IT1162598B - Composizione fotosensibile di rivestimento - Google Patents
Composizione fotosensibile di rivestimentoInfo
- Publication number
- IT1162598B IT1162598B IT27810/79A IT2781079A IT1162598B IT 1162598 B IT1162598 B IT 1162598B IT 27810/79 A IT27810/79 A IT 27810/79A IT 2781079 A IT2781079 A IT 2781079A IT 1162598 B IT1162598 B IT 1162598B
- Authority
- IT
- Italy
- Prior art keywords
- photosensitive composition
- coating photosensitive
- coating
- composition
- photosensitive
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
- C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
- C08F299/026—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight
- C08F299/028—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight photopolymerisable compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Epoxy Resins (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Polymerisation Methods In General (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/967,742 US4237216A (en) | 1978-12-08 | 1978-12-08 | Photosensitive patternable coating composition containing novolak type materials |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| IT7927810A0 IT7927810A0 (it) | 1979-12-04 |
| IT1162598B true IT1162598B (it) | 1987-04-01 |
Family
ID=25513244
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IT27810/79A IT1162598B (it) | 1978-12-08 | 1979-12-04 | Composizione fotosensibile di rivestimento |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4237216A (it) |
| EP (1) | EP0014237B1 (it) |
| JP (1) | JPS5579439A (it) |
| CA (1) | CA1115587A (it) |
| DE (1) | DE2965255D1 (it) |
| IT (1) | IT1162598B (it) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5622364A (en) * | 1979-08-01 | 1981-03-02 | Matsushita Electric Ind Co Ltd | Coating composition |
| DE3265242D1 (en) * | 1981-09-17 | 1985-09-12 | Ciba Geigy Ag | Light-sensitive coating agent and its use in protection purposes |
| US4483758A (en) * | 1982-01-25 | 1984-11-20 | Polychrome Corporation | Method for making a negative working lithographic printing plate |
| US4447512A (en) * | 1982-01-25 | 1984-05-08 | Polychrome Corporation | Method for making a negative working lithographic printing plate |
| US4464458A (en) * | 1982-12-30 | 1984-08-07 | International Business Machines Corporation | Process for forming resist masks utilizing O-quinone diazide and pyrene |
| GB8307220D0 (en) * | 1983-03-16 | 1983-04-20 | Ciba Geigy Ag | Production of images |
| EP0207188B1 (en) * | 1985-06-29 | 1996-06-19 | Dainippon Ink And Chemicals, Inc. | Resin composition for solder resist ink |
| US4882245A (en) * | 1985-10-28 | 1989-11-21 | International Business Machines Corporation | Photoresist composition and printed circuit boards and packages made therewith |
| JP2604173B2 (ja) * | 1987-02-25 | 1997-04-30 | 東京応化工業株式会社 | 耐熱性感光性樹脂組成物 |
| JP2571800B2 (ja) * | 1987-11-27 | 1997-01-16 | イビデン株式会社 | 無電解めっき用感光性接着剤およびプリント配線板 |
| US4948707A (en) * | 1988-02-16 | 1990-08-14 | International Business Machines Corporation | Conditioning a non-conductive substrate for subsequent selective deposition of a metal thereon |
| US5041470A (en) * | 1989-03-03 | 1991-08-20 | International Business Machines Corporation | Flame retardant photocurable adhesive for wires and circuit boards |
| US5054872A (en) * | 1990-03-16 | 1991-10-08 | Ibm Corporation | Polymeric optical waveguides and methods of forming the same |
| US5667934A (en) * | 1990-10-09 | 1997-09-16 | International Business Machines Corporation | Thermally stable photoimaging composition |
| JP2772227B2 (ja) * | 1993-11-15 | 1998-07-02 | イビデン株式会社 | プリント配線板 |
| US5561194A (en) * | 1995-03-29 | 1996-10-01 | International Business Machines Corporation | Photoresist composition including polyalkylmethacrylate co-polymer of polyhydroxystyrene |
