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JP2000206505A - Substrate for reflection type liquid crystal cell, and reflection type liquid crystal display device using the substrate - Google Patents

Substrate for reflection type liquid crystal cell, and reflection type liquid crystal display device using the substrate

Info

Publication number
JP2000206505A
JP2000206505A JP11004589A JP458999A JP2000206505A JP 2000206505 A JP2000206505 A JP 2000206505A JP 11004589 A JP11004589 A JP 11004589A JP 458999 A JP458999 A JP 458999A JP 2000206505 A JP2000206505 A JP 2000206505A
Authority
JP
Japan
Prior art keywords
substrate
liquid crystal
reflection
reflection layer
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11004589A
Other languages
Japanese (ja)
Inventor
Kenji Kameyama
健司 亀山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP11004589A priority Critical patent/JP2000206505A/en
Publication of JP2000206505A publication Critical patent/JP2000206505A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a substrate for a reflection type liquid crystal cell which shows no decrease in the reflectance and which does not require a sticking process of a reflection plate, by forming a rugged reflection layer having a rugged pattern and a reflection layer on the surface of a substrate opposite to the surface to be in contact with a liquid crystal layer. SOLUTION: A rugged reflection layer 9 having a rugged pattern and a reflection layer is formed on the surface of a substrate 5 opposite to the surface to be in contact with a liquid crystal layer. The rugged reflection layer 9 reflects the light entering at a specified angle to the normal line direction of the liquid crystal panel to produce a diffused state. In the production process of the reflection layer 9, the surface profile is transferred to the back side of the substrate where electrodes to drive the liquid crystal are to be formed, electrode films are formed, and the electrode pattern is formed in a photolithographic process, and finally the reflection layer 9 is formed. By this method, since the reflection layer 9 is directly formed on the substrate, decrease in the reflectance can be avoided and no adhesive is required. Thus, a process to stick a reflection plate to a liquid crystal panel is made unnecessary and the production yield can be improved.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、反射型液晶パネル
用基板および該基板を使用した反射型液晶表示素子に関
する。
The present invention relates to a reflective liquid crystal panel substrate and a reflective liquid crystal display device using the substrate.

【0002】[0002]

【従来技術】現在、携帯端末等には液晶パネルが使用さ
れている。端末等を長時間使用可能にするため、反射型
の液晶表示装置が使用されている。反射型の液晶表示装
置を構成するためには、反射板が必要である。特開平5
−27224では、特に反射型において使用者と逆側の
基板厚さにより、実像とその影との二重像による画質劣
化について、基板厚さを規定することで解決策を与えて
いる。しかし、基板と反射板については特に規定はして
いない。
2. Description of the Related Art Currently, liquid crystal panels are used in portable terminals and the like. In order to make a terminal or the like usable for a long time, a reflection type liquid crystal display device is used. In order to configure a reflection type liquid crystal display device, a reflection plate is required. JP 5
In -27224, a solution is provided by defining the thickness of the substrate for the image quality deterioration due to the double image of the real image and the shadow thereof, particularly in the reflection type, due to the thickness of the substrate opposite to the user. However, there are no particular restrictions on the substrate and the reflector.

【0003】また、現在、製造工程で使用されている反
射板を完成した液晶パネルに貼り付ける方法では、反射
率の低下や貼り付ける工程が必要なため、工程数の増加
を伴う。この工程数の増加は、歩留まりの低下とコスト
の上昇を起こすが、従来技術では、これらの問題に解決
策を与えていない。
[0003] Further, in the method of attaching a reflector currently used in the manufacturing process to a completed liquid crystal panel, the number of steps is increased because a reduction in reflectance and a step of attaching are required. Although this increase in the number of steps causes a decrease in yield and an increase in cost, the prior art does not provide a solution to these problems.

【0004】[0004]

【発明が解決しようとする課題】本発明は、前記問題点
を解決する反射型液晶セル用基板、および該基板を使用
した反射型液晶表示素子を提供することを目的とする。
SUMMARY OF THE INVENTION An object of the present invention is to provide a reflective liquid crystal cell substrate which solves the above-mentioned problems, and a reflective liquid crystal display device using the substrate.

【0005】[0005]

【課題を解決するための手段】本発明は、反射層を形成
する基板が、液晶層と接する側とは反対側に、凹凸形状
と反射層をもつことを特徴とする反射型液晶セル用基
板、および該基板を使用した反射型液晶表示素子を提供
することにより、前記課題を解決した。
According to the present invention, there is provided a substrate for a reflection type liquid crystal cell, wherein a substrate on which a reflection layer is formed has an uneven shape and a reflection layer on a side opposite to a side in contact with the liquid crystal layer. The problem was solved by providing a reflective liquid crystal display element using the substrate.

