JP2000167355A - Purifying apparatus - Google Patents
Purifying apparatusInfo
- Publication number
- JP2000167355A JP2000167355A JP10349769A JP34976998A JP2000167355A JP 2000167355 A JP2000167355 A JP 2000167355A JP 10349769 A JP10349769 A JP 10349769A JP 34976998 A JP34976998 A JP 34976998A JP 2000167355 A JP2000167355 A JP 2000167355A
- Authority
- JP
- Japan
- Prior art keywords
- cylinder
- photocatalytic
- photocatalyst
- filter unit
- fluid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011941 photocatalyst Substances 0.000 claims abstract description 57
- 230000001699 photocatalysis Effects 0.000 claims abstract description 52
- 230000005284 excitation Effects 0.000 claims abstract description 32
- 239000012530 fluid Substances 0.000 claims abstract description 16
- 239000002346 layers by function Substances 0.000 claims abstract description 15
- 229910052751 metal Inorganic materials 0.000 claims description 24
- 239000002184 metal Substances 0.000 claims description 24
- 238000000746 purification Methods 0.000 claims description 24
- 239000000758 substrate Substances 0.000 claims description 23
- 239000004065 semiconductor Substances 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 12
- 239000004745 nonwoven fabric Substances 0.000 claims description 7
- 239000007769 metal material Substances 0.000 claims description 4
- 239000002537 cosmetic Substances 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 abstract description 3
- 239000010410 layer Substances 0.000 description 15
- 239000002245 particle Substances 0.000 description 14
- 239000000126 substance Substances 0.000 description 13
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 12
- 239000007788 liquid Substances 0.000 description 7
- 239000000843 powder Substances 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 239000010419 fine particle Substances 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 4
- -1 frit (glaze) Substances 0.000 description 4
- 239000011148 porous material Substances 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 238000007598 dipping method Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000013067 intermediate product Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 239000002923 metal particle Substances 0.000 description 3
- 150000002894 organic compounds Chemical class 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- GNRSAWUEBMWBQH-UHFFFAOYSA-N nickel(II) oxide Inorganic materials [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 2
- 238000006864 oxidative decomposition reaction Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 2
- 239000010865 sewage Substances 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910018566 Al—Si—Mg Inorganic materials 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 229910016003 MoS3 Inorganic materials 0.000 description 1
- 229910019899 RuO Inorganic materials 0.000 description 1
- 229910002370 SrTiO3 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- 229910007541 Zn O Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 238000004887 air purification Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000963 austenitic stainless steel Inorganic materials 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- CXKCTMHTOKXKQT-UHFFFAOYSA-N cadmium oxide Inorganic materials [Cd]=O CXKCTMHTOKXKQT-UHFFFAOYSA-N 0.000 description 1
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000010840 domestic wastewater Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 230000000855 fungicidal effect Effects 0.000 description 1
- 239000000417 fungicide Substances 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 229910001872 inorganic gas Inorganic materials 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 229910052961 molybdenite Inorganic materials 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- TVWWSIKTCILRBF-UHFFFAOYSA-N molybdenum trisulfide Chemical compound S=[Mo](=S)=S TVWWSIKTCILRBF-UHFFFAOYSA-N 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- 150000002830 nitrogen compounds Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000033116 oxidation-reduction process Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- NMJKIRUDPFBRHW-UHFFFAOYSA-N titanium Chemical compound [Ti].[Ti] NMJKIRUDPFBRHW-UHFFFAOYSA-N 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten(VI) oxide Inorganic materials O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910000166 zirconium phosphate Inorganic materials 0.000 description 1
- LEHFSLREWWMLPU-UHFFFAOYSA-B zirconium(4+);tetraphosphate Chemical compound [Zr+4].[Zr+4].[Zr+4].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LEHFSLREWWMLPU-UHFFFAOYSA-B 0.000 description 1
Landscapes
- Exhaust Gas Treatment By Means Of Catalyst (AREA)
- Treatment Of Water By Oxidation Or Reduction (AREA)
- Filtration Of Liquid (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、光触媒機能により
気体や液体(以下流体という)中の有機化合物や無機ガ
ス類を分解して清浄化する浄化装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a purification apparatus for decomposing and purifying organic compounds and inorganic gases in a gas or liquid (hereinafter referred to as a fluid) by a photocatalytic function.
【0002】[0002]
【従来の技術】石油化学製品が増加して居住環境内外で
有害有機化合物の複合汚染が問題となっている。これを
解決する手段として光触媒半導体による酸化分解を利用
した浄化装置が使用されている。2. Description of the Related Art As petrochemical products increase, complex pollution of harmful organic compounds inside and outside a living environment has become a problem. As a means for solving this, a purifying apparatus utilizing oxidative decomposition by a photocatalytic semiconductor is used.
【0003】例えば、基体の表面に光触媒半導体を担持
したフィルターを有害有機物が浮遊する流体中に置くこ
とにより有害有機物を光触媒半導体に接触させるように
構成した装置がある。しかるに従来の装置では光触媒を
担持したフィルターが流体の流れ方向に沿って伸びてい
るので、有害有機物と光触媒機能層との接触効率が低
く、またその光触媒半導体が励起波長の電磁波によって
十分に活性化され得ないという問題がある。For example, there is an apparatus in which a filter carrying a photocatalyst semiconductor on the surface of a substrate is placed in a fluid in which the harmful organic substance floats so that the harmful organic substance comes into contact with the photocatalyst semiconductor. However, in the conventional device, the filter carrying the photocatalyst extends along the flow direction of the fluid, so the contact efficiency between the harmful organic substance and the photocatalytic functional layer is low, and the photocatalytic semiconductor is sufficiently activated by the electromagnetic wave of the excitation wavelength. There is a problem that can not be done.
【0004】そのため、光触媒機能層を有するフィルタ
ーの形状や配置について種々の提案がなされている。例
えば、特開平7−108138号には、薄板からなる羽
根状の反応板に光触媒を担持させ、この反応板を空気通
路にブラインド形状に配列した装置が開示されている。
特開平8−121827号には、浄化空気通路中に設置
された紫外線ランプの前後に山形状に折り曲げた光励起
触媒不織布を設置した装置が開示されている。特開平9
−187491号には、空気の通路内に、両面に光触媒
層を有する基板を光源の周囲に放射状に設けた部材を有
する装置が開示されている。特開平9−248426号
には、流体を搬送又は攪拌する凸部の表面に光触媒機能
層を設け、内側に紫外線放射部材を収容した可動体が開
示されている。For this reason, various proposals have been made regarding the shape and arrangement of a filter having a photocatalytic function layer. For example, Japanese Patent Laying-Open No. 7-108138 discloses a device in which a photocatalyst is supported on a blade-shaped reaction plate made of a thin plate, and the reaction plate is arranged in a blind shape in an air passage.
