JP2000128671A - Glazed ceramic and its production - Google Patents
Glazed ceramic and its productionInfo
- Publication number
- JP2000128671A JP2000128671A JP10307236A JP30723698A JP2000128671A JP 2000128671 A JP2000128671 A JP 2000128671A JP 10307236 A JP10307236 A JP 10307236A JP 30723698 A JP30723698 A JP 30723698A JP 2000128671 A JP2000128671 A JP 2000128671A
- Authority
- JP
- Japan
- Prior art keywords
- ceramic
- glazed
- glaze
- talc
- glaze layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000919 ceramic Substances 0.000 title claims abstract description 64
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 239000000454 talc Substances 0.000 claims abstract description 31
- 229910052623 talc Inorganic materials 0.000 claims abstract description 31
- 238000010304 firing Methods 0.000 claims description 30
- 239000002994 raw material Substances 0.000 claims description 21
- 229920003002 synthetic resin Polymers 0.000 claims description 6
- 239000000057 synthetic resin Substances 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 5
- 238000007493 shaping process Methods 0.000 claims description 2
- 238000001354 calcination Methods 0.000 claims 1
- 238000005520 cutting process Methods 0.000 abstract description 14
- 239000011248 coating agent Substances 0.000 abstract description 3
- 238000000576 coating method Methods 0.000 abstract description 3
- 229920002050 silicone resin Polymers 0.000 abstract description 3
- 208000037656 Respiratory Sounds Diseases 0.000 abstract 4
- 206010011376 Crepitations Diseases 0.000 abstract 2
- 239000010410 layer Substances 0.000 description 34
- 230000035515 penetration Effects 0.000 description 17
- 239000004927 clay Substances 0.000 description 10
- 238000000465 moulding Methods 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 229910052573 porcelain Inorganic materials 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 238000005245 sintering Methods 0.000 description 5
- 238000006703 hydration reaction Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 230000036571 hydration Effects 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- AYJRCSIUFZENHW-UHFFFAOYSA-L barium carbonate Chemical compound [Ba+2].[O-]C([O-])=O AYJRCSIUFZENHW-UHFFFAOYSA-L 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000010433 feldspar Substances 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 239000004576 sand Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000004575 stone Substances 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- 241001122767 Theaceae Species 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 239000003212 astringent agent Substances 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- BDAGIHXWWSANSR-NJFSPNSNSA-N hydroxyformaldehyde Chemical compound O[14CH]=O BDAGIHXWWSANSR-NJFSPNSNSA-N 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 description 1
- 229910052808 lithium carbonate Inorganic materials 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 229910052611 pyroxene Inorganic materials 0.000 description 1
- 239000004447 silicone coating Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 238000007582 slurry-cast process Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229910000018 strontium carbonate Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Finishing Walls (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は施釉セラミックス及
びその製造方法に係り、特に釉薬が貫入を有しており、
切断加工性に優れた施釉セラミックス及びその製造方法
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a glazed ceramic and a method for producing the same, and in particular, the glaze has an intrusion,
The present invention relates to a glazed ceramic excellent in cutting workability and a method for producing the same.
【0002】[0002]
【従来の技術】I. 陶磁器等のセラミックスの表面の
釉薬層に現われた細かいひびは貫入と称されている。湯
呑み茶碗などの陶器には、この貫入を施したものがあ
る。この貫入に茶渋などが侵入して汚れが生じることを
防止するために、特開昭51−131509号公報に
は、貫入を有した陶磁器の表面にシリコーン被膜層を形
成することが記載されている。 II. タルクを原料として使用した陶板、タイルの製造
方法としては、特公昭60−48268号、特公平2−
36543号等に記載されたものが公知である。この従
来方法においては、タルク含有原料を成形後、1100
℃以上の温度で焼成している。2. Description of the Related Art Fine cracks appearing on the glaze layer on the surface of ceramics such as ceramics are called intrusions. Some pottery such as teacups have this intrusion. JP-A-51-131509 describes that a silicone coating layer is formed on the surface of a porcelain having intrusion in order to prevent tea astringents and the like from entering the intrusion to cause contamination. . II. As a method for producing a porcelain plate or tile using talc as a raw material, Japanese Patent Publication No.
What is described in 36543 etc. is publicly known. In this conventional method, after forming a talc-containing raw material, 1100
Fired at a temperature of ℃ or more.
【0003】[0003]
【発明が解決しようとする課題】施釉セラミックスを切
断加工した場合、表面の釉薬層に大きなチッピングが生
じたり、釉薬層に大きな長いひび割れが生じ易い。When glazed ceramics are cut, large chipping is likely to occur in the glaze layer on the surface, and large long cracks are likely to occur in the glaze layer.
【0004】また、従来のタルク系陶板やタイルは、高
温で焼成されたものであるため、硬度が高く切断加工し
にくい。[0004] Further, conventional talc-based porcelain plates and tiles are fired at a high temperature and therefore have high hardness and are difficult to cut.
