HK1228517A - Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method - Google Patents

Description

Exposure apparatus, movable body apparatus, method for manufacturing flat panel display, and method for manufacturing device

The present application is a divisional application of a patent application entitled "exposure apparatus, moving body apparatus, method for manufacturing flat panel display, and method for manufacturing device" having an application date of 2011, 9, and 5, and an application number of 201180043135.0.

Technical Field

The present invention relates to an exposure apparatus, a movable body apparatus, a method for manufacturing a flat panel display, and a method for manufacturing a device, and more particularly, to an exposure apparatus used in a photolithography process for manufacturing a semiconductor device, a liquid crystal display device, and the like, a movable body apparatus suitable as a device in which the exposure apparatus moves while holding an object to be exposed, a method for manufacturing a flat panel display using the exposure apparatus, and a method for manufacturing a device using the exposure apparatus.

Background

In a conventional photolithography process for manufacturing electronic devices (microdevices) such as liquid crystal display devices and semiconductor devices (integrated circuits, etc.), an exposure apparatus (so-called scanning stepper (also called scanner)) of a step & scan method is used which transfers a pattern formed on a mask onto a substrate using an energy beam while synchronously moving the mask or reticle (hereinafter, collectively referred to as "mask") and a glass plate or wafer (hereinafter, collectively referred to as "substrate") in a predetermined scanning direction (scanning direction).

Such an exposure apparatus is widely known as an overlay type (gantry type) stage apparatus having an X coarse movement stage movable in a long stroke in a scanning direction, and a Y coarse movement stage movable in a scanning intersecting direction (a direction orthogonal to the scanning direction), and as this stage apparatus, for example, a structure in which a weight canceling (cancel) apparatus on a table formed of a stone material is moved in a horizontal plane is known (for example, see patent document 1).

However, in the exposure apparatus described in patent document 1, since the weight removing device moves in a wide range corresponding to the step & scan operation, it is necessary to make the flatness of the upper surface of the stage (the movement guide surface of the weight removing device) extremely high in a wide range. In addition to the tendency of the exposure target substrate of the exposure apparatus to be increased in size in recent years, the size of the stage is increased, and therefore, in addition to the increase in cost, the transportability of the exposure apparatus, the availability of the dioxan at the time of assembly, and the like have been receiving great attention.

In the exposure apparatus described in patent document 1, a very large space is required in the height direction in order to accommodate the XY two-axis stage, the actuator for driving the fine movement stage a little by a little, and the like between the stage (stage base) and the fine movement stage. For this reason, the weight removing device has to be larger (tall), and a large driving force is also necessary to drive the weight removing device along a horizontal plane.

Conventionally, a linear motor having an iron core that can generate a large driving force (thrust) has been used to drive a substrate stage having a large mass. The linear motor having an iron core can generate a magnetic attraction force (attraction force) several times as large as a thrust force between a magnet unit included in a mover (or stator) and a coil unit having an iron core included in a stator (or mover). Specifically, the suction force of 10000 to 20000N can be generated with respect to the thrust of 4000N.

Therefore, in the conventional substrate stage device having the above-described configuration, the pair of single-axis drive units disposed between the X coarse movement stage and the stage base act to generate a heavy load (and an inertial force accompanying the movement of the X coarse movement stage) on the substrate, the Y coarse movement stage, the X coarse movement stage, and the like, and particularly, a large attractive force generated from the iron-cored linear motors constituting the pair of single-axis drive units also acts thereon. Therefore, the single-shaft drive unit, particularly the linear motor and the guide device, which constitute a part of the single-shaft drive unit, respectively, must have a large load capacity (capability), and the movable member and the fixed member must be firmly configured to withstand the suction force from the linear motor.

On the other hand, since a large frictional resistance acts between the linear guide (rail) and the slider constituting the guide device (single shaft guide), the driving resistance increases, and thus a linear motor capable of generating a larger driving force is required. In addition, the accompanying problems such as an increase in size of the substrate stage device, generation of frictional heat in the guide device and joule heat in the linear motor, and mechanical damage by the adsorbed substance have become apparent.

Prior art documents

[ patent document 1] specification of U.S. patent application publication No. 2010/0018950.

Disclosure of Invention

A 1 st scanning exposure apparatus according to a 1 st aspect of the present invention moves an object to be exposed in a 1 st direction parallel to a horizontal plane by a predetermined 1 st stroke with respect to an energy beam for exposure during an exposure process, the apparatus comprising: a 1 st moving body movable in the 1 st direction by at least the predetermined 1 st stroke; a 2 nd movable body that guides movement of the 1 st movable body in the 1 st direction and is movable in the 2 nd stroke in the 2 nd direction orthogonal to the 1 st direction in the horizontal plane together with the 1 st movable body; an object holding member that can hold the object and move together with the 1 st moving body at least in a direction parallel to the horizontal plane; a weight removing device that supports the object holding member from below to remove the weight of the object holding member; and a support member extending in the 1 st direction, supporting the weight removing device from below and capable of moving in the 2 nd direction by the 2 nd stroke in a state where the weight removing device is supported from below.

