JP2000007020A - Carrier material for chip electronic part and its manufacture - Google Patents
Carrier material for chip electronic part and its manufactureInfo
- Publication number
- JP2000007020A JP2000007020A JP10188128A JP18812898A JP2000007020A JP 2000007020 A JP2000007020 A JP 2000007020A JP 10188128 A JP10188128 A JP 10188128A JP 18812898 A JP18812898 A JP 18812898A JP 2000007020 A JP2000007020 A JP 2000007020A
- Authority
- JP
- Japan
- Prior art keywords
- chip
- thermoplastic resin
- type electronic
- resin layer
- base material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012876 carrier material Substances 0.000 title claims abstract description 34
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 229920005992 thermoplastic resin Polymers 0.000 claims abstract description 57
- 239000000463 material Substances 0.000 claims abstract description 35
- 238000003860 storage Methods 0.000 claims abstract description 18
- 238000002834 transmittance Methods 0.000 claims abstract description 8
- 238000004080 punching Methods 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 7
- 238000005520 cutting process Methods 0.000 claims description 4
- 230000004927 fusion Effects 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 72
- -1 polyethylene Polymers 0.000 description 19
- 239000003795 chemical substances by application Substances 0.000 description 13
- 239000000123 paper Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 10
- 229920000642 polymer Polymers 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 239000011087 paperboard Substances 0.000 description 7
- 238000001125 extrusion Methods 0.000 description 6
- 238000003475 lamination Methods 0.000 description 6
- 239000004698 Polyethylene Substances 0.000 description 5
- 239000012790 adhesive layer Substances 0.000 description 5
- 229920000573 polyethylene Polymers 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 239000002216 antistatic agent Substances 0.000 description 4
- 238000009823 thermal lamination Methods 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000003851 corona treatment Methods 0.000 description 3
- 230000005611 electricity Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 230000003068 static effect Effects 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229920000089 Cyclic olefin copolymer Polymers 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000003985 ceramic capacitor Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 208000028659 discharge Diseases 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- KWIUHFFTVRNATP-UHFFFAOYSA-N glycine betaine Chemical compound C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 2
- 229920001903 high density polyethylene Polymers 0.000 description 2
- 239000004700 high-density polyethylene Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 229920001684 low density polyethylene Polymers 0.000 description 2
- 239000004702 low-density polyethylene Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 150000004291 polyenes Chemical class 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 239000004711 α-olefin Substances 0.000 description 2
- JNYAEWCLZODPBN-JGWLITMVSA-N (2r,3r,4s)-2-[(1r)-1,2-dihydroxyethyl]oxolane-3,4-diol Chemical compound OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O JNYAEWCLZODPBN-JGWLITMVSA-N 0.000 description 1
- 229920003026 Acene Polymers 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 102100033029 Carbonic anhydrase-related protein 11 Human genes 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- 229920000219 Ethylene vinyl alcohol Polymers 0.000 description 1
- 101000867841 Homo sapiens Carbonic anhydrase-related protein 11 Proteins 0.000 description 1
- 101001075218 Homo sapiens Gastrokine-1 Proteins 0.000 description 1
- 238000012369 In process control Methods 0.000 description 1
- 229920010126 Linear Low Density Polyethylene (LLDPE) Polymers 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 229920000265 Polyparaphenylene Polymers 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 229920006243 acrylic copolymer Polymers 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 229960003237 betaine Drugs 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000011111 cardboard Substances 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000006258 conductive agent Substances 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000009820 dry lamination Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 229920006242 ethylene acrylic acid copolymer Polymers 0.000 description 1
- 229920005648 ethylene methacrylic acid copolymer Polymers 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 229920006244 ethylene-ethyl acrylate Polymers 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 150000002462 imidazolines Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000010965 in-process control Methods 0.000 description 1
- 229910052809 inorganic oxide Inorganic materials 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 229920000554 ionomer Polymers 0.000 description 1
- 229920000092 linear low density polyethylene Polymers 0.000 description 1
- 239000004707 linear low-density polyethylene Substances 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920000553 poly(phenylenevinylene) Polymers 0.000 description 1
- 229920001197 polyacetylene Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000009816 wet lamination Methods 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Landscapes
- Packages (AREA)
- Packaging Frangible Articles (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、チップ型電子部品
(以下、「チップ部品」と略称する場合がある)の搬送
用に使用されるテープ状のチップ型電子部品用キャリア
材とその製造法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a tape-shaped carrier for chip-type electronic components used for transporting chip-type electronic components (hereinafter sometimes abbreviated as "chip components") and a method of manufacturing the same. About.
【0002】[0002]
【従来の技術】チップ固定抵抗器、積層セラミックコン
デンサ等のチップ型電子部品を搬送する方法として、電
子部品搬送用テープを用いるテーピングリール方式が知
られている。図4は従来の電子部品搬送用テープを示す
概略斜視図である。このテーピングリール方式では、チ
ップ型電子部品収納用打抜き角穴14と自動機械送り穴
15とが長さ方向にそれぞれ一定の間隔で形成されたテ
ープ状厚紙(キャリアテープ)11の下面をボトムカバ
ーテープ19で熱シールして収納用ポケットを作製し、
その直後にチップ型電子部品17を前記収納用ポケット
に挿入し、キャリアテープ11の上面をトップカバーテ
ープ16で熱シールしてチップ部品17を封入した後、
リール状に巻取られ搬送される。そして、搬送先の回路
基板等の作製工程においては、トップカバーテープ16
を剥離後、収納されたチップ部品17をエアーノズルで
自動的に吸着して基板上に供給する自動組入れシステム
が主流となっている。なお、上記テーピングリール方式
においては、キャリアテープ11として、予め電子部品
収納用打抜き角穴14と自動機械送り穴15とが作製さ
れた打抜き品を用いる場合と、未打ち抜き品を用い、前
記打抜き角穴14及び自動機械送り穴15を一連のテー
ピングリール工程で形成する場合とがある。2. Description of the Related Art As a method of transporting chip-type electronic components such as chip fixed resistors and multilayer ceramic capacitors, a taping reel system using an electronic component transport tape is known. FIG. 4 is a schematic perspective view showing a conventional electronic component transport tape. In this taping reel system, the lower surface of a tape-shaped cardboard (carrier tape) 11 in which a punched rectangular hole 14 for accommodating a chip-type electronic component and an automatic machine feed hole 15 are formed at regular intervals in the longitudinal direction, respectively. Heat sealing at 19 to make a storage pocket,
Immediately after that, the chip-type electronic component 17 is inserted into the storage pocket, and the top surface of the carrier tape 11 is heat-sealed with the top cover tape 16 to encapsulate the chip component 17.
