JP2000072856A - Polymer and method for producing the same - Google Patents
Polymer and method for producing the sameInfo
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- JP2000072856A JP2000072856A JP10247971A JP24797198A JP2000072856A JP 2000072856 A JP2000072856 A JP 2000072856A JP 10247971 A JP10247971 A JP 10247971A JP 24797198 A JP24797198 A JP 24797198A JP 2000072856 A JP2000072856 A JP 2000072856A
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Abstract
(57)【要約】 (修正有)
【課題】 安定性、寸法安定性、電気、機械的特性のす
ぐれたビナフトール骨格を有する重合体を得る。
【解決手段】 下記式(1)で表される繰り返し単位を
有する重量平均分子量3000〜100,000の重合
体。
[式中、Rは2価の有機基を示す。](57) [Summary] (Problem corrected) [PROBLEMS] To obtain a polymer having a binaphthol skeleton excellent in stability, dimensional stability, electric and mechanical properties. SOLUTION: A polymer having a repeating unit represented by the following formula (1) and having a weight average molecular weight of 3,000 to 100,000. [Wherein, R represents a divalent organic group. ]
Description
【0001】[0001]
【発明の属する技術分野】本発明はビナフトール骨格を
有する重合体およびこの重合体を酸化カップリング重合
で製造する方法に関する。The present invention relates to a polymer having a binaphthol skeleton and a method for producing the polymer by oxidative coupling polymerization.
【0002】[0002]
【従来の技術】縮合系芳香族重合体は、その優れた熱安
定性、寸法安定性、電気、機械的特性のために、各種電
気、電子、航空産業等で広く用いられてきた。通常、こ
れらの重合体は、アシル誘導体親電子反応または求核的
置換反応により合成されている。すなわち、重合を行う
ためにはモノマー中に適当な脱離基が必要不可欠であ
り、これが製造工程数を著しく増加するので、反応収
率、コスト面で不利となり、工業化を妨げていた。ま
た、一般の縮合系芳香族重合体の合成においては、水酸
基等の活性基は反応基または触媒毒になるため、これら
の活性基含有重合体を活性基の保護なしに得ることは困
難であった。したがって、従来、縮合系芳香族重合体合
成においてはモノマー中への脱離基の導入が必須であ
り、重合と同時に副生する脱離基の塩の除去も課題とな
っていた。また、修飾可能な活性基を有するポリマーを
重合する際、この活性基の保護および脱保護が必要であ
り、この点も製造工程数を増加させるていた。2. Description of the Related Art Condensed aromatic polymers have been widely used in various electric, electronic and aviation industries because of their excellent thermal stability, dimensional stability, electric and mechanical properties. Generally, these polymers are synthesized by an acyl derivative electrophilic reaction or a nucleophilic substitution reaction. That is, in order to carry out the polymerization, an appropriate leaving group is necessary and indispensable in the monomer, which significantly increases the number of production steps, which is disadvantageous in terms of reaction yield and cost, and hinders industrialization. In addition, in the synthesis of a general condensed aromatic polymer, since an active group such as a hydroxyl group becomes a reactive group or a catalyst poison, it is difficult to obtain such an active group-containing polymer without protecting the active group. Was. Therefore, conventionally, in the synthesis of a condensed aromatic polymer, introduction of a leaving group into a monomer has been essential, and removal of a salt of a leaving group produced as a by-product at the same time as polymerization has been a problem. In addition, when polymerizing a polymer having a modifiable active group, protection and deprotection of the active group are required, which also increases the number of production steps.
【0003】[0003]
【発明が解決しようとする課題】本発明は、これら従来
技術の問題を背景になされたもので、新規なビナフトー
ル骨格を有する重合体とその製造方法を提供することを
目的とする。SUMMARY OF THE INVENTION The present invention has been made in view of these problems of the prior art, and has as its object to provide a novel polymer having a binaphthol skeleton and a method for producing the same.
【0004】[0004]
【問題を解決するための手段】本発明は、下記式(1)
で表される繰り返し単位を有する重量平均分子量3000
〜100,000の重合体ならびに下記式(3)で表される化
合物を、有機アミン銅塩および酸素の存在下、溶媒中で
酸化カップリング重合することを特徴とする重合体の製
造方法を提供するものである。[Means for Solving the Problems] The present invention provides the following formula (1)
Weight average molecular weight having a repeating unit represented by 3000
~ 100,000 polymer and a compound represented by the following formula (3) by oxidative coupling polymerization in a solvent in the presence of an organic amine copper salt and oxygen in a solvent. It is.