Japanese Patent Application Laid-Open No. HEI 8-121827 discloses a device in which a photoexcited catalytic nonwoven fabric bent in a mountain shape is installed before and after an ultraviolet lamp installed in a purified air passage. JP 9
No. 187,491 discloses an apparatus having a member in which a substrate having a photocatalyst layer on both surfaces is radially provided around a light source in an air passage. Japanese Patent Application Laid-Open No. 9-248426 discloses a movable body in which a photocatalytic function layer is provided on the surface of a convex portion that carries or stirs a fluid, and an ultraviolet radiation member is housed inside.
【0005】[0005]
【発明が解決しようとする課題】光触媒による酸化還元
分解は、処理対象物質がO2 −、OH−等の活性ラジカ
ル種と接触することで分解性能が生まれると言われてい
る。それゆえに、上述した従来の装置では、処理対象物
質の量が多い場合、光触媒フィルターと処理対象物質が
確実に接触するには時間がかかったり、光触媒フィルタ
ーと処理対象物質が接触する機会が少ないという問題が
あった。また、光触媒機能化のためには、光触媒フィル
ターが光触媒半導体金属に見合う励起波長を受光するこ
とが必要であるが、従来の装置では効率的に受光させる
構成とはなっていなかった。特に、従来の浄化装置で
は、光触媒フィルターの表面に付着堆積した中間生成物
を除去することが難しく、保守点検が面倒であった。It is said that the oxidation-reduction decomposition using a photocatalyst produces decomposition performance when a substance to be treated comes into contact with an active radical species such as O 2 − and OH − . Therefore, in the above-described conventional apparatus, when the amount of the substance to be treated is large, it takes time to surely contact the photocatalyst filter and the substance to be treated, or the chance that the photocatalyst filter contacts the substance to be treated is small. There was a problem. Further, in order to realize the photocatalytic function, the photocatalytic filter needs to receive an excitation wavelength suitable for the photocatalytic semiconductor metal, but the conventional apparatus has not been configured to efficiently receive light. In particular, in the conventional purifying device, it is difficult to remove the intermediate products adhered and deposited on the surface of the photocatalytic filter, and maintenance and inspection are troublesome.
【0006】したがって本発明の第1の目的は、処理対
象物質とより多くの接触機会を作り得る浄化装置を提供
することである。本発明の第2の目的は、光触媒半導体
金属に確実に励起波長を受光しかつ散乱光を有効に利用
し得る浄化装置を提供することである。本発明の第3の
目的は、中間生成物をはじめとする付着物を容易に除去
しうる構造をもった浄化装置を提供することである。Accordingly, a first object of the present invention is to provide a purification apparatus capable of creating more opportunities for contact with a substance to be treated. A second object of the present invention is to provide a purification device capable of reliably receiving an excitation wavelength in a photocatalytic semiconductor metal and effectively using scattered light. A third object of the present invention is to provide a purification device having a structure capable of easily removing deposits including intermediate products.
【0007】[0007]
【課題を解決するための手段】上記目的を達成するため
に、本発明においては、軸方向に沿って被処理流体が流
れるシリンダーと、シリンダーの内部に収納された光触
媒フィルターユニットを有し、光触媒フィルターユニッ
トは軸部材とその周囲に立体的に配設された複数の透過
接触性を有する光触媒フィルターを有すると共に、光触
媒フィルターの少なくとも一部は被処理流体の流れ方向
と交叉している、という技術的手段を採用した。本発明
において、光触媒フィルターユニットは軸部材の内部に
励起波長発光体を有することが好ましい。本発明におい
て、光触媒フイルターユニットはシリンダーの内部に着
脱自在に収納され、シリンダーは少なくともその一部を
開閉する手段を有することが好ましい。本発明におい
て、シリンダーは励起波光を反射することが可能な材料
で形成されかつ内面に光触媒機能層を有することが好ま
しい。本発明において、シリンダーは透光性化粧窓を有
することが好ましい。本発明において、光触媒フィルタ
ーは、金属材料からなる基板と光触媒機能層を有するこ
とが好ましい。上記目的を達成するために、本発明にお
いては、一端側から他端側に向って被処理流体が流れる
光触媒フィルターユニットを有し、光触媒フィルターユ
ニットは、励起波長発光体の周囲を取囲む透過接触性光
触媒フィルターを含み、透過接触性光触媒フィルターは
金属製不織布を含む多孔質部材とそこに担持された光触
媒機能層を有する構成とすることができる。この構成に
おいて、励起波長発光装置は、被処理流体が流れる方向
と交叉する方向に伸長しかつ少くとも一端側で折返され
た発光管を有し、多孔質部材は励起波長発光装置の両側
に配置されることが好ましい。According to the present invention, there is provided a photocatalyst having a cylinder through which a fluid to be processed flows along an axial direction, and a photocatalyst filter unit housed inside the cylinder. The filter unit has a shaft member and a plurality of photocatalyst filters having three-dimensionally permeable contacts disposed around the shaft member, and at least a part of the photocatalyst filter crosses the flow direction of the fluid to be treated. Tactics were adopted. In the present invention, it is preferable that the photocatalytic filter unit has an excitation wavelength luminous body inside the shaft member. In the present invention, it is preferable that the photocatalyst filter unit is detachably housed inside the cylinder, and the cylinder preferably has means for opening and closing at least a part thereof. In the present invention, the cylinder is preferably formed of a material capable of reflecting excitation wave light and has a photocatalytic function layer on the inner surface. In the present invention, the cylinder preferably has a translucent decorative window. In the present invention, the photocatalytic filter preferably has a substrate made of a metal material and a photocatalytic functional layer. In order to achieve the above object, the present invention has a photocatalyst filter unit through which a fluid to be treated flows from one end to the other end, wherein the photocatalyst filter unit has a transparent contact surrounding the excitation wavelength luminous body. The transparent contact photocatalyst filter may include a porous member including a metal nonwoven fabric and a photocatalyst functional layer carried thereon. In this configuration, the excitation wavelength light emitting device has an arc tube that extends in a direction intersecting with the direction in which the fluid to be processed flows and is bent at least at one end, and the porous members are disposed on both sides of the excitation wavelength light emitting device. Is preferably performed.
