JP2000124164A - Manufacture of semiconductor device and mounting method thereof - Google Patents
Manufacture of semiconductor device and mounting method thereofInfo
- Publication number
- JP2000124164A JP2000124164A JP29549698A JP29549698A JP2000124164A JP 2000124164 A JP2000124164 A JP 2000124164A JP 29549698 A JP29549698 A JP 29549698A JP 29549698 A JP29549698 A JP 29549698A JP 2000124164 A JP2000124164 A JP 2000124164A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- semiconductor device
- sealing
- manufacturing
- bump electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Dicing (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、半導体装置の製造
方法及びその実装方法に係わり、特に樹脂封止型の半導
体チップの製造方法及び実装方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a semiconductor device and a method of mounting the same, and more particularly to a method of manufacturing and mounting a resin-sealed semiconductor chip.
【0002】[0002]
【従来の技術】従来、チップサイズパッケージ型の半導
体装置の製造は、例えば特開平9−232256号公報
に示されているように、配線を形成した半導体チップの
電極パッド上に突起バンプ電極を形成し、このバンプ電
極を実装基板上に圧着接合などによってダイボンドした
後、半導体チップの配線形成面(バンプ電極を形成した
面)と実装基板との間隙部に樹脂(以下、アンダーフィ
ル樹脂という)を注入する製造方法による。この製造法
により、半導体チップの配線形成面および突起バンプ電
極が樹脂封止された状態で半導体チップを実装基板上に
実装することができる。しかし、このような製造方法で
は実装基板上に実装する際のアンダーフィル樹脂封止工
程に時間を要するばかりでなく、アンダーフィル樹脂の
流動性、充填剤量等が制約されるため、十分な信頼性の
確保が困難になっている。2. Description of the Related Art Conventionally, in manufacturing a semiconductor device of a chip size package type, as shown in, for example, Japanese Patent Application Laid-Open No. 9-232256, a bump electrode is formed on an electrode pad of a semiconductor chip on which wiring is formed. After the bump electrodes are die-bonded to the mounting substrate by pressure bonding or the like, a resin (hereinafter, referred to as an underfill resin) is applied to a gap between the wiring forming surface of the semiconductor chip (the surface on which the bump electrodes are formed) and the mounting substrate. It depends on the manufacturing method to be injected. According to this manufacturing method, the semiconductor chip can be mounted on the mounting board in a state where the wiring forming surface of the semiconductor chip and the bump electrodes are sealed with resin. However, in such a manufacturing method, not only time is required for the underfill resin sealing step when mounting on the mounting board, but also the fluidity of the underfill resin, the amount of the filler, and the like are restricted, so that sufficient reliability is required. It is difficult to secure the sex.
【0003】[0003]
【発明が解決しようとする課題】上記したように、従来
の半導体装置の製造法は、半導体チップと実装基板の間
隙にアンダーフィル樹脂を注入する必要があるために工
程が複雑であるのと同時に、アンダーフィル樹脂に関し
て、ボイド無く注入するための流動性、充填剤量の制御
が困難であるという問題がある。As described above, in the conventional method of manufacturing a semiconductor device, the process is complicated because the underfill resin needs to be injected into the gap between the semiconductor chip and the mounting substrate. On the other hand, the underfill resin has a problem that it is difficult to control the fluidity and the amount of the filler for injection without voids.
【0004】本発明は、上記の問題点に鑑みてなされた
ものであり、半導体装置の製造効率、及び半導体装置の
信頼性向上を図り得る半導体装置の製造方法及び実装方
法を提供することを目的とする。SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and has as its object to provide a semiconductor device manufacturing method and a mounting method capable of improving semiconductor device manufacturing efficiency and semiconductor device reliability. And
【0005】[0005]
【発明を解決するための手段】請求項1に係る発明は、
複数の半導体チップが形成され、この半導体チップそれ
ぞれにバンプ電極が配設され、このバンプ電極が配設さ
れた面と反対側の面にダイシングテープを装備している
半導体ウエハの各半導体チップ間を、上記ダイシングテ
ープは切断しないで、分離する空隙を形成する分離工程
1と、上記各半導体チップがテープ上に装着されたま
ま、半導体チップのバンプ電極面と各半導体チップ間の
空隙に封止樹脂を供給してバンプ電極面と半導体チップ
端面を同時に封止し樹脂層を形成する樹脂封止工程と、
上記樹脂層の反応を進める樹脂反応促進工程と、各半導
体チップ間で切断して個々の樹脂封止された半導体チッ
プに分離する分離工程2とを具備する半導体装置の製造
方法である。The invention according to claim 1 is
A plurality of semiconductor chips are formed, bump electrodes are provided on each of the semiconductor chips, and a dicing tape is provided on a surface opposite to the surface on which the bump electrodes are provided. A separating step 1 for forming a gap to be separated without cutting the dicing tape, and a sealing resin in a gap between the bump electrode surface of the semiconductor chip and each semiconductor chip while the respective semiconductor chips are mounted on the tape. A resin encapsulation step of simultaneously encapsulating the bump electrode surface and the semiconductor chip end surface to form a resin layer,
A method for manufacturing a semiconductor device, comprising: a resin reaction accelerating step for promoting the reaction of the resin layer; and a separation step 2 for cutting the semiconductor chips into individual resin-sealed semiconductor chips.