【0005】さらに、従来の施釉陶板には、水和膨張が
大きく大形化しにくいという短所があった。即ち、陶器
質の板状体は水和反応により膨張するが、施釉陶板の場
合、表面の釉薬層は吸水せず膨張しない。このため、施
釉陶板が水和すると徐々に凹反りが生じてしまう。ま
た、陶板の膨張に伴って釉薬層に引張応力が生じ、釉薬
層に亀裂が生じる。このようなことから、従来は厚さ5
〜6mmの場合300mm×300mm以上の大形施釉
陶板で、凹反りの問題が生じないものは殆ど実現されて
いない。Further, the conventional glazed porcelain plate has a disadvantage that hydration expansion is large and it is difficult to increase the size. That is, the ceramic plate-like body expands due to the hydration reaction, but in the case of a glazed ceramic plate, the glaze layer on the surface does not absorb water and does not expand. Therefore, when the glazed porcelain plate hydrates, concave warpage gradually occurs. Further, tensile stress is generated in the glaze layer as the ceramic plate expands, and cracks are generated in the glaze layer. For this reason, the conventional thickness of 5
In the case of 66 mm, a large glazed porcelain plate of 300 mm × 300 mm or more that does not cause the problem of concave warpage is hardly realized.
【0006】本発明は、切断加工時に釉薬層にひび割れ
が全く又は殆ど広がることがない施釉セラミックスとそ
の製造方法を提供することを目的とする。SUMMARY OF THE INVENTION An object of the present invention is to provide a glazed ceramic in which cracks do not or hardly spread in the glaze layer at the time of cutting, and a method for producing the same.
【0007】また、本発明は、切断加工が容易な施釉セ
ラミックス及びその製造方法を提供することを目的とす
る。Another object of the present invention is to provide a glazed ceramic which can be easily cut and a method for producing the same.
【0008】さらに、本発明は、大形で薄型化すること
が可能な施釉セラミックスとその製造方法を提供するこ
とを目的とする。Another object of the present invention is to provide a large-sized and thinned glazed ceramic and a method for producing the same.
【0009】[0009]
【課題を解決するための手段】本発明の施釉セラミック
スは、セラミックスの表面に貫入を有した釉薬層が設け
られた施釉セラミックスにおいて、該釉薬の表面におい
て長さ10cmの線分が貫入と交叉するポイントの数が
20〜500である貫入密度となっていることを特徴と
するものである。The glazed ceramic of the present invention is a glazed ceramic provided with a glaze layer having an intrusion on the surface of the ceramic, wherein a line segment having a length of 10 cm intersects the intrusion on the surface of the glaze. The number of points is 20 to 500, and the penetration density is characterized.
【0010】かかる施釉セラミックスにあっては、釉薬
層に細かい貫入が形成されているため、切断加工時に釉
薬層に大きなチッピングが生じたり、釉薬層に長く大き
なひび割れが新たに発生することが全く又は殆どない。
このため、表面の美感に優れ且つ切断加工面が整った切
断加工体を得ることができる。In such glazed ceramics, since fine penetration is formed in the glaze layer, large chipping occurs in the glaze layer at the time of cutting, or a long and large crack is newly generated in the glaze layer. Almost no.
For this reason, it is possible to obtain a cut processed body having an excellent surface aesthetics and a well-cut surface.
【0011】また本発明の施釉セラミックスにあって
は、釉薬層に細かな貫入が入っているため、釉薬層に引
張応力が加えられた場合、貫入のクラック幅が拡大し、
釉薬層全体がこの引張応力に追随して伸長する。このた
め、施釉セラミックスが吸水しても凹反りすることが無
く、また釉薬層に長く大きなクラックが入ることもな
い。In the glazed ceramic of the present invention, since the glaze layer has fine penetration, when a tensile stress is applied to the glaze layer, the crack width of the penetration increases,
The entire glaze layer expands following this tensile stress. For this reason, even if the glazed ceramics absorbs water, it does not warp and there is no long and large crack in the glaze layer.
【0012】このセラミックスは易切断性セラミックス
であることが好ましく、この易切断性としてはタルクを
主原料としたセラミックスが特に好ましい。このセラミ
ックスにおいては、焼成後のタルク残存量が20重量%
であると、切断加工性がきわめて良好である。The ceramic is preferably an easily-cuttable ceramic, and as the easily-cuttable ceramic, a ceramic containing talc as a main raw material is particularly preferable. In this ceramic, the residual amount of talc after firing is 20% by weight.
, The cutting workability is extremely good.
【0013】この施釉セラミックスの釉薬の表面に合成
樹脂を塗着することにより、貫入への汚れの侵入が防止
される。By applying a synthetic resin to the surface of the glaze of the glazed ceramics, the penetration of dirt into the intrusion can be prevented.
【0014】本発明の施釉セラミックスの製造方法は、
素地焼結体の線熱膨張係数と釉薬層の線熱膨張係数との
差が18×10-6以上となるように調合された調合原料
と釉薬原料とを用い、この調合原料を成形し、次いで施
釉した後焼成する、或いは、この調合原料を成形後焼成
し、次いで施釉した後釉焼することを特徴とするもので
ある。The method for producing a glazed ceramic according to the present invention comprises:
Using the prepared raw material and the glaze raw material prepared so that the difference between the linear thermal expansion coefficient of the base sintered body and the linear thermal expansion coefficient of the glaze layer becomes 18 × 10 −6 or more, this mixed raw material is molded, Then, it is characterized by firing after glazing, or firing the blended raw material after molding, then glazing and firing.