According to this apparatus, at the time of exposure processing of the object, the object holding member holding the object is driven in the direction parallel to the 1 st direction (scanning direction) together with the 1 st moving body. In addition, the object is driven in the 2 nd direction orthogonal to the 1 st direction by the 2 nd moving body to move in the 2 nd direction. Thus, the object can be moved two-dimensionally along a plane parallel to the horizontal plane. Here, since it is sufficient to drive only the 1 st moving body (and the object holding member) to move the object in the 1 st direction, it is assumed that the moving body (only the 1 st moving body, the object holding member, and the weight cancellation device) driven at the time of the scanning exposure is smaller in mass than a case where another moving body moving in the 2 nd direction is mounted on the moving body moving in the 1 st direction. Therefore, the actuator for moving the object can be miniaturized. Further, since the support member for supporting the weight cancellation device from below is constituted by a member extending in the 1 st direction and is movable in the 2 nd direction in a state of supporting the weight cancellation device from below, the weight cancellation device is constantly supported from below by the support member regardless of the position in the horizontal plane. Therefore, the entire device can be reduced in weight and size, as compared with the case where a large member having a large guide surface capable of covering the movement range of the weight cancellation device is provided.

A mobile device according to aspect 2 of the present invention includes: a movable body which moves at least in a 1 st direction parallel to a 1 st axis within a plane parallel to a horizontal plane; a base for supporting the movable body; and a driving device including 1 st and 2 nd movable elements provided on the movable body in 1 st predetermined directions and 2 nd predetermined directions intersecting with the 1 st and 2 nd movable elements, respectively, and 1 st and 2 nd stators facing the 1 st and 2 nd movable elements and extending in the 1 st direction on the base, respectively, the movable body being driven in the 1 st direction with respect to the base by using the 1 st direction driving force generated between the 1 st movable element and the 1 st stator and between the 2 nd movable element and the 2 nd stator, respectively; at least one of the 1 st predetermined direction and the 2 nd predetermined direction is a direction in which a 2 nd axis orthogonal to the 1 st axis and a 3 rd axis orthogonal to the horizontal plane intersect in the horizontal plane; at least during the driving of the movable body in the 1 st direction, the forces in the 1 st predetermined direction and the 2 nd predetermined direction act between the 1 st movable element and the 1 st stator, and between the 2 nd movable element and the 2 nd stator, respectively.

Here, the force in the 1 st predetermined direction (opposing direction) acting between the 1 st movable element and the 1 st fixed element and the force in the 2 nd predetermined direction (opposing direction) acting between the 2 nd movable element and the 2 nd fixed element are either attraction forces or repulsion forces in opposing directions, and for example, a magnetic force is typically mentioned, but the force is not limited thereto, and may be a pressure due to a vacuum attraction force, a gas static pressure, or the like.

According to this device, the load acting on the base including the weight of the moving body itself can be reduced by the force in the 1 st predetermined direction acting between the 1 st movable element and the 1 st fixed element and the force in the 2 nd predetermined direction acting between the 2 nd movable element and the 2 nd fixed element when the moving body is driven in the 1 st direction, and the moving body can be driven with high precision without impairing the driving performance.

The 2 nd exposure apparatus according to the 3 rd aspect of the present invention is an apparatus for irradiating an energy beam to form a pattern on an object, and includes the movable body apparatus of the present invention in which the object is held by the other movable body.

According to this apparatus, since the movable body holding the object can be driven with high accuracy, high-accuracy exposure of the object can be performed.

The 3 rd exposure apparatus according to the 4 th aspect of the present invention includes: a movable body for holding the object to move at least in a 1 st direction parallel to a 1 st axis within a plane parallel to a horizontal plane; a base for supporting the movable body; a driving device including 1 st and 2 nd movable elements provided on the movable body in 1 st predetermined directions and 2 nd predetermined directions intersecting with the 1 st and 2 nd movable elements, respectively, and 1 st and 2 nd stators facing the 1 st and 2 nd movable elements and extending in the 1 st direction on the base, respectively, for driving the movable body in the 1 st direction with respect to the base, and using, at the time of the driving, forces in the 1 st predetermined direction and the 2 nd predetermined direction acting between the 1 st movable element and the 1 st stator and between the 2 nd movable element and the 2 nd stator, respectively, as buoyancy of the movable body; and a pattern generating device that irradiates the object with an energy beam to generate a pattern on the object.

According to this device, when the moving body is driven by the driving device, the forces in the 1 st and 2 nd predetermined directions acting between the 1 st movable element and the 1 st stator and between the 2 nd movable element and the 2 nd stator are used as the buoyancy of the moving body, thereby reducing the load acting on the base including the weight of the moving body itself and enabling highly accurate driving of the moving body without impairing the driving performance.

In a 5 th aspect of the present invention, there is provided a method of manufacturing a flat panel display, comprising: exposing the substrate using any one of the 1 st to 3 rd exposure apparatuses; and developing the exposed substrate.

In accordance with a 6 th aspect of the present invention, there is provided a device manufacturing method comprising: an operation of exposing the object by using any one of the 1 st to 3 rd exposure devices; and developing the exposed object.

Drawings

Fig. 1 is a view schematically showing the configuration of an exposure apparatus according to embodiment 1.

Fig. 2 is a plan view of a substrate stage included in the exposure apparatus of fig. 1.

Fig. 3a is a side view of the substrate stage of fig. 2 as viewed from the-Y direction (a cross-sectional view taken along line a-a of fig. 2), fig. 3B is an enlarged view of the periphery of the weight cancellation device included in the substrate stage, and fig. 3C is an enlarged view of the periphery of the base frame (-X side).

Fig. 4 is a plan view of the substrate stage shown in fig. 3a with the fine movement stage removed (a cross-sectional view taken along line B-B of fig. 3).