【0006】請求項2に係る発明は、請求項1記載の半
導体装置の製造方法において、分離工程1が完了した
後、樹脂封止工程の前に、ダイシングテープをエキスパ
ンドする工程を加えることにより各半導体チップ間の空
隙幅を大きくするものである。According to a second aspect of the present invention, in the method of manufacturing a semiconductor device according to the first aspect, a step of expanding a dicing tape is added after the separation step 1 is completed and before the resin sealing step. The gap width between the semiconductor chips is increased.
【0007】請求項3に係る発明は、請求項1記載の半
導体装置の製造方法において、樹脂封止工程に用いる封
止樹脂として、単一または異なる特性を有する複数の封
止樹脂を用いるものである。According to a third aspect of the present invention, in the method for manufacturing a semiconductor device according to the first aspect, a single or a plurality of sealing resins having different characteristics are used as the sealing resin used in the resin sealing step. is there.
【0008】請求項4に係る発明は、請求項1記載の半
導体装置の製造方法において、樹脂封止工程における封
止樹脂の供給方法に、スプレー法、スピンコート法また
は印刷法を用いるものである。According to a fourth aspect of the present invention, in the method of manufacturing a semiconductor device according to the first aspect, a spraying method, a spin coating method, or a printing method is used as a method of supplying the sealing resin in the resin sealing step. .
【0009】請求項5に係る発明は、請求項1記載の半
導体装置の製造方法において、樹脂封止工程における封
止樹脂の供給方法に、成型用金型を用いる方法を適用す
るものである。According to a fifth aspect of the present invention, in the method of manufacturing a semiconductor device according to the first aspect, a method using a molding die is applied to a method of supplying a sealing resin in a resin sealing step.
【0010】請求項6に係る発明は、請求項5記載の半
導体装置の製造方法において、成形用金型表面に離型フ
ィルムを装着するものである。According to a sixth aspect of the present invention, in the method of manufacturing a semiconductor device according to the fifth aspect, a release film is mounted on a surface of a molding die.
【0011】請求項7に係る発明は、請求項1記載の半
導体装置の製造方法において、樹脂封止工程における封
止樹脂の供給を、減圧した雰囲気下で行うものである。According to a seventh aspect of the present invention, in the method of manufacturing a semiconductor device according to the first aspect, the supply of the sealing resin in the resin sealing step is performed in a reduced-pressure atmosphere.
【0012】請求項8に係る発明は、請求項1記載の半
導体装置の製造方法において、樹脂反応促進工程におけ
る樹脂反応の促進は、加熱、または光照射により行うも
のである。According to an eighth aspect of the present invention, in the method of manufacturing a semiconductor device according to the first aspect, the promotion of the resin reaction in the resin reaction promoting step is performed by heating or light irradiation.
【0013】請求項9に係る発明は、請求項1記載の半
導体装置の製造方法において、樹脂封止工程後、封止樹
脂に覆われたバンプ電極の少なくとも先端部を上記封止
樹脂より露出させるバンプ電極露出工程を加えるもので
ある。According to a ninth aspect of the present invention, in the method of manufacturing a semiconductor device according to the first aspect, at least a tip portion of the bump electrode covered with the sealing resin is exposed from the sealing resin after the resin sealing step. A bump electrode exposure step is added.
【0014】請求項10に係る発明は、請求項9記載の
半導体装置の製造方法において、バンプ電極露出工程に
おけるバンプ電極の露出は、樹脂封止工程後、バンプ電
極面に離型フィルムを被覆し押し付ける手段によるもの
である。According to a tenth aspect of the present invention, in the method of manufacturing a semiconductor device according to the ninth aspect, the bump electrode is exposed in the bump electrode exposing step by covering the bump electrode surface with a release film after the resin sealing step. It is by pressing means.
【0015】請求項11に係る発明は、請求項9記載の
半導体装置の製造方法において、バンプ電極露出工程に
おけるバンプ電極の露出は、レーザ光照射、エキシマレ
ーザ、エッチング、機械研磨、及びブラストの少なくと
も1つの手段によるものである。According to an eleventh aspect of the present invention, in the method of manufacturing a semiconductor device according to the ninth aspect, the exposing of the bump electrode in the bump electrode exposing step is performed by at least one of laser light irradiation, excimer laser, etching, mechanical polishing, and blasting. It is by one means.
