IT1066543B - Apparato di spruzzamento - Google Patents

Apparato di spruzzamento

Info

Publication number: IT1066543B
Authority: IT; Italy
Prior art keywords: spraying apparatus; spraying
Prior art date: 1975-12-17

Application number

IT51804/76A

Other languages

English (en)

Original Assignee

Coulter Information Systems

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1975-12-17

Filing date

1976-10-19

Publication date

1985-03-12

1975-12-17 Priority claimed from US05/641,481 external-priority patent/US4014779A/en

1976-10-19 Application filed by Coulter Information Systems filed Critical Coulter Information Systems

1985-03-12 Application granted granted Critical

1985-03-12 Publication of IT1066543B publication Critical patent/IT1066543B/it

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
- H01J37/32761—Continuous moving
- H01J37/3277—Continuous moving of continuous material
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3438—Electrodes other than cathode

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Physics & Mathematics (AREA)
Plasma & Fusion (AREA)
Analytical Chemistry (AREA)
Materials Engineering (AREA)
Chemical Kinetics & Catalysis (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Physical Vapour Deposition (AREA)
Physical Or Chemical Processes And Apparatus (AREA)
Electrostatic Spraying Apparatus (AREA)

IT51804/76A 1975-12-17 1976-10-19 Apparato di spruzzamento IT1066543B (it)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US05/641,481 US4014779A (en)	1974-11-01	1975-12-17	Sputtering apparatus

Publications (1)

Publication Number	Publication Date
IT1066543B true IT1066543B (it)	1985-03-12

Family

ID=24572585

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
IT51804/76A IT1066543B (it)	1975-12-17	1976-10-19	Apparato di spruzzamento

Country Status (17)

Country	Link
JP (1)	JPS6035429B2 (it)
AT (1)	AT344501B (it)
AU (1)	AU511961B2 (it)
BE (1)	BE847413A (it)
CA (1)	CA1077437A (it)
CH (1)	CH617965A5 (it)
DD (1)	DD127637A5 (it)
DE (1)	DE2647149C2 (it)
DK (1)	DK149926C (it)
FR (1)	FR2335615A1 (it)
GB (1)	GB1503301A (it)
IL (1)	IL50722A (it)
IT (1)	IT1066543B (it)
LU (1)	LU76026A1 (it)
MX (1)	MX145314A (it)
NL (1)	NL7611563A (it)
SE (1)	SE429108B (it)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4151059A (en) *	1977-12-27	1979-04-24	Coulter Stork U.S.A., Inc.	Method and apparatus for sputtering multiple cylinders simultaneously
FR2527233A1 (fr) *	1982-05-24	1983-11-25	Asu Composants Sa	Installation pour le depot d'un revetement sur des substrats
US4417968A (en) *	1983-03-21	1983-11-29	Shatterproof Glass Corporation	Magnetron cathode sputtering apparatus
FR2548589B1 (fr) *	1983-07-07	1987-02-20	Aerospatiale	Procede et dispositif d'impregnation metallique d'un substrat se presentant sous la forme d'une nappe de fibres conductrices du courant electrique
US4443318A (en) *	1983-08-17	1984-04-17	Shatterproof Glass Corporation	Cathodic sputtering apparatus
EP0157991A1 (fr) *	1984-04-10	1985-10-16	INTERPATENT ANSTALT (INDELEC Abteilung)	Dispositif pour effectuer en continu la métallisation sélective de pièces industrielles, notamment en électronique
JPS6162117A (ja) *	1984-09-03	1986-03-31	Brother Ind Ltd	キーボードの製造方法
FR2940321B1 (fr) *	2008-12-19	2011-12-23	Carewave Shielding Technologies	Machine de depot sous vide,sur un substrat,de materiaux en couches minces,par pulverisation cathodique.
JP5969953B2 (ja) *	2013-05-31	2016-08-17	株式会社神戸製鋼所	成膜装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
NL136984C (it) *	1964-06-04
DE2115590A1 (en) *	1971-03-31	1972-10-05	Leybold Heraeus Gmbh & Co Kg	Cathode sputtering device - has cathode with projecting rim
US3905887A (en) *	1973-01-12	1975-09-16	Coulter Information Systems	Thin film deposition method using segmented plasma
US3829373A (en) *	1973-01-12	1974-08-13	Coulter Information Systems	Thin film deposition apparatus using segmented target means