FIG. 5 is a cross-sectional view taken along line C-C of FIG. 2.

Fig. 6 is a perspective view of a part of the substrate stage of fig. 2 omitted.

FIG. 7 is a block diagram showing the input/output relationship of a main controller mainly constituted by the control system of the exposure apparatus according to embodiment 1.

FIG. 8 is a view schematically showing the structure of an exposure apparatus according to embodiment 2.

Fig. 9 is a plan view of the substrate stage included in the exposure apparatus of fig. 8.

Fig. 10 is a cross-sectional view taken along line D-D of fig. 9.

Fig. 11 is a plan view of the substrate stage excluding the fine movement stage (cross-sectional view taken along line E-E in fig. 10).

FIG. 12 is a sectional view taken along line F-F of FIG. 9.

Fig. 13 is a cross-sectional view of the weight cancellation device included in the substrate stage device of fig. 9.

Fig. 14 is a plan view of the substrate stage according to embodiment 3.

FIG. 15 is a sectional view taken along line G-G of FIG. 14.

Fig. 16 is a cross-sectional view of the weight cancellation device included in the substrate stage device of fig. 14.

Fig. 17 is a plan view of the substrate stage according to embodiment 4.

Fig. 18 is a cross-sectional view of a weight cancellation device and a leveling device provided in a substrate stage device according to modification 1.

Fig. 19 is a cross-sectional view of a weight cancellation device and a leveling device provided in a substrate stage device according to modification 2.

Fig. 20 is a cross-sectional view of a weight cancellation device and a leveling device provided in the substrate stage device according to modification 3.

Fig. 21(a) is a view showing a modification of the X guide, and fig. 21(B) and 21(C) are views showing substrate stage devices according to other modifications.

Fig. 22 is a diagram showing another modification of the substrate stage.

Fig. 23 is a side view showing a schematic configuration of a stage device provided in the exposure apparatus according to embodiment 5.

FIG. 24 is a sectional view taken along line H-H of FIG. 23.

FIG. 25 is a block diagram illustrating the input/output relationship of a main controller provided in the exposure apparatus according to embodiment 5.

Fig. 26 is a cross-sectional view showing a schematic configuration of a single-axis drive unit constituting the stage drive system.

Fig. 27 is a diagram for explaining balance of forces acting on each component of the single-axis drive unit.

Fig. 28 is a diagram for explaining an assembly method of the single-axis drive unit.

Fig. 29 is a view showing a modification (1) of the uniaxial drive unit.

Fig. 30 is a view showing a modification (2) of the uniaxial drive unit.

Detailed Description

Embodiment 1

Hereinafter, embodiment 1 will be described with reference to fig. 1 to 7.

Fig. 1 schematically shows the structure of an exposure apparatus 10 according to embodiment 1. The exposure apparatus 10 is an る step-and-scan type projection exposure apparatus, a so-called scanner, which uses a rectangular glass substrate P (hereinafter simply referred to as a substrate P) used in a liquid crystal display device (flat panel display) as an exposure object.

As shown in fig. 1, exposure apparatus 10 includes an illumination system IOP, a mask stage MST holding a mask M, a projection optical system PL, a pair of substrate stage stages 19, a substrate stage device PST holding a substrate P so as to be movable along a horizontal plane, and a control system for these components. In the following description, the direction in the horizontal plane in which the mask M and the substrate P are scanned with respect to the projection optical system PL during exposure is defined as the X-axis direction, the direction orthogonal thereto in the horizontal plane is defined as the Y-axis direction, and the directions orthogonal to the X-axis and the Y-axis directions are defined as the Z-axis direction, and the rotational (tilt) directions around the X-axis, the Y-axis, and the Z-axis are defined as the θ X, θ Y, and θ Z directions, respectively.

The illumination system IOP is configured similarly to the illumination system disclosed in, for example, U.S. Pat. No. 6,552,775 and the like.

That is, the illumination system IOP has a plurality of, for example, 5 illumination systems each illuminating a plurality of, for example, 5 illumination areas arranged in a zigzag shape on the mask M, and each illumination system irradiates light emitted from a light source (for example, a mercury lamp), not shown, as exposure illumination light (illumination light) IL onto the mask M through a mirror, a spectroscope (dichroic mirror), a blind, a wavelength selection filter, various lenses, and the like, not shown. The illumination light IL is, for example, light of i-line (wavelength 365nm), g-line (wavelength 436nm), h-line (wavelength 405nm), etc. (or synthesized light of the above-mentioned i-line, g-line, h-line). The wavelength of the illumination light IL can be appropriately switched by a wavelength selective filter, for example, depending on the required resolution.

A mask M having a pattern surface (lower surface in fig. 1) on which a circuit pattern or the like is formed is fixed to mask stage MST by, for example, vacuum suction. Mask stage MST is mounted on a guide (not shown) in a non-contact state, and is driven in the scanning direction (X-axis direction) by a predetermined stroke by mask stage driving system MSD (not shown in fig. 1, see fig. 7) including, for example, a linear motor, and is finely driven in the Y-axis direction and θ z direction as appropriate.

Positional information of mask stage MST in the XY plane is measured at any time, for example, with a resolving power of about 0.5 to 1nm by a laser interferometer (hereinafter, referred to as "mask interferometer") 16 that irradiates a reflection surface of mask M with a laser beam (measuring beam). This measurement result is supplied to the main control device 50 (refer to fig. 7).

