IE812693L - Gate enhanced rectifier - Google Patents
Gate enhanced rectifierInfo
- Publication number
- IE812693L IE812693L IE812693A IE269381A IE812693L IE 812693 L IE812693 L IE 812693L IE 812693 A IE812693 A IE 812693A IE 269381 A IE269381 A IE 269381A IE 812693 L IE812693 L IE 812693L
- Authority
- IE
- Ireland
- Prior art keywords
- rectifier
- gate
- gate enhanced
- gb2088631a
- insulator
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 abstract 2
- 238000009825 accumulation Methods 0.000 abstract 1
- 230000000903 blocking effect Effects 0.000 abstract 1
- 230000005669 field effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D12/00—Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
- H10D12/411—Insulated-gate bipolar transistors [IGBT]
- H10D12/441—Vertical IGBTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/13—Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
- H10D62/141—Anode or cathode regions of thyristors; Collector or emitter regions of gated bipolar-mode devices, e.g. of IGBTs
- H10D62/142—Anode regions of thyristors or collector regions of gated bipolar-mode devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/13—Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
- H10D62/149—Source or drain regions of field-effect devices
- H10D62/151—Source or drain regions of field-effect devices of IGFETs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/13—Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
- H10D62/149—Source or drain regions of field-effect devices
- H10D62/151—Source or drain regions of field-effect devices of IGFETs
- H10D62/152—Source regions of DMOS transistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions
- H10D64/27—Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
- H10D64/311—Gate electrodes for field-effect devices
- H10D64/411—Gate electrodes for field-effect devices for FETs
- H10D64/511—Gate electrodes for field-effect devices for FETs for IGFETs
- H10D64/517—Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers
- H10D64/518—Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers characterised by their lengths or sectional shapes
Landscapes
- Thyristors (AREA)
- Junction Field-Effect Transistors (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
A high power field effect controlled semiconductor rectifier is constructed so that the rectifier is normally off and can be switched on by applying a bias signal to a gate 68 of a metal-insulator-semiconductor structure monolithically integrated with the rectifier in such a manner as to induce a contacting channel including inversion layer 78 and accumulation layer 79, between the anode 62 and cathode 70 of the rectifier. The device has both forward and reverse blocking capability and a low forward voltage drop when in the conducting state. The device has a very high turn-off gain and both high dV/dt and di/dt capabilities. <IMAGE>
[GB2088631A]
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US21218180A | 1980-12-02 | 1980-12-02 |
Publications (2)
Publication Number | Publication Date |
---|---|
IE812693L true IE812693L (en) | 1982-06-02 |
IE52758B1 IE52758B1 (en) | 1988-02-17 |
Family
ID=22789906
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IE2693/81A IE52758B1 (en) | 1980-12-02 | 1981-11-17 | Gate enhanced rectifier |
Country Status (8)
Country | Link |
---|---|
JP (1) | JPS57120369A (en) |
CH (1) | CH657230A5 (en) |
DE (1) | DE3147075A1 (en) |
FR (1) | FR2495382B1 (en) |
GB (1) | GB2088631B (en) |
IE (1) | IE52758B1 (en) |
MX (1) | MX151412A (en) |
SE (1) | SE8107136L (en) |
Families Citing this family (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2524710B1 (en) * | 1982-04-01 | 1986-03-14 | Gen Electric | SEMICONDUCTOR SWITCHING DEVICE |
EP0091686B1 (en) * | 1982-04-12 | 1989-06-28 | General Electric Company | Semiconductor device having a diffused region of reduced length and method of fabricating the same |
JPS594077A (en) * | 1982-06-30 | 1984-01-10 | Toshiba Corp | Field-effect transistor |
JPS5927569A (en) * | 1982-08-06 | 1984-02-14 | Hitachi Ltd | Semiconductor switch element |
CA1200322A (en) * | 1982-12-13 | 1986-02-04 | General Electric Company | Bidirectional insulated-gate rectifier structures and method of operation |
EP0111803B1 (en) * | 1982-12-13 | 1989-03-01 | General Electric Company | Lateral insulated-gate rectifier structures |
EP0118007B1 (en) * | 1983-02-04 | 1990-05-23 | General Electric Company | Electrical circuit comprising a hybrid power switching semiconductor device including an scr structure |
JPS59211271A (en) * | 1983-05-17 | 1984-11-30 | Toshiba Corp | Semiconductor device |
