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JP2000018912A - Grazing incidence interferometer - Google Patents

Grazing incidence interferometer

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Publication number
JP2000018912A
JP2000018912A JP10184138A JP18413898A JP2000018912A JP 2000018912 A JP2000018912 A JP 2000018912A JP 10184138 A JP10184138 A JP 10184138A JP 18413898 A JP18413898 A JP 18413898A JP 2000018912 A JP2000018912 A JP 2000018912A
Authority
JP
Japan
Prior art keywords
measurement
measured
light
incidence interferometer
reflected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10184138A
Other languages
Japanese (ja)
Other versions
JP3939028B2 (en
Inventor
Katsuyasu Mizuno
勝保 水野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nidek Co Ltd
Original Assignee
Nidek Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nidek Co Ltd filed Critical Nidek Co Ltd
Priority to JP18413898A priority Critical patent/JP3939028B2/en
Publication of JP2000018912A publication Critical patent/JP2000018912A/en
Application granted granted Critical
Publication of JP3939028B2 publication Critical patent/JP3939028B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

(57)【要約】 【課題】 測定感度切替え用の機構を簡単な構造にする
ことにより、大きな測定面にも安価に対応できる干渉計
を提供する。 【解決手段】 測定光源から出射された可干渉光を被測
定面に斜め方向から入射させ、被測定面より反射する反
射光と参照面で反射する前記可干渉光の反射光とにより
干渉縞を得る斜入射干渉計において、前記測定光源から
出射される可干渉光を略平行光束にするために固定配置
された凸レンズと、被測定面に対向した参照面を持ち、
前記凸レンズにより平行光束にされた可干渉光を通過さ
せて被測定面に斜め方向から入射させる光学素子と、異
なる測定感度に対応させて被測定面に斜め入射する可干
渉光の入射角を変えるべく前記測定光源から出射する可
干渉光の出射位置を変化させる出射位置可変手段と、を
備える。
(57) [Problem] To provide an interferometer that can cope with a large measurement surface at low cost by making the mechanism for switching the measurement sensitivity simple. SOLUTION: Coherent light emitted from a measurement light source is obliquely incident on a surface to be measured, and interference fringes are formed by reflected light reflected from the surface to be measured and reflected light of the coherent light reflected from a reference surface. In the oblique incidence interferometer to be obtained, a convex lens fixedly arranged to convert the coherent light emitted from the measurement light source into a substantially parallel light beam, having a reference surface facing the surface to be measured,
An optical element that passes coherent light converted into a parallel light beam by the convex lens and impinges on the surface to be measured from an oblique direction, and changes an incident angle of coherent light obliquely incident on the surface to be measured corresponding to different measurement sensitivities. Emission position changing means for changing the emission position of the coherent light emitted from the measurement light source.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、測定物の表面形状
の測定に好適な斜入射干渉計に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a grazing incidence interferometer suitable for measuring the surface shape of an object to be measured.

【0002】[0002]

【従来技術】斜入射干渉計としては、例えば半導体素子
製造過程におけるシリコンウェハの平面度検査に利用さ
れるものが知られている。この斜入射干渉計は、斜め方
向から測定面へ光を入射させるので、比較的凹凸の大き
な物でも測定可能であり、また、測定面への入射角度を
変えることにより測定感度を変更できるという特徴を持
つ。
2. Description of the Related Art As an oblique incidence interferometer, there is known an oblique incidence interferometer which is used, for example, for flatness inspection of a silicon wafer in a semiconductor device manufacturing process. This oblique incidence interferometer allows light to enter the measurement surface from an oblique direction, so it can measure objects with relatively large irregularities, and can change the measurement sensitivity by changing the angle of incidence on the measurement surface. have.