Based on the measurement result of mask interferometer 16, main controller 50 controls the driving of mask stage MST by mask stage driving system MSD (not shown in fig. 1, see fig. 4). Alternatively, an encoder (or an encoder system including a plurality of encoders) may be used instead of or in addition to the mask interferometer 16.

Projection optical system PL is arranged below mask stage MST in fig. 1. The projection optical system PL has the same configuration as that of the projection optical system disclosed in, for example, U.S. Pat. No. 6,552,775. That is, the projection optical system PL corresponds to the plurality of illumination areas, and the plurality of, for example, five projection optical systems (multi-lens projection optical systems) in which the projection areas including the pattern image of the mask M are arranged in a staggered manner have the same function as the projection optical system having a rectangular single image field whose longitudinal direction is the Y-axis direction. In the present embodiment, each of the plurality of projection optical systems is composed of, for example, a 2-segment lens-in-lens (mirror lens) optical system including a prism, an optical element group (lens group), and two sets of mirrors arranged along the optical axis, and forms an erect image by using, for example, an equal power system that is telecentric on both sides.

Therefore, when the illumination area on the mask M is illuminated with the illumination light IL from the illumination system IOP, that is, the illumination light IL passing through the mask M arranged so that the 1 st surface (object surface) of the projection optical system PL and the pattern surface substantially coincide with each other, a projection image (partial erected image) of the circuit pattern of the mask M in the illumination area is formed on the projection optical system PL through the illumination area (exposure area) of the illumination light IL conjugate with the illumination area on the substrate P arranged on the 2 nd surface (image surface) side of the projection optical system PL and coated with a photoresist (sensor) on the surface. By synchronously driving mask stage MST and fine movement stage 21 described later, which constitutes a part of substrate stage device PST, mask M is moved in the scanning direction (X-axis direction) with respect to the illumination area (illumination light IL) and substrate P is moved in the scanning direction (X-axis direction) with respect to the exposure area (illumination light IL), so that scanning exposure of one illumination area (divided area) on substrate P is performed, and the pattern (mask pattern) of mask M is transferred to the illumination area. That is, in the present embodiment, a pattern of the mask M is generated on the substrate P by the illumination system IOP and the projection optical system PL, and the pattern is formed on the substrate P by exposure of the sensitive layer (resist layer) on the substrate P using the illumination light IL.

Each of the pair of substrate stage mounts 19 is formed of a member extending in the Y-axis direction (see fig. 5), and both ends in the longitudinal direction thereof are supported from below by the vibration isolator 13 provided on the floor surface F. A pair of substrate stage mounts 19 are arranged in parallel at a predetermined interval in the X-axis direction. The pair of substrate stage mounts 19 constitute an apparatus main body (body) of the exposure apparatus 10, and the projection optical system PL, the mask stage MST, and the like are mounted on the apparatus main body.

As shown in fig. 1, substrate stage device PST includes a pair of bed (bed)12, a pair of base frames 14, coarse movement stage 23, fine movement stage 21, weight cancellation device 40, X guide 102 that supports weight cancellation device 40 from below, and the like.

Each of the pair of base beds 12 is formed of a rectangular box-shaped member (rectangular parallelepiped-shaped member) whose longitudinal direction is the Y-axis direction in a plan view (as viewed from the + Z side). The pair of bed members 12 are arranged in parallel at a predetermined interval in the X-axis direction. The + X-side base bed 12 is mounted on the + X-side substrate stage mount 19, and the-X-side base bed 12 is mounted on the-X-side substrate stage mount 19, as shown in fig. 1. The positions of the upper surfaces of the pair of bed plates 12 in the Z-axis direction (hereinafter, referred to as Z positions) are adjusted to be substantially the same.

As is clear from FIGS. 1 and 2, the pair of bedsteads 12 are mechanically connected in the vicinity of both ends in the longitudinal direction by two connecting members 79. As shown in fig. 3(a), each of the pair of bedpans 12 is formed of a hollow member, and a plurality of ribs formed of plate-like members parallel to YZ-plane are provided between the upper surface portion and the lower surface portion at predetermined intervals in the X-axis direction to ensure rigidity and strength. Further, although not shown, a plurality of ribs formed of plate-like members parallel to the XZ plane are provided between the upper surface and the lower surface of the bed 12 at predetermined intervals in the Y-axis direction. A circular hole (see fig. 5) for reducing the weight and forming is formed in the center of each of the plurality of ribs and the side surface of the bed 12. For example, when sufficient exposure accuracy can be ensured without providing the connection member 79, the connection member 79 may not be provided.

As shown in fig. 2, a plurality of Y linear guides 71A (four, for example, in the present embodiment) which are essential components of the mechanical uniaxial guide device are fixed on the upper surfaces of the pair of bed plates 12 at predetermined intervals in the X-axis direction so as to be parallel to each other.

One of the pair of base frames 14 is disposed on the + X side of the + X side bed 12, and the other is disposed on the-X side of the-X side bed 12, as shown in FIG. 1 and FIG. 3 (A). Since the pair of base frames 14 have the same structure, only the base frame 14 on the-X side will be described below. The base frame 14, as shown in fig. 3(C), includes: the body portion 14a includes a plate-like member extending in the Y-axis direction and having one surface and the other surface parallel to the YZ plane, and a plurality of leg portions 14b (not shown in fig. 2 and 4) for supporting the body portion 14a from below. The length (dimension in the longitudinal direction (Y-axis direction)) of the main body portion 14a is set to be longer than the length of each of the pair of bedsteads 12 in the Y-axis direction. The leg parts 14b are provided at predetermined intervals in the Y-axis direction, for example, three. At the lower end of the leg portion 14b, a plurality of adjusters 14c are provided to adjust the Z position of the main body portion 14 a.