【化4】 [式中Rは、2価の有機基を示す。]Embedded image [In the formula, R represents a divalent organic group. ]
【0005】[0005]
【化5】 [式中Rは、2価の有機基を示す。]を提供するものであ
る。Embedded image [In the formula, R represents a divalent organic group. ] Is provided.
【0006】[0006]
【発明の実施の形態】本発明の重合体において、式
(1)中のRは、2価の有機基、好ましくは芳香環を有す
る2価の有機基であり、酸化カップリング反応を妨害す
る官能基を有さないものである。2価の有機基としては
下記式(2)または下記式(4)〜(6)で表される構造
などを挙げることができるが、式(2)で表される構造
が、原料化合物の入手性、モノマーの重合性および重合
体の溶解性の面で優れており、特に好ましい。BEST MODE FOR CARRYING OUT THE INVENTION In the polymer of the present invention, R in the formula (1) is a divalent organic group, preferably a divalent organic group having an aromatic ring, which hinders the oxidative coupling reaction. It has no functional group. Examples of the divalent organic group include structures represented by the following formula (2) or the following formulas (4) to (6). It is particularly preferable in terms of properties, polymerizability of the monomer and solubility of the polymer.
【0007】[0007]
【化6】 Embedded image
【0008】[0008]
【化7】 Embedded image
【0009】[0009]
【化8】 Embedded image
【0010】[0010]
【化9】 Embedded image
【0011】本発明の重合体の重量平均分子量(テトラ
ヒドロフラン溶媒、40℃、サイズ排除クロマトグラフィ
ー、ポリスチレン換算)は、3000〜100,000、好ましく
は3000〜50,000である。本発明の重合体は、芳香族ジオ
ールジカリウム塩または芳香族ジハライドとナルトール
誘導体を反応させてモノマー前駆体を製造し、ついで該
モノマー前駆体の保護基をはずすことにより得られる前
記式(3)で表される化合物を、有機アミン銅塩および
酸素分子存在下、溶媒中で酸化カップリング重合して得
られる。The weight average molecular weight (tetrahydrofuran solvent, 40 ° C., size exclusion chromatography, polystyrene conversion) of the polymer of the present invention is 3000 to 100,000, preferably 3000 to 50,000. The polymer of the present invention is obtained by reacting an aromatic diol dipotassium salt or an aromatic dihalide with a nalitol derivative to produce a monomer precursor, and then removing the protecting group of the monomer precursor by the above-mentioned formula (3). It is obtained by subjecting the compound represented by oxidative coupling polymerization in a solvent in the presence of an organic amine copper salt and an oxygen molecule.
【0012】モノマー前駆体を合成する具体的方法は次
のとおりである。芳香族ジオールジカリウム塩を用いる
場合には、下記式(7)または(8)に示す芳香族ジオー
ルジカリウム塩と、ナルトール誘導体として下記式
(9)に示す臭化メトキシナフタレンとを銅の存在下、
無溶媒で、250℃、6時間の条件で求核置換反応させ、下
記式(10)または(11)に示す保護基を有するモノマー
前駆体を合成する。The specific method for synthesizing the monomer precursor is as follows. When an aromatic diol dipotassium salt is used, an aromatic diol dipotassium salt represented by the following formula (7) or (8) and a methoxynaphthalene bromide represented by the following formula (9) as a nalitol derivative are added in the presence of copper,
A nucleophilic substitution reaction is carried out without solvent at 250 ° C. for 6 hours to synthesize a monomer precursor having a protecting group represented by the following formula (10) or (11).