【0016】請求項12に係る発明は、請求項1記載の
半導体装置の製造方法において、分離工程2における切
断に、レーザを用いるものである。According to a twelfth aspect of the present invention, in the method of manufacturing a semiconductor device according to the first aspect, a laser is used for cutting in the separation step 2.
【0017】請求項13に係る発明は、請求項1記載の
半導体装置の製造方法において、半導体チップ上にバン
プ電極が配設され、上記半導体チップ上面及びバンプ電
極面と上記半導体チップ側面とを封止樹脂で封止した半
導体装置を準備し、この半導体装置のバンプ電極面を実
装基板に熱圧着により接続する半導体装置の実装方法で
ある。According to a thirteenth aspect of the present invention, in the method of manufacturing a semiconductor device according to the first aspect, a bump electrode is provided on the semiconductor chip, and the upper surface of the semiconductor chip, the bump electrode surface, and the side surface of the semiconductor chip are sealed. This is a semiconductor device mounting method in which a semiconductor device sealed with a sealing resin is prepared, and the bump electrode surface of the semiconductor device is connected to a mounting substrate by thermocompression bonding.
【0018】[0018]
【発明の実施の形態】以下、添付図面に基づいて本発明
に係わる半導体装置の製造方法及び実装方法を詳細に説
明する。 実施の形態1.図1は、本発明における実施の形態1の
製造工程を示したものである。この図にしたがって以下
に製造方法を説明する。まず、半導体ウエハ1上に集積
回路を形成した複数の半導体チップ2の電極上に、多数
のバンプ電極3を形成する(図1(a)参照)。図1
(b)に示すように、バンプ電極3を形成した半導体ウ
エハ1面と反対側の面にはダイシングテープ4が貼付さ
れている。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a method for manufacturing and mounting a semiconductor device according to the present invention will be described in detail with reference to the accompanying drawings. Embodiment 1 FIG. FIG. 1 shows a manufacturing process according to a first embodiment of the present invention. The manufacturing method will be described below with reference to FIG. First, a large number of bump electrodes 3 are formed on electrodes of a plurality of semiconductor chips 2 having integrated circuits formed on a semiconductor wafer 1 (see FIG. 1A). FIG.
As shown in FIG. 2B, a dicing tape 4 is attached to a surface opposite to the surface of the semiconductor wafer 1 on which the bump electrodes 3 are formed.
【0019】次に、バンプ電極3を形成した半導体ウエ
ハ1を装着治具5に固定し、ダイサー等を用い、ダイシ
ングテープ4を切断しないように、半導体ウエハ1の半
導体チップ2間に空隙を形成し、個々の半導体チップ2
に分離する分離工程1を行う(図1(c)参照)。この
時、個々の半導体チップ2は全てダイシングテープ4上
に固定されている。Next, the semiconductor wafer 1 on which the bump electrodes 3 are formed is fixed to a mounting jig 5, and a gap is formed between the semiconductor chips 2 of the semiconductor wafer 1 using a dicer or the like so as not to cut the dicing tape 4. And individual semiconductor chips 2
Is performed (see FIG. 1C). At this time, all the individual semiconductor chips 2 are fixed on the dicing tape 4.
【0020】次に、半導体チップ2間の空隙、半導体チ
ップ2のバンプ電極3形成面及びバンプ電極3面間に封
止樹脂6を注入する。封止樹脂6は半導体チップ2間に
注入できる粘度のものを用いる。注入方法は、樹脂粘度
に依存するが、スプレー法あるいはスピンコート法など
の塗布法、スクリーン印刷などの印刷法が可能である
(図1(d)参照)。なお、この封止樹脂工程におい
て、封止樹脂6にボイドの発生が懸念される場合は、減
圧系内において封止樹脂工程を行うことにより、高粘度
の封止樹脂6を塗布した場合でも、バンプ電極3間、半
導体チップ2間の空隙へのボイドの発生は防止すること
ができる。Next, a sealing resin 6 is injected between the semiconductor chips 2 and between the bump electrode 3 forming surface and the bump electrode 3 surface of the semiconductor chip 2. The sealing resin 6 has a viscosity that can be injected between the semiconductor chips 2. The injection method depends on the viscosity of the resin, but may be a coating method such as a spray method or a spin coating method, or a printing method such as screen printing (see FIG. 1D). In this sealing resin step, if there is a concern about occurrence of voids in the sealing resin 6, even if the high-viscosity sealing resin 6 is applied by performing the sealing resin step in a reduced pressure system, The generation of voids in the gap between the bump electrodes 3 and between the semiconductor chips 2 can be prevented.