It is wound and transported in a reel shape. Then, in the process of manufacturing the circuit board or the like of the transfer destination, the top cover tape 16
After peeling off, an automatic assembling system that automatically sucks the stored chip components 17 with an air nozzle and supplies the chip components 17 onto a substrate is mainly used. In the taping reel system, the carrier tape 11 may be a punched product in which a punched square hole 14 for storing electronic components and an automatic machine feed hole 15 are prepared in advance, or a non-punched product may be used. The hole 14 and the automatic machine feed hole 15 may be formed in a series of taping reel steps.
【0003】従来、前記ボトムカバーテープ19とし
て、高圧法ポリエチレン(LDPE)、線状低密度ポリ
エチレン(LLDPE)、エチレン−α−オレフィン共
重合体等の熱可塑性樹脂からなる層(導電剤又は帯電防
止剤を含む場合もある)を、和紙等の支持基材上に設け
たテープが用いられている。しかし、前記テーピングリ
ール方式において、近年の高速テーピング化に伴い、ボ
トムカバーテープ19の熱シール後からチップ部品挿入
までが短時間となったことから、ボトムカバーテープ1
9の熱可塑性樹脂層(接着層)が十分に冷却固化しない
状態でチップ部品17が挿入される。そのため、チップ
部品17がボトムカバーテープ19の接着層表面に、付
着又は融着し、自動組入れシステムにおいて、機械停止
トラブルを引き起こすという欠点があった。Conventionally, as the bottom cover tape 19, a layer (a conductive agent or an antistatic agent) made of a thermoplastic resin such as high-pressure polyethylene (LDPE), linear low-density polyethylene (LLDPE), ethylene-α-olefin copolymer or the like. (Which may contain an agent) on a supporting substrate such as Japanese paper. However, in the above-mentioned taping reel system, the time from heat sealing of the bottom cover tape 19 to insertion of chip components has become short in accordance with recent high-speed taping.
The chip component 17 is inserted in a state where the thermoplastic resin layer (adhesive layer) 9 is not sufficiently cooled and solidified. Therefore, there is a disadvantage that the chip component 17 adheres or fuses to the surface of the adhesive layer of the bottom cover tape 19 and causes a machine stop trouble in the automatic assembly system.
【0004】また、これらの熱的要因以外にも、チップ
部品17の帯電および搬送、輸送途中の振動による静電
気の発生が、益々極小化するチップ部品17の自重の軽
さと相俟って、チップ部品17のボトムカバーテープ1
9への付着を助長していると考えられる。さらに、ボト
ムカバーテープ19をキャリアテープ11に熱シールす
る際、ボトムカバーテープ19を構成する和紙等の支持
基材に含まれる異常厚さ部分においては十分熱が伝わら
ず、ボトムカバーテープ19の接着層に浮きが生じる。
最近の極小チップの出現により、前記接着層の浮きによ
りチップ部品17が収納用ポケットから脱落するおそれ
があり、回路基板等の作製工程への部品供給の信頼性が
低下する懸念がある。また、今後チップ部品が益々小さ
くなることから、回路基板等の作製工程への部品供給時
の工程管理として、ボトムカバーテープ側からのチップ
部品の収納確認の必要性が生じることも十分考えられ
る。[0004] In addition to these thermal factors, the generation of static electricity due to vibrations during charging, transportation and transportation of the chip component 17 is coupled with the minimization of the weight of the chip component 17 which is further minimized. Bottom cover tape 1 for part 17
It is believed that this promoted the adhesion to No. 9. Furthermore, when the bottom cover tape 19 is heat-sealed to the carrier tape 11, heat is not sufficiently transmitted to an abnormally thick portion included in a supporting base material such as Japanese paper constituting the bottom cover tape 19, and the bottom cover tape 19 is adhered. Floating occurs in the layer.
With the recent emergence of extremely small chips, there is a possibility that the chip component 17 may fall out of the storage pocket due to the floating of the adhesive layer, and there is a concern that the reliability of component supply to the manufacturing process of a circuit board or the like may be reduced. In addition, since chip components will become increasingly smaller in the future, it is fully conceivable that the necessity of confirming the storage of chip components from the bottom cover tape side will arise as a process management when supplying components to the manufacturing process of a circuit board or the like.
【0005】[0005]
【発明が解決しようとする課題】したがって、本発明の
目的は、チップ型電子部品を収納して搬送する際に、該
チップ型電子部品の付着又は融着を防止できるチップ型
電子部品用キャリア材とその製造法を提供することにあ
る。本発明の他の目的は、チップ型電子部品が小さくて
もその脱落を防止できるチップ型電子部品用キャリア材
とその製造法を提供することにある。本発明のさらに他
の目的は、チップ型電子部品の収納状態を視認できるチ
ップ型電子部品用キャリア材とその製造法を提供するこ
とにある。SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a chip type electronic component carrier material which can prevent the chip type electronic component from adhering or fusing when the chip type electronic component is stored and transported. And its manufacturing method. Another object of the present invention is to provide a chip-type electronic component carrier material which can prevent the chip-type electronic component from falling off even if the chip-type electronic component is small, and a method of manufacturing the same. It is still another object of the present invention to provide a chip-type electronic component carrier material in which the stored state of the chip-type electronic component can be visually recognized, and a method of manufacturing the same.
【0006】[0006]
【課題を解決するための手段】本発明者らは、前記目的
を達成するため鋭意検討した結果、チップ部品収納用の
孔を形成した基材層の一方の面に、支持基材を伴わない
熱可塑性樹脂層を設けたテープ状のキャリア材を用いる
と、チップ部品の付着を防止できるだけでなく、チップ
部品の脱落をも防ぐことができ、確実に搬送できること
を見出し、本発明を完成した。Means for Solving the Problems The inventors of the present invention have conducted intensive studies to achieve the above object, and have found that one side of a base layer having a hole for accommodating a chip component does not include a supporting base. It has been found that the use of a tape-shaped carrier material provided with a thermoplastic resin layer not only prevents chip components from adhering, but also prevents chip components from falling off, and enables reliable transport, thus completing the present invention.
【0007】すなわち、本発明は、チップ型電子部品を
収納可能な収納孔が長さ方向に所定間隔で形成されてい
る基材層と、該基材層の一方の面に設けられた支持基材
を伴わない熱可塑性樹脂層とで構成されているテープ状
のチップ型電子部品用キャリア材を提供する。That is, the present invention provides a base material layer in which accommodation holes for accommodating chip-type electronic components are formed at predetermined intervals in the length direction, and a support base provided on one surface of the base material layer. Provided is a tape-shaped chip-type electronic component carrier material comprising a thermoplastic resin layer without a material.