【0015】このような線熱膨張係数差を有したセラミ
ックス素地と釉薬との焼成により、細かな貫入が釉薬層
に形成されるようになる。By sintering the ceramic substrate having such a difference in linear thermal expansion coefficient and the glaze, fine penetration is formed in the glaze layer.
【0016】このセラミックスの調合原料としては、タ
ルクを40〜80重量部含むものが好ましい。この場
合、焼成温度を900〜1000℃とすることにより、
セラミックス素地中にタルクが20重量%以上残存し、
セラミックスが切断加工し易いものとなる。As a raw material for preparing this ceramic, one containing 40 to 80 parts by weight of talc is preferable. In this case, by setting the firing temperature to 900 to 1000 ° C,
20% by weight or more of talc remains in the ceramic body,
Ceramics can be easily cut.
【0017】また、本発明では、焼成により形成された
釉薬層に合成樹脂を塗布することにより、汚れがつきに
くいものとすることができる。Further, in the present invention, by applying a synthetic resin to the glaze layer formed by baking, it is possible to make the glaze less likely to adhere.
【0018】[0018]
【発明の実施の形態】本発明の施釉セラミックスを製造
するには、原料調合としてタルクを含有するものを用い
るのが好ましい。特に好ましい原料調合としては、 タルク 40〜80重量部 骨材成分 20〜50重量部 粘 土 5〜20重量部 が挙げられる(合計100重量部)。タルクの配合量が
40重量部よりも少ないと焼結体の切断加工性が不足す
るようになる。タルクは粉砕性が良いため、80重量部
よりも多いと微粒子が多くなり、成形性が悪化する。BEST MODE FOR CARRYING OUT THE INVENTION In order to produce the glazed ceramic of the present invention, it is preferable to use a raw material mixture containing talc. Particularly preferred raw material preparations include 40 to 80 parts by weight of talc, 20 to 50 parts by weight of an aggregate component, and 5 to 20 parts by weight of clay (100 parts by weight in total). If the amount of talc is less than 40 parts by weight, the cutability of the sintered body becomes insufficient. Since talc has good pulverizability, if it is more than 80 parts by weight, the amount of fine particles increases, and the moldability deteriorates.
【0019】上記の骨材成分としては、長石、ろう石、
陶石、珪石、シャモット等の1種又は2種以上が好まし
い。この骨材成分は、セラミックス焼結体の体積を増す
ための増量材として添加されるものである。また、粉砕
されにくいため、粉砕後も粗粒で残り、成形性が向上す
るという効果もある。この骨材成分は、900〜100
0℃の焼成温度では殆ど溶融しない。この骨材成分が2
0重量部よりも少ないと成形性が悪化する。また、50
重量部よりも多くなると、成形体、焼結体の強度が低く
なる。As the above-mentioned aggregate component, feldspar, pyroxene,
One or more of pottery stone, silica stone, chamotte and the like are preferable. This aggregate component is added as a filler for increasing the volume of the ceramic sintered body. In addition, since it is hard to be crushed, there is an effect that coarse particles remain even after crushing, and the moldability is improved. This aggregate component is 900-100
It hardly melts at a firing temperature of 0 ° C. This aggregate component is 2
If the amount is less than 0 parts by weight, the moldability deteriorates. Also, 50
When the amount is more than the weight part, the strength of the molded body and the sintered body decreases.
【0020】粘土は成形時の可塑性を出すために添加さ
れる。この粘土の配合量が5重量部よりも少ないと可塑
性が不足し、20重量部よりも多いと成形性が悪化す
る。この粘土としては、木節粘土、蛙目粘土等のカオリ
ン系粘土、ベンナイトなどを用いることができる。Clay is added to enhance plasticity during molding. If the amount of the clay is less than 5 parts by weight, the plasticity is insufficient, and if it is more than 20 parts by weight, the moldability deteriorates. As the clay, kaolin clay such as Kibushi clay and Frogme clay, benite and the like can be used.
【0021】なお、原料に炭酸カルシウム、炭酸マグネ
シウム及び炭酸リチウム、炭酸ストロンチウム、炭酸バ
リウムの1種又は2種以上を10重量部以下加えても良
い。これらはタルクや粘土の脱水物のガラス化を防ぎ結
晶化を促進する等より、焼結体の水和膨張を小さくする
効果がある。[0021] One or more of calcium carbonate, magnesium carbonate and lithium carbonate, strontium carbonate and barium carbonate may be added to the raw material in an amount of 10 parts by weight or less. These have the effect of reducing the hydration expansion of the sintered body by preventing the dehydration of talc or clay from vitrifying and promoting crystallization.
【0022】この調合比の原料を粉砕・混合し、成形
後、施釉した後、焼成することにより、或いは、成形後
焼成し、施釉した後、釉焼することにより、本発明の施
釉セラミックスが得られる。The glazed ceramics of the present invention can be obtained by pulverizing / mixing the raw materials having the above mixing ratio, molding, glazing and firing, or firing after molding, glazing and firing. Can be
【0023】この成形方法としては、プレス成形、泥し
ょう鋳込成形、押出成形など各種方法を採用できる。こ
の成形時には、必要に応じメチルセルローズなどを添加
する。As this molding method, various methods such as press molding, slurry casting molding, and extrusion molding can be adopted. During this molding, methyl cellulose or the like is added as necessary.