【0006】以下、本発明を図面に基づいて、説明す
る。図2は、従来構造の反射型液晶表示素子の模式的断
面である。 図2中、3,5は液晶セルの基板で、図中
8のギヤップ剤を介した基板間4に液晶を挟持する。1
は偏光板+位相差板(簡便のため1つの部品として示し
た。)。7は反射板を示す。偏光板+位相差板および反
射板は、それそれ2,6の接着剤を介して液晶セルに貼
り付けられている。この構成では、反射板7の反射率が
低下する。また、完成した液晶セルに反射板7を接着す
る構成のため、工数の増加によるコスト上昇および歩留
まりを低下させる。
Hereinafter, the present invention will be described with reference to the drawings. FIG. 2 is a schematic cross section of a reflection type liquid crystal display device having a conventional structure. In FIG. 2, reference numerals 3 and 5 denote substrates of a liquid crystal cell, which sandwich liquid crystal between substrates 4 via a gapping agent 8 in the drawing. 1
Is a polarizing plate + a retardation plate (shown as one component for simplicity). Reference numeral 7 denotes a reflector. The polarizing plate + the retardation plate and the reflection plate are attached to the liquid crystal cell via adhesives 2, 6, respectively. With this configuration, the reflectance of the reflection plate 7 decreases. Further, since the reflection plate 7 is bonded to the completed liquid crystal cell, the cost is increased and the yield is reduced due to an increase in the number of steps.

【0007】図1は本発明の液晶表示素子の1例を示す断
面図である。9は基板5の裏面に形成した反射層であ
る。この構成では、図2とは異なり、接着剤6が不要と
なる。反射層を形成する基板表面は、基板表面を凹凸に
形状加工することにより、該基板の反射特性を制御する
ことで、目的に応じた効率の良い反射光の利用が可能と
なる。
FIG. 1 is a sectional view showing an example of the liquid crystal display device of the present invention. 9 is a reflection layer formed on the back surface of the substrate 5. In this configuration, unlike FIG. 2, the adhesive 6 is not required. The surface of the substrate on which the reflective layer is formed is processed into irregularities on the surface of the substrate to control the reflection characteristics of the substrate, thereby making it possible to use the reflected light efficiently according to the purpose.

【0008】基板の表面処理の方法については、本発明
の目的を達成し得る凹凸を基板に形成することができる
ものであれば、特にその方法は制限されるものではない
が、たとえば、ガラス基板については、研磨やエッチン
グ等を行うことができる。また、表面処理を行う基板を
プラスチック基板とすることで、表面処理の加工性は大
幅に向上し、かつ、加工コストは低減される。一例をあ
げれば、金型に転写すべき表面形状の型を作製し、該型
にプラスチック基板を押し当てる方法を用いることがで
きる。なお、基板上の凹凸は微細な構造のため、図1、
図2共、図中には示されていない。
[0008] The method of surface treatment of the substrate is not particularly limited as long as irregularities capable of achieving the object of the present invention can be formed on the substrate. Can be polished or etched. Further, by using a plastic substrate as the substrate for performing the surface treatment, the workability of the surface treatment is greatly improved and the processing cost is reduced. For example, a method of preparing a mold having a surface shape to be transferred to a mold and pressing a plastic substrate against the mold can be used. Since the unevenness on the substrate is a fine structure, FIG.
2 are not shown in the figure.

【0009】図3は、基板に形成された反射層の形状を
示す1例である。この例では、凹凸状反射層9は、一定
角度で入射する光を液晶パネルの法線方向に反射するも
のである。また、図4に示すように、凹凸状反射層9
は、拡散状態を作り出すことも可能である。反射層の作
成手順としては、液晶を駆動する電極を形成する基板面
の裏側に、表面形状を転写し、その後に電極の成膜、フ
ォトリソ工程等による電極パターンの形成を行い、最後
に反射層の形成を行うことが望ましい。
FIG. 3 is an example showing the shape of a reflective layer formed on a substrate. In this example, the uneven reflection layer 9 reflects light incident at a fixed angle in the normal direction of the liquid crystal panel. In addition, as shown in FIG.
Can also create a diffuse state. As a procedure for forming the reflective layer, the surface shape is transferred to the back side of the substrate surface on which the electrodes for driving the liquid crystal are formed, then the electrode is formed, an electrode pattern is formed by a photolithography process, and finally, the reflective layer is formed. Is desirably formed.

