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IT1125196B - Disassorbitore fotoresistivo privo di fenolo - Google Patents

Disassorbitore fotoresistivo privo di fenolo

Info

Publication number
IT1125196B
IT1125196B IT6870276A IT6870276A IT1125196B IT 1125196 B IT1125196 B IT 1125196B IT 6870276 A IT6870276 A IT 6870276A IT 6870276 A IT6870276 A IT 6870276A IT 1125196 B IT1125196 B IT 1125196B
Authority
IT
Italy
Prior art keywords
phenoresistive
dehabsorbor
phenol
free
phenoresistive dehabsorbor
Prior art date
Application number
IT6870276A
Other languages
English (en)
Original Assignee
Allied Chem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Allied Chem filed Critical Allied Chem
Application granted granted Critical
Publication of IT1125196B publication Critical patent/IT1125196B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
IT6870276A 1975-08-01 1976-06-08 Disassorbitore fotoresistivo privo di fenolo IT1125196B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US60157475A 1975-08-01 1975-08-01

Publications (1)

Publication Number Publication Date
IT1125196B true IT1125196B (it) 1986-05-14

Family

ID=24408019

Family Applications (1)

Application Number Title Priority Date Filing Date
IT6870276A IT1125196B (it) 1975-08-01 1976-06-08 Disassorbitore fotoresistivo privo di fenolo

Country Status (6)

Country Link
JP (1) JPS5220101A (it)
CA (1) CA1074219A (it)
DE (1) DE2632949A1 (it)
FR (1) FR2319396A1 (it)
GB (1) GB1551143A (it)
IT (1) IT1125196B (it)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4165295A (en) * 1976-10-04 1979-08-21 Allied Chemical Corporation Organic stripping compositions and method for using same
US4165294A (en) 1976-11-08 1979-08-21 Allied Chemical Corporation Phenol-free and chlorinated hydrocarbon-free photoresist stripper comprising surfactant and hydrotropic aromatic sulfonic acids
US4242218A (en) * 1976-11-08 1980-12-30 Allied Chemical Corporation Phenol-free photoresist stripper
CA1116059A (en) * 1978-05-22 1982-01-12 Allied Corporation Phenol-free and chlorinated hydrocarbon-free photoresist stripper
US4187191A (en) * 1978-07-26 1980-02-05 General Motors Corporation Photoresist stripper with dodecylsulfonic acid and chlorinated solvents
EP0337342A1 (de) * 1988-04-13 1989-10-18 Siemens Aktiengesellschaft Verfahren zum Entschichten von Photolack
US4971715A (en) * 1988-11-18 1990-11-20 International Business Machines Corporation Phenolic-free stripping composition and use thereof
US8614053B2 (en) 2009-03-27 2013-12-24 Eastman Chemical Company Processess and compositions for removing substances from substrates

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1419726A (fr) * 1963-10-04 1965-12-03 Kalle Ag Solutions détersives pour formes d'imprimerie planes
US3582401A (en) * 1967-11-15 1971-06-01 Mallinckrodt Chemical Works Photosensitive resist remover compositions and methods

Also Published As

Publication number Publication date
DE2632949C2 (it) 1987-11-19
FR2319396B1 (it) 1980-03-14
JPS5220101A (en) 1977-02-15
DE2632949A1 (de) 1977-02-17
CA1074219A (en) 1980-03-25
GB1551143A (en) 1979-08-22
FR2319396A1 (fr) 1977-02-25

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