【0021】封止樹脂6を注入した後、加熱または光照
射等により流動性を確保しつつ封止樹脂6のタック性が
無くなるまで反応を進めて樹脂層を形成する。加熱によ
って反応が進む封止樹脂6としては、エポキシ樹脂を用
いることができ、また、光照射によって反応が進む封止
樹脂としては、エポキシ樹脂にアクリル系樹脂を混合し
たもの、あるいはエポキシ末端基にアクリル基を導入し
たものを用いることができる。なお、バンプ電極3上が
封止樹脂6で覆われていた場合には、実装時の実装基板
とバンプ電極3の導通を確実に取るために、レーザ光照
射、エキシマレーザ、エッチング、機械研磨、ブラスト
等を用いバンプ電極3表面を露出させてもよい。After injecting the sealing resin 6, the reaction is advanced until the tackiness of the sealing resin 6 is lost while securing the fluidity by heating or light irradiation or the like to form a resin layer. An epoxy resin can be used as the sealing resin 6 whose reaction proceeds by heating. As the sealing resin whose reaction proceeds by light irradiation, an epoxy resin mixed with an acrylic resin, or an epoxy terminal group is used. Those into which an acrylic group has been introduced can be used. When the bump electrode 3 is covered with the sealing resin 6, in order to ensure conduction between the mounting substrate and the bump electrode 3 during mounting, laser light irradiation, excimer laser, etching, mechanical polishing, The surface of the bump electrode 3 may be exposed using blasting or the like.
【0022】次に、樹脂封止された半導体チップ2を個
々に分離するために、半導体チップ2間に充填された封
止樹脂6(樹脂層ともいう)の中央部を、レーザ光を用
いて切断する(図1(e)参照)。この工程により、ダ
イシングテープ4が装着されたままの樹脂封止半導体チ
ップ7が完成される(図1(e)参照)。Next, in order to separate the resin-sealed semiconductor chips 2 from each other, a central portion of a sealing resin 6 (also referred to as a resin layer) filled between the semiconductor chips 2 is separated by using a laser beam. Cut (see FIG. 1 (e)). Through this step, the resin-encapsulated semiconductor chip 7 with the dicing tape 4 mounted thereon is completed (see FIG. 1E).
【0023】次に、個々に分離した半導体チップ5のバ
ンプ電極3を実装基板8に押し付けた状態でリフロー炉
等を用い実装する(図1(g)参照)。この時点で、バ
ンプ電極3が実装基板8と電気的に接続されると同時
に、封止樹脂6は溶融した後、硬化する。この硬化によ
り、封止樹脂6と実装基板8との接着が行われる。Then, the bump electrodes 3 of the individually separated semiconductor chips 5 are mounted using a reflow furnace or the like while being pressed against the mounting substrate 8 (see FIG. 1 (g)). At this point, at the same time that the bump electrodes 3 are electrically connected to the mounting substrate 8, the sealing resin 6 is melted and then hardened. By this curing, the sealing resin 6 and the mounting substrate 8 are bonded.
【0024】最後に、ダイシングテープ4を除去するこ
とにより、図1(h)に示すように、半導体装置を実装
基板上に実装したものが完成する。Finally, by removing the dicing tape 4, a semiconductor device mounted on a mounting substrate is completed as shown in FIG. 1 (h).
【0025】実施の形態2.図2は、本発明における実
施の形態2の製造工程を示したものである。上記実施の
形態1において、半導体チップ2間の空隔が狭く、封止
樹脂工程で封止樹脂の注入が困難な場合は、図2に示し
たように、ダイシングテープ4をエキスパンドし半導体
チップ2間を広げた後、そのままの状態で治具に装着し
封止樹脂の注入性を高めることが可能である。Embodiment 2 FIG. 2 shows a manufacturing process according to the second embodiment of the present invention. In the first embodiment, when the space between the semiconductor chips 2 is small and it is difficult to inject the sealing resin in the sealing resin step, as shown in FIG. After the space is widened, it is possible to mount the device as it is on a jig to improve the injection property of the sealing resin.
【0026】実施の形態3.上記実施の形態1の封止樹
脂工程において、複数の封止樹脂6を塗布する。図3に
示すように、例えば、フィラーが高充填された封止樹脂
6aを最初に一層塗布した後にフィラー充填率の低い封
止樹脂6bをその上に塗布するという方法を取ることに
より、半導体チップ2側に低熱膨張の封止樹脂6が介在
し、実装基板側に熱膨張率の高い樹脂が介在することに
なり、半導体装置のヒートサイクル等の熱的信頼性が向
上することになる。Embodiment 3 FIG. In the sealing resin step of the first embodiment, a plurality of sealing resins 6 are applied. As shown in FIG. 3, for example, a method of applying a sealing resin 6a filled with a high amount of filler first, and then applying a sealing resin 6b having a low filler filling rate thereon, is used. The sealing resin 6 having a low thermal expansion is interposed on the second side, and a resin having a high coefficient of thermal expansion is interposed on the mounting substrate side, so that the thermal reliability of the semiconductor device such as a heat cycle is improved.