【0010】すなわち、表面形状の転写時は基板にスト
レスがかかるため、透明電極等の機能を持つ膜(タラッ
ク等が入ると機能か損なわれるもの)は、クラック等を
防止するため、転写後の成膜が好ましい。続いて反射層
形成前に、透明電極を成膜し、フォトリソ工程でのパタ
ーニングを行うことが好ましい。フォトリソ工程は、酸
や塩基を使用するため、反射層材料が、これらによっ
て、影響を受けないようにするためである。もちろん、
先に酸や塩基に耐性の高い材料を使用して反射材料を成
膜したり、あるいは保護膜を形成する方法もあるが、こ
れらの方法では材料・成膜方法が高価であったり、工程
数の増加を引き起こす。
That is, since stress is applied to the substrate at the time of transferring the surface shape, a film having a function such as a transparent electrode (a function which is impaired when a tarak or the like enters) is prevented from cracking or the like. Film formation is preferred. Subsequently, before forming the reflective layer, it is preferable to form a transparent electrode and pattern it in a photolithography process. The photolithography process uses an acid or a base, so that the material of the reflective layer is not affected by these. of course,
There is a method of forming a reflective material using a material that is highly resistant to acids and bases first, or a method of forming a protective film. However, these methods require expensive materials and film forming methods, or require a large number of steps. Cause an increase.

【0011】反射板の表面形状については、ガラス基板
を使用した場合は、従来反射板を設定していた側のガラ
ス表面を荒らす等の表面処理を行い、続いて反射用の材
料を成膜することで作製することができる。反射用の材
料としてはAl、Ag等の金属材料を使用することがで
きる。これら金属材料は、蒸着、スパッタ等の方法で成
膜可能である。
Regarding the surface shape of the reflection plate, when a glass substrate is used, surface treatment such as roughening the glass surface on the side where the reflection plate is conventionally set is performed, and then a material for reflection is formed. It can be manufactured by the following. As a material for reflection, a metal material such as Al or Ag can be used. These metal materials can be formed into a film by a method such as vapor deposition or sputtering.

【0012】特に、基板にプラスチック材料を使用する
ことで、本発明の目的を容易に実現することができる。
本発明で使用するプラスチック基板の種類は、反射の為
の表面処理を行うことが可能であるものであれば、特に
制限されるものではない。基板にプラスチック材料を使
用する場合、ガラスと同様に、従来反射板を設定してい
た側のプラスチック基板面を荒らす等の表面処理を行
い、次に反射用の材料を成膜することで反射板とするこ
とができる。
In particular, the object of the present invention can be easily realized by using a plastic material for the substrate.
The type of the plastic substrate used in the present invention is not particularly limited as long as it can perform a surface treatment for reflection. When a plastic material is used for the substrate, similar to glass, surface treatment such as roughening the surface of the plastic substrate on the side where the reflection plate was conventionally set is performed, and then the reflection plate is formed by forming a material for reflection. It can be.

【0013】プラスチック基板の場合は、基板に金型を
押し当てる等の方法で反射の為の表面処理を容易に行う
ことが可能である。また、基板作製時に基板表面を荒ら
すことも可能である。プラスチック基板を使用した場合
の反射用材料の成膜は、スパッタ法が望ましい。また、
プラスチック基板を使用することで表示品質の向上(実
像と影による二重像の回避)および加工性の向上(基板
表面の加工が容易である)が得られる。
In the case of a plastic substrate, surface treatment for reflection can be easily performed by, for example, pressing a mold against the substrate. In addition, the surface of the substrate can be roughened during the production of the substrate. In the case of using a plastic substrate, the film formation of the reflection material is preferably performed by a sputtering method. Also,
By using a plastic substrate, display quality can be improved (a double image due to a real image and a shadow can be avoided) and workability can be improved (processing of the substrate surface is easy).

【0014】[0014]

【実施例】以下に本発明の実施例をあげて説明する。Embodiments of the present invention will be described below.