【0013】[0013]
【化10】 Embedded image
【0014】[0014]
【化11】 Embedded image
【0015】[0015]
【化12】 Embedded image
【0016】[0016]
【化13】 Embedded image
【0017】[0017]
【化14】 Embedded image
【0018】芳香族ジハライドを用いる場合には、ま
ず、下記式(12)または(13)に示す芳香族ジハライド
と、ナフトール誘導体として下記式(14)に示すメトキ
シナフトールとを炭酸カリウムの存在化、有機溶媒、た
とえば、ジメチルアセトアミド、トルエン混合溶媒中
で、165℃、3時間の条件で求核置換反応させ、下記式
(15)または(16)に示す保護されたビスナフタレン構
造を有する保護基を有するモノマー前駆体を合成する。When an aromatic dihalide is used, first, an aromatic dihalide represented by the following formula (12) or (13) and methoxynaphthol represented by the following formula (14) as a naphthol derivative are converted into potassium carbonate: In an organic solvent such as dimethylacetamide / toluene mixed solvent, a nucleophilic substitution reaction is carried out at 165 ° C. for 3 hours to form a protecting group having a protected bisnaphthalene structure represented by the following formula (15) or (16) A monomer precursor having the same is synthesized.
【0019】[0019]
【化15】 Embedded image
【0020】[0020]
【化16】 Embedded image
【0021】[0021]
【化17】 Embedded image
【0022】[0022]
【化18】 Embedded image
【0023】[0023]
【化19】 Embedded image
【0024】上記のようにして得られた保護基を有する
モノマー前駆体と三臭化ホウ素とを、有機溶媒、たとえ
ば、塩化メチレン中で、−78℃、5時間の条件で脱保護
させ、上記式(3)で表される化合物を合成する。次
に、このようにして得られた式(3)で表されるビスナ
フトール構造を有するモノマーと、下記式(17)で表さ
れる銅塩とを有機溶媒、たとえば塩化メチレン中で反応
させて重合させることにより、式(1)で示される繰り
返し単位を有する重合体を製造することができる。The thus obtained monomer precursor having a protecting group and boron tribromide are deprotected in an organic solvent, for example, methylene chloride at -78 ° C. for 5 hours. A compound represented by the formula (3) is synthesized. Next, the thus obtained monomer having a bisnaphthol structure represented by the formula (3) and a copper salt represented by the following formula (17) are reacted in an organic solvent, for example, methylene chloride. By polymerizing, a polymer having a repeating unit represented by the formula (1) can be produced.
【0025】[0025]
【化20】 [式中Xは、ハロゲン原子、脂肪族または芳香族の第3
級アミンを示す] ここで、第3級アミンの具体例としてはテトラメチルエ
チレンジアミンやピリジンを挙げることができる。Embedded image Wherein X is a halogen atom, an aliphatic or aromatic tertiary
Shows a tertiary amine] Here, specific examples of the tertiary amine include tetramethylethylenediamine and pyridine.
【0026】なお、上記式(3)で示される化合物と上記
式(17)で表される銅塩とは、通常1:0.01〜5、好ましく
は、1:0.03〜3、最適には1:0.05〜1.0(上記式(3)
で示される化合物:上記式(17)で表される銅塩)の割
合で反応させる。ここで、式(17)で示される銅塩とし
ては、ジ-m-ヒドロキソ-ビス[(N, N,N', N'-テトラメ
チルエチレンジアミン)銅(II)]クロリド(下記式
(18))、塩化第一銅-ピリジン錯体(下記式(19))
などを挙げることができる。下記式(17)で表される銅
塩として、置換基Xのアミンの求核性の高いものを用い
た場合には、銅触媒の活性が向上し、より高分子量の重
合体を得ることができる。The compound represented by the above formula (3) and the copper salt represented by the above formula (17) usually have a ratio of 1: 0.01 to 5, preferably 1: 0.03 to 3, and most preferably 1: 0.03. 0.05 to 1.0 (the above formula (3)
(A copper salt represented by the above formula (17)). Here, as the copper salt represented by the formula (17), di-m-hydroxo-bis [(N, N, N ', N'-tetramethylethylenediamine) copper (II)] chloride (the following formula (18) ), Cuprous chloride-pyridine complex (following formula (19))
And the like. When a high nucleophilic property of the amine of the substituent X is used as the copper salt represented by the following formula (17), the activity of the copper catalyst is improved, and a higher molecular weight polymer can be obtained. it can.
【0027】[0027]
【化21】 Embedded image
【0028】[0028]
【化22】 Embedded image
【0029】このように、反応に特定の銅塩を用いるこ
とにより、有機溶媒に対する触媒の溶解性を確保すると
共に、上記式(3)で表される化合物の反応を十分に行
わせることができる。As described above, by using a specific copper salt for the reaction, the solubility of the catalyst in an organic solvent can be ensured, and the reaction of the compound represented by the above formula (3) can be sufficiently performed. .