Y stators 73, which are elements of the linear motor, are fixed to both side surfaces of the main body 14 a. The Y stator 73 has a magnet unit including a plurality of permanent magnets arranged at predetermined intervals in the Y axis direction. Y linear guides 74A, which are elements of a mechanical uniaxial guide device, are fixed to the upper surface and both side surfaces of the main body portion 14A (below the Y stator 73).

Returning to fig. 1, coarse movement stage 23 includes Y coarse movement stage 23Y and X coarse movement stage 23X mounted on Y coarse movement stage 23Y. The coarse movement stage 23 is positioned above (+ Z side) the pair of bed 12.

Y coarse movement stage 23Y has a pair of X columns 101 as shown in fig. 2. The pair of X columns 101 are each formed of a member extending in the X-axis direction and having a YZ cross section in a rectangular shape, and are arranged parallel to each other at a predetermined interval in the Y-axis direction. Further, since the rigidity of each X column 101 in the Z axis direction (gravity direction) is not required to be higher than that in the Y axis direction, the YZ cross section may have an I shape, for example.

As shown in fig. 6, a member called a Y bracket (carriage)75 is fixed to the lower surface of each of the pair of X columns 101 near both ends in the longitudinal direction via a sheet 76. That is, a total of four Y holders 75 are attached to the lower surface of Y coarse movement stage 23Y, for example. The plate 76 is formed of a plate-like member extending in the Y-axis direction in parallel with the XY-plane, and mechanically connects the pair of X-pillars 101 to each other. For example, since each of the four Y holders 75 in total has the same configuration, only one Y holder 75 corresponding to the-X side mount 14 will be described below.

The Y holder 75 is formed of a member having an inverted U-shape in XZ cross section as shown in FIG. 3C, and the main body 14a of the base frame 14 is inserted between a pair of facing surfaces. A pair of Y movers 72 facing each other are fixed to each of the pair of Y stators 73 through a predetermined gap on each of the pair of facing surfaces of the Y holder 75. Each Y movable element 72 includes a coil unit (not shown), and constitutes a Y linear motor YDM (see fig. 7) that drives the Y coarse movement stage 23Y (see fig. 1) in the Y axis direction by a predetermined stroke, together with the opposing Y stator 73. In the present embodiment, since the total of four Y holders 75 are provided as described above, for example, Y coarse movement stage 23Y is driven in the Y axis direction by the total of eight Y linear motors YDM, for example.

Sliders 74B including a rotating body (e.g., a plurality of balls) and slidably engaged with the Y linear guide 74A are fixed to a pair of opposing surfaces and a top surface of the Y holder 75, respectively. In fig. 3C, although the pair of opposing surfaces and the top surface of the Y holder 75 are overlapped and shielded in the depth direction of the paper, two sliders 74B are attached to each of the pair of opposing surfaces and the top surface of the Y holder 75 at a predetermined interval in the depth direction of the paper (Y-axis direction), for example (see fig. 5). Y coarse movement stage 23Y (see fig. 1) is linearly guided in the Y-axis direction by a plurality of Y linear guide devices including Y linear guide 74A and slider 74B. Further, although not shown, a Y scale whose periodic direction is the Y axis direction is fixed to main body portion 14a of base frame 14, and an encoder head constituting a Y linear encoder system EY (see fig. 7) for obtaining positional information of Y coarse movement stage 23Y in the Y axis direction together with the Y scale is fixed to Y holder 75. The position of Y coarse movement stage 23Y in the Y axis direction is controlled by main control device 50 (see fig. 7) based on the output of the encoder head.

Here, as shown in fig. 1, an auxiliary guide frame 103 is disposed between the pair of bed frames 12. The auxiliary guide frame 103 is composed of a member extending in the Y-axis direction, and is installed on the floor F through a plurality of adjusters. One Y linear guide 77A, which is a component of a mechanical uniaxial guide device extending in the Y-axis direction, is fixed to an upper end face (+ Z-side end face) of the auxiliary guide frame 103. The Z position of the upper end of the auxiliary guide frame 103 is set to be substantially the same as the upper surface of the pair of bedsteads 12. The auxiliary guide frame 103 is separated from the pair of base beds 12 and the pair of substrate stage mounts 19 in terms of vibration. Further, since the pair of bedsteads 12 are mechanically connected by the connecting member 79, a through hole, not shown, for passing the connecting member 79 is formed in the auxiliary guide frame 103.

An auxiliary bracket 78 (see fig. 6) is fixed to the lower surface of each of the longitudinal center portions of the pair of X columns 101. The auxiliary holder 78 is formed of a rectangular parallelepiped member, and as shown in fig. 1, a slider 77B including a rotating body (e.g., a plurality of balls) and slidably engaged with the Y linear guide 77A is fixed to a lower surface thereof. In fig. 1, although it cannot be seen because they overlap in the depth direction of the drawing sheet, two sliders 77B are attached to one auxiliary holder 78, for example, at a predetermined interval in the depth direction of the drawing sheet (Y-axis direction). In this way, the longitudinal center portion of Y coarse movement stage 23Y is supported from below by auxiliary guide frame 103 through auxiliary holder 78, so that the bending due to its own weight is suppressed.

