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IT1228515B - AROMATIC POLYAMIDE RESINS HEAT RESISTANT AND PHOTOSENSITIVE AND METHOD FOR THEIR PREPARATION - Google Patents

AROMATIC POLYAMIDE RESINS HEAT RESISTANT AND PHOTOSENSITIVE AND METHOD FOR THEIR PREPARATION

Info

Publication number
IT1228515B
IT1228515B IT8919593A IT1959389A IT1228515B IT 1228515 B IT1228515 B IT 1228515B IT 8919593 A IT8919593 A IT 8919593A IT 1959389 A IT1959389 A IT 1959389A IT 1228515 B IT1228515 B IT 1228515B
Authority
IT
Italy
Prior art keywords
photosensitive
preparation
heat resistant
aromatic polyamide
polyamide resins
Prior art date
Application number
IT8919593A
Other languages
Italian (it)
Other versions
IT8919593A0 (en
Inventor
Tsuguo Yamaoka
Kentaro Tsutsumi
Yutaka Maruyama
Haruhiko Komoriya
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP63048726A external-priority patent/JP2542033B2/en
Priority claimed from JP63104858A external-priority patent/JP2542041B2/en
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Publication of IT8919593A0 publication Critical patent/IT8919593A0/en
Application granted granted Critical
Publication of IT1228515B publication Critical patent/IT1228515B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/02—Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids
    • C08G69/26—Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids
    • C08G69/32—Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids from aromatic diamines and aromatic dicarboxylic acids with both amino and carboxylic groups aromatically bound
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/48—Polymers modified by chemical after-treatment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polyamides (AREA)
IT8919593A 1988-03-03 1989-02-28 AROMATIC POLYAMIDE RESINS HEAT RESISTANT AND PHOTOSENSITIVE AND METHOD FOR THEIR PREPARATION IT1228515B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP63048726A JP2542033B2 (en) 1988-03-03 1988-03-03 Aromatic polyamide resin and heat-resistant photosensitive material using the same
JP63104858A JP2542041B2 (en) 1988-04-27 1988-04-27 Aromatic polyamide resin, method for producing the same, and heat-resistant photosensitive material using the same

Publications (2)

Publication Number Publication Date
IT8919593A0 IT8919593A0 (en) 1989-02-28
IT1228515B true IT1228515B (en) 1991-06-20

Family

ID=26389033

Family Applications (1)

Application Number Title Priority Date Filing Date
IT8919593A IT1228515B (en) 1988-03-03 1989-02-28 AROMATIC POLYAMIDE RESINS HEAT RESISTANT AND PHOTOSENSITIVE AND METHOD FOR THEIR PREPARATION

Country Status (4)

Country Link
DE (1) DE3906684A1 (en)
FR (1) FR2628112B1 (en)
GB (1) GB2216532B (en)
IT (1) IT1228515B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5114826A (en) * 1989-12-28 1992-05-19 Ibm Corporation Photosensitive polyimide compositions
DE59010552D1 (en) * 1990-03-29 1996-12-05 Siemens Ag Highly heat-resistant negative resists and process for producing highly heat-resistant relief structures
EP0512339B1 (en) * 1991-05-07 1997-10-15 Siemens Aktiengesellschaft High temperature stable positive resists and process for the production of high temperature stable relief structure
DE4206948A1 (en) * 1992-03-05 1993-09-09 Basf Ag MOLDS BASED ON HOMO- AND COPOLYAMIDES CONTAINING OLEFINIC DOUBLE BINDINGS
DE4206949A1 (en) * 1992-03-05 1993-09-09 Basf Ag MOLDING DIMENSIONS BASED ON UNSATURATED COPOLYAMIDES
KR100805134B1 (en) * 2001-07-03 2008-02-21 히다찌 가세이 고오교 가부시끼가이샤 Photosensitive resin composition, pattern manufacturing method and electronic component using same
CN116768750B (en) * 2023-06-19 2025-05-30 兰州大学 Diphenol monomer containing photo-curable cinnamate group, preparation method of diphenol monomer, photosensitive polyaryletherketone, preparation method of photosensitive polyaryletherketone and application of photosensitive polyaryletherketone

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3066117A (en) * 1957-02-08 1962-11-27 Bayer Ag Light-sensitive water soluble compounds
DE2967162D1 (en) * 1978-09-29 1984-09-13 Hitachi Ltd Light-sensitive polymer composition
DE2933828A1 (en) * 1979-08-21 1981-03-12 Siemens AG, 1000 Berlin und 8000 München POLYOXAZOLE PREPARATIONS AND THEIR PRODUCTION.
JPS60180197A (en) * 1984-02-27 1985-09-13 宇部興産株式会社 Method for manufacturing multilayer printed wiring board
GB2188936B (en) * 1986-03-06 1988-12-21 Central Glass Co Ltd Aromatic polyamides and polybenoxazoles having diphenylhexafluoropropane units

Also Published As

Publication number Publication date
IT8919593A0 (en) 1989-02-28
FR2628112B1 (en) 1992-11-13
GB2216532A (en) 1989-10-11
FR2628112A1 (en) 1989-09-08
DE3906684A1 (en) 1989-09-21
GB2216532B (en) 1991-07-24
GB8904786D0 (en) 1989-04-12

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