【0003】従来、測定感度を変更する構成は、例えば
図5に示すように構成したものが知られている。光源で
あるHe−Neレーザ8から出射されたレーザ光は、レ
ンズ7により必要な大きさに拡張された後、コリメーテ
ィングレンズ6で平行光束にされ、ロータリープリズム
5を通ってプリズム1に入射する。プリズム参照面2で
反射した光と、プリズム参照面2を透過して測定物の測
定面3で反射した光が干渉現象を起こし、スクリーン4
には干渉縞が写し出される。測定感度の変更は、ロータ
リープリズム5を動かしてプリズム1に対するレーザ光
の入射角を変えることにより行う。
Conventionally, as a configuration for changing the measurement sensitivity, for example, a configuration as shown in FIG. 5 is known. Laser light emitted from a He-Ne laser 8 as a light source is expanded into a required size by a lens 7, converted into a parallel light beam by a collimating lens 6, and incident on the prism 1 through a rotary prism 5. I do. The light reflected on the prism reference surface 2 and the light transmitted through the prism reference surface 2 and reflected on the measurement surface 3 of the measurement object cause an interference phenomenon, and the screen 4
, An interference fringe is projected. The measurement sensitivity is changed by moving the rotary prism 5 to change the incident angle of the laser beam on the prism 1.

【0004】[0004]

【発明が解決しようとする課題】ところで、近年の半導
体ウエハは大型化の傾向にあり、現在ではその直径が20
0mmになる物もある。これに対応するためには感度切
替え用のロータリープリズム5もほぼそれに等しい大き
さが必要となるが、このような光学部材を大きくして必
要な精度を維持することはコストがかかるという欠点が
ある。
However, the size of semiconductor wafers in recent years has been increasing, and the diameter of semiconductor wafers is now 20 mm.
Some are 0mm. In order to cope with this, the rotary prism 5 for switching the sensitivity also needs to be approximately equal in size, but it is costly to enlarge such an optical member to maintain the required accuracy. .

【0005】また、上記の機構では、測定感度を変える
ためにロータリープリズム5を動かして調整しているの
で、その為の駆動装置が必要となり、大きな光学部材を
動かす機構は装置的に複雑になるという欠点がある。
Further, in the above mechanism, since the rotary prism 5 is moved and adjusted to change the measurement sensitivity, a driving device for that is required, and a mechanism for moving a large optical member becomes complicated in terms of equipment. There is a disadvantage that.

【0006】本発明は上記問題点に鑑み、測定感度切替
え用の機構を簡単な構造にして、大きな測定面にも安価
に対応できる干渉計を提供することを技術課題とする。
SUMMARY OF THE INVENTION In view of the above problems, it is an object of the present invention to provide an interferometer that has a simple structure for switching the measurement sensitivity and can cope with a large measurement surface at low cost.

【0007】[0007]

【課題を解決するための手段】上記課題を解決するため
に、本発明は以下のような構成を備えることを特徴とす
る。
Means for Solving the Problems In order to solve the above problems, the present invention is characterized by having the following configuration.

【0008】(1) 測定光源から出射された可干渉光
を被測定面に斜め方向から入射させ、被測定面より反射
する反射光と参照面で反射する前記可干渉光の反射光と
により干渉縞を得る斜入射干渉計において、前記測定光
源から出射される可干渉光を略平行光束にするために固
定配置された凸レンズと、被測定面に対向した参照面を
持ち、前記凸レンズにより平行光束にされた可干渉光を
通過させて被測定面に斜め方向から入射させる光学素子
と、異なる測定感度に対応させて被測定面に斜め入射す
る可干渉光の入射角を変えるべく前記測定光源から出射
する可干渉光の出射位置を変化させる出射位置可変手段
と、を備えることを特徴とする。
(1) Coherent light emitted from a measurement light source is obliquely incident on a surface to be measured, and interferes with reflected light reflected from the measured surface and reflected light of the coherent light reflected on a reference surface. The oblique incidence interferometer for obtaining fringes has a convex lens fixedly arranged to convert the coherent light emitted from the measurement light source into a substantially parallel light beam, and a reference surface facing the surface to be measured. An optical element that allows the coherent light to pass through and enters the surface to be measured from an oblique direction, and from the measurement light source to change the incident angle of the coherent light that obliquely enters the surface to be measured corresponding to different measurement sensitivities. Emission position changing means for changing the emission position of the emitted coherent light.