Returning to fig. 2, a plurality of X linear guides 80A (two for one X column 101, for example) extending in the X axis direction are fixed to the upper surfaces of the pair of X columns 101 at predetermined intervals in the Y axis direction so as to be parallel to each other. An X stator 81A is fixed to a region between the pair of X linear guides 80A on the upper surfaces of the pair of X columns 101. The X stator 81A has a magnet unit including a plurality of permanent magnets arranged at predetermined intervals in the X axis direction.

As described above, Y coarse movement stage 23Y is supported from below by the pair of base frames 14 and auxiliary guide frame 103, and is separated from the pair of base beds 12 and substrate stage mounting 19 in terms of vibration.

X coarse movement stage 23X is formed of a plate-like member rectangular in plan view, and has an opening formed in the central portion thereof as shown in fig. 4. As shown in fig. 5, a pair of X movers 81B are fixed to the lower surface of X coarse movement stage 23X, and the pair of X movers 81B face X stator 81A fixed to each of the pair of X columns 101 through a predetermined gap. Each X mover 81B includes a coil unit (not shown), and constitutes an X linear motor XDM (see fig. 7) that drives X coarse movement stage 23X in the X axis direction by a predetermined stroke, together with opposing X stator 81A. In the present embodiment, X coarse movement stage 23X is driven in the X axis direction by, for example, a pair of (two) X linear motors XDM provided corresponding to a pair of X columns 101.

As shown in fig. 1, a plurality of sliders 80B including a rotating body (e.g., a plurality of balls) and slidably engaged with the X linear guide 80A are fixed to the lower surface of the X coarse movement stage 23X. Slide 80B is provided with, for example, four slides 80B at predetermined intervals in the X axis direction with respect to one X linear guide 80A, and 16 slides 80B in total are fixed to the lower surface of X coarse movement stage 23X, for example. X coarse movement stage 23X is guided linearly in the X-axis direction by a plurality of X linear guide devices each including an X linear guide 80A and a slider 80B. In addition, X coarse movement stage 23X is restricted from moving in the Y-axis direction with respect to Y coarse movement stage 23Y by a plurality of sliders 80B, and moves in the Y-axis direction integrally with Y coarse movement stage 23Y.

Although not shown, an X scale having the X axis direction as the periodic direction is fixed to at least one of the pair of X columns 101, and an encoder head is fixed to X coarse movement stage 23X, and this encoder head constitutes, together with the X scale, an X linear encoder system EX (see fig. 7) for obtaining position information of X coarse movement stage 23X in the X axis direction. The position of X coarse movement stage 23X in the X axis direction is controlled by main control device 50 (see fig. 7) based on the output of the encoder head. In the present embodiment, encoder system 20 (see fig. 7) for detecting positional information (including rotation in the θ z direction) of the coarse movement stage (X coarse movement stage 23X) in the XY plane is configured including the X linear encoder system EX and the Y linear encoder system EY.

Further, although not shown, a stopper (stopper) member that mechanically restricts the movable amount of fine movement stage 21 with respect to X coarse movement stage 23X, a gap sensor that measures the amount of movement of fine movement stage 21 with respect to X coarse movement stage 23X in the X-axis and Y-axis directions, and the like are attached to X coarse movement stage 23X.

As is clear from fig. 1 and 2, the fine movement stage 21 is composed of a plate-like member (or a box-like (hollow rectangular parallelepiped) member) having a substantially square shape in plan view, and the substrate P is held by suction, for example, by vacuum suction (or electrostatic suction) on the plate-like member (or the box-like (hollow rectangular parallelepiped) member) through the substrate holder PH.

Fine movement stage 21 is fine-driven in the 3-degree-of-freedom direction (each direction of the X axis, Y axis, and θ z) in the XY plane on X coarse movement stage 23X by fine movement stage drive system 26, and fine movement stage drive system 26 (see fig. 7) includes a plurality of voice coil motors (or linear motors) each including a stator fixed to X coarse movement stage 23X and a movable rotor fixed to fine movement stage 21. As shown in fig. 2, a pair of X voice coil motors 18X for micro-driving the micro-movement stage 21 in the X-axis direction are provided apart in the Y-axis direction, and a pair of Y voice coil motors 18Y for micro-driving the micro-movement stage 21 in the Y-axis direction are provided apart in the X-axis direction. Fine movement stage 21 is driven in synchronization with X coarse movement stage 23X (driven in the same direction as X coarse movement stage 23X at the same speed) using X voice coil motor 18X and/or Y voice coil motor 18Y described above, and moves in the X-axis direction and/or the Y-axis direction with X coarse movement stage 23X by a predetermined stroke. Therefore, fine movement stage 21 can move (roughly move) in the XY biaxial directions with a long stroke with respect to projection optical system PL (see fig. 1), and can perform fine movement in the three-degree-of-freedom directions of X, Y and θ z.

Further, as shown in fig. 3(B), fine movement stage drive system 26 includes a plurality of Z voice coil motors 18Z for fine-driving fine movement stage 21 in the 3-degree-of-freedom direction of θ x, θ y, and Z-axis directions. Plural Z voice coil motors 18Z are arranged at four corners of the bottom surface of fine movement stage 21 (only two of the four Z voice coil motors 18Z are shown in fig. 3B, and the other two are not shown). The structure of a system including a plurality of voice coil motors and a micro-motion stage driving system is disclosed in, for example, U.S. patent application publication No. 2010/0018950.