【0030】また、本発明の重合体を製造する際に使用
される有機溶媒としては、使用されるモノマーおよび銅
触媒に対して不活性であり、かつこれらを溶解するもの
が使用される。好ましい有機溶媒の例としては、塩化メ
チレン、クロロホルム、四塩化炭素、1,2-ジクロロエタ
ン、1,4-ジオキサン、1,3ジオキサン、テトラヒドロフ
ラン、ピリジン、トリエチルアミン、ニトロベンゼン、
ベンゼン、クロロベンゼン等を挙げることができ、これ
らの有機溶媒は、単独でまたは二種類以上を混合して使
用することができる。また、本発明の重合体を合成する
際の反応温度は、通常0〜100℃であり、より好ましくは
常温(25℃)〜50℃の範囲内の温度である。また、反応
圧力は特に限定されず、通常、常圧で実施することがで
きる。さらに、上記式(3)で表される化合物の重合は、
酸素存在下で行われ、反応時間は、通常、0.5〜24時間
の範囲内であることが好ましい。As the organic solvent used for producing the polymer of the present invention, those which are inactive with respect to the monomer and the copper catalyst used and which dissolve these are used. Examples of preferred organic solvents include methylene chloride, chloroform, carbon tetrachloride, 1,2-dichloroethane, 1,4-dioxane, 1,3 dioxane, tetrahydrofuran, pyridine, triethylamine, nitrobenzene,
Benzene, chlorobenzene and the like can be mentioned, and these organic solvents can be used alone or in combination of two or more. The reaction temperature at the time of synthesizing the polymer of the present invention is usually from 0 to 100 ° C, and more preferably a temperature in the range from ordinary temperature (25 ° C) to 50 ° C. The reaction pressure is not particularly limited, and the reaction can be usually carried out at normal pressure. Further, the polymerization of the compound represented by the above formula (3),
The reaction is carried out in the presence of oxygen, and the reaction time is usually preferably in the range of 0.5 to 24 hours.
【0031】本発明の重合体を製造する際の上記式(3)
で表される化合物の濃度は、適宜調整することができる
が、モル濃度が0.2〜10モル/リットルの範囲内の値とす
ることが好ましく、より好ましくは0.5〜5mol/Lの範囲
内の値である。The above formula (3) for producing the polymer of the present invention
The concentration of the compound represented by can be appropriately adjusted, the molar concentration is preferably a value in the range of 0.2 to 10 mol / liter, more preferably a value in the range of 0.5 to 5 mol / L It is.
【0032】[0032]
【実施例】以下、本発明を実施例によって具体的に説明
する。 [実施例1]空気が十分に取り入れられるフラスコにお
いて、上記式(6)のモノマー0.512g(1.0ミリ
モル)を、塩化メチレン1ミリリットルに溶解させ、つづいて
攪拌下にジ-u-ヒドロキソ-ビス[(N, N, N', N'-テト
ラメチルエチレンジアミン)銅(II)]クロリド0.0
23g(0.05ミリモル)を加え、室温で20時間反応
させ、収率は83%で重合体を得た。得られた重合体の重
量平均分子量(テトラヒドロフラン溶媒、40℃、サイズ
排除クロマトグラフィー)は9600であった。また、得ら
れた重合体のIRを測定したところ3600cm-1に水酸基に起
因する幅広い吸収が見られた。さらに、プロトンNMRに
おいては、9.2ppmに水酸基のシグナルの存在を確認し
た。さらに、プロトンおよびカーボンNMR測定結果か
ら、得られた重合体は、b-ナフトール部位の1位で選択
的にカップリング反応が進行し、構造規則性を有するポ
リマーが得られたことを確認した。さらにまた、この得
られた重合体はDMF、DMSO、THFにそれぞれ可溶であっ
た。The present invention will be specifically described below with reference to examples. Example 1 In a flask with sufficient air intake, 0.512 g (1.0 mmol) of the monomer of the above formula (6) was dissolved in 1 ml of methylene chloride, and then di-u-hydroxo was stirred. -Bis [(N, N, N ', N'-tetramethylethylenediamine) copper (II)] chloride 0.0
23 g (0.05 mmol) was added and reacted at room temperature for 20 hours to obtain a polymer in a yield of 83%. The weight average molecular weight (tetrahydrofuran solvent, 40 ° C., size exclusion chromatography) of the obtained polymer was 9,600. Further, the IR of the obtained polymer was measured, and a broad absorption attributable to a hydroxyl group was observed at 3600 cm-1. Further, in proton NMR, the presence of a hydroxyl group signal was confirmed at 9.2 ppm. Further, from the proton and carbon NMR measurement results, it was confirmed that the obtained polymer underwent a selective coupling reaction at the first position of the b-naphthol moiety, and a polymer having structural regularity was obtained. Furthermore, the obtained polymer was soluble in DMF, DMSO, and THF, respectively.
