IT8420877A0 - MASK STRUCTURE FOR VACUUM ULTRAVIOLET RADIATION LITHOGRAPHY. - Google Patents
MASK STRUCTURE FOR VACUUM ULTRAVIOLET RADIATION LITHOGRAPHY.Info
- Publication number
- IT8420877A0 IT8420877A0 IT8420877A IT2087784A IT8420877A0 IT 8420877 A0 IT8420877 A0 IT 8420877A0 IT 8420877 A IT8420877 A IT 8420877A IT 2087784 A IT2087784 A IT 2087784A IT 8420877 A0 IT8420877 A0 IT 8420877A0
- Authority
- IT
- Italy
- Prior art keywords
- ultraviolet radiation
- vacuum ultraviolet
- mask structure
- radiation lithography
- lithography
- Prior art date
Links
- 238000001459 lithography Methods 0.000 title 1
- 230000005855 radiation Effects 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US49506483A | 1983-05-13 | 1983-05-13 |
Publications (3)
Publication Number | Publication Date |
---|---|
IT8420877A0 true IT8420877A0 (en) | 1984-05-10 |
IT8420877A1 IT8420877A1 (en) | 1985-11-10 |
IT1174089B IT1174089B (en) | 1987-07-01 |
Family
ID=23967113
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT20877/84A IT1174089B (en) | 1983-05-13 | 1984-05-10 | VACUUM ULTRAVIOLET LITHOGRAPHY MASK STRUCTURE |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPS59214856A (en) |
DE (1) | DE3417888A1 (en) |
FR (1) | FR2545949B1 (en) |
GB (1) | GB2139781B (en) |
IT (1) | IT1174089B (en) |
NL (1) | NL8401525A (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2189903A (en) * | 1986-04-01 | 1987-11-04 | Plessey Co Plc | An etch technique for metal mask definition |
US4780175A (en) * | 1986-10-27 | 1988-10-25 | Sharp Kabushiki Kaisha | Method for the production of an optical phase-shifting board |
JPH02166447A (en) * | 1988-12-20 | 1990-06-27 | Fujitsu Ltd | Exposure mask and its manufacturing method |
JPH11237503A (en) * | 1997-12-03 | 1999-08-31 | Canon Inc | Diffraction optical element and optical system having that |
DE19808461A1 (en) * | 1998-03-02 | 1999-09-09 | Zeiss Carl Fa | Reticle with crystal carrier material |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2658623C2 (en) * | 1976-12-23 | 1982-07-29 | Dr. Johannes Heidenhain Gmbh, 8225 Traunreut | Recording media and process for its manufacture |
-
1984
- 1984-05-09 GB GB08411765A patent/GB2139781B/en not_active Expired
- 1984-05-09 FR FR8407120A patent/FR2545949B1/en not_active Expired
- 1984-05-10 IT IT20877/84A patent/IT1174089B/en active
- 1984-05-11 JP JP59093094A patent/JPS59214856A/en active Pending
- 1984-05-11 NL NL8401525A patent/NL8401525A/en not_active Application Discontinuation
- 1984-05-14 DE DE19843417888 patent/DE3417888A1/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
FR2545949B1 (en) | 1986-10-10 |
IT1174089B (en) | 1987-07-01 |
GB8411765D0 (en) | 1984-06-13 |
JPS59214856A (en) | 1984-12-04 |
DE3417888A1 (en) | 1984-11-15 |
GB2139781B (en) | 1986-09-10 |
FR2545949A1 (en) | 1984-11-16 |
NL8401525A (en) | 1984-12-03 |
IT8420877A1 (en) | 1985-11-10 |
GB2139781A (en) | 1984-11-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
IT8320321A0 (en) | WHEELCHAIR. | |
IT8321232A0 (en) | PROCEDURE FOR MANUFACTURING A MICROMINIATURE DEVICE. | |
FI830995L (en) | LAONGNYPPRESS FOER PAPER MASK. | |
NL188485B (en) | TURNING ANOD FOR A ROENTGEN TUBE. | |
DE3788623D1 (en) | X-ray mask for semiconductor exposure. | |
FR2475751B1 (en) | HIGH CONTRAST LITHOGRAPHIC PHOTOSENSITIVE MATERIAL | |
DE68906689D1 (en) | RADIATION-SENSITIVE PHOTORESIST MIXTURE FOR SHORT-WAVE ULTRAVIOLET RADIATION. | |
DE69126907D1 (en) | X-ray mask structure | |
IT7822779V0 (en) | PERFECT STRUCTURE MASK FOR CASSETTE | |
GB8319949D0 (en) | Electron beam lithography | |
EP0127919A3 (en) | Electron lithography mask manufacture | |
IT8420877A0 (en) | MASK STRUCTURE FOR VACUUM ULTRAVIOLET RADIATION LITHOGRAPHY. | |
DE3381033D1 (en) | ELECTRON BEAM EXPOSURE METHOD. | |
KR890015348A (en) | X-ray exposure mask manufacturing method | |
FI840721L (en) | MASK FOER MATERIALAVVERKANDE BEARBETNING TRAEDSTOCKAR. | |
ES523773A0 (en) | A PROCEDURE FOR FORMING A BLOWN FILM | |
FI832729L (en) | KOPPLINGSNORDNING FOER ATT ADDRESSERA ETT SKIVMINNE I EN ANLAEGGNING SOM BEHANDLAR DATASIGNALER, SPECIELLT I EN TELEX- OCH DATAFOERMEDLINGSANLAEGGNING | |
DE3381021D1 (en) | ROENTGEN RADIATION MASK. | |
IT9021589A1 (en) | METHOD FOR THE MANUFACTURE OF A MASK. | |
FR2522440B1 (en) | ELECTRON CANON | |
IT8304816A0 (en) | EXPOSURE MASK, PHOTOGRAPHIC FOR A SENSITIVE MATERIAL TRANSPORT UNIT. | |
FI842401L (en) | INLOPPSLAODA FOER PAPER MASK. | |
IT8123887V0 (en) | MASK STRUCTURE FOR THE REALIZATION OF PROPORTIONING RETICLES OF A GRAPHIC FIGURE. | |
FI832799L (en) | ANORDNING FOER ATT INFOERA ETT AENDLOEST BAND I EN PAPER MASK | |
FI842245L (en) | MASK FOER FALSNING AV TAKPLAOT. |