitance connection line for electrically connecting the auxiliary capacitance lines. 4. The liquid crystal display device according to claim 1, wherein at least one of the outermost wirings in the effective display area is a redundant wiring used for repairing when the signal line is damaged. A liquid crystal display device, comprising: 5. The liquid crystal display device according to claim 1, wherein a line width of an outermost wiring in the effective display area is:
A liquid crystal display device, wherein the line width of the gate bus line and the source bus line located at the center of the effective display area is wider than the line width of the gate bus line and the source bus line. 6. A switching element connected to each of the pixel electrodes arranged in a matrix, a wiring including a signal line arranged between the pixel electrodes and supplying a signal to each of the switching elements, and a liquid crystal layer. A method for manufacturing a liquid crystal display device, comprising: a light-shielding layer that covers a non-display area and sets an effective display area by blocking light passing through the liquid crystal layer on at least the insulating substrate on which the wiring is formed; A method for manufacturing a liquid crystal display device, comprising a step of forming an edge of a layer so as to overlap an outermost wiring in the effective display area. 7. The method for manufacturing a liquid crystal display device according to claim 6, wherein a step of forming a transparent insulating layer on at least the insulating substrate on which the wiring is formed prior to the formation of the light shielding layer; Forming a color filter forming electrode patterned on the transparent insulating layer so that an edge overlaps with each signal line around each pixel; and forming a color filter on the color filter forming electrode. The method for manufacturing a liquid crystal display device, wherein the light shielding layer is formed on the transparent insulating layer. 8. The method for manufacturing a liquid crystal display device according to claim 6, wherein the wiring is formed on the insulating substrate,
A step of forming the outermost wiring in the area which will be the effective display area later, wider than the line widths of the gate bus wiring and the source bus wiring positioned in the center of the effective display area. A method for manufacturing a liquid crystal display device, comprising: 9. The method of manufacturing a liquid crystal display device according to claim 6, further comprising a step of forming a plurality of auxiliary capacitance lines, and a step of forming a plurality of auxiliary capacitance lines at an outermost position in the effective display area. The method of manufacturing a liquid crystal display device, wherein the located wiring is an auxiliary capacitance connection wiring for electrically connecting the plurality of auxiliary capacitance wirings. 10. The method for manufacturing a liquid crystal display device according to claim 6, wherein an outermost wiring in the effective display area is repaired when the signal line is damaged. A method for manufacturing a liquid crystal display device, comprising a redundant wiring used.