【0008】[0008]
【発明の実施の形態】以下本発明の詳細を図面により説
明する。図1は本発明の一実施例に係る浄化装置の斜視
図、図2は図1のA-A線矢視図である。両図におい
て、1は浄化装置であり、ベース2上に立設された円筒
状を有するシリンダー3とその内部に収納された光触媒
フィルターユニット4とを有する。シリンダー3は、下
端部に被処理流体(例えば汚染された空気)が流入する
流入口5を有し、その上方には汚染された空気中の異物
(塵芥)を除去するためのフィルター6と光触媒フィル
ターユニット4の一端を受け取るためのソケット部7を
有する。シリンダー3の上端部には、浄化された空気が
流出する流出口8が形成されると共に、シリンダー3の
上端面はヒンジ9を介して開閉自在に取着されたふた1
0で密閉されている。ふた10の内面には、光触媒フィ
ルターユニット4の他端を受け取るためのソケット部1
1が装着されている。12は透光性化粧窓であり、例え
ばシリンダー3の一部を切欠いてそこに透明なシート
(プラスチック板)を貼着して形成される。DESCRIPTION OF THE PREFERRED EMBODIMENTS The details of the present invention will be described below with reference to the drawings. FIG. 1 is a perspective view of a purification device according to one embodiment of the present invention, and FIG. 2 is a view taken along line AA of FIG. In both figures, reference numeral 1 denotes a purifying device, which includes a cylindrical cylinder 3 erected on a base 2 and a photocatalytic filter unit 4 housed therein. The cylinder 3 has, at a lower end thereof, an inlet 5 through which a fluid to be treated (for example, contaminated air) flows, and a filter 6 and a photocatalyst above the contaminated air for removing foreign substances (dust) in the contaminated air. It has a socket part 7 for receiving one end of the filter unit 4. An outlet 8 through which purified air flows out is formed at the upper end of the cylinder 3, and a lid 1, which is openably and closably attached via a hinge 9, to an upper end surface of the cylinder 3.
0 is sealed. A socket 1 for receiving the other end of the photocatalytic filter unit 4 is provided on the inner surface of the lid 10.
1 is attached. Reference numeral 12 denotes a translucent decorative window, which is formed, for example, by cutting out a part of the cylinder 3 and attaching a transparent sheet (plastic plate) thereto.
【0009】光触媒フィルターユニット4は、枠状に形
成された軸部材(図示せず)の周囲に放射状にかつスパ
イラル状にねじり組付けられた複数個の透過接触性を有
する帯状の光触媒フィルター13と、軸部材の内部に挿
入された励起発光管14とを有する。励起発光管14
は、その両端部においてソケット部7及びソケット部1
1により支承されており、一端側にファン15が装着さ
れている。励起発光管14の両端はソケット部に挿入固
定されていてもよいし、あるいはソケット部に対して回
転可能に支持されていてもよい。励起発光管14として
は、ブラックライトや蛍光灯などの紫外線を放射するラ
ンプを用い得る。The photocatalyst filter unit 4 includes a plurality of strip-shaped photocatalyst filters 13 having transmission contact properties, which are radially and spirally twisted around a shaft member (not shown) formed in a frame shape. , An excitation light emitting tube 14 inserted inside the shaft member. Excitation arc tube 14
Are socket portions 7 and 1 at both ends.
1 and a fan 15 is mounted on one end side. Both ends of the excitation light emitting tube 14 may be inserted and fixed in the socket portion, or may be rotatably supported with respect to the socket portion. As the excitation light emitting tube 14, a lamp that emits ultraviolet light such as a black light or a fluorescent light can be used.
【0010】上記シリンダー3は、励起発光管14から
照射された紫外線を反射させ、光触媒フィルター13に
導くために、例えば紫外線が近紫外線の場合には、アル
ミニウム合金又はステンレス鋼のような励起波長を反射
しうる機能を有する材料で形成することが望ましい。更
にシリンダー3の内周面に光触媒機能層を形成しておく
と、空気の清浄化をより効率よく行うことができる。The cylinder 3 reflects ultraviolet light emitted from the excitation luminous tube 14 and guides the ultraviolet light to the photocatalytic filter 13. For example, when the ultraviolet light is near ultraviolet light, an excitation wavelength such as an aluminum alloy or stainless steel is used. It is desirable to form with a material having a function that can reflect light. Furthermore, if a photocatalytic function layer is formed on the inner peripheral surface of the cylinder 3, air can be more efficiently purified.
【0011】上記浄化装置1によれば、ファン15の駆
動により、流入口5よりシリンダー3内に流入した汚染
空気は、フィルター6で粗大な異物が除去され、光触媒
フィルター13と接触し、励起発光管14からの紫外線
で活性化された光触媒により汚染空気中の各種化合物が
酸化分解され、次いで清浄空気がシリンダー3外に排出
される。各光触媒フィルター13は、励起発光管14に
対して傾斜して配置されているので、光触媒機能層は均
等にかつ大量の紫外線を受光することが可能となり、光
触媒機能化を確実に行うことができる。上記光触媒によ
る酸化分解が継続して行われると、窒素化合物、イオウ
化合物あるいは塩素化合物の場合には、中間生成物が光
触媒機能層の表面に付着して、分解効率が低下する。そ
の場合には、図2に一点鎖線で示すようにふた10を開
放した後光触媒フィルターユニット4を図2に破線で示
す位置まで引上げ、この光触媒フィルターユニット4を
水(例えば弱酸性水)で洗浄してから、シリンダー3内
にセットすればよい。According to the purification device 1, the contaminated air flowing into the cylinder 3 from the inflow port 5 by driving the fan 15 removes coarse foreign substances by the filter 6 and comes into contact with the photocatalyst filter 13 so as to emit light by excitation. The various compounds in the contaminated air are oxidized and decomposed by the photocatalyst activated by the ultraviolet light from the tube 14, and then the clean air is discharged out of the cylinder 3. Since each photocatalyst filter 13 is arranged obliquely with respect to the excitation light emitting tube 14, the photocatalyst functional layer can receive a large amount of ultraviolet light evenly, and the photocatalytic function can be reliably achieved. . If the oxidative decomposition by the photocatalyst is continuously performed, in the case of a nitrogen compound, a sulfur compound or a chlorine compound, an intermediate product adheres to the surface of the photocatalytic functional layer, and the decomposition efficiency is reduced. In this case, after opening the lid 10 as shown by the dashed line in FIG. 2, the photocatalytic filter unit 4 is pulled up to the position shown by the broken line in FIG. 2, and the photocatalytic filter unit 4 is washed with water (for example, weakly acidic water). Then, it may be set in the cylinder 3.