【0024】成形後、焼成を行う場合は、必要に応じ乾
燥した後、好ましくは900〜1000℃、より好まし
くは900〜950℃で焼成する。焼成温度が900℃
よりも低いと、タルクの焼結が不十分であり、焼結体の
強度が低くなる。焼成温度が1000℃超であると、タ
ルクの焼結量が過多となり、焼結体の切断加工性が低下
する。In the case of firing after forming, after drying if necessary, firing is carried out preferably at 900 to 1000 ° C, more preferably at 900 to 950 ° C. Firing temperature is 900 ℃
If it is lower than this, sintering of talc is insufficient, and the strength of the sintered body decreases. If the firing temperature is higher than 1000 ° C., the sintering amount of talc becomes excessive, and the cutting workability of the sintered body is reduced.
【0025】900〜1000℃とくに900〜950
℃の焼成温度の場合、タルクが適度に溶融し、焼結体の
強度が満足すべき強度になると共に、タルクの残存量も
20重量%以上となり、焼結体の切断加工性も良好であ
る。なお、タルクの残存量は、過多であると焼結体の強
度が低くなるので、20〜50重量%とりわけ25〜3
5重量%であることが好ましい。900-1000 ° C., especially 900-950
In the case of the sintering temperature of ° C., talc is appropriately melted, the strength of the sintered body becomes a satisfactory strength, the residual amount of talc becomes 20% by weight or more, and the cutability of the sintered body is good. . If the amount of residual talc is excessive, the strength of the sintered body is reduced.
Preferably it is 5% by weight.
【0026】このタルクの残存量は、X線回折を利用し
て定量することができる。具体的には、内部標準物質と
してフッ化カルシウムを、また、希釈材としてガラスを
用い、X線回折装置にてd値が1.5570,1.52
70となる面の強度の平均値により求められる。The residual amount of talc can be quantified using X-ray diffraction. Specifically, calcium fluoride was used as an internal standard substance, glass was used as a diluent, and the d values were 1.5570, 1.52 with an X-ray diffractometer.
It is determined by the average value of the strength of the surface of 70.
【0027】このようにして得られた上記調合の焼結体
の線熱膨張係数は6.5〜7.5×10-6℃-1程度であ
る。The linear thermal expansion coefficient of the thus obtained sintered compact is about 6.5 to 7.5 × 10 −6 ° C. −1 .
【0028】この焼結体又は成形体に対し施釉した後、
焼成する。施釉方法としては、カーテン掛け、スプレー
掛け、遠心掛けなど各種方法を採用できる。After glazing the sintered body or the molded body,
Bake. Various methods such as curtain hanging, spray hanging and centrifugal hanging can be adopted as the glaze method.
【0029】釉焼温度は800℃〜1000℃とくに9
00〜950℃が好ましい。この釉焼温度が1000℃
超であると、残存タルクが焼結し、焼成体の切断加工性
が悪くなる。800℃よりも低いと熔融する釉薬を作る
のが困難となる。また、成形体の焼成を行わずに、施釉
後焼成する場合には、上記成形体の焼成の場合と同様の
理由から、この焼成温度は900〜1000℃とくに9
00〜950℃とするのが好ましい。The glaze baking temperature is 800 ° C to 1000 ° C, especially 9
00-950 degreeC is preferable. The glaze temperature is 1000 ℃
If it is more than that, the residual talc sinters, and the cutability of the fired body becomes poor. If the temperature is lower than 800 ° C., it is difficult to produce a glaze that melts. When firing after glazing without firing the molded body, the firing temperature is 900 to 1000 ° C., particularly 9 ° C., for the same reason as in the case of firing the molded body.
The temperature is preferably set to 00 to 950 ° C.
【0030】なお、成形後の焼成と、施釉後の釉焼とで
2回の焼成を行う場合、成形後の焼成温度より、施釉後
の釉焼温度を高くする方が、平滑な釉薬層表面が得ら
れ、好ましい。これは、施釉後の釉焼温度が成形後の焼
成温度より高いと施釉後の釉焼中に、素地成分が反応し
て揮発することで、釉薬層面を攪乱するためである。In the case where firing is performed twice, ie, firing after forming and firing after glazing, it is better to set the firing temperature after glazing higher than the firing temperature after shaping to obtain a smooth glaze layer surface. Is obtained, which is preferable. This is because if the glaze firing temperature after glazing is higher than the firing temperature after molding, the base component reacts and volatilizes during glaze firing after glazing, thereby disturbing the glaze layer surface.
【0031】この釉は、釉焼後において線熱膨張係数が
23×10-6℃-1以上であるものが好ましく、ほう酸系
フリット釉、鉛系フリット釉などを用いることができ
る。The glaze preferably has a coefficient of linear thermal expansion of 23 × 10 −6 ° C.- 1 or more after baking the glaze, and boric acid frit glaze, lead frit glaze, or the like can be used.
【0032】この釉と前記セラミックス焼成体との線熱
膨張係数差が18×10-6以上とくに23×10-6以上
℃-1であることにより貫入が十分に発生するようにな
る。とくに、上記の釉焼後、400℃以下の温度まで1
0〜20分程度で冷却することにより貫入が十分に発生
するようになる。When the difference in linear thermal expansion coefficient between this glaze and the ceramic fired body is 18 × 10 −6 or more, particularly 23 × 10 −6 or more and C −1 , penetration can be sufficiently generated. In particular, after the above glaze firing, the temperature is reduced to 400 ° C or less.