In the present embodiment, a substrate stage drive system PSD (see fig. 7) is configured including a fine movement stage drive system 26 and a coarse movement stage drive system configured by the plurality of Y linear motors YDM and the pair of X linear motors XDM.

As shown in fig. 3a, an X moving mirror (bar mirror) 22X having a reflection surface orthogonal to the X axis is fixed to a-X side surface of the fine movement stage 21 through a mirror (mirror) base 24X. As shown in fig. 5, a Y-moving mirror 22Y having a reflection surface orthogonal to the Y axis is fixed to the-Y side surface of the fine movement stage 21 through a mirror base 24Y. Positional information of fine movement stage 21 in the XY plane is detected at any time with an analytical capability of, for example, about 0.5 to 1nm by a laser interferometer system (hereinafter, referred to as a substrate interferometer system) 92 (see fig. 1) using X moving mirror 22X and Y moving mirror 22Y. In practice, the substrate interferometer system 92 includes a plurality of X laser interferometers corresponding to the X moving mirror 22X and a plurality of Y laser interferometers corresponding to the Y moving mirror 22Y, but only the X laser interferometers are representatively shown in fig. 1. The plurality of laser interferometers are respectively fixed on the device body. The positional information of the fine movement stage 21 in the θ x, θ y, and Z-axis directions is obtained by using a sensor, not shown, fixed to the lower surface of the fine movement stage 21, for example, a target fixed to a weight cancellation device 40 described later. The configuration of the position measuring system of the fine movement stage 21 is disclosed in, for example, U.S. patent application publication No. 2010/0018950.

The weight cancellation device 40 is, as shown in fig. 3(a), composed of a columnar member extending in the Z-axis direction, also referred to as a stem. The weight cancellation device 40 is mounted on an X-way 102 described later, and supports the fine movement stage 21 from below via a leveling (leveling) device 57 described later する. Weight cancellation device 40 has an upper half inserted into the opening of X coarse movement stage 23X, and a lower half inserted between a pair of X columns 101 (see fig. 4).

As shown in fig. 3(B), the weight cancellation device 40 includes a housing 41, an air spring 42, a Z slider 43, and the like. The housing 41 is formed of a bottomed cylindrical member having an opening on the + Z side. A plurality of air bearings (hereinafter, referred to as base pads) 44 having bearing surfaces facing the-Z side are mounted on the lower surface of the housing 41. The air spring 42 is housed inside the housing 41. The air spring 42 is supplied with pressurized gas from the outside. The Z slider 43 is formed of a cylindrical member extending in the Z-axis direction, and is inserted into the housing 41 and mounted on the air spring 42. An air bearing, not shown, having a bearing surface facing the + Z side is attached to the + Z side end of the Z slider 43.

The leveling device 57 is a device for supporting the fine movement stage 21 to be tiltable (swingable in the θ x and θ y directions with respect to the XY plane), and is supported from below by the air bearing attached to the Z slider 43 in a noncontact manner. The weight cancellation device 40 cancels (cancels) the weight (downward force in the direction of gravity) of the system including the fine movement stage 21 by the force raised in the direction of gravity by the air spring 42 through the Z slider 43 and the leveling device 57, thereby reducing the load of the plurality of Z voice coil motors 18Z.

Weight cancellation device 40 is mechanically connected to X coarse movement stage 23X via a plurality of connection devices 45. The Z position of the plurality of connecting means 45 substantially coincides with the center of gravity position of the weight cancellation device 40 in the Z-axis direction. The connecting means 45 includes a thin steel plate or the like parallel to the XY plane, and is also called a flexure (flexure) means. Coupling device 45 couples housing 41 of weight cancellation device 40 and X coarse movement stage 23X on + X side, -X side, + Y side, -Y side of weight cancellation device 40 (in fig. 3B, + Y side, -Y side coupling device 45 is not shown; see fig. 4). Therefore, weight cancellation device 40 is pulled by X coarse movement stage 23X through any of a plurality of connection devices 45, and moves integrally with X coarse movement stage 23X in the X-axis direction or the Y-axis direction. At this time, a traction force acts on the weight cancellation device 40 in a plane parallel to the XY plane including the position of the center of gravity thereof in the Z-axis direction, and therefore a moment (pitching moment) about an axis orthogonal to the moving direction is not generated (acts). The details of the structure of the weight reducing device 40 according to the present embodiment, including the leveling device 57 and the coupling device 45, are disclosed in, for example, U.S. patent application publication No. 2010/0018950.

As shown in fig. 3a, the X guide 102 includes a guide body 102a formed of a member having an inverted U-shape in YZ cross section (see fig. 5) whose longitudinal direction is the X-axis direction, and a plurality of ribs 102 b. The X-guide 102 is disposed above (on the + Z side) the pair of bedsteads 12 so as to cross the pair of bedsteads 12. The length (dimension in the longitudinal direction (X-axis direction)) of the X-guide 102 is set to be longer than that of the X-guide

The sum of the dimension in the X-axis direction of each of the pair of bed plates 12 arranged at a predetermined interval in the X-axis direction and the dimension in the X-axis direction of the gap between the pair of bed plates 12 is slightly longer. Therefore, as shown in fig. 2, the + X side end of the X guide 102 protrudes to the + X side (outside of the bed 12) from the + X side end of the + X side bed 12, and the-X side end of the X guide 102 protrudes to the-X side (outside of the bed 12) from the-X side end of the-X side bed 12.