【0027】実施の形態4.上記実施の形態1の封止樹
脂工程において封止樹脂6を塗布した後に、図4に示す
ように、封止樹脂6を塗布したバンプ電極3形成面を離
型フィルム9で被覆し離型フィルム9を押し付ける。こ
のように離型フィルム7で被覆し押し付けることによ
り、離型フィルム7の弾性によってバンプ電極3表面が
封止樹脂から露出し、封止樹脂で覆われることを防ぐこ
とができると同時に、ハンドリング性も向上する。Embodiment 4 After the sealing resin 6 is applied in the sealing resin process of the first embodiment, as shown in FIG. Press 9. By covering and pressing with the release film 7 in this manner, the surface of the bump electrode 3 can be prevented from being exposed from the sealing resin due to the elasticity of the release film 7 and covered with the sealing resin, and at the same time, the handling property can be improved. Also improve.
【0028】実施の形態5.上記実施の形態1の封止樹
脂工程において、塗布法のかわりに、図5に示すように
成型用金型10を用いて、半導体チップを封止する。成
型用金型10を用いる場合、射出成形法、あるいはバン
プ電極3形成面に封止樹脂を滴下し、この滴下面に成型
用金型10を押し当てて加熱し、封止樹脂を硬化させる
方法を適用することができる。加熱は、成型用金型10
にヒータを備え、このヒータによって加熱する等の方法
を適用することができる。その他の工程は全て、上記実
施の形態1と同じである。Embodiment 5 In the sealing resin process of the first embodiment, the semiconductor chip is sealed using a molding die 10 as shown in FIG. 5 instead of the coating method. When using the molding die 10, an injection molding method or a method in which a sealing resin is dropped on the surface on which the bump electrodes 3 are formed, and the molding die 10 is pressed against the dropped surface and heated to cure the sealing resin. Can be applied. Heating is performed by the molding die 10
And a method such as heating by the heater. All other steps are the same as in the first embodiment.
【0029】実施の形態6.上記実施の形態5の封止樹
脂工程において、図6に示すように、樹脂注入工程で前
もってバンプ電極3形成面と当接する成型金型10の面
に離型フィルム9を装着しておくことにより、バンプ電
極3表面が封止樹脂で覆われることを防ぐことができる
と同時に、ハンドリング性も向上する。Embodiment 6 FIG. In the encapsulating resin step of the fifth embodiment, as shown in FIG. 6, by attaching the release film 9 to the surface of the molding die 10 which comes into contact with the surface on which the bump electrodes 3 are formed in advance in the resin injecting step. In addition, it is possible to prevent the surface of the bump electrode 3 from being covered with the sealing resin, and at the same time, to improve the handleability.
【0030】[0030]
【発明の効果】請求項1記載の発明によれば、半導体ウ
エハに形成した複数の半導体チップにバンプ電極を形成
し、バンプ電極形成面と反対側の半導体ウエハ面にダイ
シングテープを装着し、ダイシングテープを切断するこ
となく各半導体チップ間に空隙を形成し、空隙、バンプ
電極形成面及びバンプ電極面を樹脂封止することによ
り、気泡等のない確実な樹脂封止ができ、半導体装置を
実装する際にアンダーフィル樹脂を半導体チップと実装
基板間に充填する必要はなくなり、これにより実装工程
を容易にすることができる。また、樹脂封止後の封止樹
脂の仮硬化によるウエハの反り、割れ等を防止すること
が可能となる。さらに、樹脂封止工程によりバンプ電極
面と半導体チップ端面が樹脂層により覆われることによ
りハンドリング性が向上するとともに、樹脂層によりチ
ップ表面の保護及び半導体チップとバンプとの接合部に
おいて発生する応力を緩和する効果を有する。According to the present invention, bump electrodes are formed on a plurality of semiconductor chips formed on a semiconductor wafer, and a dicing tape is mounted on a surface of the semiconductor wafer opposite to the bump electrode formation surface. By forming a gap between each semiconductor chip without cutting the tape, and sealing the gap, the bump electrode formation surface and the bump electrode surface with resin, it is possible to securely seal resin without bubbles and mount semiconductor devices. In this case, it is not necessary to fill the space between the semiconductor chip and the mounting substrate with the underfill resin, thereby facilitating the mounting process. In addition, it is possible to prevent the wafer from being warped or cracked due to temporary curing of the sealing resin after resin sealing. Further, the bumpability is improved by covering the bump electrode surface and the semiconductor chip end surface with the resin layer in the resin sealing step, and the resin layer protects the chip surface and reduces the stress generated at the joint between the semiconductor chip and the bump. It has a relaxing effect.