【0012】図3は本発明の他の実施例に係る浄化装置
の斜視図、図4は図3のB−B線矢視図であり、図1及
び2と同一機能部分は同一の参照符号で示す。この浄化
装置1では、光触媒フィルターユニット4は、円板状の
光触媒フィルター40を複数個軸方向に配設すると共
に、帯状の光触媒フィルター41を複数個放射状に配設
して形成されている。シリンダー3は、半円筒体3a及
び3bをヒンジ30で結合し、軸方向に分割面31を形
成した構造を有する。上記浄化装置1によれば、図1の
装置と同様に、流入口5からシリンダー3内に流入した
汚染空気は、フィルター6でろ過され、光触媒フィルタ
ー40、41と接触し、励起発光管14からの紫外線で
活性化された光触媒により、汚染空気中の各種化合物が
酸化分解され、清浄空気が流出口8から排出される。ま
た光触媒フィルターユニット4を洗浄する場合は、シリ
ンダー3を図4の破線で示す位置まで開放し、次いで光
触媒フィルターユニット4を取出せばよい。FIG. 3 is a perspective view of a purifying apparatus according to another embodiment of the present invention, and FIG. 4 is a view taken along the line BB of FIG. 3, in which the same functional parts as in FIGS. Indicated by In this purification device 1, the photocatalyst filter unit 4 is formed by arranging a plurality of disk-shaped photocatalyst filters 40 in the axial direction and arranging a plurality of strip-shaped photocatalyst filters 41 in a radial manner. The cylinder 3 has a structure in which the semi-cylindrical bodies 3a and 3b are connected by a hinge 30, and a dividing surface 31 is formed in the axial direction. According to the purification device 1, similarly to the device of FIG. 1, the contaminated air flowing into the cylinder 3 from the inflow port 5 is filtered by the filter 6, comes into contact with the photocatalyst filters 40 and 41, and The various compounds in the contaminated air are oxidized and decomposed by the photocatalyst activated by the ultraviolet light, and the clean air is discharged from the outlet 8. When the photocatalyst filter unit 4 is to be cleaned, the cylinder 3 is opened to the position shown by the broken line in FIG.
【0013】本発明では、上述した光触媒フィルター1
3は、基体の表面に光触媒機能層が造膜された構造を有
し、図5に示すように、基体を多数の空孔21を有する
基板20に微粒子22からなる多孔質層23を形成し
て、透過接触性能を有しかつ多表面積をもつ多孔質積層
体(以下多表面積多孔質積層体という)とした構成とす
ることが好ましい。光触媒フィルターに多表面積をもた
せるための多孔質層を構成する微粒子は、セラミック、
ガラス、金属、プラスチック等材質は問わないが、基板
の材質と同一であることが望ましい。また基板は、金
網、エクスパンドメタル、パンチングメタル等の網状体
又はそれと類似のものであってもよい。この場合基板と
微粒子との位置関係が重要であって、微粒子は、処理対
象物質を含有する気体や液体が透過する空孔21の周辺
に効果的に接触し、且つ励起波長を受光する位置に配さ
れている必要がある。図5において、処理対象物質を含
有する気体や液体が多表面積多孔質積層体{平面投影面
積(A)}を透過する時の単位時間当りの透過量をa、
多表面積多孔質積層体の内光触媒半導体金属が造膜され
た領域の平面投影面積(b)と上記平面投影面積(A)
との比率(表面積比)をb/A、多表面積多孔質積層体
の側面の表面積(c)と上記平面投影面積(A)との比
率(側面表面積比)をC/Aとすると、励起波長が図面
の上下から発生しているとして、透過量(a)及び表面
積比(b/A)ができるだけ多く、かつ、側面表面積比
(C/A)ができるだけ小さいといった条件を満足させ
ることが好ましい。In the present invention, the photocatalyst filter 1 described above is used.
3 has a structure in which a photocatalytic function layer is formed on the surface of a base, and as shown in FIG. 5, a base is formed by forming a porous layer 23 composed of fine particles 22 on a substrate 20 having many holes 21. Thus, it is preferable that the porous laminate has a permeable contact performance and a large surface area (hereinafter, referred to as a multi-surface area porous laminate). The fine particles constituting the porous layer for providing the photocatalytic filter with a large surface area are ceramic,
The material is not limited, such as glass, metal, and plastic, but is preferably the same as the material of the substrate. The substrate may be a net such as a wire net, expanded metal, punched metal, or the like. In this case, the positional relationship between the substrate and the fine particles is important, and the fine particles are in effective contact with the periphery of the hole 21 through which the gas or liquid containing the substance to be processed passes, and at a position where the excitation wavelength is received. Must be arranged. In FIG. 5, a represents the amount of permeation per unit time when a gas or liquid containing the substance to be processed permeates the multi-surface area porous laminate {planar projected area (A)}.
Plane projected area (b) of the region where the inner photocatalytic semiconductor metal is formed in the multi-surface area porous laminate and the planar projected area (A)
If the ratio (surface area ratio) of the surface area (c) of the side surface of the multi-surface area porous laminate and the above-mentioned plane projected area (A) (side surface surface ratio) is C / A, the excitation wavelength It is preferable to satisfy the conditions that the amount of transmission (a) and the surface area ratio (b / A) are as large as possible and that the side surface area ratio (C / A) is as small as possible, assuming that is generated from above and below the drawing.
【0014】また、光触媒機能化の条件を満足するため
には、光触媒半導体金属が励起波長を受光することが必
要であり、多数の板状光触媒フィルターが表裏とも均等
に受光することが望ましい。そのために本発明では板状
の光触媒フィルターを励起波長発源に対し傾斜させてい
ることで造膜面により多く受光することが可能になる。Further, in order to satisfy the condition for functionalizing the photocatalyst, it is necessary that the photocatalytic semiconductor metal receives the excitation wavelength, and it is desirable that a large number of plate-shaped photocatalytic filters receive light uniformly on both sides. Therefore, in the present invention, the plate-shaped photocatalytic filter is inclined with respect to the excitation wavelength source, so that more light can be received on the film forming surface.