【0009】(2) (1)の斜入射干渉計において、
前記測定光源は異なる測定感度に対応させて被測定面に
斜め入射する可干渉光の入射角を変えるべく所定位置に
複数個配置されており、前記出射位置可変手段は複数個
の測定光源の何れかを選択的に点灯する手段であること
を特徴とする。
(2) In the grazing incidence interferometer of (1),
A plurality of the measurement light sources are arranged at predetermined positions so as to change the incident angle of the coherent light obliquely incident on the surface to be measured in accordance with different measurement sensitivities, and the emission position variable means is any one of the plurality of measurement light sources. Is a means for selectively turning on the light.

【0010】(3) (1)の斜入射干渉計において、
前記出射位置可変手段は前記測定光源を移動させる移動
手段を備えることを特徴とする。
(3) In the grazing incidence interferometer of (1),
The emission position changing means includes a moving means for moving the measurement light source.

【0011】(4) (3)の斜入射干渉計において、
さらに測定感度を選択する選択手段と、該選択手段によ
る選択信号に基づいて前記移動手段の駆動を制御する移
動制御手段と、を備えることを特徴とする。
(4) In the grazing incidence interferometer of (3),
Further, it is characterized by comprising a selection means for selecting the measurement sensitivity, and a movement control means for controlling the driving of the movement means based on a selection signal from the selection means.

【0012】(5) (1)〜(4)の斜入射干渉計に
おいて、前記測定光源は半導体レーザであることを特徴
とする。
(5) In the grazing incidence interferometer of (1) to (4), the measurement light source is a semiconductor laser.

【0013】(6) 測定光源から出射された可干渉光
を被測定面に斜め方向から入射させ、被測定面より反射
する反射光と参照面で反射する前記可干渉光の反射光と
により干渉縞を得る斜入射干渉計において、異なる測定
感度に対応させて被測定面に斜め入射する可干渉光の入
射角を変えるべく所定位置に配置された複数個の測定光
源と、該複数個の測定光源の何れかを選択的に点灯する
ことにより測定感度を選択する選択手段と、を備えるこ
とを特徴とする。
(6) Coherent light emitted from the measurement light source is obliquely incident on the surface to be measured, and interferes with reflected light reflected from the measured surface and reflected light of the coherent light reflected on the reference surface. In a grazing incidence interferometer for obtaining fringes, a plurality of measurement light sources arranged at predetermined positions to change the incident angle of coherent light obliquely incident on a surface to be measured in accordance with different measurement sensitivities, and the plurality of measurement sources Selecting means for selecting the measurement sensitivity by selectively turning on one of the light sources.

【0014】(7) (6)の斜入射干渉計において、
前記測定光源は半導体レーザであることを特徴とする。
(7) In the grazing incidence interferometer of (6),
The measurement light source is a semiconductor laser.

【0015】[0015]

【発明の実施の形態】以下、本発明の実施の形態を図面
に基づいて説明する。図1は本発明に係る斜入射干渉計
の概略構成を示す図である。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a diagram showing a schematic configuration of an oblique incidence interferometer according to the present invention.

【0016】10は可干渉光を出射するレーザ光源が配
置された光源部であり、光源部10には測定感度を切替
えるべく被測定物30の測定面30aへの入射角を変更
できるように5つのレーザ光源11a〜11eが配置さ
れている(この配置については後述する)。レーザ光源
11a〜11eとしては、波長655nmの赤色光を発
する半導体レーザ(以下、LDと示す)を使用して、配
置スペースを節約できるようにしている。LD11a〜
11eは、コントロールパネル21が持つ感度切替え用
のスイッチ21aを操作することにより、制御部20の
駆動制御によって選択的に点灯される。測定感度は1〜
5μmで1μm毎に変更できるようにしている。
Reference numeral 10 denotes a light source unit in which a laser light source for emitting coherent light is disposed. The light source unit 10 has a light source 5 so that the angle of incidence on the measurement surface 30a of the DUT 30 can be changed to switch the measurement sensitivity. Two laser light sources 11a to 11e are arranged (this arrangement will be described later). As the laser light sources 11a to 11e, semiconductor lasers (hereinafter, referred to as LDs) that emit red light having a wavelength of 655 nm are used to save the arrangement space. LD11a ~
11e is selectively turned on by the drive control of the control unit 20 by operating the sensitivity switching switch 21a of the control panel 21. Measurement sensitivity is 1 to
5 μm can be changed every 1 μm.