Cooling in about 0 to 20 minutes allows sufficient penetration to occur.
【0033】なお、この釉焼後の釉薬層の厚さが20〜
200μmとくに30〜100μmの厚さとなるように
釉掛けするのが好ましい。この釉薬層が200μmより
も厚いと釉焼後の釉薬層の収縮力が過大となり、施釉セ
ラミックスに凹反りが生じ易くなる。一方、釉薬層が2
0μmよりも薄いと釉による外観の改良が不十分とな
る。The thickness of the glaze layer after baking is 20 to
It is preferable to glaze to a thickness of 200 μm, especially 30 to 100 μm. If the glaze layer is thicker than 200 μm, the shrinkage of the glaze layer after baking the glaze becomes excessive, and the glazed ceramics are likely to be concavely warped. On the other hand, the glaze layer is 2
If the thickness is less than 0 μm, the improvement of the appearance by the glaze becomes insufficient.
【0034】本発明では、貫入の量を釉薬層表面の長さ
10cmの任意の線分が貫入と交叉するポイント数で定
量する。例えば、施釉セラミックスの表面に長さ10c
mの任意の線分をひき、この線分と貫入とが交叉するポ
イントの数をカウントすることによりこの数が求まる。
施釉セラミックスが一辺10cm以下の小さなものであ
るときには、例えば5cmの線分をひいて上記ポイント
数をカウントし、それを2倍すれば良い。In the present invention, the amount of penetration is quantified by the number of points where an arbitrary line segment having a length of 10 cm of the glaze layer crosses the penetration. For example, length 10c on the surface of glazed ceramics
This number is obtained by drawing an arbitrary line segment of m and counting the number of points where this line segment intersects with the penetration.
When the glazed ceramics are small with a side of 10 cm or less, the number of points may be counted by drawing a line segment of 5 cm, for example, and the number may be doubled.
【0035】本発明では、このポイント数は20〜50
0好ましくは50〜500とする。このポイント数が2
0よりも少ないと切断加工性が低く500よりも多いと
釉薬層の光沢が低くなる。In the present invention, the number of points is 20 to 50.
0, preferably 50 to 500. The number of points is 2
If it is less than 0, the cutting processability is low, and if it is more than 500, the gloss of the glaze layer is low.
【0036】なお、この貫入は微小幅のクラックよりな
るものであるが、この幅は0.1〜0.002μm程度
であることが好ましい。The intrusion consists of a crack having a very small width, and the width is preferably about 0.1 to 0.002 μm.
【0037】また、この貫入の密度は、施釉重量との関
係が大きく、同一の素地に同一の釉薬を施釉しても、施
釉重量によって貫入の密度は変化する。一般的には、施
釉重量が多くなると、釉薬層の厚さが厚くなり、釉の密
度が強くなるため、クラック層の広い貫入が、粗い密度
で発生し、施釉量の少ない場合は、クラック幅の狭い貫
入が、細かい密度で発生する。The density of the intrusion has a large relationship with the weight of the glaze. Even if the same base material is glazed with the same glaze, the density of the intrusion changes depending on the weight of the glaze. Generally, as the weight of the glaze increases, the thickness of the glaze layer increases, and the density of the glaze increases.Therefore, a wide penetration of the crack layer occurs at a coarse density. Narrow intrusion occurs at a fine density.
【0038】この施釉セラミックスにはシリコーン樹
脂、アクリル樹脂、フッ素樹脂等の合成樹脂を1〜15
0g/m2程度の割合で、スプレー掛け、カーテン掛
け、スポンジ塗布、刷毛塗布等によって塗着し、貫入を
合成樹脂で埋め、汚れがつきにくいものとすることがで
きる。The glazed ceramic is made of a synthetic resin such as a silicone resin, an acrylic resin, or a fluororesin in an amount of 1 to 15
It can be applied at a rate of about 0 g / m 2 by spraying, curtaining, sponge coating, brush coating, or the like, and the intrusion can be filled with a synthetic resin to make it less likely to be stained.
【0039】[0039]
【実施例】実施例1 次の調合割合(合計100重量部)の原料を湿式粉砕
後、乾燥、造粒し、乾式成形して200×200mmの
成形体とし、これを乾燥後950℃×0.5Hr焼成し
てセラミックス焼結体とした。Example 1 Raw materials having the following mixing ratio (total of 100 parts by weight) were wet-pulverized, dried, granulated, and dry-molded to obtain a molded body having a size of 200 × 200 mm. After firing for 5 hours, a ceramic sintered body was obtained.
【0040】 タルク 55重量部 長 石 30重量部 粘 土 15重量部 (木節系粘土) この焼結体にスプレー掛け法によりほう酸フリット釉を
0.03g/cm2釉掛けし、900℃×30Hr釉焼
した。これにアクリル変性シリコン樹脂を20g/m2
の割合で塗着し、施釉セラミックス製品を得た。この焼
成後の釉薬層の厚みは100μmである。55 parts by weight of talc 30 parts by weight of feldspar 15 parts by weight of clay (kibushi-based clay) This sintered body was glazed with a boric acid frit glaze of 0.03 g / cm 2 by a spraying method, and 900 ° C. × 30 hours. Glazed. 20 g / m 2 of acrylic modified silicone resin
To obtain a glazed ceramic product. The thickness of the glaze layer after firing is 100 μm.