【0031】また、請求項2記載の発明によれば、分離
された個々の半導体チップの間隔が狭い場合に、ダイシ
ングテープをエキスパンドする工程を行い、半導体チッ
プ間の空隙を広げることにより、容易に樹脂封止工程に
おいて封止樹脂が半導体チップ間に均一に充填される。According to the second aspect of the present invention, when the interval between the separated semiconductor chips is small, the step of expanding the dicing tape is performed to easily increase the gap between the semiconductor chips, thereby facilitating the process. In the resin sealing step, the sealing resin is uniformly filled between the semiconductor chips.
【0032】また、請求項3記載の発明によれば、複数
の封止樹脂を用いることにより、半導体装置の信頼性を
向上させることができる。According to the third aspect of the present invention, the reliability of the semiconductor device can be improved by using a plurality of sealing resins.
【0033】また、請求項4記載の発明によれば、封止
樹脂をスプレー法、スピンコート法、印刷法など簡便な
方法で、バンプ電極形成面、空隙の全面に確実に樹脂層
を形成することができる。According to the fourth aspect of the present invention, the resin layer is reliably formed on the entire surface of the bump electrode forming surface and the gap by a simple method such as a spray method, a spin coating method and a printing method. be able to.
【0034】また、請求項5記載の発明によれば、成型
用金型を用いることにより、樹脂封止後の封止樹脂表面
の凹凸性が少なくなると同時に、封止樹脂注入時に圧を
かけることにより、バンプ電極間、半導体チップ間等の
狭間隙にまで封止樹脂を充填することが可能となる。According to the fifth aspect of the present invention, by using a molding die, the unevenness of the sealing resin surface after resin sealing is reduced, and at the same time, pressure is applied when the sealing resin is injected. Accordingly, it is possible to fill the sealing resin into a narrow gap between bump electrodes, between semiconductor chips, and the like.
【0035】また、請求項6記載の発明によれば、バン
プ電極と当接する成形金型表面に離型フィルムを前もっ
て装着することにより、バンプ電極表面への封止樹脂の
カブリを防ぐことが可能となる。According to the sixth aspect of the present invention, it is possible to prevent the sealing resin from fogging on the surface of the bump electrode by mounting the release film in advance on the surface of the molding die in contact with the bump electrode. Becomes
【0036】また、請求項7記載の発明によれば、減圧
下で樹脂封止することにより半導体チップ間の空隙、さ
らにはバンプ電極間の距離が狭くなった場合でもボイド
の発生なく簡便に封止樹脂を充填できる効果を増すこと
ができる。According to the seventh aspect of the present invention, even when the gap between the semiconductor chips and the distance between the bump electrodes are reduced by sealing with resin under reduced pressure, the sealing is easily performed without generating voids. The effect of filling the sealing resin can be increased.
【0037】また、請求項8記載の発明によれば、封止
樹脂層を加熱または光照射により反応率を進め仮硬化を
行うことにより、半導体チップのハンドリング性が向上
すると同時に後工程の分割工程2が簡便に行われる。According to the invention of claim 8, the reaction rate of the sealing resin layer is increased by heating or light irradiation, and the temporary curing is carried out, so that the handleability of the semiconductor chip is improved and, at the same time, the dividing step in the subsequent step is performed. 2 is simply performed.
【0038】また、請求項9ないし11記載の発明によ
れば、バンプ電極の少なくとも先端部を封止樹脂より露
出させることによって、バンプ電極と外部の、例えば実
装基板との電気的な接続状態が確実になる。封止樹脂塗
布後バンプ電極面を離型フィルムで覆うことにより、バ
ンプ電極表面を封止樹脂が覆うことを防ぐ効果が得られ
ると同時に、ハンドリング性も向上する。According to the ninth to eleventh aspects of the present invention, at least the tip of the bump electrode is exposed from the sealing resin, so that the electrical connection between the bump electrode and the outside, for example, a mounting substrate is improved. Be certain. By covering the bump electrode surface with the release film after applying the sealing resin, the effect of preventing the sealing resin from covering the bump electrode surface is obtained, and the handling property is also improved.