【0008】また、本発明は、上記のテープ状のチップ
型電子部品用キャリア材を製造する方法であって、チッ
プ型電子部品を収納可能な収納孔を、幅広のシート状基
材の長さ方向及び幅方向に所定間隔で打ち抜き加工によ
り形成した後、前記シート状基材の一方の面に熱可塑性
樹脂層を設け、次いで所定の幅に裁断するチップ型電子
部品用キャリア材の製造法を提供する。The present invention also relates to a method of manufacturing the above-mentioned tape-shaped carrier for chip-type electronic components, wherein the accommodating holes for accommodating the chip-type electronic components are provided with a length of a wide sheet-like base material. After forming by punching at predetermined intervals in the direction and width direction, a thermoplastic resin layer is provided on one surface of the sheet-like base material, and then cut to a predetermined width to produce a carrier material for chip-type electronic components. provide.
【0009】[0009]
【発明の実施の形態】以下、本発明の実施の形態を、必
要に応じて図面を参照にしつつ詳細に説明する。図1は
本発明のチップ型電子部品用キャリア材の一例の使用状
態を示す概略斜視図である。図2は図1のチップ型電子
部品用キャリア材の使用状態を示す長さ方向の概略断面
図である。図3は本発明のチップ型電子部品用キャリア
材の他の例の使用状態を示す長さ方向の概略断面図であ
る。Embodiments of the present invention will be described below in detail with reference to the drawings as necessary. FIG. 1 is a schematic perspective view showing a use state of an example of a chip-type electronic component carrier material of the present invention. FIG. 2 is a schematic cross-sectional view in a length direction showing a use state of the chip-type electronic component carrier material of FIG. FIG. 3 is a schematic cross-sectional view in the length direction showing a usage state of another example of the carrier material for a chip-type electronic component of the present invention.
【0010】図1及び図2に示される例では、チップ型
電子部品用キャリア材1は、チップ型電子部品7を収納
可能な収納孔4が幅方向の中央部において長さ方向に所
定間隔で形成されている基材層2と、この基材層2の一
方の面に設けられた熱可塑性樹脂層3とで構成されてい
る。前記熱可塑性樹脂層3は和紙などの支持基材を伴っ
ていない。キャリア材1の幅方向側部には、長さ方向に
所定間隔で自動機械送り穴5が形成されている。In the example shown in FIGS. 1 and 2, the chip-type electronic component carrier material 1 has a storage hole 4 for storing the chip-type electronic component 7 at a predetermined interval in the length direction at the center in the width direction. It is composed of a base layer 2 formed and a thermoplastic resin layer 3 provided on one surface of the base layer 2. The thermoplastic resin layer 3 does not have a supporting substrate such as Japanese paper. Automatic machine feed holes 5 are formed in the width direction side portion of the carrier material 1 at predetermined intervals in the length direction.
【0011】基材層2を構成する基材としては、自己支
持性を有するものであればよく、例えば、和紙、クレー
プ紙、合成紙、混抄紙、複合紙などの紙;不織布、布;
ポリエチレン、ポリプロピレン、ポリエチレンテレフタ
レート、ポリ塩化ビニル、セロハンなどで構成されたプ
ラスチックフィルム又はシート;銅、ニッケル、アルミ
ニウム、鉄などの金属で構成された金属箔又は薄板、又
はこれらの積層体などが挙げられる。前記基材として、
紙を用いる場合が多い。基材層2の表面は、慣用の表面
処理、例えば、シリコーン系樹脂やフッ素系樹脂等の剥
離剤などによるコーティング処理や、プライマー処理、
クロム酸処理、コロナ放電処理、オゾン処理、火炎処
理、電子線照射、プラズマ処理等の化学的又は物理的処
理がなされていてもよい。The base material constituting the base layer 2 may be any material having a self-supporting property, for example, paper such as Japanese paper, crepe paper, synthetic paper, mixed paper, composite paper; non-woven fabric, cloth;
Plastic films or sheets composed of polyethylene, polypropylene, polyethylene terephthalate, polyvinyl chloride, cellophane, etc .; metal foils or thin plates composed of metals such as copper, nickel, aluminum, iron, etc., and laminates thereof . As the base material,
Paper is often used. The surface of the base material layer 2 is subjected to a conventional surface treatment, for example, a coating treatment with a release agent such as a silicone resin or a fluorine resin, a primer treatment,
Chemical or physical treatment such as chromic acid treatment, corona discharge treatment, ozone treatment, flame treatment, electron beam irradiation, and plasma treatment may be performed.
【0012】基材層2の厚みは、機械的強度、ハンドリ
ング性、部品保持性などが損なわれない範囲で適宜選択
でき、例えば100〜3000μm、好ましくは200
〜1500μm程度である。収納孔4の大きさは、収納
すべきチップ型電子部品の大きさに応じて適宜設定でき
るが、通常、キャリア材1の長さ方向及び幅方向にそれ
ぞれ0.3〜5mm程度、好ましくは0.5〜3mm程
度の大きさである。収納孔4の間隔及び自動機械送り穴
5の間隔は、ハンドリング性等を損なわない範囲で選択
でき、例えば、キャリア材の長さ方向にそれぞれ1〜1
0mm程度、好ましくは2〜8mm程度である。The thickness of the base material layer 2 can be appropriately selected within a range where the mechanical strength, handleability, component holding property, etc. are not impaired, and is, for example, 100 to 3000 μm, preferably 200 to 3000 μm.
程度 1500 μm. The size of the storage hole 4 can be appropriately set according to the size of the chip-type electronic component to be stored, but is usually about 0.3 to 5 mm in the length direction and the width direction of the carrier material 1, preferably 0 to 5 mm. The size is about 0.5 to 3 mm. The interval between the storage holes 4 and the interval between the automatic machine feed holes 5 can be selected within a range that does not impair the handling property and the like.
It is about 0 mm, preferably about 2 to 8 mm.
【0013】熱可塑性樹脂層3を構成する熱可塑性樹脂
としては、被膜形成能を有する種々の熱可塑性樹脂、例
えば、ポリオレフィン系樹脂[例えば、ポリエチレン
(高密度ポリエチレン、低圧法ポリエチレン、高圧法ポ
リエチレン、線状低密度ポリエチレンなど)、ポリプロ
ピレン、エチレン−α−オレフィン共重合体(エチレン
−プロピレン共重合体など)、エチレン−酢酸ビニル共
重合体、エチレン−アクリル系共重合体(エチレン−ア
クリル酸エチル共重合体、エチレン−メタクリル酸グリ
シジル共重合体、エチレン−アクリル酸共重合体、エチ
レン−メタクリル酸共重合体、アイオノマ−等)な
ど]、ポリエステル系樹脂(例えば、ポリエチレンテレ
フタレート、ポリブチレンテレフタレートなど)、ポリ
スチレン系樹脂、ポリビニルアルコール系樹脂(ポリビ
ニルアルコール、エチレン−ビニルアルコール共重合体
など)、ポリ塩化ビニル系樹脂、ポリ塩化ビニリデン系
樹脂、フッ素系樹脂、セルロース系樹脂、ポリカーボネ
ート系樹脂、ポリアミド系樹脂などが挙げられる。これ
らの熱可塑性樹脂は、単独で又は2種以上を組み合わせ
て使用できる。Examples of the thermoplastic resin constituting the thermoplastic resin layer 3 include various thermoplastic resins having a film forming ability, for example, polyolefin resins [for example, polyethylene (high-density polyethylene, low-pressure polyethylene, high-pressure polyethylene, Linear low-density polyethylene, etc.), polypropylene, ethylene-α-olefin copolymer (ethylene-propylene copolymer, etc.), ethylene-vinyl acetate copolymer, ethylene-acrylic copolymer (ethylene-ethyl acrylate copolymer) Polymers, ethylene-glycidyl methacrylate copolymer, ethylene-acrylic acid copolymer, ethylene-methacrylic acid copolymer, ionomer, etc.), polyester resins (eg, polyethylene terephthalate, polybutylene terephthalate, etc.), Polystyrene resin, polyvinyl Alcohol-based resin (polyvinyl alcohol, ethylene - vinyl alcohol copolymer), polyvinyl chloride resin, polyvinylidene chloride resin, fluorine resin, cellulose resins, polycarbonate resins, and polyamide resins. These thermoplastic resins can be used alone or in combination of two or more.