【0017】LD11a〜11eの何れかから出射され
たレーザ光は、固定配置されたコリメーティングレンズ
12により平行光束にされた後、プリズム13に入射す
る。プリズム13に入射した光束は、参照面13aから
の反射光とプリズム13を透過して測定面30aへ斜め
方向から入射する光束に別れる。参照面13aで反射し
た光束と測定面30aで反射した光束とが干渉現象を起
こし、これがスクリーン14に投影される。スクリーン
14に投影された干渉縞は、フィールドレンズ15を介
してテレビカメラ16に撮像され、その出力信号が画像
処理装置22に入力される。画像処理装置22では入力
された画像に所定の画像処理を施し、測定面30aの凹
凸の状態が測定される。23はモニタで、テレビカメラ
16に撮像される干渉縞画像や測定結果が表示される。
31は、測定物30の載置台である。
A laser beam emitted from one of the LDs 11a to 11e is converted into a parallel light beam by a collimating lens 12 which is fixed and then enters a prism 13. The light beam incident on the prism 13 is separated into a light beam reflected from the reference surface 13a and a light beam transmitted through the prism 13 and obliquely incident on the measurement surface 30a. The light beam reflected by the reference surface 13a and the light beam reflected by the measurement surface 30a cause an interference phenomenon, which is projected on the screen 14. The interference fringe projected on the screen 14 is captured by the television camera 16 via the field lens 15, and an output signal thereof is input to the image processing device 22. The image processing device 22 performs predetermined image processing on the input image, and measures the state of unevenness of the measurement surface 30a. Reference numeral 23 denotes a monitor on which an interference fringe image captured by the television camera 16 and a measurement result are displayed.
Reference numeral 31 denotes a mounting table for the object 30 to be measured.

【0018】次に、測定感度を変更するためのLD11
a〜11eの配置について説明する。斜入射干渉計で
は、干渉縞の1縞分が被測定面の高低差に対してどのく
らいに相当するかを示す測定感度Sは、図2に示すよう
にプリズム参照面の法線と、プリズムから出射した光線
とのなす角をθとするとき、S=λ/2COSθで表され
る。ここで、λ=655nmとすると、θ=70.9°でS
=1.0μmとなる。同様に、θ=80.6°でS=2.0μm、
θ=83.7°でS=3.0μm、θ=85.3°でS=4.00μ
m、θ=86.2°でS=5.0μmとなる。
Next, an LD 11 for changing the measurement sensitivity is used.
The arrangement of a to 11e will be described. In the grazing incidence interferometer, the measurement sensitivity S indicating how much one interference fringe corresponds to the height difference of the surface to be measured is determined by the normal to the prism reference surface and the prism as shown in FIG. Assuming that the angle between the emitted light and the emitted light is θ, S = λ / 2COSθ. Here, if λ = 655 nm, S = θ = 70.9 °
= 1.0 μm. Similarly, S = 2.0 μm at θ = 80.6 °,
S = 3.0 μm at θ = 83.7 °, S = 4.00 μ at θ = 85.3 °
When m and θ = 86.2 °, S = 5.0 μm.

【0019】したがって、各LD11a〜11eは、そ
の出射光束がコリメーティングレンズ12及びプリズム
13を介して測定面30aに上記の入射角度で入射する
ように設計配置しておけば良い。
Therefore, each of the LDs 11a to 11e may be designed and arranged so that the emitted light beam enters the measurement surface 30a via the collimating lens 12 and the prism 13 at the above-mentioned incident angle.