【0015】本発明では、次のようにして複数の空孔を
有する基板の表面に微粒子からなる多孔質層を形成する
ことが望ましい。この多孔質層は、例えば、平均粒径1
0〜400μmの金属粉末を水等の溶媒に混合したスラ
リー(固形分60〜80重量%)を基板の表面に塗布
し、乾燥後焼結することにより得られる。基板もしくは
微粉末を形成する金属材料としては、SUS304、S
US310、SUS316等のオーステナイト系ステン
レス鋼、Ti又はその合金(Ti−Mn系、Ti−Cr
系等)、Cu又はその合金あるいは、Al又はその合金
(Al−Si−Mg系)、Fe又はその合金を用い得
る。但しFe系材料の場合は、表面に耐酸化性皮膜(酸
化鉄)を形成することが好ましい。金属粉末は、その粒
径が小さすぎると価格が高くなり(粉砕時間が長くな
る)、大きすぎると微細な空孔が得られなくなるので、
平均粒径10〜400μmのものを用いることが好まし
い。焼結温度は、金属粉末の材質に応じて定めればよい
が、低すぎると十分な焼結密度が得られず、強度が低下
し、一方金属の融点近くになると各粒子が融着して却っ
て粗大な空孔が形成されてしまうので、SUS、Ti、
Cuの場合は800〜1000℃の範囲が、Alの場合
は300〜400℃の範囲が好ましい。In the present invention, it is desirable to form a porous layer made of fine particles on the surface of a substrate having a plurality of holes as follows. This porous layer has, for example, an average particle size of 1
A slurry (solid content: 60 to 80% by weight) obtained by mixing a metal powder of 0 to 400 μm in a solvent such as water is applied to the surface of a substrate, dried, and then sintered. As the metal material for forming the substrate or the fine powder, SUS304, S
Austenitic stainless steel such as US310 and SUS316, Ti or its alloy (Ti-Mn-based, Ti-Cr
System), Cu or an alloy thereof, Al or an alloy thereof (Al-Si-Mg system), Fe or an alloy thereof. However, in the case of an Fe-based material, it is preferable to form an oxidation-resistant film (iron oxide) on the surface. If the particle size of the metal powder is too small, the price increases (the pulverization time increases), and if it is too large, fine pores cannot be obtained.
It is preferable to use one having an average particle size of 10 to 400 μm. The sintering temperature may be determined according to the material of the metal powder, but if it is too low, a sufficient sintering density is not obtained, and the strength is reduced. On the contrary, coarse pores are formed, so SUS, Ti,
In the case of Cu, the range is preferably 800 to 1000 ° C, and in the case of Al, the range is preferably 300 to 400 ° C.
【0016】このようにして得られた多孔質層は、5〜
1000μmの空孔径を有することが好ましい。空孔径
が大きすぎると、空気の浄化に使用しても微細な異物を
阻止できなくなり、清浄な空気が得られなくなるので、
1000μm以下とする必要がある。また多孔質層の厚
さは薄いと強度が不足し、一方厚いと透過抵抗が大きく
なるので、10〜100μmの厚さが好ましい。[0016] The porous layer thus obtained is
It preferably has a pore diameter of 1000 μm. If the pore diameter is too large, it will not be possible to prevent fine foreign substances even when used for air purification, and it will not be possible to obtain clean air.
It is necessary to be 1000 μm or less. When the thickness of the porous layer is small, the strength is insufficient, and when the thickness is large, the permeation resistance increases. Therefore, the thickness of the porous layer is preferably 10 to 100 μm.
【0017】多孔質層を形成する金属粒子は、定形粒子
(球形あるいは粒状粉粒子)又は不定形粒子(角状粉粒
子のような鋭利な角をもつ粒子)のことが多いが、鱗状
あるいは薄片状であってもよい。基体への固定に焼付け
などの溶融手段を採用するときは、馴染がよいことから
基体と同じ素材であることが好ましい。しかし、素材が
異なっても適切なバインダーを適量に利用することなく
固定することができる。なお、基体と表面積を増大する
ための粒子とが異種の素材である場合には線膨張係数を
合わせておくか、どちらか一方の材の線膨張に見合う伸
縮性を保持していることが必要である。バインダーとし
ては無機ガラス、フリット(釉薬)、金属粉あるいは通
常の熱可塑性樹脂などを用い得る。上記金属粒子を積層
するには、スプレーやディッピングを数回繰り返すなど
の他にスクリーンを用いた転写(プリント)を繰り返す
などの手段がある。そして、積層に際して粒子を基体側
が密に基体から離れるにしたがって粗に積層する場合に
は、スプレー液やディッピング液における粒子の分散程
度(密度)を調節するとかプリントに使用するスクリー
ンの目の粗さを選択する。また、積層する粒子の粒径を
選択することでも可能である。さらに、断面における積
層の構造を選定することでも可能である。すなわち、正
確に位置決めできるスクリーンを数枚用い、積層の断面
形態において基体側を底辺とし基体から離れた位置に頂
点を備えた構造とする。この構造によっても上記金属粒
子は結果的に基体側が密に基体から離れるにしたがって
粗に積層される。The metal particles forming the porous layer are often regular particles (spherical or granular powder particles) or irregular particles (particles having sharp corners such as angular powder particles). Shape. When a melting means such as baking is employed for fixing to the substrate, the material is preferably the same as that of the substrate because of good compatibility. However, even if the materials are different, they can be fixed without using an appropriate binder in an appropriate amount. When the substrate and the particles for increasing the surface area are made of different kinds of materials, it is necessary to match the coefficient of linear expansion or to maintain elasticity corresponding to the linear expansion of one of the materials. It is. As the binder, inorganic glass, frit (glaze), metal powder, ordinary thermoplastic resin, or the like can be used. In order to laminate the metal particles, there are means such as repeating the spraying and dipping several times, and also repeating the transfer (printing) using a screen. In the case of laminating the particles coarsely as the substrate side is densely separated from the substrate at the time of lamination, the degree of dispersion (density) of the particles in the spray liquid or dipping liquid is adjusted or the roughness of the screen used for printing is adjusted. Select It is also possible to select the particle size of the particles to be laminated. Furthermore, it is also possible to select a laminated structure in a cross section. That is, several screens that can be accurately positioned are used, and the structure is such that the base side is the base in the cross-sectional configuration of the laminate and the apex is provided at a position away from the base. Also according to this structure, the metal particles are consequently coarsely laminated as the substrate side is densely separated from the substrate.