【0014】熱可塑性樹脂層3の厚みは、機械的強度や
ハンドリング性などを考慮して適宜設定できるが、一般
には5〜150μm程度、好ましくは10〜100μm
程度である。熱可塑性樹脂層3の軟化点は、例えば60
〜290℃程度である。また、熱可塑性樹脂層3の全光
線(可視光線)透過率は、70%以上、特に80%以上
であるのが好ましい。熱可塑性樹脂層3の全光線透過率
が高い場合には、収納孔4にチップ型電子部品7が収納
されているか否かを容易に視認でき、工程管理上有利と
なる。The thickness of the thermoplastic resin layer 3 can be appropriately set in consideration of mechanical strength, handleability and the like, but is generally about 5 to 150 μm, preferably 10 to 100 μm.
It is about. The softening point of the thermoplastic resin layer 3 is, for example, 60
~ 290 ° C. Further, the total light (visible light) transmittance of the thermoplastic resin layer 3 is preferably 70% or more, particularly preferably 80% or more. When the total light transmittance of the thermoplastic resin layer 3 is high, whether or not the chip-type electronic component 7 is stored in the storage hole 4 can be easily visually recognized, which is advantageous in process management.
【0015】キャリア材1の幅は、ハンドリング性を損
なわない範囲で設定でき、搬送するチップ型電子部品の
大きさ等によっても異なるが、例えば3〜50mm、好
ましくは4〜20mm程度である。The width of the carrier material 1 can be set within a range that does not impair the handling property and varies depending on the size of the chip-type electronic component to be conveyed, but is, for example, about 3 to 50 mm, preferably about 4 to 20 mm.
【0016】図中、6はトップカバーテープを示し、例
えばテーピングリール工程において、収納孔4と熱可塑
性樹脂層3とにより形成されたチップ部品収納用ポケッ
トにチップ部品7を挿入した後、基材層2側の面に熱シ
ール法などにより接着される。このトップカバーテープ
6はチップ部品4の落下や塵芥がチップ部品4に付着す
るのを防止する機能を有する。In the drawing, reference numeral 6 denotes a top cover tape, for example, in a taping reel process, after a chip component 7 is inserted into a chip component storage pocket formed by the storage hole 4 and the thermoplastic resin layer 3, and then a base material is formed. It is bonded to the surface on the layer 2 side by a heat sealing method or the like. The top cover tape 6 has a function of preventing the chip component 4 from falling and dust from adhering to the chip component 4.
【0017】上記チップ型電子部品用キャリア材1によ
れば、収納孔4が形成された基材層2の一方の面に熱可
塑性樹脂層3が設けられており、テーピングリール工程
に供給する前に、すでに収納孔4と熱可塑性樹脂層3と
によりチップ部品収納用ポケットが形成されている。そ
のため、従来のように熱可塑性樹脂層が十分固化してい
ない状態でチップ部品が挿入されるということがなく、
チップ部品が接着層に付着又は融着するのを防止でき
る。また、熱可塑性樹脂層3は和紙などの支持基材を伴
っていないので、例えば熱可塑性樹脂層3を基材層2に
サーマルラミネーションにより積層する場合にも、熱伝
導が確実になされ、浮きが発生することなくラミネート
できる。そのため、前記収納用ポケットに収納されたチ
ップ部品4が脱落することがほとんどない。According to the chip-type electronic component carrier material 1, the thermoplastic resin layer 3 is provided on one surface of the base material layer 2 in which the accommodating holes 4 are formed. In addition, a chip component storage pocket is already formed by the storage hole 4 and the thermoplastic resin layer 3. Therefore, unlike the conventional case, the chip component is not inserted in a state where the thermoplastic resin layer is not sufficiently solidified,
Adhesion or fusion of the chip component to the adhesive layer can be prevented. Further, since the thermoplastic resin layer 3 does not have a supporting base material such as Japanese paper, even when the thermoplastic resin layer 3 is laminated on the base material layer 2 by thermal lamination, for example, heat conduction is ensured and floating is achieved. Lamination can be performed without generation. Therefore, the chip components 4 stored in the storage pockets hardly fall off.
【0018】図3に示されるチップ型電子部品用キャリ
ア材1は、基材層2と熱可塑性樹脂層3との間に静電防
止層8が形成されている点で、図1及び図2に示される
チップ型電子部品用キャリア材と相違する。The carrier material 1 for a chip-type electronic component shown in FIG. 3 has an antistatic layer 8 formed between a base material layer 2 and a thermoplastic resin layer 3 in that it is shown in FIGS. Is different from the chip-type electronic component carrier material shown in FIG.
【0019】静電防止層8は、例えば、導電性付与剤と
被膜形成能を有する樹脂とで構成できる。なお、導電性
付与剤自体が被膜形成能を有する場合には、導電性付与
剤のみで構成することもできる。The antistatic layer 8 can be composed of, for example, a conductivity-imparting agent and a resin having a film forming ability. In addition, when the conductivity imparting agent itself has a film forming ability, it can be constituted only by the conductivity imparting agent.