【0020】なお、コリメーティングレンズ12の焦点
距離を短く設定すると、各LDを配置すべき間隔は狭く
なり、LDのパッケージ同士が干渉して望みの感度を得
る為のライン上の配置が難しい場合がある。この場合は
図3のように各LD11a〜11eを互い違いにずらし
て配置すれば良い(図3は、各LD11a〜11eをコ
リメーティングレンズ12の方向から見た図である)。
測定感度はプリズム参照面から出射した光束が測定面へ
入射する角度θによるが、光線は図1または図2の紙面
内になければならないということはないので、このよう
な配置も可能である。
If the focal length of the collimating lens 12 is set short, the intervals at which the LDs are to be arranged become narrow, and the LD packages interfere with each other, making it difficult to arrange them on a line for obtaining the desired sensitivity. There are cases. In this case, the LDs 11a to 11e may be staggered as shown in FIG. 3 (FIG. 3 is a diagram of the LDs 11a to 11e viewed from the direction of the collimating lens 12).
Although the measurement sensitivity depends on the angle θ at which the light beam emitted from the prism reference surface enters the measurement surface, such an arrangement is also possible because the light beam does not need to be within the paper plane of FIG. 1 or FIG.

【0021】測定感度を変更するときは、コントロール
パネル21にあるスイッチ21aにより所望の測定感度
を選択する。制御部20はスイッチ21aによる選択信
号の入力に応じて光源部10のLD11a〜11eの何
れかを点灯駆動する。測定感度の変更はLDの電気的な
点灯駆動だけで即座に行える。また、機械的な可動部が
無いので、角度ずれによる測定精度の低下や故障の心配
が少ない。
To change the measurement sensitivity, a desired measurement sensitivity is selected by a switch 21a on the control panel 21. The control unit 20 drives one of the LDs 11a to 11e of the light source unit 10 to light up in response to the input of the selection signal by the switch 21a. The measurement sensitivity can be changed immediately only by the electric lighting drive of the LD. In addition, since there is no mechanical movable part, there is little fear of a decrease in measurement accuracy and a failure due to an angle shift.

【0022】LDの点灯によりスクリーン14には、参
照面13aで反射した光束と測定面30aで反射した光
束とにより所望の測定感度を持つ干渉縞が投影される。
この干渉縞がテレビカメラ16により撮像され、画像処
理装置22に入力される。画像処理装置22は撮像され
た画像データに対して所定の画像解析を行う。また、画
像処理装置22にはスイッチ21aにより選択された測
定感度の情報が制御部20を介して入力されるので、画
像解析の結果と測定感度の情報とに基づいて測定面30
aの平坦度の測定結果を算出する。
When the LD is turned on, an interference fringe having a desired measurement sensitivity is projected on the screen 14 by the light beam reflected by the reference surface 13a and the light beam reflected by the measurement surface 30a.
The interference fringes are captured by the television camera 16 and input to the image processing device 22. The image processing device 22 performs a predetermined image analysis on the captured image data. Further, since the information on the measurement sensitivity selected by the switch 21a is input to the image processing device 22 via the control unit 20, the measurement surface 30 is determined based on the result of the image analysis and the information on the measurement sensitivity.
The measurement result of the flatness a is calculated.

【0023】以上説明した実施形態では光源を複数個設
けて構成したが、図4に示すように(先の形態と同一の
要素には同一の符号を付している)、1つのLD11を
使用してその位置を移動装置40により移動することに
より、LD11から出射するレーザ光の出射位置を変化
させ、測定面30aに斜め入射するレーザ光の入射角を
変えるようにしても良い。制御部20はコントロールパ
ネル21からの感度変更の信号により移動装置40を駆
動し、LD11を感度に応じた位置に移動する。この場
合、測定感度は連続可変が可能である。
In the embodiment described above, a plurality of light sources are provided. However, as shown in FIG. 4 (the same elements as those in the previous embodiment are denoted by the same reference numerals), one LD 11 is used. Then, by moving the position by the moving device 40, the emission position of the laser light emitted from the LD 11 may be changed, and the incident angle of the laser light obliquely incident on the measurement surface 30a may be changed. The control unit 20 drives the moving device 40 according to a sensitivity change signal from the control panel 21, and moves the LD 11 to a position corresponding to the sensitivity. In this case, the measurement sensitivity can be continuously varied.

【0024】この形態の場合、測定感度を変更するため
の可動機構としては光源の移動だけで良く、また、光源
として小型のLDを使用することによりその機構を大き
くしなくてすむので、大きな測定面に対しても安価に構
成することができる。
In this embodiment, the movable mechanism for changing the measurement sensitivity only needs to move the light source, and the use of a small LD as the light source does not require the mechanism to be large, so that a large measurement can be performed. It can be configured inexpensively for the surface.