【0018】図6は本発明の他の実施例に係る浄化装置
の斜視図、図7は図6のB−B線断面図であり、図1〜
4と同一機能部分は同一の参照符号で示す。この浄化装
置1は、直方体形状を有し、励起波長発生装置140の
周囲に、光触媒フィルターユニット4が着脱自在に装着
された構造を有する。励起波長発生装置140はU字形
状の冷陰極管141とそれを取囲むガラスカバー142
を有する。光触媒フィルターユニット4は、コ字形状の
透過接触性光触媒フィルター13を含む。光触媒フィル
ター13は、金属板からなるカバー16及びカバー17
で覆われた金属製不織布マット18ならびに励起波長発
光装置140と対向する側に形成された光触媒機能層
(図示せず)を有する。上記のカバー16、17及び金
属製不織布マット18を形成する金属材料としては、A
l、Ti又はCuあるいはそれらの合金、又はステンレ
ス鋼等を用い得る。金属製不織布マット18の内周側に
は、例えば金網あるいはパンチングメタル(金属製薄板
に多数の切込みを入れ、切込みを略直角方向に引張って
全体を網状にしたもの)からなる金属製網目状体(図示
せず)が設けられ、その上に光触媒機能層(図示せず)
が担持されている。上記金属製不織布マット18は、例
えば線径が10〜100μmで、長さが数mm〜数10
mmのアルミニウム矩繊維又は長さが数10cm以上の
アルミニウム長繊維をコ字状に積層し、次いで必要に応
じ圧着することにより形成される。上記浄化装置1によ
れば、光触媒フィルターユニット4の下方から同ユニッ
ト内に流入した汚染空気は、光触媒フィルター13と接
触し、冷陰極管141からの紫外線で活性化された光触
媒により、汚染空気中の各種化合物が酸化分解され、清
浄空気がユニット4の上方から排出される。また光触媒
フィルターユニット4を洗浄する場合は、光触媒フィル
ターユニット4を図7に破線で示すように上方に引出せ
ばよい。FIG. 6 is a perspective view of a purification apparatus according to another embodiment of the present invention, and FIG. 7 is a sectional view taken along the line BB of FIG.
4 are denoted by the same reference numerals. The purifying device 1 has a rectangular parallelepiped shape, and has a structure in which a photocatalytic filter unit 4 is detachably mounted around an excitation wavelength generating device 140. The excitation wavelength generator 140 includes a U-shaped cold cathode tube 141 and a glass cover 142 surrounding the cold cathode tube 141.
Having. The photocatalyst filter unit 4 includes a U-shaped transmission contact photocatalyst filter 13. The photocatalyst filter 13 includes a cover 16 and a cover 17 made of a metal plate.
And a photocatalytic functional layer (not shown) formed on a side facing the metal nonwoven fabric mat 18 and the excitation wavelength light emitting device 140. Examples of the metal material forming the covers 16, 17 and the metal nonwoven fabric mat 18 include A
1, Ti or Cu or an alloy thereof, stainless steel, or the like can be used. On the inner peripheral side of the metal nonwoven fabric mat 18, a metal mesh body made of, for example, a wire mesh or a punching metal (a plurality of cuts are made in a thin metal plate, and the cuts are pulled substantially in a perpendicular direction to form a net). (Not shown), and a photocatalytic functional layer (not shown) is provided thereon.
Is carried. The metal nonwoven fabric mat 18 has, for example, a wire diameter of 10 to 100 μm and a length of several mm to several tens.
It is formed by laminating aluminum rectangular fibers of mm or aluminum long fibers having a length of several tens of cm or more in a U-shape, and then press-bonding as necessary. According to the purification device 1, the contaminated air that has flowed into the photocatalyst filter unit 4 from under the photocatalyst filter unit 4 comes into contact with the photocatalyst filter 13, and is activated in the contaminated air by the photocatalyst activated by ultraviolet rays from the cold cathode tube 141. Are oxidatively decomposed, and clean air is discharged from above the unit 4. When the photocatalyst filter unit 4 is to be washed, the photocatalyst filter unit 4 may be pulled out upward as shown by a broken line in FIG.
【0019】本発明において、光触媒機能層は、例えば
TiO2などの光触媒半導体を混入しているゾル液を、
基体の表面にスプレーやディッピングで付着させ、乾燥
させたのち、50℃〜500℃未満の温度で焼き付けて
形成することができる。なお、ゾル中に光触媒半導体の
他にアモルファス型過酸化チタンまたは酸化チタンをチ
タン重量比(乾量)で1:1あるいは1:5の範囲で混
合しておくと比較的低い温度で光触媒半導体の粒子を強
固に担持させることができる。In the present invention, the photocatalytic functional layer is formed by mixing a sol liquid mixed with a photocatalytic semiconductor such as TiO 2 .
It can be formed by attaching it to the surface of the substrate by spraying or dipping, drying it, and baking it at a temperature of 50 ° C to less than 500 ° C. If amorphous titanium peroxide or titanium oxide is mixed in the sol in a titanium weight ratio (dry amount) of 1: 1 or 1: 5 in addition to the photocatalyst semiconductor, the photocatalyst semiconductor is produced at a relatively low temperature. The particles can be firmly supported.
【0020】さらに、防黴殺菌などの機能補完用にP
t、Ag、Rh、RuO2、Nb、Cu、Sn、NiO
の粒子を微量混入したり、吸着機能を付加して酸化還元
による分解性能を向上させるためにゼオライト、シリカ
(二酸化ケイ素)、アルミナ、酸化亜鉛、酸化マグネシ
ウム、ルチル型酸化チタン、リン酸ジルコニウムなどの
無機材料、あるいは各種の活性炭、多孔質のフェノール
樹脂やメラミン樹脂を一種または二種以上混入すること
ができる。Further, P is used for complementing functions such as fungicide sterilization.
t, Ag, Rh, RuO 2 , Nb, Cu, Sn, NiO
Of zeolite, silica (silicon dioxide), alumina, zinc oxide, magnesium oxide, rutile type titanium oxide, zirconium phosphate, etc. One or more kinds of inorganic materials, various types of activated carbon, porous phenol resins and melamine resins can be mixed.
