ITVA20050049A1 - Sistemi fotopolimerizzabili contenenti coiniziatori a bassa estraibilita' e volatilita' - Google Patents
Sistemi fotopolimerizzabili contenenti coiniziatori a bassa estraibilita' e volatilita'Info
- Publication number
- ITVA20050049A1 ITVA20050049A1 IT000049A ITVA20050049A ITVA20050049A1 IT VA20050049 A1 ITVA20050049 A1 IT VA20050049A1 IT 000049 A IT000049 A IT 000049A IT VA20050049 A ITVA20050049 A IT VA20050049A IT VA20050049 A1 ITVA20050049 A1 IT VA20050049A1
- Authority
- IT
- Italy
- Prior art keywords
- volatility
- coinitators
- systems containing
- photopolymerizable systems
- containing low
- Prior art date
Links
- 238000000605 extraction Methods 0.000 title 1
- 238000000576 coating method Methods 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- 238000004806 packaging method and process Methods 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F4/00—Polymerisation catalysts
Landscapes
- Chemical & Material Sciences (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Dental Preparations (AREA)
- Inspection Of Paper Currency And Valuable Securities (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Wrappers (AREA)
Priority Applications (14)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT000049A ITVA20050049A1 (it) | 2005-08-05 | 2005-08-05 | Sistemi fotopolimerizzabili contenenti coiniziatori a bassa estraibilita' e volatilita' |
NZ565037A NZ565037A (en) | 2005-08-05 | 2006-05-10 | Photopolymerisable systems containing low-extractable and low-volatile coinitiators |
CN2006800292840A CN101243109B (zh) | 2005-08-05 | 2006-05-10 | 含低提取性和低挥发性共引发剂的可光聚合体系 |
US11/997,934 US7851029B2 (en) | 2005-08-05 | 2006-05-10 | Photopolymerisable systems containing low-extractable and low-volatile coinitiators |
DK06755130.9T DK1910425T3 (da) | 2005-08-05 | 2006-05-10 | Fotopolymeriserbare systemer, der indeholder co-initiatorer med lav ekstraherbarhed og flygtighed |
BRPI0614206-0A BRPI0614206A2 (pt) | 2005-08-05 | 2006-05-10 | sistemas fotopolimerizÁveis, compostos, e, processo para preparar coberturas para superfÍcies de metal, madeira, papel e plÁstico |
PCT/EP2006/062213 WO2007017298A1 (en) | 2005-08-05 | 2006-05-10 | Photopolymerisable systems containing low-extractable and low-volatile coinitiators |
AT06755130T ATE510860T1 (de) | 2005-08-05 | 2006-05-10 | Photopolymerisierbare systeme, enthaltend coinitiatoren mit geringer extrahierbarkeit und flüchtigkeit |
KR1020087003495A KR101327711B1 (ko) | 2005-08-05 | 2006-05-10 | 저추출성 및 저휘발성 공개시제를 함유하는 광중합성시스템 |
ES06755130T ES2366964T3 (es) | 2005-08-05 | 2006-05-10 | Sistemas fotopolimerizables que contienen coiniciadores poco extraíbles y poco volátiles. |
JP2008524456A JP5047965B2 (ja) | 2005-08-05 | 2006-05-10 | 低抽出性、低揮発性共開始剤を含む光重合系 |
EP06755130A EP1910425B1 (en) | 2005-08-05 | 2006-05-10 | Photopolymerisable systems containing low-extractable and low-volatile coinitiators |
CA2616289A CA2616289C (en) | 2005-08-05 | 2006-05-10 | Photopolymerisable systems containing low-extractable and low-volatile coinitiators |
