IT1149814B - Struttura semiconduttrice - Google Patents
Struttura semiconduttriceInfo
- Publication number
- IT1149814B IT1149814B IT23529/80A IT2352980A IT1149814B IT 1149814 B IT1149814 B IT 1149814B IT 23529/80 A IT23529/80 A IT 23529/80A IT 2352980 A IT2352980 A IT 2352980A IT 1149814 B IT1149814 B IT 1149814B
- Authority
- IT
- Italy
- Prior art keywords
- semiconductive structure
- semiconductive
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/81—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation
- H10D62/815—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation of structures having periodic or quasi-periodic potential variation, e.g. superlattices or multiple quantum wells [MQW]
- H10D62/8161—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation of structures having periodic or quasi-periodic potential variation, e.g. superlattices or multiple quantum wells [MQW] potential variation due to variations in composition or crystallinity, e.g. heterojunction superlattices
- H10D62/8162—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation of structures having periodic or quasi-periodic potential variation, e.g. superlattices or multiple quantum wells [MQW] potential variation due to variations in composition or crystallinity, e.g. heterojunction superlattices having quantum effects only in the vertical direction, i.e. layered structures having quantum effects solely resulting from vertical potential variation
- H10D62/8164—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation of structures having periodic or quasi-periodic potential variation, e.g. superlattices or multiple quantum wells [MQW] potential variation due to variations in composition or crystallinity, e.g. heterojunction superlattices having quantum effects only in the vertical direction, i.e. layered structures having quantum effects solely resulting from vertical potential variation comprising only semiconductor materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/40—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels
- H10D30/47—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels having 2D charge carrier gas channels, e.g. nanoribbon FETs or high electron mobility transistors [HEMT]
- H10D30/471—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT]
- H10D30/473—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having confinement of carriers by multiple heterojunctions, e.g. quantum well HEMT
- H10D30/4732—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having confinement of carriers by multiple heterojunctions, e.g. quantum well HEMT using Group III-V semiconductor material
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US9747379A | 1979-11-26 | 1979-11-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
IT8023529A0 IT8023529A0 (it) | 1980-07-18 |
IT1149814B true IT1149814B (it) | 1986-12-10 |
Family
ID=22263555
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT23529/80A IT1149814B (it) | 1979-11-26 | 1980-07-18 | Struttura semiconduttrice |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0029481A1 (it) |
JP (1) | JPS5676581A (it) |
IT (1) | IT1149814B (it) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58178572A (ja) * | 1982-04-14 | 1983-10-19 | Hiroyuki Sakaki | 移動度変調形電界効果トランジスタ |
JPS5929462A (ja) * | 1982-08-10 | 1984-02-16 | Mitsubishi Electric Corp | ヘテロ接合素子 |
EP0133342B1 (en) * | 1983-06-24 | 1989-11-29 | Nec Corporation | A superlattice type semiconductor structure having a high carrier density |
US4642144A (en) * | 1983-10-06 | 1987-02-10 | Exxon Research And Engineering Company | Proximity doping of amorphous semiconductors |
JPS60235476A (ja) * | 1984-05-09 | 1985-11-22 | Nec Corp | 半導体装置 |
US4558337A (en) * | 1984-05-30 | 1985-12-10 | Texas Instruments Inc. | Multiple high electron mobility transistor structures without inverted heterojunctions |
US4590507A (en) * | 1984-07-31 | 1986-05-20 | At&T Bell Laboratories | Variable gap devices |
FR2606552B1 (fr) * | 1986-06-11 | 1991-08-23 | Raytheon Co | Composant a semi-conducteur resistant aux rayonnements |
US4855797A (en) * | 1987-07-06 | 1989-08-08 | Siemens Corporate Research And Support, Inc. | Modulation doped high electron mobility transistor with n-i-p-i structure |
US7348612B2 (en) * | 2004-10-29 | 2008-03-25 | Cree, Inc. | Metal-semiconductor field effect transistors (MESFETs) having drains coupled to the substrate and methods of fabricating the same |
JP5629714B2 (ja) * | 2012-03-19 | 2014-11-26 | トヨタ自動車株式会社 | 半導体装置 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4137542A (en) * | 1977-04-20 | 1979-01-30 | International Business Machines Corporation | Semiconductor structure |
US4163237A (en) * | 1978-04-24 | 1979-07-31 | Bell Telephone Laboratories, Incorporated | High mobility multilayered heterojunction devices employing modulated doping |
-
1980
- 1980-07-18 EP EP80104215A patent/EP0029481A1/en not_active Withdrawn
- 1980-07-18 IT IT23529/80A patent/IT1149814B/it active
- 1980-09-05 JP JP12252580A patent/JPS5676581A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JPS5676581A (en) | 1981-06-24 |
EP0029481A1 (en) | 1981-06-03 |
IT8023529A0 (it) | 1980-07-18 |
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