【0021】また、基体の表面に過酸化チタン水溶液な
どの保護材をスプレーして保護被膜を形成する下地処理
を施してから光触媒機能層を形成することもできる。い
ずれの場合も過酸化チタン水溶液(オキシサンタイニッ
ク・チタン・アシド)で事前に被膜を形成しておくとT
iO2ゾル液の付着、展延性が改善されて濡れ易く、基
体の表面に光触機能層を均一に、かつ、広く形成するこ
とができる。この過酸化チタン水溶液は基体がステンレ
ス鋼のような金属の場合でも展延性に優れTiO2ゾル
液を広く均一に塗布するのに有効である。過酸化チタン
水溶液はバインダーとしても機能するが、組成的にセラ
ミック系統のものを含まず、金属との相性が良いので基
体の表面に形成した光触媒機能層が、基体が撓んだり振
動しても剥離することが少ない。The photocatalyst layer may be formed after the surface of the substrate is sprayed with a protective material such as an aqueous solution of titanium peroxide to perform a base treatment for forming a protective film. In any case, if a film is formed in advance with an aqueous solution of titanium peroxide (oxysanthainic titanium titanium acid), T
The adhesion and spreadability of the iO 2 sol liquid are improved, so that the iO 2 sol is easily wetted, and the photo functional layer can be uniformly and widely formed on the surface of the substrate. This aqueous solution of titanium peroxide has excellent spreadability even when the substrate is made of a metal such as stainless steel, and is effective in applying the TiO 2 sol solution widely and uniformly. The aqueous solution of titanium peroxide also functions as a binder, but does not include a ceramic-based composition, and has good compatibility with metals, so the photocatalytic functional layer formed on the surface of the base may be bent or vibrated even if the base is bent. Less peeling.
【0022】光触媒半導体としてはTiO2の他にZn
O、SrTiO3、CdS、CdO、CaP、InP、
In2O3、CaAs、BaTiO3、K2NbO3、
Fe 2O3、Ta2O5、WO3、SnO2、Bi2O
3、NiO、Cu2O、SiC、SiO2、MoS2、
MoS3、InPb、RuO2、CeO2などがある。
この中で酸化チタンTiO2(アナターゼ型)が安価で
特性が安定しており、かつ、人体に無害であり、光触媒
として最も優れている。As the photocatalytic semiconductor, TiO is used.2Besides Zn
O, SrTiO3, CdS, CdO, CaP, InP,
In2O3, CaAs, BaTiO3, K2NbO3,
Fe 2O3, Ta2O5, WO3, SnO2, Bi2O
3, NiO, Cu2O, SiC, SiO2, MoS2,
MoS3, InPb, RuO2, CeO2and so on.
Among them, titanium oxide TiO2(Anatase type)
Characteristics are stable, harmless to human body, photocatalyst
As the best.
【0023】本発明は、上述した実施例に限定されるも
のではなく、種々の変形が可能である。例えば、光触媒
フィルターを収納する容器(シリンダー)の断面は円形
状あるいは矩形状のものに限らず、楕円形状あるいは多
角形状といった他の形状でもよく、また図3の装置に透
光性化粧窓を設けてもよい。また本発明は、室内の空気
浄化に限らず、大気の浄化、汚水(生活排水、工場排
水、下水等)の浄化等に適用できることはもちろんであ
る。The present invention is not limited to the embodiment described above, and various modifications are possible. For example, the cross section of the container (cylinder) for storing the photocatalyst filter is not limited to a circular or rectangular shape, but may be another shape such as an elliptical shape or a polygonal shape. You may. In addition, the present invention is not limited to the purification of indoor air, but may be applied to purification of air, purification of sewage (domestic wastewater, factory wastewater, sewage, etc.).
【0024】[0024]
【発明の効果】本発明の浄化装置は、流体中を浮遊する
有機化合物と光触媒機能層との接触機会が多く、高い浄
化性能を得ることが出来る。また本発明の浄化装置は、
光触媒フィルターユニットが着脱自在にケース内に収納
されているので、保守点検が容易である。According to the purification apparatus of the present invention, there are many opportunities for the organic compound floating in the fluid to come into contact with the photocatalytic functional layer, and high purification performance can be obtained. In addition, the purification device of the present invention,
Since the photocatalyst filter unit is detachably housed in the case, maintenance and inspection are easy.
【図1】本発明の一実施例に係る浄化装置を示す斜視図
である。FIG. 1 is a perspective view showing a purification device according to one embodiment of the present invention.
【図2】図1のA−A線矢視図である。FIG. 2 is a view taken along the line AA of FIG. 1;
【図3】本発明の他の実施例に係る浄化装置を示す斜視
図である。FIG. 3 is a perspective view showing a purification device according to another embodiment of the present invention.
【図4】図2のB−B線矢視図である。FIG. 4 is a view taken in the direction of arrows BB in FIG. 2;
【図5】本発明の板状光触媒フィルターを構成する基体
の断面を示す模式図である。FIG. 5 is a schematic view showing a cross section of a substrate constituting the plate-shaped photocatalytic filter of the present invention.
【図6】本発明の他の実施例に係る浄化装置を示す分解
斜視図である。FIG. 6 is an exploded perspective view showing a purification device according to another embodiment of the present invention.
【図7】図6のB方向断面図である。FIG. 7 is a sectional view in the B direction of FIG. 6;
1 浄化装置、3 シリンダー、4 光触媒フィルター
ユニット、10 ふた、13 光触媒フィルター、14
励起発光管DESCRIPTION OF SYMBOLS 1 Purification device, 3 cylinders, 4 photocatalyst filter units, 10 lids, 13 photocatalyst filters, 14
Excitation arc tube
フロントページの続き Fターム(参考) 4D048 AA17 AA21 AB01 AB03 BA02X BA06X BA07X BA13X BA14X BA15X BA16X BA17X BA19X BA20X BA21X BA22X BA24X BA26X BA27X BA32X BA35X BA36X BA38X BA41X BA42X BA44X BA45X BA46X BB07 BB08 BB17 BB18 CA01 CA07 CC08 CC35 CC38 CC40 CD05 EA01 EA04 4D050 AA12 AB11 BC04 BC06 BC09 BD02 4D064 AA19 BK03 Continued on the front page F-term (reference) 4D048 AA17 AA21 AB01 AB03 BA02X BA06X BA07X BA13X BA14X BA15X BA16X BA17X BA19X BA20X BA21X BA22X BA24X BA26X BA27X BA32X BA35X BA36X BA38X BA41X BA42X BA44CCBA07 BB01 CC EA04 4D050 AA12 AB11 BC04 BC06 BC09 BD02 4D064 AA19 BK03
Claims (8)
ンダーと、前記シリンダーの内部に収納される光触媒フ
ィルターユニットを有し、前記光触媒フィルターユニッ
トは軸部材とその周囲に立体的に配設された複数の透過
接触性を有する光触媒フィルタを有すると共に、前記光
触媒フィルターの少なくとも一部は被処理流体の流れ方
向と交叉していることを特徴とする浄化装置。1. A cylinder through which a fluid to be treated flows along an axial direction, and a photocatalyst filter unit housed inside the cylinder, wherein the photocatalyst filter unit is three-dimensionally arranged around a shaft member and the periphery thereof. And a photocatalyst filter having a plurality of transmissive contacts, and at least a part of the photocatalyst filter crosses the flow direction of the fluid to be treated.