【0041】この施釉セラミックスの貫入量、タルク残
存量を表1に示す。また、セラミックス焼結体及び釉薬
層の線熱膨張係数を測定した。なお、釉薬層について
は、釉薬泥漿を乾燥させ、粉状(含水率4%)にし、2
50kgf/cm2の圧力で棒状に成形後、棒の周囲を
珪砂で固めたものを釉焼と同温度で50分焼成し、その
後周囲の珪砂を取り除くことにより、得られた棒状試料
の熱膨張を測定した。その結果を表1に併せて示す。さ
らに、この施釉セラミックスの切断加工性を外径125
mm、刃先厚1.8mm、歯数86個の超鋼チップソウ
を毎分6000回転で回転させ、水平方向に1kgfの
力をかけて5秒間切断し、1秒あたりの切断された長さ
を測定することにより評価し、その結果を表1に示し
た。この施釉セラミックスを墨汁を添付し、乾燥後、水
でぬらした布でふきとることにより貫入の汚れ易さを調
べた。その結果を表1に示す。Table 1 shows the penetration amount of the glazed ceramic and the residual amount of talc. In addition, the linear thermal expansion coefficients of the ceramic sintered body and the glaze layer were measured. As for the glaze layer, the glaze slurry was dried to form a powder (water content: 4%).
After forming the rod into a rod at a pressure of 50 kgf / cm 2 , the rod was hardened with silica sand and baked at the same temperature as the glaze for 50 minutes, and then the surrounding silica sand was removed. Was measured. The results are shown in Table 1. Further, the cutting workability of this glazed ceramic is set to an outer diameter of 125.
mm, blade thickness 1.8mm, super-teeth tip saw 86 teeth are rotated at 6000 revolutions per minute, cut by applying 1kgf force in horizontal direction for 5 seconds, and the cut length per second is measured. The results are shown in Table 1. The glazed ceramic was attached with ink and dried, and then wiped off with a cloth soaked with water to examine the ease of penetration. Table 1 shows the results.
【0042】実施例2〜5、比較例1,2 原料調合を表1の通り変え、釉薬層の厚みを表1の通り
としたほかは同様にして施釉セラミックスを製造し、同
様の測定、評価を行った。結果を表1に示す。なお、実
施例4,5においては樹脂としてフッ素シリコン系樹脂
を用いている。また、比較例1では、成形体の焼成を1
200℃で行った。Examples 2 to 5 and Comparative Examples 1 and 2 Glazed ceramics were produced in the same manner except that the raw material preparation was changed as shown in Table 1 and the thickness of the glaze layer was changed as shown in Table 1, and the same measurements and evaluations were made. Was done. Table 1 shows the results. In Examples 4 and 5, a fluorosilicone resin was used as the resin. In Comparative Example 1, the firing of the compact was performed for 1
Performed at 200 ° C.
【0043】[0043]
【表1】 [Table 1]
【0044】表1より次のことが明らかである。The following is clear from Table 1.
【0045】比較例1はタルクを主原料とした通常のタ
イルであり、1200℃で焼成しているために、素地の
焼結、溶融が充分進行し、切断加工性が悪いものとなっ
ている。また、比較例2は、低熱膨張釉薬を使用したた
め、釉面の貫入はないが、連続した釉面を持っているた
め、実施例1,2と比べて切断加工性が低下している。
また、表中には記載していないが、素地の水和膨張後の
凹反りが大きい結果となった。Comparative Example 1 is a normal tile using talc as a main raw material. Since it is fired at 1200 ° C., the sintering and melting of the base material sufficiently proceed, and the cutting workability is poor. . In Comparative Example 2, since the low thermal expansion glaze was used, there was no penetration of the glaze surface, but since it had a continuous glaze surface, the cutting workability was lower than in Examples 1 and 2.
Although not shown in the table, the concave warp after hydration expansion of the base material was large.
【0046】これに対して、実施例1〜5では、良好な
切断加工性が得られている。なお、実施例2は、実施例
1と同様の素地で低線熱膨張率の釉薬を使用したもので
あり、実施例1と比べ、貫入量が少なくなっている。実
施例3は、素地のタルク調合量が少ないため、タルク残
存量が少ない。このため、実施例1よりも切断加工性が
低下している。実施例4は、素地調合を変更したため素
地の線熱膨張係数が高く、釉薬も熱膨張の小さいものを
使用しているが、釉薬層厚さが小さくなっているため
に、貫入量は多くなっている。実施例5では、タルク調
合量を増やしているため、タルク残存量が増加してい
る。このため、素地の切断加工性が向上している。On the other hand, in Examples 1 to 5, good cutting workability was obtained. In Example 2, the same base material as that of Example 1 was used and a glaze having a low coefficient of linear thermal expansion was used, and the penetration amount was smaller than that of Example 1. In Example 3, the amount of talc remaining was small because the amount of talc blended in the base material was small. For this reason, the cutting workability is lower than in Example 1. In Example 4, although the base material preparation was changed, the coefficient of linear thermal expansion of the base material was high, and the glaze used had a small thermal expansion. However, since the thickness of the glaze layer was small, the penetration amount was large. ing. In Example 5, the amount of talc remaining was increased because the amount of talc was increased. For this reason, the cutting workability of the base is improved.