JPS605568A (en) * | 1983-06-23 | 1985-01-12 | Sanken Electric Co Ltd | Vertical insulated gate field effect transistor |
EP0144654A3 (en) * | 1983-11-03 | 1987-10-07 | General Electric Company | Semiconductor device structure including a dielectrically-isolated insulated-gate transistor |
US4618872A (en) * | 1983-12-05 | 1986-10-21 | General Electric Company | Integrated power switching semiconductor devices including IGT and MOSFET structures |
JPS60174258U (en) * | 1983-12-22 | 1985-11-19 | 株式会社明電舎 | Electric field controlled semiconductor device |
JPH0810763B2 (en) * | 1983-12-28 | 1996-01-31 | 株式会社日立製作所 | Semiconductor device |
JPH0618255B2 (en) * | 1984-04-04 | 1994-03-09 | 株式会社東芝 | Semiconductor device |
US4672407A (en) * | 1984-05-30 | 1987-06-09 | Kabushiki Kaisha Toshiba | Conductivity modulated MOSFET |
JPS61185971A (en) * | 1985-02-14 | 1986-08-19 | Toshiba Corp | Conductivity modulated semiconductor device |
JPS61191071A (en) * | 1985-02-20 | 1986-08-25 | Toshiba Corp | Conductivity modulation type semiconductor device and manufacture thereof |
EP0199293B2 (en) * | 1985-04-24 | 1995-08-30 | General Electric Company | Insulated gate semiconductor device |
DE3628857A1 (en) * | 1985-08-27 | 1987-03-12 | Mitsubishi Electric Corp | SEMICONDUCTOR DEVICE |
JPH0715998B2 (en) * | 1985-08-27 | 1995-02-22 | 三菱電機株式会社 | Semiconductor device |
JPS6248073A (en) * | 1985-08-27 | 1987-03-02 | Mitsubishi Electric Corp | Semiconductor device |
US4809045A (en) * | 1985-09-30 | 1989-02-28 | General Electric Company | Insulated gate device |
JPS62126668A (en) * | 1985-11-27 | 1987-06-08 | Mitsubishi Electric Corp | semiconductor equipment |
JPH0821713B2 (en) * | 1987-02-26 | 1996-03-04 | 株式会社東芝 | Conduction modulation type MOSFET |
JPH0624244B2 (en) * | 1987-06-12 | 1994-03-30 | 株式会社日立製作所 | Composite semiconductor device |
JP2576173B2 (en) * | 1988-02-02 | 1997-01-29 | 日本電装株式会社 | Insulated gate semiconductor device |
DE58909474D1 (en) * | 1988-02-24 | 1995-11-30 | Siemens Ag | Method for producing a bipolar transistor which can be controlled by a field effect. |
JPH07120799B2 (en) * | 1988-04-01 | 1995-12-20 | 株式会社日立製作所 | Semiconductor device |
JPH0247874A (en) * | 1988-08-10 | 1990-02-16 | Fuji Electric Co Ltd | Manufacturing method of MOS type semiconductor device |
EP0409010A1 (en) * | 1989-07-19 | 1991-01-23 | Asea Brown Boveri Ag | Switchable semiconductor power device |
JP2752184B2 (en) * | 1989-09-11 | 1998-05-18 | 株式会社東芝 | Power semiconductor device |
GB8921596D0 (en) * | 1989-09-25 | 1989-11-08 | Lucas Ind Plc | Mos gated bipolar devices |
DE3942490C2 (en) * | 1989-12-22 | 1994-03-24 | Daimler Benz Ag | Field effect controlled semiconductor device |
JP2808882B2 (en) * | 1990-05-07 | 1998-10-08 | 富士電機株式会社 | Insulated gate bipolar transistor |
GB2255494B (en) * | 1990-10-31 | 1995-07-05 | Coffea Sa | Apparatus and cartridge for preparing a liquid product |
JPH0548111A (en) * | 1991-08-12 | 1993-02-26 | Toshiba Corp | Semiconductor device and manufacturing method thereof |
JP2984478B2 (en) * | 1992-08-15 | 1999-11-29 | 株式会社東芝 | Conductivity modulation type semiconductor device and method of manufacturing the same |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2040657C3 (en) * | 1970-08-17 | 1975-10-02 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Electronic switch for semiconductor crosspoints in telecommunications, in particular telephone switching systems |
US3831187A (en) * | 1973-04-11 | 1974-08-20 | Rca Corp | Thyristor having capacitively coupled control electrode |
US4364073A (en) * | 1980-03-25 | 1982-12-14 | Rca Corporation | Power MOSFET with an anode region |
-
1981
- 1981-04-01 SE SE8107136A patent/SE8107136L/en not_active Application Discontinuation
- 1981-11-17 IE IE2693/81A patent/IE52758B1/en unknown
- 1981-11-24 GB GB8135419A patent/GB2088631B/en not_active Expired
- 1981-11-27 DE DE19813147075 patent/DE3147075A1/en not_active Withdrawn
- 1981-11-27 CH CH7616/81A patent/CH657230A5/en not_active IP Right Cessation
- 1981-11-30 JP JP56190983A patent/JPS57120369A/en active Pending
- 1981-12-01 FR FR8122488A patent/FR2495382B1/en not_active Expired
- 1981-12-02 MX MX190377A patent/MX151412A/en unknown
Also Published As
Publication number | Publication date |
---|---|
MX151412A (en) | 1984-11-14 |
FR2495382A1 (en) | 1982-06-04 |
GB2088631A (en) | 1982-06-09 |
CH657230A5 (en) | 1986-08-15 |
IE52758B1 (en) | 1988-02-17 |
JPS57120369A (en) | 1982-07-27 |
SE8107136L (en) | 1982-06-03 |
FR2495382B1 (en) | 1988-04-29 |
GB2088631B (en) | 1984-11-28 |
DE3147075A1 (en) | 1982-07-01 |
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