の内部に励起波長発光体を有することを特徴とする請求
項1記載の浄化装置。2. The purifying apparatus according to claim 1, wherein said photocatalytic filter unit has an excitation wavelength luminous body inside a shaft member.
リンダーの内部に着脱自在に収納されると共に、前記シ
リンダーは少なくともその一部を開閉する手段を有する
ことを特徴とする請求項1又は2記載の浄化装置。3. The purifying apparatus according to claim 1, wherein the photocatalytic filter unit is removably housed inside the cylinder, and the cylinder has means for opening and closing at least a part of the cylinder. .
とが可能な材料で形成されかつ内面に光触媒半導体金属
を含む光触媒機能層を有することを特徴とする請求項1
〜3のいずれかに記載の浄化装置。4. The cylinder according to claim 1, wherein the cylinder is formed of a material capable of reflecting excitation wave light, and has a photocatalytic functional layer including a photocatalytic semiconductor metal on an inner surface thereof.
A purification device according to any one of claims 1 to 3.
ことを特徴とする請求項4記載の浄化装置。5. The purification device according to claim 4, wherein the cylinder has a translucent cosmetic window.
なる基板と光触媒機能層とを有することを特徴とする請
求項1記載の浄化装置。6. The purification device according to claim 1, wherein the photocatalytic filter has a substrate made of a metal material and a photocatalytic functional layer.
流れる光触媒フィルターユニットと励起波長発光装置を
有し、前記光触媒フィルターユニットは、前記励起波長
発光装置の周囲を取り囲む透過接触性光触媒フィルター
を含み、前記透過接触性光触媒フィルターは金属製不織
布を含む多孔質部材とそこに担持された光触媒機能層を
有することを特徴とする浄化装置。7. A photocatalytic filter unit through which a fluid to be treated flows from one end side to the other end side and an excitation wavelength light emitting device, wherein the photocatalytic filter unit is a transmissive contact photocatalyst surrounding the excitation wavelength light emitting device. A purifying apparatus comprising a filter, wherein the transmissive contact photocatalytic filter has a porous member including a metal non-woven fabric and a photocatalytic functional layer carried thereon.
れる方向と交叉する方向に伸長しかつ少なくとも一端側
で折返を有し、前記多孔質部材は前記励起波長発光装置
の両側に配置されることを特徴とする浄化装置。8. The excitation wavelength light emitting device extends in a direction intersecting the direction in which the fluid to be processed flows and has a turn at least at one end, and the porous members are arranged on both sides of the excitation wavelength light emitting device. Purification device characterized by the above-mentioned.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10349769A JP2000167355A (en) | 1998-12-09 | 1998-12-09 | Purifying apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10349769A JP2000167355A (en) | 1998-12-09 | 1998-12-09 | Purifying apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2000167355A true JP2000167355A (en) | 2000-06-20 |
Family
ID=18405996
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10349769A Pending JP2000167355A (en) | 1998-12-09 | 1998-12-09 | Purifying apparatus |
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Country | Link |
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JP (1) | JP2000167355A (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002085534A (en) * | 2000-09-18 | 2002-03-26 | Anzai Kantetsu:Kk | Deodorizing and cleaning element and deodorizing and cleaning unit using the same as well as deodorizing and cleaning system using the same |
JP2006142133A (en) * | 2004-11-16 | 2006-06-08 | Kazuhiko Kato | Catalyst apparatus |
KR100660990B1 (en) | 2005-12-27 | 2006-12-28 | (주) 유니티엔시 | Photocatalyst Purification Filter |
JP2007507259A (en) * | 2003-10-01 | 2007-03-29 | アルセロール フランス | Air purification wall |
WO2012077969A3 (en) * | 2010-12-07 | 2012-11-01 | Woongjincoway Co., Ltd. | Photocatalytic reactor |
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1998
- 1998-12-09 JP JP10349769A patent/JP2000167355A/en active Pending
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002085534A (en) * | 2000-09-18 | 2002-03-26 | Anzai Kantetsu:Kk | Deodorizing and cleaning element and deodorizing and cleaning unit using the same as well as deodorizing and cleaning system using the same |
JP2007507259A (en) * | 2003-10-01 | 2007-03-29 | アルセロール フランス | Air purification wall |
JP2006142133A (en) * | 2004-11-16 | 2006-06-08 | Kazuhiko Kato | Catalyst apparatus |
KR100660990B1 (en) | 2005-12-27 | 2006-12-28 | (주) 유니티엔시 | Photocatalyst Purification Filter |
WO2012077969A3 (en) * | 2010-12-07 | 2012-11-01 | Woongjincoway Co., Ltd. | Photocatalytic reactor |
CN104399311A (en) * | 2014-11-14 | 2015-03-11 | 无锡乐华自动化科技有限公司 | Secondary reverse-flow type filtering joint |
CN104436849A (en) * | 2014-11-14 | 2015-03-25 | 无锡乐华自动化科技有限公司 | Spiral-flow filter connector |
CN104399311B (en) * | 2014-11-14 | 2016-09-21 | 江苏晟利探测仪器有限公司 | A kind of secondary returning streaming transition joint |
WO2018133356A1 (en) * | 2017-01-18 | 2018-07-26 | 山东京博石油化工有限公司 | Method for treating petrochemical alkaline residue wastewater |
US10710906B2 (en) | 2017-01-18 | 2020-07-14 | Shandong Chambroad Petrochemicals Co., Ltd. | Method for treatment of petrochemical spent caustic wastewater |
KR20180127133A (en) * | 2017-05-19 | 2018-11-28 | 엄지원 | A Device using Resonance Frequency for Decomposing and Removing Fine Dust |
KR102339293B1 (en) | 2017-05-19 | 2021-12-14 | 엄지원 | A Device using Resonance Frequency for Decomposing and Removing Fine Dust |
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