AU2006278164A AU2006278164B2 (en) | 2005-08-05 | 2006-05-10 | Photopolymerisable systems containing low-extractable and low-volatile coinitiators |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT000049A ITVA20050049A1 (it) | 2005-08-05 | 2005-08-05 | Sistemi fotopolimerizzabili contenenti coiniziatori a bassa estraibilita' e volatilita' |
Publications (1)
Publication Number | Publication Date |
---|---|
ITVA20050049A1 true ITVA20050049A1 (it) | 2007-02-06 |
Family
ID=36691908
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT000049A ITVA20050049A1 (it) | 2005-08-05 | 2005-08-05 | Sistemi fotopolimerizzabili contenenti coiniziatori a bassa estraibilita' e volatilita' |
Country Status (14)
Country | Link |
---|---|
US (1) | US7851029B2 (it) |
EP (1) | EP1910425B1 (it) |
JP (1) | JP5047965B2 (it) |
KR (1) | KR101327711B1 (it) |
CN (1) | CN101243109B (it) |
AT (1) | ATE510860T1 (it) |
AU (1) | AU2006278164B2 (it) |
BR (1) | BRPI0614206A2 (it) |
CA (1) | CA2616289C (it) |
DK (1) | DK1910425T3 (it) |
ES (1) | ES2366964T3 (it) |
IT (1) | ITVA20050049A1 (it) |
NZ (1) | NZ565037A (it) |
WO (1) | WO2007017298A1 (it) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8063115B2 (en) * | 2006-11-23 | 2011-11-22 | Agfa Graphics Nv | Radiation curable compositions |
US8470518B2 (en) | 2007-09-14 | 2013-06-25 | E I Du Pont De Nemours And Company | Photosensitive element having reinforcing particles and method for preparing a printing form from the element |
EP2475687B1 (en) * | 2009-09-08 | 2014-11-12 | Sun Chemical B.V. | A photoinitiator composition |
SG184325A1 (en) * | 2010-03-31 | 2012-11-29 | Furukawa Electric Co Ltd | Pressure-sensitive adhesive sheet for semiconductor wafer processing |
IT1402691B1 (it) * | 2010-11-10 | 2013-09-13 | Lamberti Spa | Tioxantoni a bassa migrabilita' |
JP5676512B2 (ja) * | 2012-03-30 | 2015-02-25 | 富士フイルム株式会社 | インクジェットインク組成物、インクジェット記録方法、及び、印刷物 |
BE1022066B1 (nl) * | 2013-06-28 | 2016-02-15 | Chemstream Bvba | Oppervlakteactief middel en bereiding daarvan |
EP3033324B8 (en) * | 2013-08-12 | 2024-04-17 | Sun Chemical B.V. | Oligomeric aminoketones and their use as photoinitiators |
CN108794659A (zh) * | 2017-04-26 | 2018-11-13 | 常州强力先端电子材料有限公司 | 含砜结构的光引发剂及其制备方法和应用 |
US11359102B2 (en) | 2018-03-27 | 2022-06-14 | Sun Chemical Corporation | UV-curable compositions comprising cleavage type photoinitiators |
CN109438270B (zh) * | 2018-12-04 | 2021-06-04 | 北京英力精化技术发展有限公司 | 二(对n,n-二烷基氨基苯甲酸)-n-烷基二乙醇胺酯的制备方法 |
EP3686252A1 (en) * | 2019-01-24 | 2020-07-29 | Agfa-Gevaert Nv | Radiation curable inkjet ink for manufacturing printed circuit boards |
EP3929256B1 (en) | 2020-06-22 | 2024-01-24 | Allnex Belgium, S.A. | Polymeric amino (meth)acrylate |
CN115141113B (zh) * | 2022-09-05 | 2022-11-29 | 天津久日新材料股份有限公司 | 一种活性胺及其制备方法和应用 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4525256A (en) * | 1983-07-01 | 1985-06-25 | Johnson & Johnson Dental Products Company | Photopolymerizable composition including catalyst comprising diketone plus 4-(N,N-dimethylamino)benzoic acid or ester thereof |