【0015】実施例1 画素容量160×160画素ピッチ200μmであり、
厚さ0.7mmガラス基板を使用し、液晶パネルを作製
した。液晶パネルの裏側にあたる基板(液晶電極とは逆
側)にエッチングにより凹凸を形成した後にAlを成膜
し、セルを作製した。比較のために、同一構成で液晶パ
ネルの外側に同一条件でガラス基板をエッチングして凹
凸を形成した後Alを成膜した反射板を接着したセルを
作製した。本発明による液晶セルは、比較例のセルと比
べて、白表示時の反射強度が約5%高くなった。
Embodiment 1 The pixel capacity is 160 × 160 and the pixel pitch is 200 μm.
A liquid crystal panel was manufactured using a glass substrate having a thickness of 0.7 mm. After forming irregularities on the substrate (the side opposite to the liquid crystal electrodes) on the back side of the liquid crystal panel by etching, Al was deposited to form a cell. For comparison, a cell was prepared in which the glass substrate was etched under the same conditions on the outside of the liquid crystal panel under the same conditions to form irregularities, and then a reflective plate formed with Al was bonded thereto. In the liquid crystal cell according to the present invention, the reflection intensity at the time of white display was about 5% higher than that of the cell of the comparative example.

【0016】実施例2 実施例1の解像度をもち、使用者が観察する側の基板
は、厚さ0.7mmのガラス基板を使用し、反対側の基
板はポリカーボネート(以下PCと示す)を使用した液
晶セルを作製した。はじめに金型を使用し、液晶パネル
の裏側に当たる基板(液晶電極とは逆側)に凹凸を形成
した後、PC上に液晶駆動のための電極パターンを作製
し、反対側にAlを成膜した反射層を設けた。比較のた
めに、液晶セルを構成する2枚の基板に、厚さ0.7m
mのガラス基板を使用し、裏面にエッチング処理にて同
様の凹凸を形成した後、Alを反射層として成膜したも
のを作製した。比較の結果、白表示時の反射強度は、ほ
とんど変わらなかったが、二重像はPC基板を使用した
ものが極端に少なかった。
Example 2 A substrate having the same resolution as that of Example 1 was used, and a substrate on the side to be observed by a user was a glass substrate having a thickness of 0.7 mm. A liquid crystal cell was prepared. First, using a mold, after forming irregularities on the substrate (the opposite side to the liquid crystal electrode) on the back side of the liquid crystal panel, an electrode pattern for driving the liquid crystal was formed on the PC, and Al was formed on the opposite side. A reflective layer was provided. For comparison, the two substrates constituting the liquid crystal cell have a thickness of 0.7 m.
Using a glass substrate having a thickness of m, similar irregularities were formed on the back surface by etching, and then a film was formed by using Al as a reflective layer. As a result of the comparison, the reflection intensity at the time of white display hardly changed, but the number of double images using a PC substrate was extremely small.

【0017】実施例3 実施例1の解像度で、電極を形成する側とは反対側にエ
ッチングにより凹凸を形成した後に、電極パターン用の
フォトリソ工程前および後に反射層を作製した基板をそ
れぞれ作製した。反射層材料としてはAlを使用した。
また、どちらの基板も反射層形成後、無機コート層を形
成した。その結果、フォトリソ工程前に反射層を形成し
た基板では、一部エッチング液で反射層が侵されてい
た。使用した保護コートでは、エッチング液に対する保
護が不十分だったと考えられ、これを解決するには、保
護コートを厚くするか、多層化する等の対策が必要と考
えられる。
Example 3 At the resolution of Example 1, irregularities were formed by etching on the side opposite to the side on which the electrodes were formed, and then substrates having a reflective layer before and after a photolithography step for an electrode pattern were manufactured. . Al was used as a reflective layer material.
After forming the reflective layer on both substrates, an inorganic coat layer was formed. As a result, in the substrate on which the reflection layer was formed before the photolithography step, the reflection layer was partially damaged by the etching solution. It is considered that the used protective coat did not provide sufficient protection against the etching solution. To solve this problem, it is necessary to take measures such as increasing the thickness of the protective coat or increasing the number of layers.

【0018】フォトリソ工程後に、反射層を形成した基
板では、反射層の変化は見られなかった。フォトリソ工
程後に反射層を形成することで、反射層の信頼性・品質
の向上と、低コスト化が計れることがわかった。
No change in the reflective layer was observed on the substrate on which the reflective layer was formed after the photolithography step. It was found that by forming the reflective layer after the photolithography step, the reliability and quality of the reflective layer could be improved and the cost could be reduced.