【0047】[0047]
【発明の効果】以上の実施例及び比較例からも明らかな
通り、本発明によると切断加工性に優れ、汚れも付着し
にくい施釉セラミックスが提供される。As is clear from the above Examples and Comparative Examples, according to the present invention, there is provided a glazed ceramic which is excellent in cutting workability and hardly adheres dirt.
Claims (9)
層が設けられた施釉セラミックスにおいて、該釉薬の表
面において長さ10cmの線分が貫入と交叉するポイン
トの数が20〜500である貫入密度となっていること
を特徴とする施釉セラミックス。1. A glazed ceramic provided with a glaze layer having an intrusion on the surface of the ceramic, wherein the number of points at which a line segment having a length of 10 cm intersects the intrusion is 20 to 500 on the surface of the glaze. Glazed ceramics characterized by the following.
断性セラミックスであることを特徴とする施釉セラミッ
クス。2. The glazed ceramic according to claim 1, wherein the ceramic is an easily cut ceramic.
はタルク質原料を用いたセラミックスであることを特徴
とする施釉セラミックス。3. The glazed ceramic according to claim 1, wherein the ceramic is a ceramic using a talc raw material.
存タルクの量が20重量%以上であることを特徴とする
施釉セラミックス。4. The glazed ceramic according to claim 3, wherein the amount of residual talc in the ceramic is 20% by weight or more.
て、釉薬層に合成樹脂を塗着してなることを特徴とする
施釉セラミックス。5. A glazed ceramic according to any one of claims 1 to 3, wherein a synthetic resin is applied to the glaze layer.
であって、素地焼結体の線熱膨張係数と釉薬層の線熱膨
張係数との差が18×10-6/℃以上となるように調合
された調合原料と釉薬原料とを用い、この調合原料を成
形し、次いで施釉した後焼成することを特徴とする施釉
セラミックスの製造方法。6. The method for producing a glazed ceramic according to claim 1, wherein a difference between a linear thermal expansion coefficient of the base sintered body and a linear thermal expansion coefficient of the glaze layer is 18 × 10 −6 / ° C. or more. A method for producing glazed ceramics, comprising: using the prepared raw material and the glaze raw material, shaping the prepared raw material, followed by glazing and firing.
後焼成し、次いで施釉した後焼成することを特徴とする
施釉セラミックスの製造方法。7. The method for producing a glazed ceramic according to claim 6, wherein the mixed raw material is molded, fired, then glazed and fired.
がタルクを40〜80重量部含んでおり、焼成温度が9
00〜1000℃であることを特徴とする施釉セラミッ
クスの製造方法。8. The method according to claim 6, wherein the raw material contains 40 to 80 parts by weight of talc, and the calcination temperature is 9%.
A method for producing a glazed ceramic, which is performed at a temperature of from 00 to 1000 ° C.
て、施釉後焼成した後、釉薬層に合成樹脂を塗着するこ
とを特徴とする施釉セラミックスの製造方法。9. The method for producing glazed ceramics according to claim 6, wherein after glazing and firing, a synthetic resin is applied to the glaze layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10307236A JP2000128671A (en) | 1998-10-28 | 1998-10-28 | Glazed ceramic and its production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10307236A JP2000128671A (en) | 1998-10-28 | 1998-10-28 | Glazed ceramic and its production |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2000128671A true JP2000128671A (en) | 2000-05-09 |
Family
ID=17966682
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10307236A Pending JP2000128671A (en) | 1998-10-28 | 1998-10-28 | Glazed ceramic and its production |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2000128671A (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2363670C1 (en) * | 2008-04-17 | 2009-08-10 | Юлия Алексеевна Щепочкина | Production method of crackle glaze on surface of ceramic product |
CN109574710A (en) * | 2018-12-28 | 2019-04-05 | 福建泉州顺美集团有限责任公司 | A kind of point reduction skin texture glaze ceramics and its manufacture craft |
CN110156330A (en) * | 2019-06-10 | 2019-08-23 | 潮州市长城世家瓷业有限公司 | A kind of non-leakage cyanic colours crack glaze porcelain utensil and its manufacture craft |
CN110590407A (en) * | 2019-09-27 | 2019-12-20 | 合肥汉甲陶瓷科技有限公司 | Firing method for uniformly distributing cracks on surface of crack glaze ceramic |
CN112174525A (en) * | 2020-09-19 | 2021-01-05 | 龙泉市卫洪青瓷工作室 | Preparation method of Longquan Ge kiln garbage broken porcelain and glaze |
CN113292311A (en) * | 2021-05-20 | 2021-08-24 | 福建省德化十斗金工艺有限公司 | Hand-pulled blank white porcelain crack-blasting thick-glaze porcelain and preparation method thereof |
CN115370095A (en) * | 2022-08-13 | 2022-11-22 | 陈昕 | Wall surface glazed brick and construction method thereof |
CN115536362A (en) * | 2022-09-21 | 2022-12-30 | 峨眉山金陶瓷业发展有限公司 | Mirror-polished large-size ultrathin ceramic rock plate and preparation method thereof |