【0020】前記導電性付与剤としては、銅、ニッケ
ル、アルミニウム、鉄などの金属の微粉末又は繊維;カ
ーボンブラックなどのカーボン粉末又は繊維;導電性酸
化スズ、シリカ、酸化亜鉛などの無機酸化物;アニオン
系帯電防止剤(アルキルサルフェート系、アルキルアリ
ールサルフェート系、アルキルホスフェート系、アルキ
ルアミンサルフェート系など)、カチオン系帯電防止剤
(第4級アンモニウム塩系、第4級アンモニウム樹脂
系、イミダゾリン系など)、非イオン系帯電防止剤(ソ
ルビタン系、エーテル系、アミン及びアミド系、エタノ
ールアミド系、ポリエチレングリコール系など)、両性
系帯電防止剤(ベタイン系など)などの帯電防止剤;T
CNQ、ポリエン系ポリマー(ポリアセチレンなど)、
芳香族ポリマー[ポリ(p−フェニレン)、ポリ(2,
6−ナフタレン)など]、複素環ポリマー[ポリピロー
ル、ポリ(2,5−チエニレン)、ポリ(ピリジン−
2,5−ジイル)など]、複素鎖状ポリマー(ポリフェ
ニレンスルフィド、ポリアニリンなど)、共重合型ポリ
マー(ポリフェニレンビニレン、ポリジチエニルポリエ
ンなど)、ラダーポリマー(ポリアセンなど)などの導
電性高分子(有機半導体高分子)などが挙げられる。導
電性付与剤は、1種のみ用いてもよく、2種以上を併用
してもよい。前記被膜形成能を有する樹脂としては、前
記例示の熱可塑性樹脂などが挙げられる。Examples of the conductivity-imparting agent include fine powders or fibers of metals such as copper, nickel, aluminum and iron; carbon powders and fibers such as carbon black; and inorganic oxides such as conductive tin oxide, silica and zinc oxide. Anionic antistatic agents (such as alkyl sulfates, alkylaryl sulfates, alkyl phosphates, and alkylamine sulfates), and cationic antistatics (quaternary ammonium salts, quaternary ammonium resins, and imidazolines). ), Nonionic antistatic agents (such as sorbitan, ether, amine and amide, ethanolamide, and polyethylene glycol), and amphoteric antistatic agents (such as betaine); T
CNQ, polyene-based polymer (such as polyacetylene),
Aromatic polymers [poly (p-phenylene), poly (2,
6-naphthalene)], a heterocyclic polymer [polypyrrole, poly (2,5-thienylene), poly (pyridine-
Conductive polymers (organic semiconductors) such as hetero-chain polymers (polyphenylene sulfide, polyaniline, etc.), copolymerized polymers (polyphenylene vinylene, polydithienyl polyene, etc.), ladder polymers (polyacene, etc.) Polymer). The conductivity imparting agent may be used alone or in combination of two or more. Examples of the resin having a film forming ability include the thermoplastic resins exemplified above.
【0021】静電防止層8中の導電性付与剤の含有量
は、キャリア材1の機械的強度や透明性などを考慮して
適宜設定でき、導電性付与剤の種類によっても異なる
が、一般には0.1〜70重量%程度である。The content of the conductivity-imparting agent in the antistatic layer 8 can be appropriately set in consideration of the mechanical strength and transparency of the carrier material 1, and varies depending on the type of the conductivity-imparting agent. Is about 0.1 to 70% by weight.
【0022】静電防止層8の厚みは、例えば0.01〜
50μm、好ましくは0.1〜30μm程度である。静
電防止層8は、収納孔4の部位に収納されるチップ型電
子部品7の視認性を高めるため、透明であるのが好まし
い。例えば、熱可塑性樹脂層3と静電防止層8の2層を
透過する全光線透過率は、好ましくは70%以上、さら
に好ましくは80%以上である。The thickness of the antistatic layer 8 is, for example, 0.01 to
It is 50 μm, preferably about 0.1 to 30 μm. The antistatic layer 8 is preferably transparent in order to increase the visibility of the chip-type electronic component 7 stored in the storage hole 4. For example, the total light transmittance transmitted through the two layers of the thermoplastic resin layer 3 and the antistatic layer 8 is preferably 70% or more, more preferably 80% or more.
【0023】なお、静電防止層8は、必ずしも基材層2
と熱可塑性樹脂層3との間に設ける必要はなく、熱可塑
性樹脂層3の外側に形成してもよい。また、静電防止層
8を独立して設けることなく、熱可塑性樹脂層3に前記
導電性付与剤を添加することにより静電防止機能を持た
せることもできる。The antistatic layer 8 is not necessarily formed on the base material layer 2.
It is not necessary to provide between the thermoplastic resin layer 3 and it, and it may be formed outside the thermoplastic resin layer 3. Further, the antistatic function can be provided by adding the above-described conductivity imparting agent to the thermoplastic resin layer 3 without independently providing the antistatic layer 8.
【0024】静電防止層8を設けることにより、又は、
熱可塑性樹脂層3に導電性付与剤を含有させることによ
り、キャリア材1のうち熱可塑性樹脂層3側の表面抵抗
を大きく低減できる。例えば、前記表面抵抗を102〜
1013Ω程度にまで減少させることができる。このよう
なキャリア材では、搬送、輸送中の振動等による静電気
の発生を顕著に抑制できるため、チップ型電子部品の付
着をより確実に防止できる。したがって、例えば自動組
み入れシステムにおける回路基板等の作製工程へのチッ
プ部品の供給を確実に行うことが可能となる。By providing an antistatic layer 8, or
By including a conductivity-imparting agent in the thermoplastic resin layer 3, the surface resistance of the carrier material 1 on the thermoplastic resin layer 3 side can be greatly reduced. For example, the surface resistance is 10 2 to
It can be reduced to about 10 13 Ω. With such a carrier material, generation of static electricity due to vibration during transportation or transportation can be significantly suppressed, and thus, adhesion of chip-type electronic components can be more reliably prevented. Therefore, for example, it is possible to reliably supply chip components to a process of manufacturing a circuit board or the like in an automatic assembly system.
【0025】本発明のチップ型電子部品キャリア材は、
チップ型電子部品を収納可能な収納孔を、幅広のシート
状基材の長さ方向及び幅方向に所定間隔で打ち抜き加工
により形成した後、前記シート状基材の一方の面に熱可
塑性樹脂層を設け、次いで所定の幅に裁断することによ
り製造できる。The chip-type electronic component carrier material of the present invention comprises:
After forming a storage hole capable of storing the chip-type electronic component by punching at predetermined intervals in the length direction and the width direction of the wide sheet-shaped base material, a thermoplastic resin layer is formed on one surface of the sheet-shaped base material. And then cut to a predetermined width.
【0026】打ち抜き加工及び裁断(スリット)は、慣
用の打ち抜き手段及び裁断手段により行うことができ
る。シート状基材と熱可塑性樹脂層との積層は、例え
ば、熱可塑性樹脂を含む樹脂組成物をTダイなどにより
シート状基材上に溶融押し出しする押し出しラミネーシ
ョン、熱可塑性樹脂で構成されたフィルム又はシートを
熱ロールによりシート状基材表面に熱融着させるサーマ
ルラミネーション、適当な接着剤を用いてシート状基材
と熱可塑性樹脂で構成されたフィルム又はシートとを貼
り合わせるドライラミネーション又はウエットラミネー
ションなどにより行うことができる。好ましい積層法に
は、押し出しラミネーション及びサーマルラミネーショ
ンが含まれる。The punching and cutting (slit) can be performed by conventional punching means and cutting means. The lamination of the sheet-like base material and the thermoplastic resin layer is, for example, an extrusion lamination in which a resin composition containing a thermoplastic resin is melt-extruded onto a sheet-like base material by a T-die or the like, a film formed of a thermoplastic resin or Thermal lamination in which the sheet is thermally fused to the surface of the sheet-like substrate by a heat roll, dry lamination or wet lamination in which the sheet-like substrate is bonded to a film or sheet made of a thermoplastic resin using an appropriate adhesive, or the like. Can be performed. Preferred lamination methods include extrusion lamination and thermal lamination.