| US6259036B1 (en) * | 1998-04-13 | 2001-07-10 | Micron Technology, Inc. | Method for fabricating electronic assemblies using semi-cured conductive elastomeric bumps |
| KR100796405B1 (ko) * | 2000-09-20 | 2008-01-21 | 다이요 잉키 세이조 가부시키가이샤 | 카르복실기 함유 감광성 수지, 이것을 함유하는 알칼리현상 가능 광경화성ㆍ열경화성 조성물 및 그 경화물 |
| US6811937B2 (en) | 2001-06-21 | 2004-11-02 | Dsm Desotech, Inc. | Radiation-curable resin composition and rapid prototyping process using the same |
| US20030138731A1 (en) * | 2001-12-21 | 2003-07-24 | Treliant Fang | Photoresist formulation for high aspect ratio plating |
| US20130017374A1 (en) | 2009-11-18 | 2013-01-17 | Ecole Polytechnique Federale De Lausanne | Carbon nanotubes nanocomposites for microfabrication applications |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3301743A (en) * | 1963-06-12 | 1967-01-31 | Robertson Co H H | Polyhydroxy polyacrylate esters of epoxidized phenol-formaldehyde novolac resins and laminates therefrom |
| US3450613A (en) * | 1964-03-09 | 1969-06-17 | Bausch & Lomb | Epoxy adhesive containing acrylic acid-epoxy reaction products and photosensitizers |
| US3637618A (en) * | 1970-03-11 | 1972-01-25 | Shell Oil Co | Unsaturated polyesters from epoxides and ethylenically unsaturated monocarboxylic acid mixed with solid epoxide resin |
| NL154236B (nl) * | 1971-02-10 | 1977-08-15 | Showa Highpolymer | Werkwijze voor het bereiden van een onverzadigde epoxyesterhars, alsmede gevormd voortbrengsel, voorzien van een bekledingslaag van een dergelijke epoxyesterhars. |
| US3776729A (en) * | 1971-02-22 | 1973-12-04 | Ibm | Photosensitive dielectric composition and process of using the same |
| US3804735A (en) * | 1972-04-10 | 1974-04-16 | Continental Can Co | Photopolymerizable compositions prepared from beta-hydroxy esters and polyitaconates |
| US3847770A (en) * | 1972-04-10 | 1974-11-12 | Continental Can Co | Photopolymerizable compositions prepared from beta hydroxy esters and polyitaconates |
| US3968016A (en) * | 1972-05-17 | 1976-07-06 | Ppg Industries, Inc. | Mixture of unsaturated polyester resins with an epoxy diacrylate and the actinic light treatment of same |
| NL7207743A (en) * | 1972-06-07 | 1973-12-11 | Acrylic esters of polyepoxy cpds - crosslinkable by uv light and ionizing radiation | |
| JPS4967709A (it) * | 1972-10-28 | 1974-07-01 | ||
| US3912670A (en) * | 1973-02-28 | 1975-10-14 | O Brien Corp | Radiation curable can coating composition |
| DE2349979A1 (de) * | 1973-10-04 | 1975-04-17 | Bayer Ag | Uv-licht-haertende massen hoher reaktivitaet |
| JPS5128677A (en) * | 1974-09-04 | 1976-03-11 | Alps Electric Co Ltd | Suitsuchi no tanshiban no seizohoho |
| US4169732A (en) * | 1978-01-09 | 1979-10-02 | International Business Machines Corporation | Photosensitive coating composition and use thereof |
-
1978
- 1978-12-08 US US05/967,742 patent/US4237216A/en not_active Expired - Lifetime
-
1979
- 1979-10-18 CA CA337,954A patent/CA1115587A/en not_active Expired
- 1979-11-02 JP JP14140879A patent/JPS5579439A/ja active Granted
- 1979-11-19 EP EP79104589A patent/EP0014237B1/de not_active Expired
- 1979-11-19 DE DE7979104589T patent/DE2965255D1/de not_active Expired
- 1979-12-04 IT IT27810/79A patent/IT1162598B/it active
Also Published As
| Publication number | Publication date |
|---|---|
| EP0014237B1 (de) | 1983-04-20 |
| DE2965255D1 (en) | 1983-05-26 |
| IT7927810A0 (it) | 1979-12-04 |
| EP0014237A2 (de) | 1980-08-20 |
| EP0014237A3 (en) | 1980-12-10 |
| CA1115587A (en) | 1982-01-05 |
| JPS5579439A (en) | 1980-06-14 |
| JPS6213657B2 (it) | 1987-03-27 |
| US4237216A (en) | 1980-12-02 |
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