【0039】また、請求項11記載の発明によれば、レ
ーザ光照射あるいはエキシマレーザを用いた場合には、
簡便かつ精度よくバンプ電極の先端を露出させることが
でき、また、エッチング、機械研磨あるいはブラストを
用いた場合には、安価にバンプ電極の先端部を露出させ
ることができる。According to the eleventh aspect of the present invention, when laser light irradiation or excimer laser is used,
The tip of the bump electrode can be easily and accurately exposed, and when etching, mechanical polishing, or blasting is used, the tip of the bump electrode can be exposed at low cost.
【0040】また、請求項12記載の発明によれば、分
離工程2においてレーザ光を用いることにより、半導体
チップ間に充填された封止樹脂の中央部を精度良く分離
でき、個々の半導体チップの寸法は均一になると共に、
ダイシングテープ、またはダイシングテープと離型フィ
ルムも一括して裁断できる。According to the twelfth aspect of the present invention, by using a laser beam in the separation step 2, the central portion of the sealing resin filled between the semiconductor chips can be accurately separated, and the individual semiconductor chips can be separated. The dimensions become uniform,
A dicing tape or a dicing tape and a release film can be cut at a time.
【0041】また、請求項13記載の発明によれば、半
導体装置のバンプ電極と実装基板との接合において、バ
ンプ電極形成面の封止樹脂が熱圧着時に溶融した後にバ
ンプ電極が実装基板の電極と圧着されるため、半導体チ
ップと実装基板が封止樹脂を介し強固に接着した状態と
なり、バンプ電極の信頼性は熱的、電気的にも飛躍的に
向上する。According to the thirteenth aspect of the present invention, in bonding the bump electrode of the semiconductor device to the mounting substrate, the bump electrode is formed on the mounting substrate after the sealing resin on the bump electrode forming surface is melted during thermocompression bonding. Therefore, the semiconductor chip and the mounting board are firmly bonded to each other via the sealing resin, and the reliability of the bump electrodes is significantly improved both thermally and electrically.
【図1】 本発明の実施の形態1に係わる半導体装置の
製造工程及び実装工程を示す図である。FIG. 1 is a diagram showing a manufacturing process and a mounting process of a semiconductor device according to a first embodiment of the present invention.
【図2】 本発明の実施の形態2に係わる半導体装置の
製造工程を説明するための断面図である。FIG. 2 is a cross-sectional view for explaining a manufacturing step of the semiconductor device according to the second embodiment of the present invention.
【図3】 本発明の実施の形態3に係わる半導体装置の
製造工程を説明するための断面図である。FIG. 3 is a cross-sectional view for describing a manufacturing step of a semiconductor device according to a third embodiment of the present invention.
【図4】 本発明の実施の形態4に係わる半導体装置の
製造工程を説明するための断面図である。FIG. 4 is a cross-sectional view for describing a manufacturing step of a semiconductor device according to a fourth embodiment of the present invention.
【図5】 本発明の実施の形態5に係わる半導体装置の
製造工程を説明するための断面図である。FIG. 5 is a cross-sectional view for describing a manufacturing step of a semiconductor device according to a fifth embodiment of the present invention.
【図6】 本発明の実施の形態6に係わる半導体装置の
製造工程を説明するための断面図である。FIG. 6 is a cross-sectional view for describing a manufacturing step of a semiconductor device according to a sixth embodiment of the present invention.
1 半導体ウエハ、2、7 半導体チップ、3 バンプ
電極、4 ダイシングテープ、5 装着治具、6 封止
樹脂(樹脂層)、8 実装基板、9 離型フィルム、1
0 成型用金型、Reference Signs List 1 semiconductor wafer, 2, 7 semiconductor chip, 3 bump electrode, 4 dicing tape, 5 mounting jig, 6 sealing resin (resin layer), 8 mounting substrate, 9 release film, 1
0 Mold for molding,
Claims (13)
導体チップそれぞれにバンプ電極が配設され、このバン
プ電極が配設された面と反対側の面にダイシングテープ
を装備している半導体ウエハの各半導体チップ間に、上
記ダイシングテープは切断しないで、分離する空隙を形
成する分離工程1と、上記各半導体チップがテープ上に
装着されたまま、半導体チップのバンプ電極面と各半導
体チップ間の空隙に封止樹脂を供給してバンプ電極面と
半導体チップ端面を同時に封止し樹脂層を形成する樹脂
封止工程と、上記樹脂層の反応を進める樹脂反応促進工
程と、各半導体チップ間で切断して個々の樹脂封止され
た半導体チップに分離する分離工程2とを具備すること
を特徴とする半導体装置の製造方法。1. A semiconductor wafer comprising a plurality of semiconductor chips, a bump electrode provided on each of the semiconductor chips, and a dicing tape provided on a surface opposite to a surface on which the bump electrodes are provided. Between the semiconductor chips, the dicing tape is not cut, and a separation step 1 for forming a gap to be separated, and the semiconductor chip is mounted on the tape and the bump electrode surface of the semiconductor chip and each semiconductor chip are separated. A resin sealing step of supplying a sealing resin to the gap to simultaneously seal the bump electrode surface and the semiconductor chip end surface to form a resin layer, a resin reaction accelerating step of promoting a reaction of the resin layer, A method of manufacturing a semiconductor device, comprising: a separation step 2 of cutting the semiconductor chip into individual resin-sealed semiconductor chips.