EP0538997B1 (en) * | 1991-10-25 | 1998-07-01 | Minnesota Mining And Manufacturing Company | Aminoketone sensitizers for aqueous soluble photopolymer compositions |
US5415976A (en) * | 1991-10-25 | 1995-05-16 | Minnesota Mining And Manufacturing Company | Aminoketone sensitizers for photopolymer compositions |
JPH06263811A (ja) * | 1993-03-12 | 1994-09-20 | Toyo Ink Mfg Co Ltd | 光開始剤組成物および光硬化性被覆組成物 |
KR100548976B1 (ko) * | 1997-01-30 | 2006-02-03 | 시바 스페셜티 케미칼스 홀딩 인크. | 비휘발성 페닐글리옥살산 에스테르 |
IT1303775B1 (it) * | 1998-11-19 | 2001-02-23 | Lamberti Spa | Fotoiniziatori impiegabili nella fotopolimerizzazione, e relativeformulazioni. |
ATE466667T1 (de) * | 2000-02-08 | 2010-05-15 | Basf Se | Verfahren zur herstellung fest haftender substratbeschichtungen durch plasma- oder korona aktivierte pfropfung |
ITVA20030028A1 (it) * | 2003-08-07 | 2005-02-08 | Lamberti Spa | Sistemi fotopolimerizzabili trasparenti per la preparazione di rivestimenti ad elevato spessore. |
US7276324B2 (en) * | 2003-11-14 | 2007-10-02 | Shin-Etsu Chemical Co., Ltd. | Nitrogen-containing organic compound, resist composition and patterning process |
US7396861B2 (en) * | 2004-07-15 | 2008-07-08 | Agfa Graphics Nv | Radiation curable compositions |
-
2005
- 2005-08-05 IT IT000049A patent/ITVA20050049A1/it unknown
-
2006
- 2006-05-10 US US11/997,934 patent/US7851029B2/en active Active
- 2006-05-10 NZ NZ565037A patent/NZ565037A/en not_active IP Right Cessation
- 2006-05-10 WO PCT/EP2006/062213 patent/WO2007017298A1/en active Application Filing
- 2006-05-10 AT AT06755130T patent/ATE510860T1/de not_active IP Right Cessation
- 2006-05-10 CA CA2616289A patent/CA2616289C/en not_active Expired - Fee Related
- 2006-05-10 JP JP2008524456A patent/JP5047965B2/ja active Active
- 2006-05-10 KR KR1020087003495A patent/KR101327711B1/ko active Active
- 2006-05-10 ES ES06755130T patent/ES2366964T3/es active Active
- 2006-05-10 DK DK06755130.9T patent/DK1910425T3/da active
- 2006-05-10 EP EP06755130A patent/EP1910425B1/en active Active
- 2006-05-10 CN CN2006800292840A patent/CN101243109B/zh active Active
- 2006-05-10 BR BRPI0614206-0A patent/BRPI0614206A2/pt not_active Application Discontinuation
- 2006-05-10 AU AU2006278164A patent/AU2006278164B2/en not_active Ceased
Also Published As
Publication number | Publication date |
---|---|
US7851029B2 (en) | 2010-12-14 |
WO2007017298A1 (en) | 2007-02-15 |
EP1910425B1 (en) | 2011-05-25 |
JP5047965B2 (ja) | 2012-10-10 |
KR20080039416A (ko) | 2008-05-07 |
CA2616289A1 (en) | 2007-02-15 |
BRPI0614206A2 (pt) | 2012-11-20 |
US20080213502A1 (en) | 2008-09-04 |
DK1910425T3 (da) | 2011-09-05 |
NZ565037A (en) | 2010-12-24 |
AU2006278164B2 (en) | 2011-04-21 |
ES2366964T3 (es) | 2011-10-27 |
JP2009503209A (ja) | 2009-01-29 |
CN101243109B (zh) | 2013-01-02 |
CA2616289C (en) | 2013-11-19 |
AU2006278164A1 (en) | 2007-02-15 |
EP1910425A1 (en) | 2008-04-16 |
KR101327711B1 (ko) | 2013-11-11 |
ATE510860T1 (de) | 2011-06-15 |
CN101243109A (zh) | 2008-08-13 |
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