1976
- 1976-10-18 MX MX166694A patent/MX145314A/es unknown
- 1976-10-19 NL NL7611563A patent/NL7611563A/xx not_active Application Discontinuation
- 1976-10-19 GB GB43369/76A patent/GB1503301A/en not_active Expired
- 1976-10-19 IT IT51804/76A patent/IT1066543B/it active
- 1976-10-19 SE SE7611581A patent/SE429108B/xx unknown
- 1976-10-19 DK DK469976A patent/DK149926C/da not_active IP Right Cessation
- 1976-10-19 LU LU76026A patent/LU76026A1/xx unknown
- 1976-10-19 DE DE2647149A patent/DE2647149C2/de not_active Expired
- 1976-10-19 FR FR7631399A patent/FR2335615A1/fr active Granted
- 1976-10-19 JP JP51125438A patent/JPS6035429B2/ja not_active Expired
- 1976-10-19 BE BE171612A patent/BE847413A/xx not_active IP Right Cessation
- 1976-10-19 AT AT776076A patent/AT344501B/de not_active IP Right Cessation
- 1976-10-19 CH CH1321176A patent/CH617965A5/fr not_active IP Right Cessation
- 1976-10-19 IL IL50722A patent/IL50722A/xx unknown
- 1976-10-19 CA CA263,664A patent/CA1077437A/en not_active Expired
- 1976-10-22 DD DD195409A patent/DD127637A5/xx unknown
- 1976-12-16 AU AU20598/76A patent/AU511961B2/en not_active Expired

Also Published As

Publication number	Publication date
GB1503301A (en)	1978-03-08
AT344501B (de)	1978-07-25
SE7611581L (sv)	1977-06-18
FR2335615A1 (fr)	1977-07-15
ATA776076A (de)	1977-11-15
DE2647149A1 (de)	1977-06-30
DK149926C (da)	1987-09-28
DK469976A (da)	1977-06-18
AU511961B2 (en)	1980-09-18
FR2335615B1 (it)	1981-12-04
NL7611563A (nl)	1977-06-21
IL50722A (en)	1979-05-31
CH617965A5 (en)	1980-06-30
DK149926B (da)	1986-10-27
LU76026A1 (it)	1978-05-16
JPS6035429B2 (ja)	1985-08-14
BE847413A (nl)	1977-04-19
SE429108B (sv)	1983-08-15
MX145314A (es)	1982-01-27
DD127637A5 (it)	1977-10-05
AU2059876A (en)	1978-06-22
JPS5275669A (en)	1977-06-24
CA1077437A (en)	1980-05-13
IL50722A0 (en)	1976-12-31
DE2647149C2 (de)	1983-08-25

Publication	Publication Date	Title
SE7605208L (sv)	1976-12-21	Sprayanordning
IT1063489B (it)	1985-02-11	Apparato di allarme
SE7606785L (sv)	1976-12-17	Pipetteringsapparat
SE7609135L (sv)	1977-02-28	Finfordelningsapparat
FR2302617A1 (fr)	1976-09-24	Di
BR7608511A (pt)	1977-12-20	Dispositivo pulverizador
BR7606423A (pt)	1977-06-14	Moinho de pulverizacao
IT1056752B (it)	1982-02-20	Apparecchio grammofonico
FR2300480A1 (fr)	1976-09-03	Di
BE844720A (fr)	1977-01-31	Pulverisateur
IT1067169B (it)	1985-03-12	Equipaggiamento radiogoniometrico
FR2300604A1 (fr)	1976-09-10	Di
DK146199C (da)	1983-12-27	Vaeskeudleveringsapparat
AT376149B (de)	1984-10-10	Spritzaggregat
BE844297A (fr)	1977-01-19	Opklapbare huishoudstoel met traptreden
IT1066543B (it)	1985-03-12	Apparato di spruzzamento
IT1058970B (it)	1982-05-10	Boccetta spargitalco
IT1058871B (it)	1982-05-10	Apparecchio di commutazione
FR2300345A1 (fr)	1976-09-03	Appa
IT1066655B (it)	1985-03-12	Procedimento per depurare caprolattame
TR19024A (tr)	1978-03-01	Boyama usulue
SE7603118L (sv)	1976-09-13	Beleggningsanordning
IT1061925B (it)	1983-04-30	Apparecchio elettroradiografico
FR2329361A1 (fr)	1977-05-27	Atomiseur
FR2300972A1 (fr)	1976-09-10	Di