【0033】[0033]
【発明の効果】本発明の重合体は、熱安定性、寸法安定
性、電機機械特性に優れるので電気、電子材料などに好
適に用いることができる。また、本発明の重合体の製造
方法によれば、反応モノマーとして、ビスナフトール構
造を導入した特定の化合物と、特定の銅塩とを用いるこ
とにより、酸化的カップリング反応により、脱離基をモ
ノマーに導入することなく、高収率でポリマーを製造す
ることができる。さらに、ナフトール類が酸化的カップ
リング反応によりビナフトールを与えることを利用し、
水酸基を保護することなく一段階でこの官能基を有する
ポリマーを得ることができた。このポリマー中の水酸基
は他の化合物とも反応可能であり、種々の化合物と反応
させることにより、ポリマーの変性も可能である。The polymer of the present invention is excellent in thermal stability, dimensional stability, and electrical and mechanical properties, and thus can be suitably used for electric and electronic materials. Further, according to the method for producing a polymer of the present invention, by using a specific compound having a bisnaphthol structure introduced and a specific copper salt as a reaction monomer, a leaving group can be formed by an oxidative coupling reaction. Polymers can be produced in high yields without introducing them into monomers. Furthermore, utilizing the fact that naphthols give binaphthol by an oxidative coupling reaction,
A polymer having this functional group could be obtained in one step without protecting the hydroxyl group. The hydroxyl groups in this polymer can also react with other compounds, and the polymer can be modified by reacting with various compounds.
【図1】実施例1で得られた重合体の1H−NMRスペ
クトルを示す。FIG. 1 shows a 1 H-NMR spectrum of a polymer obtained in Example 1.
【図2】実施例1で得られた重合体の13C−NMRスペ
クトルを示す。FIG. 2 shows a 13 C-NMR spectrum of the polymer obtained in Example 1.
───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4J005 AA21 BB04 4J032 CA04 CA12 CB01 CB03 CB12 CC01 CD01 CD08 CD09 CE03 CE22 CF03 CG07 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 4J005 AA21 BB04 4J032 CA04 CA12 CB01 CB03 CB12 CC01 CD01 CD08 CD09 CE03 CE22 CF03 CG07
Claims (3)
有する重量平均分子量3000 〜 100,000の重合体。 【化1】 [式中、Rは2価の有機基を示す。]1. A polymer having a weight average molecular weight of 3,000 to 100,000 having a repeating unit represented by the following formula (1). Embedded image [Wherein, R represents a divalent organic group. ]
構造であることを特徴とする請求項1記載の重合体。 【化2】 2. The polymer according to claim 1, wherein the divalent organic group has a structure represented by the following formula (2). Embedded image
アミン銅塩および酸素の存在下、溶媒中で酸化カップリ
ング重合することを特徴とする請求項1記載の重合体の
製造方法。 【化3】 [式中Rは、2価の有機基を示す。]3. The method for producing a polymer according to claim 1, wherein the compound represented by the following formula (3) is subjected to oxidative coupling polymerization in a solvent in the presence of an organic amine copper salt and oxygen. . Embedded image [In the formula, R represents a divalent organic group. ]
Priority Applications (1)
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JP24797198A JP3867749B2 (en) | 1998-09-02 | 1998-09-02 | Polymer and process for producing the same |
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JP24797198A JP3867749B2 (en) | 1998-09-02 | 1998-09-02 | Polymer and process for producing the same |
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Publication Number | Publication Date |
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JP2000072856A true JP2000072856A (en) | 2000-03-07 |
JP3867749B2 JP3867749B2 (en) | 2007-01-10 |
Family
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2022003134A (en) * | 2018-08-17 | 2022-01-11 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC | Aromatic underlayer |
-
1998
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JP2024009902A (en) * | 2018-08-17 | 2024-01-23 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシー | aromatic lower layer |
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