【0027】なお、図3に示されるような静電防止層8
は、例えば、熱可塑性樹脂で構成されたフィルム又はシ
ートの表面に、導電性付与剤を含むコーティング液をコ
ーティングしたり、導電性付与剤を含む樹脂組成物を溶
融押し出し(又は共押出し)するなどして、予め静電防
止層8と熱可塑性樹脂層3との積層体を成形し、この積
層体を上記積層法(例えば、サーマルラミネーションな
ど)を用いてシート状基材2上にラミネートすることに
より設けることができる。また、静電防止層8を熱可塑
性樹脂層3の外側に設ける場合には、シート状基材2の
表面に熱可塑性樹脂層3を設けた後、この熱可塑性樹脂
層3の表面にコーティング法などにより静電防止層8を
形成することもできる。The antistatic layer 8 as shown in FIG.
For example, the surface of a film or sheet made of a thermoplastic resin is coated with a coating solution containing a conductivity-imparting agent, or a resin composition containing a conductivity-imparting agent is melt-extruded (or co-extruded). Then, a laminate of the antistatic layer 8 and the thermoplastic resin layer 3 is formed in advance, and the laminate is laminated on the sheet-like substrate 2 by using the above-described lamination method (for example, thermal lamination). Can be provided. When the antistatic layer 8 is provided outside the thermoplastic resin layer 3, the thermoplastic resin layer 3 is provided on the surface of the sheet-like base material 2, and then the surface of the thermoplastic resin layer 3 is coated by a coating method. For example, the antistatic layer 8 can be formed.
【0028】自動機械送り穴5は、例えば、シート状基
材1の一方の面に熱可塑性樹脂層3を設けた後、所定の
幅に裁断する前に形成してもよく、所定の幅に裁断した
後に形成してもよい。自動機械送り穴5の形成は、慣用
の穴あけ手段により行うことができる。The automatic machine feed hole 5 may be formed, for example, after the thermoplastic resin layer 3 is provided on one surface of the sheet-like base material 1 and before the sheet is cut into a predetermined width. It may be formed after cutting. The formation of the automatic machine feed hole 5 can be performed by a conventional drilling means.
【0029】本発明のチップ型電子部品キャリア材は、
チップ固定抵抗器などの抵抗器、積層セラミックコンデ
ンサなどのコンデンサ等の広範なチップ型電子部品の搬
送に好適に使用できる。The chip-type electronic component carrier material of the present invention comprises:
It can be suitably used to transport a wide range of chip-type electronic components such as resistors such as chip fixed resistors and capacitors such as multilayer ceramic capacitors.
【0030】[0030]
【発明の効果】本発明によれば、熱可塑性樹脂層が完全
に冷却、固化された状態で使用に供されるので、チップ
型電子部品を収納して搬送する際に、該チップ型電子部
品のキャリア材への付着又は融着を防止できる。また、
基材層の一方の面に、支持基材を伴うことなく熱可塑性
樹脂層を設けるので、基材層と熱可塑性樹脂層との接合
が確実に行われる。そのため、チップ型電子部品が小さ
くても脱落するおそれがない。さらに、熱可塑性樹脂層
の全光線透過率が70%以上である場合には、工程管理
において、キャリア材の下面側からの部品収納確認の認
識精度が向上する。また、熱可塑性樹脂層側の表面抵抗
が102〜1013Ωである場合には、搬送、輸送中の振
動等により発生する静電気に起因するチップ部品の付着
を防止できるため、自動組み入れシステムにおいて、回
路基板等の作製工程にチップ型電子部品を確実に供給で
きる。According to the present invention, since the thermoplastic resin layer is used in a completely cooled and solidified state, the chip-type electronic component can be stored and transported when the chip-type electronic component is stored and transported. Can be prevented from adhering or fusing to the carrier material. Also,
Since the thermoplastic resin layer is provided on one surface of the base material layer without the supporting base material, the bonding between the base material layer and the thermoplastic resin layer is reliably performed. Therefore, even if the chip-type electronic component is small, there is no risk of falling off. Further, when the total light transmittance of the thermoplastic resin layer is 70% or more, recognition accuracy of component storage confirmation from the lower surface side of the carrier material is improved in process control. Further, when the surface resistance of the thermoplastic resin layer side is 10 2 to 10 13 Ω, adhesion of chip components due to static electricity generated by vibration during transportation and transportation can be prevented. In addition, chip-type electronic components can be reliably supplied to a process of manufacturing a circuit board or the like.
【0031】[0031]
【実施例】以下、本発明を実施例に基づいてより詳細に
説明するが、本発明はこれらの実施例により限定される
ものではない。EXAMPLES Hereinafter, the present invention will be described in more detail with reference to examples, but the present invention is not limited to these examples.
【0032】実施例1 厚さ0.6mm、坪量485g/m2の板紙に、長さ方
向に約1.5mm、幅方向に約2mmの大きさのチップ
部品収納用角穴を、長さ方向に4mm等間隔で全幅方向
に亘り打抜き加工した。この板紙の一方の面をコロナ放
電処理し、コロナ放電処理面に、Tダイ押出しラミネー
ターにより、ダイ下温度250℃の熱溶融状態にあるL
DPE(三井石油化学工業株式会社製;商品名:ミラソ
ン10P)を40μmの厚さにラミネートした後、ロー
ルに巻き取って巻取り品を得た。次に、先に形成したチ
ップ部品収納用角穴の隣接する二穴の中間部において、
角穴の長さ方向に平行な一辺より外側に約1.5mm離
隔した位置に、自動機械送り用穴を長さ方向に4mm等
間隔で設けた後、チップ部品収納用角穴および自動機械
送り穴を含むように8mm幅にスリットし、キャリアテ
ープを得た。Example 1 A square hole for storing chip parts having a size of about 1.5 mm in the length direction and about 2 mm in the width direction was formed on a paperboard having a thickness of 0.6 mm and a basis weight of 485 g / m 2. Punching was performed over the entire width direction at regular intervals of 4 mm in the direction. One surface of the paperboard is subjected to corona discharge treatment, and the corona discharge-treated surface is heated by a T-die extrusion laminator to a temperature of 250 ° C. under the die in a molten state.