の前に、ダイシングテープをエキスパンドする工程を加
えることにより各半導体チップ間の空隙幅を大きくする
ことを特徴とする請求項1記載の半導体装置の製造方
法。2. The method according to claim 1, wherein after the separation step 1 is completed, before the resin sealing step, a step of expanding the dicing tape is added to increase the gap width between the semiconductor chips. Of manufacturing a semiconductor device.
単一または異なる特性を有する複数の封止樹脂を用いる
ことを特徴とする請求項1記載の半導体装置の製造方
法。3. A sealing resin used in a resin sealing step,
2. The method according to claim 1, wherein a plurality of sealing resins having a single property or different properties are used.
法に、スプレー法、スピンコート法または印刷法を用い
ることを特徴とする請求項1記載の半導体装置の製造方
法。4. The method of manufacturing a semiconductor device according to claim 1, wherein a method of supplying a sealing resin in the resin sealing step is a spray method, a spin coating method, or a printing method.
法に、成型用金型を用いる方法を適用することを特徴と
する請求項1記載の半導体装置の製造方法。5. The method of manufacturing a semiconductor device according to claim 1, wherein a method using a molding die is applied to a method of supplying the sealing resin in the resin sealing step.
ることを特徴とする請求項5記載の半導体装置の製造方
法。6. The method for manufacturing a semiconductor device according to claim 5, wherein a release film is mounted on the surface of the molding die.
を、減圧した雰囲気下で行うことを特徴とする請求項1
記載の半導体装置の製造方法。7. The method according to claim 1, wherein the supply of the sealing resin in the resin sealing step is performed in a reduced-pressure atmosphere.
The manufacturing method of the semiconductor device described in the above.
進は、加熱、または光照射により行うことを特徴とする
請求項1記載の半導体装置の製造方法。8. The method for manufacturing a semiconductor device according to claim 1, wherein the promotion of the resin reaction in the resin reaction promoting step is performed by heating or light irradiation.
ンプ電極の少なくとも先端部を上記封止樹脂より露出さ
せるバンプ電極露出工程を加えることを特徴とする請求
項1記載の半導体装置の製造方法。9. The semiconductor device according to claim 1, further comprising, after the resin sealing step, a bump electrode exposing step of exposing at least a tip portion of the bump electrode covered with the sealing resin from the sealing resin. Manufacturing method.
極の露出は、樹脂封止工程後、バンプ電極面に離型フィ
ルムを被覆し押し付ける手段によることを特徴とする請
求項9記載の半導体装置の製造方法。10. The method of manufacturing a semiconductor device according to claim 9, wherein the exposing of the bump electrode in the bump electrode exposing step is performed by means for coating and pressing a release film on the bump electrode surface after the resin sealing step. .
極の露出は、レーザ光照射、エキシマレーザ、エッチン
グ、機械研磨、及びブラストの少なくとも1つの手段に
よることを特徴とする請求項9記載の半導体装置の製造
方法。11. The manufacturing of a semiconductor device according to claim 9, wherein the exposure of the bump electrode in the bump electrode exposure step is performed by at least one of laser light irradiation, excimer laser, etching, mechanical polishing, and blasting. Method.
用いることを特徴とする請求項1記載の半導体装置の製
造方法。12. The method of manufacturing a semiconductor device according to claim 1, wherein a laser is used for cutting in the separation step 2.
れ、上記半導体チップ上面及びバンプ電極面と上記半導
体チップ側面とを封止樹脂で封止した半導体装置を準備
し、この半導体装置のバンプ電極面を実装基板に熱圧着
により接続することを特徴とする半導体装置の実装方
法。13. A semiconductor device in which bump electrodes are provided on a semiconductor chip, and a top surface of the semiconductor chip, a bump electrode surface and a side surface of the semiconductor chip are sealed with a sealing resin, and the bump electrode of the semiconductor device is prepared. A method for mounting a semiconductor device, comprising connecting a surface to a mounting substrate by thermocompression bonding.
Priority Applications (1)
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JP29549698A JP2000124164A (en) | 1998-10-16 | 1998-10-16 | Manufacture of semiconductor device and mounting method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29549698A JP2000124164A (en) | 1998-10-16 | 1998-10-16 | Manufacture of semiconductor device and mounting method thereof |
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Family
ID=17821372
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