CN116282918A (en) * | 2023-02-24 | 2023-06-23 | 山东理工大学 | Ceramic artistic glaze with spherical crown-shaped cracks and preparation method thereof |
CN117185842A (en) * | 2023-10-12 | 2023-12-08 | 广东方向陶瓷有限公司 | Antifouling wear-resistant ceramic tile and preparation method thereof |
-
1998
- 1998-10-28 JP JP10307236A patent/JP2000128671A/en active Pending
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2363670C1 (en) * | 2008-04-17 | 2009-08-10 | Юлия Алексеевна Щепочкина | Production method of crackle glaze on surface of ceramic product |
CN109574710A (en) * | 2018-12-28 | 2019-04-05 | 福建泉州顺美集团有限责任公司 | A kind of point reduction skin texture glaze ceramics and its manufacture craft |
CN109574710B (en) * | 2018-12-28 | 2023-09-26 | 福建泉州顺美集团有限责任公司 | Pinch-point texture glaze ceramic and manufacturing process thereof |
CN110156330A (en) * | 2019-06-10 | 2019-08-23 | 潮州市长城世家瓷业有限公司 | A kind of non-leakage cyanic colours crack glaze porcelain utensil and its manufacture craft |
CN110590407B (en) * | 2019-09-27 | 2020-11-06 | 福建省德化县雅丽达陶瓷有限公司 | Firing method for uniformly distributing cracks on surface of crack glaze ceramic |
CN110590407A (en) * | 2019-09-27 | 2019-12-20 | 合肥汉甲陶瓷科技有限公司 | Firing method for uniformly distributing cracks on surface of crack glaze ceramic |
CN112174525A (en) * | 2020-09-19 | 2021-01-05 | 龙泉市卫洪青瓷工作室 | Preparation method of Longquan Ge kiln garbage broken porcelain and glaze |
CN112174525B (en) * | 2020-09-19 | 2022-07-29 | 龙泉市卫洪青瓷工作室 | Preparation method of Longquan Ge kiln waste broken porcelain and glaze |
CN113292311A (en) * | 2021-05-20 | 2021-08-24 | 福建省德化十斗金工艺有限公司 | Hand-pulled blank white porcelain crack-blasting thick-glaze porcelain and preparation method thereof |
CN115370095A (en) * | 2022-08-13 | 2022-11-22 | 陈昕 | Wall surface glazed brick and construction method thereof |
CN115370095B (en) * | 2022-08-13 | 2023-10-27 | 陈昕 | Wall glazed brick and construction method thereof |
CN115536362A (en) * | 2022-09-21 | 2022-12-30 | 峨眉山金陶瓷业发展有限公司 | Mirror-polished large-size ultrathin ceramic rock plate and preparation method thereof |
CN115536362B (en) * | 2022-09-21 | 2023-07-21 | 峨眉山金陶瓷业发展有限公司 | Mirror polished large-specification ultrathin ceramic rock plate and preparation method thereof |
CN116282918A (en) * | 2023-02-24 | 2023-06-23 | 山东理工大学 | Ceramic artistic glaze with spherical crown-shaped cracks and preparation method thereof |
CN117185842A (en) * | 2023-10-12 | 2023-12-08 | 广东方向陶瓷有限公司 | Antifouling wear-resistant ceramic tile and preparation method thereof |
CN117185842B (en) * | 2023-10-12 | 2024-02-13 | 广东方向陶瓷有限公司 | Antifouling wear-resistant ceramic tile and preparation method thereof |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR20180065675A (en) | Method for manufacturing ceramic composition with excellent durability | |
JP2000128671A (en) | Glazed ceramic and its production | |
JPH0225876B2 (en) | ||
JPH0223485B2 (en) | ||
JPH11199311A (en) | Production of clay ceramic and caly ceramic | |
JP3254878B2 (en) | High strength porcelain and its manufacturing method | |
US3773531A (en) | Dense chrome refractory material | |
KR940000727B1 (en) | Cement-containing ceramic articles and method for production thereof | |
JP3491991B2 (en) | Manufacturing method of cement-based fired building materials | |
JPH06305828A (en) | Aluminum titanate composite material and its production | |
JP3111741B2 (en) | High strength porcelain and its manufacturing method | |
US2303964A (en) | Porous ceramic insulating material | |
JP3173657B2 (en) | Ceramic products and their manufacturing methods | |
JP2002255630A (en) | Sanitary chinaware | |
JP3217583B2 (en) | Pottery tile | |
JP2001287981A (en) | Sanitary earthenware | |
JPH10287481A (en) | Production of cement-based ceramic whiteware product | |
JPH0987004A (en) | Production of clay for porcelain and production of porcelain | |
JP3690998B2 (en) | Earthenware tile | |
JP2000319061A (en) | Ceramic and its production | |
JP2709744B2 (en) | Method of manufacturing ceramic products | |
KR810001740B1 (en) | Process for preparing of construction materials | |
JP3343383B2 (en) | Method for producing inorganic lightweight fired body | |
JP2833171B2 (en) | Manufacturing method of low firing shrinkage ceramic molded body | |
JPH0587466B2 (en) |