After DPE (manufactured by Mitsui Petrochemical Industries, Ltd .; trade name: Mirason 10P) was laminated to a thickness of 40 μm, it was wound around a roll to obtain a rolled product. Next, at an intermediate portion between two adjacent holes of the previously formed chip component storing square hole,
A hole for automatic machine feed is provided at a distance of about 1.5 mm outside of one side parallel to the length direction of the square hole at an equal interval of 4 mm in the length direction. The carrier tape was obtained by slitting to a width of 8 mm so as to include the holes.
【0033】実施例2 厚さ0.4mm、坪量320g/m2の板紙に、長さ方
向に約1.5mm、幅方向に約2mmの大きさのチップ
部品収納用角穴を、長さ方向に2mm等間隔で全幅方向
に亘り打抜き加工した。この板紙の一方の面をコロナ放
電処理し、コロナ放電処理面に、Tダイ押出しラミネー
ターにより、ダイ下温度280℃の熱溶融状態にあるP
P(三井石油化学工業株式会社製;商品名:ハイポール
LA221)を40μmの厚さにラミネートした後、ロ
ールに巻き取って巻取り品を得た。次に、先に形成した
チップ部品収納用角穴の隣接する二穴の中間部におい
て、角穴の長さ方向に平行な一辺より外側に約2mm離
隔した位置に、自動機械送り用穴を長さ方向に4mm等
間隔で設けた後、チップ部品収納用角穴および自動機械
送り穴を含むように8mm幅にスリットし、キャリアテ
ープを得た。Example 2 A square hole for storing chip components having a size of about 1.5 mm in the length direction and about 2 mm in the width direction was formed on a paperboard having a thickness of 0.4 mm and a basis weight of 320 g / m 2. Punching was performed over the entire width direction at equal intervals in the direction of 2 mm. One surface of the paperboard is subjected to corona discharge treatment, and the corona discharge-treated surface is heated by a T-die extrusion laminator to a P-melted state at a temperature below the die of 280 ° C.
After laminating P (manufactured by Mitsui Petrochemical Industry Co., Ltd .; trade name: Hypol LA221) to a thickness of 40 μm, it was wound up on a roll to obtain a rolled product. Next, in the intermediate portion between two adjacent holes of the previously formed chip component storing square hole, an automatic machine feed hole is extended at a position about 2 mm outside of a side parallel to the longitudinal direction of the square hole and separated by a length. After being provided at regular intervals of 4 mm in the vertical direction, the tape was slit into a width of 8 mm so as to include a square hole for storing chip components and an automatic machine feed hole to obtain a carrier tape.
【0034】実施例3 厚さ0.6mm、坪量485g/m2の板紙に、長さ方
向に約1.5mm、幅方向に約2mmの大きさのチップ
部品収納用角穴を、長さ方向に4mm等間隔で全幅方向
に亘り打抜き加工した。一方、厚さ40μmのHDPE
フィルム(三井石油化学工業株式会社製;商品名:ハイ
ゼックス3300F)に静電防止接着剤(アルテック株
式会社製;商品名:ボンディップ−PA)を5μm厚に
塗布し、乾燥させてシートを得た。このシートの静電防
止接着剤塗布面側を、熱ラミネートロールにより、前記
チップ部品収納用角穴を加工した板紙に熱融着し、ロー
ルに巻き取って巻取り品を得た。次に、先に形成したチ
ップ部品収納用角穴の隣接する二穴の中間部において、
角穴の長さ方向に平行な一辺より外側に約1.5mm離
隔した位置に、自動機械送り用穴を長さ方向に4mm等
間隔で設けた後、チップ部品収納用角穴および自動機械
送り穴を含むように8mm幅にスリットし、キャリアテ
ープを得た。Example 3 A square hole for storing chip components having a size of about 1.5 mm in the length direction and about 2 mm in the width direction was formed on a paperboard having a thickness of 0.6 mm and a basis weight of 485 g / m 2. Punching was performed over the entire width direction at regular intervals of 4 mm in the direction. On the other hand, HDPE with a thickness of 40 μm
A film (manufactured by Mitsui Petrochemical Industry Co., Ltd .; trade name: Hizex 3300F) was coated with an antistatic adhesive (manufactured by Altec Co., Ltd .; trade name: Bondip-PA) to a thickness of 5 μm and dried to obtain a sheet. . The surface of the sheet on which the antistatic adhesive was applied was heat-sealed with a heat laminating roll to a paperboard on which the square holes for storing chip components had been processed, and the roll was rolled up to obtain a rolled product. Next, at an intermediate portion between two adjacent holes of the previously formed chip component storing square hole,
A hole for automatic machine feed is provided at a distance of about 1.5 mm outside of one side parallel to the length direction of the square hole at an equal interval of 4 mm in the length direction. The carrier tape was obtained by slitting to a width of 8 mm so as to include the holes.
【0035】比較例1 Tダイ押出しラミネーターにより、和紙(坪量20g/
m2、厚み40μm)にLDPE(三菱化学株式会社
製;商品名:LC607)を、厚み20μmとなるよう
に押出しラミネートした後、5.5mm幅にスリットし
てボトムテープを得た。一方、幅8mm、厚さ0.6m
m、坪量485g/m2の板紙に、長さ方向に約1.5
mm、幅方向に約2mmの大きさのチップ部品収納用角
穴を、長さ方向に4mm等間隔で打抜き加工して、キャ
リアテープを作製した。Comparative Example 1 Using a T-die extrusion laminator, Japanese paper (basis weight 20 g /
m 2, the LDPE (manufactured by Mitsubishi Chemical Corporation thickness 40 [mu] m); trade name: LC607 a), was extrusion laminated in a thickness of 20 [mu] m, to obtain a bottom tape was slit to 5.5mm widths. On the other hand, width 8mm, thickness 0.6m
m, paperboard having a basis weight of 485 g / m 2 ,
A chip hole for storing chip components having a size of about 2 mm in the width direction and about 2 mm in the width direction was punched at regular intervals of 4 mm in the length direction to prepare a carrier tape.
【0036】評価試験 実施例1〜3については、得られたキャリアテープのチ
ップ部品収納用角穴部にチップ部品を挿入し、トップカ
バーテープを熱シールしてチップ部品を封じた後、リー
ル状に巻き取ったものをサンプルとした。Evaluation Test In Examples 1 to 3, the chip components were inserted into the square holes for accommodating the chip components of the obtained carrier tape, and the top cover tape was heat-sealed to seal the chip components. Was taken as a sample.
【0037】比較例1については、従来のテーピングリ
ール方式に基づき、前記キャリアテープの一方の面に前
記ボトムテープを熱シールした後、チップ部品収納用角
穴部にチップ部品を挿入し、トップカバーテープを熱シ
ールしてチップ部品を封じ、リール状に巻き取ったもの
をサンプルとした。In Comparative Example 1, based on the conventional taping reel system, the bottom tape was heat-sealed on one surface of the carrier tape, and then the chip component was inserted into the square hole for storing the chip component. The tape was heat-sealed to seal the chip components, and the tape was wound into a reel to obtain a sample.