【0025】[0025]

【発明の効果】以上説明したように、本発明によれば、
測定感度切替え用の機構を簡略化して大きな測定面にも
安価に対応できる。
As described above, according to the present invention,
The mechanism for switching the measurement sensitivity can be simplified and a large measurement surface can be inexpensively handled.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る斜入射干渉計の概略構成を示す図
である。
FIG. 1 is a diagram showing a schematic configuration of an oblique incidence interferometer according to the present invention.

【図2】測定感度に対応させて被測定面に斜めに入射さ
せる光の入射角度を説明する図である。
FIG. 2 is a diagram illustrating an incident angle of light obliquely incident on a surface to be measured in accordance with measurement sensitivity.

【図3】光源を配置すべき間隔が狭い場合の配置例を示
す図である。
FIG. 3 is a diagram illustrating an example of an arrangement in a case where an interval at which light sources are to be arranged is small.

【図4】本発明の変容例を示す図である。FIG. 4 is a diagram showing a modification of the present invention.

【図5】従来の斜入射干渉計における測定感度の切替え
機構を示す図である。
FIG. 5 is a diagram showing a mechanism for switching measurement sensitivity in a conventional grazing incidence interferometer.

【符号の説明】[Explanation of symbols]

10 光源部 11a〜11b レーザ光源 12 コリメーティングレンズ 13 プリズム 13a 参照面 14 スクリーン 15 フィールドレンズ 20 制御部 30 被測定物 30a 測定面 DESCRIPTION OF SYMBOLS 10 Light source part 11a-11b Laser light source 12 Collimating lens 13 Prism 13a Reference surface 14 Screen 15 Field lens 20 Control part 30 Object under test 30a Measurement surface