【0019】実施例4 実施例1の解像度で、基板にPCを使用し、透明電極材
料の成膜前および後に、金型による基板上への反射層用
のパターン転写をおこなった。上記工程後、実施例3同
様に反射層材料にAlを使用し、通常の作製工程で液晶
セルを作製した。図5記載の回路構成で動作確認をおこ
なった。透明電極材料の成膜後にパターン転写をおこな
ったセルでは、電極の断線と考えられる表示不良があっ
た。一方透明電極材料の成膜前にパターン転写をおこな
ったセルでは電極に断線は起こさなかった。
Example 4 At the resolution of Example 1, a PC was used for the substrate, and before and after the formation of the transparent electrode material, the pattern for the reflective layer was transferred onto the substrate by a mold. After the above steps, Al was used as the material of the reflective layer in the same manner as in Example 3, and a liquid crystal cell was manufactured by a normal manufacturing process. The operation was confirmed with the circuit configuration shown in FIG. In the cell where the pattern transfer was performed after the film formation of the transparent electrode material, there was a display defect considered to be a disconnection of the electrode. On the other hand, in the cell where the pattern was transferred before the formation of the transparent electrode material, no disconnection occurred in the electrode.

【0020】実施例5 実施例1で作製した解像度をもち、液晶セルを構成する
2枚の基板ともPCを使用した液晶セルを作製した。液
晶セルの裏面にあたるPCは金型により反射層を成膜す
る側に表面形状の変更をおこなった。続いて表面形状を
変更した反対側に液晶駆動のための電極パターンを作製
し、先に表面形状を変更した側にAlを成膜した反射層
を設けた。比較のために液晶セルを構成する2枚の基板
に同様にPCを使用し、裏面にAlを反射層として成膜
したものを作製した。比較の結果、白表示時の反射強度
は、反射層の表面形状を変更したもので10%(比較例
対比)の向上が見られた。
Example 5 A liquid crystal cell having the resolution produced in Example 1 and using a PC for both substrates constituting the liquid crystal cell was produced. The PC on the back surface of the liquid crystal cell had its surface shape changed on the side on which the reflective layer was formed by a mold. Subsequently, an electrode pattern for driving the liquid crystal was formed on the opposite side where the surface shape was changed, and a reflection layer formed of Al was provided on the side where the surface shape was changed first. For comparison, PCs were similarly used for two substrates constituting a liquid crystal cell, and a film was formed on the back surface using Al as a reflective layer. As a result of the comparison, the reflection intensity at the time of white display was improved by 10% (compared with the comparative example) when the surface shape of the reflection layer was changed.

【0021】[0021]

【効果】1.請求項1 液晶パネルに反射板を貼り合わせる工程が不要になり、
歩留まりが向上した。また、反射特性が調整可能で明る
い反射板を提供できた。 2.請求項2 反射特性が調整可能で、明るい反射板を含んだ基板を提
供できた。 3.請求項3 電極パターンの形成のエッチンググプロセスを終了した
後に反射層を作製することで、反射層材料をエッチング
グプロセスに耐える材料や保護層を使用するコストを削
減することができ、また、反射層を形成する面の加工
は、電極パターンの形成する前に行うことにより、透明
電極へのダメージを低減し、高信頼性の液晶表示素子を
提供できる反射型液晶セル用基板が得られた。 4.請求項4 使用する基板をプラスチック基板とすることで、表示品
質が向上し、かつ加工性の向上による低コスト化を実現
することができる反射型液晶セル用基板が得られた。 5.請求項5 前記反射型液晶セル用基板を使用することにより、従来
の問題点を解消した反射型液晶表示素子が得られた。
[Effect] 1. Claim 1 The step of attaching the reflection plate to the liquid crystal panel becomes unnecessary,
Yield improved. In addition, a bright reflector with adjustable reflection characteristics could be provided. 2. Claim 2 It is possible to provide a substrate whose reflection characteristics are adjustable and which includes a bright reflector. 3. Claim 3 By forming the reflective layer after the etching process for forming the electrode pattern is completed, it is possible to reduce the cost of using a protective layer and a material that can withstand the etching process. By processing the surface on which the layer is formed before forming the electrode pattern, a damage to the transparent electrode was reduced and a reflective liquid crystal cell substrate capable of providing a highly reliable liquid crystal display element was obtained. 4. Claim 4 By using a plastic substrate as the substrate to be used, a reflective liquid crystal cell substrate that can improve the display quality and reduce the cost by improving the processability is obtained. 5. Claim 5 By using the reflective liquid crystal cell substrate, a reflective liquid crystal display device which has solved the conventional problems can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の液晶表示素子の1例を示す断面図であ
る。
FIG. 1 is a cross-sectional view showing one example of a liquid crystal display device of the present invention.