【0038】これらのサンプルにつき、以下の評価試験
を行った。結果を表1に示す。 [チップ付着性]サンプルを、トップカバーテープ側が
地面を向くように保持しつつトップカバーテープを剥離
し、その時の落下しないチップ部品数(すなわち、キャ
リアテープに付着しているチップ部品数)を数えた。ま
た、輸送工程を経たサンプルにつき、上記と同様の操作
を行い、落下しないチップ部品数を数えた。 [チップ脱落]リール状に巻取られたサンプルについ
て、チップ部品収納用角穴部に収納されていないチップ
部品数(すなわち、脱落したチップ部品数)を数えた。 [全光線透過率]実施例1〜3については熱可塑性樹脂
層(但し、実施例3では熱可塑性樹脂層+静電防止接着
剤層)の全光線透過率を、比較例1についてはボトムテ
ープの全光線透過率を、それぞれヘイズメーターにより
測定した。The following evaluation tests were performed on these samples. Table 1 shows the results. [Chip adhesion] While holding the sample with the top cover tape side facing the ground, peel off the top cover tape and count the number of chip components that do not fall off at that time (that is, the number of chip components adhering to the carrier tape). Was. In addition, the same operation as described above was performed on the sample that had undergone the transportation step, and the number of chip components that did not fall was counted. [Dropping of chips] The number of chip components not stored in the square hole for storing chip components (that is, the number of dropped chip components) was counted for the sample wound in a reel shape. [Total light transmittance] The total light transmittance of the thermoplastic resin layer in Examples 1 to 3 (however, the thermoplastic resin layer + the antistatic adhesive layer in Example 3), and the bottom tape for Comparative Example 1 Was measured by a haze meter.
【0039】[0039]
【表1】 [Table 1]
【図1】本発明のチップ型電子部品用キャリア材の一例
の使用状態を示す概略斜視図である。FIG. 1 is a schematic perspective view showing a use state of an example of a carrier material for a chip-type electronic component of the present invention.
【図2】図1のチップ型電子部品用キャリア材の使用状
態を示す長さ方向の概略断面図である。FIG. 2 is a schematic cross-sectional view in a length direction showing a use state of the chip-type electronic component carrier material of FIG. 1;
【図3】本発明のチップ型電子部品用キャリア材の他の
例の使用状態を示す長さ方向の概略断面図である。FIG. 3 is a schematic cross-sectional view in a length direction showing a use state of another example of the carrier material for a chip-type electronic component of the present invention.
【図4】従来の電子部品搬送用テープを示す概略斜視図
である。FIG. 4 is a schematic perspective view showing a conventional electronic component transport tape.
【符号の説明】 1,11 チップ型電子部品用キャリア材(キャリアテー
プ) 2 基材層 3 熱可塑性樹脂層 4,14 収納孔 5,15 自動機械送り穴 6,16 トップカバーテープ 7,17 チップ型電子部品 8 静電防止層 19 ボトムカバーテープ[Description of Signs] 1,11 Carrier material (carrier tape) for chip-type electronic components 2 Base material layer 3 Thermoplastic resin layer 4,14 Housing hole 5,15 Automatic machine feed hole 6,16 Top cover tape 7,17 Chip Type electronic parts 8 Antistatic layer 19 Bottom cover tape
フロントページの続き (72)発明者 市川 浩樹 大阪府茨木市下穂積一丁目1番2号 日東 電工株式会社内 Fターム(参考) 3E067 AA11 AB41 AC04 AC18 BA02A BB01A BB14A BB26A BC04A BC07A CA11 CA24 EA06 EB27 EC07 EE46 FA09 FB20 FC01 3E096 AA06 BA08 BB05 CA15 CB02 DA04 EA01X EA02X EA11X FA07 FA12 FA26 FA27 GA07Continuation of front page (72) Inventor Hiroki Ichikawa 1-2-1, Shimohozumi, Ibaraki-shi, Osaka Nitto Denko Corporation F-term (reference) 3E067 AA11 AB41 AC04 AC18 BA02A BB01A BB14A BB26A BC04A BC07A CA11 CA24 EA06 EB27 EC07 EE46 FA09 FB20 FC01 3E096 AA06 BA08 BB05 CA15 CB02 DA04 EA01X EA02X EA11X FA07 FA12 FA26 FA27 GA07
Claims (5)
長さ方向に所定間隔で形成されている基材層と、該基材
層の一方の面に設けられた支持基材を伴わない熱可塑性
樹脂層とで構成されているテープ状のチップ型電子部品
用キャリア材。The present invention does not involve a base material layer in which storage holes capable of storing chip-type electronic components are formed at predetermined intervals in a length direction, and a support base material provided on one surface of the base material layer. A tape-shaped carrier material for chip-type electronic components composed of a thermoplastic resin layer.
である請求項1記載のチップ型電子部品用キャリア材。2. The thermoplastic resin layer has a thickness of 5 to 150 μm.
The carrier material for a chip-type electronic component according to claim 1, wherein
℃、全光線透過率が70%以上である請求項1記載のチ
ップ型電子部品用キャリア材。3. The thermoplastic resin layer has a softening point of 60 to 290.
The carrier material for chip-type electronic components according to claim 1, wherein the total light transmittance at 70 ° C is 70% or more.
1013Ωである請求項1記載のチップ型電子部品用キャ
リア材。4. A thermoplastic resin layer having a surface resistance of 10 2 to 10 2 .
2. The carrier material for a chip-type electronic component according to claim 1, which has a resistance of 10 13 Ω.
部品用キャリア材を製造する方法であって、チップ型電
子部品を収納可能な収納孔を、幅広のシート状基材の長
さ方向及び幅方向に所定間隔で打ち抜き加工により形成
した後、前記シート状基材の一方の面に熱可塑性樹脂層
を設け、次いで所定の幅に裁断するチップ型電子部品用
キャリア材の製造法。5. A method for producing a tape-shaped chip-type electronic component carrier material according to claim 1, wherein the accommodating hole for accommodating the chip-type electronic component is formed in a longitudinal direction of a wide sheet-like base material. And forming a thermoplastic resin layer on one surface of the sheet-like base material after forming by punching at predetermined intervals in the width direction, and then cutting the sheet-shaped substrate into a predetermined width.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10188128A JP2000007020A (en) | 1998-06-17 | 1998-06-17 | Carrier material for chip electronic part and its manufacture |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10188128A JP2000007020A (en) | 1998-06-17 | 1998-06-17 | Carrier material for chip electronic part and its manufacture |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2000007020A true JP2000007020A (en) | 2000-01-11 |
Family
ID=16218223
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10188128A Pending JP2000007020A (en) | 1998-06-17 | 1998-06-17 | Carrier material for chip electronic part and its manufacture |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2000007020A (en) |
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