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 測定光源から出射された可干渉光を被測
定面に斜め方向から入射させ、被測定面より反射する反
射光と参照面で反射する前記可干渉光の反射光とにより
干渉縞を得る斜入射干渉計において、前記測定光源から
出射される可干渉光を略平行光束にするために固定配置
された凸レンズと、被測定面に対向した参照面を持ち、
前記凸レンズにより平行光束にされた可干渉光を通過さ
せて被測定面に斜め方向から入射させる光学素子と、異
なる測定感度に対応させて被測定面に斜め入射する可干
渉光の入射角を変えるべく前記測定光源から出射する可
干渉光の出射位置を変化させる出射位置可変手段と、を
備えることを特徴とする斜入射干渉計。
1. A coherent light emitted from a measurement light source is obliquely incident on a surface to be measured, and interference fringes are formed by reflected light reflected from the surface to be measured and reflected light of the coherent light reflected from a reference surface. In a grazing incidence interferometer, a convex lens fixedly arranged to convert the coherent light emitted from the measurement light source into a substantially parallel light beam, and having a reference surface facing the surface to be measured,
An optical element that passes coherent light converted into a parallel light beam by the convex lens and impinges on the surface to be measured from an oblique direction, and changes an incident angle of coherent light obliquely incident on the surface to be measured in accordance with different measurement sensitivities. An oblique-incidence interferometer, comprising: an emission-position changing unit that changes an emission position of the coherent light emitted from the measurement light source.
【請求項2】 請求項1の斜入射干渉計において、前記
測定光源は異なる測定感度に対応させて被測定面に斜め
入射する可干渉光の入射角を変えるべく所定位置に複数
個配置されており、前記出射位置可変手段は複数個の測
定光源の何れかを選択的に点灯する手段であることを特
徴とする斜入射干渉計。
2. A grazing incidence interferometer according to claim 1, wherein a plurality of said measuring light sources are arranged at predetermined positions so as to correspond to different measuring sensitivities and to change an incident angle of coherent light obliquely incident on a surface to be measured. The oblique incidence interferometer is characterized in that the emission position changing means selectively turns on any one of a plurality of measurement light sources.
【請求項3】 請求項1の斜入射干渉計において、前記
出射位置可変手段は前記測定光源を移動させる移動手段
を備えることを特徴とする斜入射干渉計。
3. The grazing incidence interferometer according to claim 1, wherein said emission position changing means includes a moving means for moving said measuring light source.
【請求項4】 請求項3の斜入射干渉計において、さら
に測定感度を選択する選択手段と、該選択手段による選
択信号に基づいて前記移動手段の駆動を制御する移動制
御手段と、を備えることを特徴とする斜入射干渉計。
4. The grazing incidence interferometer according to claim 3, further comprising a selection unit for selecting a measurement sensitivity, and a movement control unit for controlling the driving of the movement unit based on a selection signal from the selection unit. A grazing incidence interferometer, characterized in that
【請求項5】 請求項1〜4の斜入射干渉計において、
前記測定光源は半導体レーザであることを特徴とする斜
入射干渉計。
5. The grazing incidence interferometer according to claim 1, wherein
The grazing incidence interferometer, wherein the measurement light source is a semiconductor laser.
【請求項6】 測定光源から出射された可干渉光を被測
定面に斜め方向から入射させ、被測定面より反射する反
射光と参照面で反射する前記可干渉光の反射光とにより
干渉縞を得る斜入射干渉計において、異なる測定感度に
対応させて被測定面に斜め入射する可干渉光の入射角を
変えるべく所定位置に配置された複数個の測定光源と、
該複数個の測定光源の何れかを選択的に点灯することに
より測定感度を選択する選択手段と、を備えることを特
徴とする斜入射干渉計。
6. Coherent light emitted from a measurement light source is obliquely incident on a surface to be measured, and interference fringes are formed by reflected light reflected from the surface to be measured and reflected light of the coherent light reflected from a reference surface. In a grazing incidence interferometer, a plurality of measurement light sources arranged at predetermined positions to change the incident angle of coherent light obliquely incident on the surface to be measured in accordance with different measurement sensitivities,
Selecting means for selecting measurement sensitivity by selectively turning on one of the plurality of measurement light sources.
【請求項7】 請求項6の斜入射干渉計において、前記
測定光源は半導体レーザであることを特徴とする斜入射
干渉計。
7. The grazing incidence interferometer according to claim 6, wherein the measurement light source is a semiconductor laser.
JP18413898A 1998-06-30 1998-06-30 Oblique incidence interferometer Expired - Fee Related JP3939028B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18413898A JP3939028B2 (en) 1998-06-30 1998-06-30 Oblique incidence interferometer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18413898A JP3939028B2 (en) 1998-06-30 1998-06-30 Oblique incidence interferometer

Publications (2)

Publication Number Publication Date
JP2000018912A true JP2000018912A (en) 2000-01-21
JP3939028B2 JP3939028B2 (en) 2007-06-27

Family

ID=16148045

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18413898A Expired - Fee Related JP3939028B2 (en) 1998-06-30 1998-06-30 Oblique incidence interferometer

Country Status (1)

Country Link
JP (1) JP3939028B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6501552B1 (en) * 1998-12-09 2002-12-31 Nidek Co., Ltd. Oblique incidence interferometer for removing higher-order interference fringes
US7499178B2 (en) 2006-06-30 2009-03-03 Mitutoyo Corporation Oblique incidence interferometer
JP2010112819A (en) * 2008-11-06 2010-05-20 Mitsutoyo Corp Method of correcting measurement sensitivity in oblique incidence interferometer
JP2012145377A (en) * 2011-01-07 2012-08-02 Mitsutoyo Corp Oblique incidence interferometer

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6501552B1 (en) * 1998-12-09 2002-12-31 Nidek Co., Ltd. Oblique incidence interferometer for removing higher-order interference fringes
US7499178B2 (en) 2006-06-30 2009-03-03 Mitutoyo Corporation Oblique incidence interferometer
JP2010112819A (en) * 2008-11-06 2010-05-20 Mitsutoyo Corp Method of correcting measurement sensitivity in oblique incidence interferometer
JP2012145377A (en) * 2011-01-07 2012-08-02 Mitsutoyo Corp Oblique incidence interferometer

Also Published As

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