【図2】従来構造の反射型液晶表示素子の模式的断面図
である。
FIG. 2 is a schematic sectional view of a reflection type liquid crystal display device having a conventional structure.

【図3】基板に形成された反射層の形状の1例を示す図
である。
FIG. 3 is a diagram showing an example of a shape of a reflection layer formed on a substrate.

【図4】基板に形成された反射層の形状の他の例を示す
図である。
FIG. 4 is a diagram showing another example of the shape of the reflection layer formed on the substrate.

【図5】実施例5において、液晶セルの動作確認と行っ
た回路を示す図である。
FIG. 5 is a diagram showing a circuit in which operation of a liquid crystal cell was confirmed and performed in Example 5.

【符号の説明】[Explanation of symbols]

1 偏光板+位相差板 2 接着剤 3 液晶セルの基板 4 ギヤップ剤を介した基板間 5 液晶セルの基板 6 接着剤 7 反射板 8 ギヤップ材 9 基板裏面に形成した反射層 Reference Signs List 1 polarizing plate + retardation plate 2 adhesive 3 substrate of liquid crystal cell 4 between substrates via gapping agent 5 substrate of liquid crystal cell 6 adhesive 7 reflecting plate 8 gapping material 9 reflecting layer formed on back surface of substrate

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 液晶層と接する側とは反対側の基板面
に、該基板に形成された凹凸形状と反射層を有すること
を特徴とする反射型液晶セル用基板。
1. A reflection type liquid crystal cell substrate comprising: a substrate surface on a side opposite to a side in contact with a liquid crystal layer; and a concave and convex shape formed on the substrate and a reflection layer.
【請求項2】 基板面に凹凸形状の形成後、反射層が形
成されたものである請求項1記載の反射型液晶セル用基
板。
2. The reflection type liquid crystal cell substrate according to claim 1, wherein a reflection layer is formed after forming an uneven shape on the substrate surface.
【請求項3】 凹凸形状を形成した後に、液晶を駆動す
る電極パターンの形成を行った後に反射層が形成された
ものである請求項1〜2のいずれかの項に記載の反射型
液晶セル用基板。
3. The reflection type liquid crystal cell according to claim 1, wherein a reflection layer is formed after forming an electrode pattern for driving a liquid crystal after forming the uneven shape. Substrate.
【請求項4】 基板がプラスチック基板である請求項1
〜3のいずれかの項に記載の反射型液晶セル用基板。
4. The substrate according to claim 1, wherein the substrate is a plastic substrate.
4. The substrate for a reflective liquid crystal cell according to any one of Items 3 to 3.
【請求項5】 請求項1〜4のいずれかの項に記載の反
射型液晶セル用基板を使用したことを特徴とする反射型
液晶表示素子。
5. A reflective liquid crystal display device comprising the reflective liquid crystal cell substrate according to claim 1. Description:
JP11004589A 1999-01-11 1999-01-11 Substrate for reflection type liquid crystal cell, and reflection type liquid crystal display device using the substrate Pending JP2000206505A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11004589A JP2000206505A (en) 1999-01-11 1999-01-11 Substrate for reflection type liquid crystal cell, and reflection type liquid crystal display device using the substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11004589A JP2000206505A (en) 1999-01-11 1999-01-11 Substrate for reflection type liquid crystal cell, and reflection type liquid crystal display device using the substrate

Publications (1)

Publication Number Publication Date
JP2000206505A true JP2000206505A (en) 2000-07-28

Family

ID=11588239

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11004589A Pending JP2000206505A (en) 1999-01-11 1999-01-11 Substrate for reflection type liquid crystal cell, and reflection type liquid crystal display device using the substrate

Country Status (1)

Country Link
JP (1) JP2000206505A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002229479A (en) * 2001-02-06 2002-08-14 Sumitomo Bakelite Co Ltd Plastic substrate for display element
KR20120054414A (en) * 2010-11-19 2012-05-30 엘지디스플레이 주식회사 Reflective liquid crystal display device and method of fabricating the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002229479A (en) * 2001-02-06 2002-08-14 Sumitomo Bakelite Co Ltd Plastic substrate for display element
KR20120054414A (en) * 2010-11-19 2012-05-30 엘지디스플레이 주식회사 Reflective liquid crystal display device and method of fabricating the same
KR101707961B1 (en) * 2010-11-19 2017-02-17 엘지디스플레이 주식회사 Reflective liquid crystal display device and method of fabricating the same

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