The upper face (+ Z-side face) of the guide body 102a is parallel to the XY plane and the flatness is made very high. The weight cancellation device 40 is mounted on the upper surface of the guide body 102a in a non-contact state through the plurality of base pads 44. The upper surface of the guide body 102a is adjusted to be parallel to the horizontal plane with good accuracy, and functions as a guide surface when the weight cancellation device 40 moves. The length (dimension in the longitudinal direction) of the guide body 102a is set to be slightly longer than the amount of movement of the weight cancellation device 40 (i.e., the X coarse movement stage 23X) in the X-axis direction. The width (dimension in the Y-axis direction) of the upper surface of the guide body 102a is set to a dimension that can face all the bearing surfaces of the plurality of base pads 44 (see fig. 4). Further, both ends of the guide body 102a in the longitudinal direction are closed by plate-like members parallel to the YZ plane.

The plurality of ribs 102b are formed of plate-like members parallel to YZ-plane, respectively, and are provided at predetermined intervals in the X-axis direction. Each of the plurality of ribs 102b is connected to a pair of opposing surfaces and a top surface of the guide body 102a which face each other. Here, the material and the manufacturing method of the X guide 102 including the plurality of ribs 102b are not particularly limited, but for example, when the X guide is formed by casting using iron or the like, when the X guide is formed by stone (for example, gabbros), when the X guide is formed by ceramic or cfrp (carbon fiber reinforced plastics), or the like, the guide body 102a and the plurality of ribs 102b are integrally formed. However, the guide body 102a and the plurality of ribs 102b may be made of different members, and the plurality of ribs 102b may be connected to the guide body 102a by, for example, welding. The X guide 102 may be a solid member or a box-shaped member closed on the lower surface side.

A Y slider 71B including a rotating body (e.g., a plurality of balls) and slidable on a Y linear guide 71A fixed to the upper surface of each of the pair of bed 12 is fixed to the lower end of each of the plurality of ribs 102B. As shown in fig. 4, a plurality of Y sliders 71B are fixed at predetermined intervals in the Y axis direction (in the present embodiment, two Y linear guides 71A are fixed, for example). The flatness of the upper surface of the guide body 102a can be adjusted by appropriately inserting a spacer or the like between the plurality of ribs 102B and the Y slider 71B.

As shown in fig. 2, the plate-like members provided at both ends of the X guide 102 in the longitudinal direction are opposed to Y movable members 72A (see fig. 4. for easy understanding, the plate pieces 76 in fig. 4 are not shown) to which elements of a Y linear motor 82 (see fig. 7) for driving the X guide 102 in the Y axis direction by a predetermined stroke are fixed so as to be spaced apart from the pair of Y fixed members 73 (see fig. 3C) by a predetermined gap. Each Y mover 72A has a coil unit not shown. The X guide 102 is driven in the Y axis direction by a pair of Y linear motors 82 including a Y stator 73 and a Y mover 72A, respectively, at a predetermined stroke. That is, in the present embodiment, the pair of Y linear motors 82 for driving the X guide 102 in the Y axis direction and the Y linear motor YDM for driving the Y coarse movement stage 23Y in the Y axis direction use the common stator 73.

Further, although not shown, a Y scale whose periodic direction is the Y axis direction is fixed to one of the pair of bed frames 12, and an encoder head constituting a Y linear encoder system 104 (see fig. 7) for obtaining position information of the X guide 102 in the Y axis direction together with the Y scale is fixed to the X guide 102. X guide 102 and Y coarse movement stage 23Y are driven in the Y-axis direction in synchronization with the output of the encoder head by main control device 50 (see fig. 7) (however, if necessary, the Y position may be controlled individually).

In addition, a rectangular mark plate (not shown) whose longitudinal direction is the Y-axis direction is fixed to the upper surface of the substrate holder PH. The height of the marking plate is set to be substantially the same as the surface of the substrate P mounted on the substrate holder PH. A plurality of, here, six reference marks (not shown) arranged in the Y-axis direction are formed on the surface of the marking plate.

Further, in the substrate holder PH (fine movement stage 21), six mark image detectors including a lens system and an imaging element (CCD or the like) are arranged below (on the side of the Z) each of the six reference marksMeasuring system MD₁～MD₆(refer to fig. 7). Such label image detection system MD₁～MD₆Projected images of alignment marks on the mask M formed by the lens system and each of the five projection optical systems and an image of a reference mark (not shown) formed by the lens system are simultaneously detected, and the position of the image of the alignment mark is measured with the position of the image of the reference mark as a reference. The measurement results thereof are supplied to the main control device 50 for the position alignment of the mask M (mask alignment) and the like.

Further, in the exposure apparatus 10, in order to detect six fiducial marks and alignment marks on the substrate P, six off-axis alignment detection systems AL are provided₁～AL₆(refer to fig. 7). The six alignment detection systems are sequentially arranged along the Y-axis on the + X side of the projection optical system PL.

Each alignment detection system is a FIA (field Image alignment) system sensor using Image processing. The FIA system sensor irradiates the target mark with a wide-band detection light that does not make the resist on the substrate P sensitive to light, and captures an image of the target mark formed on the light-receiving surface by the reflected light from the target mark and an image of an index (not shown) using an image pickup device (CCD) or the like. Alignment detection system AL₁～AL₆The detection result is sent to the main control device 50 through an alignment signal processing system (not shown).

In addition, an alignment sensor that can irradiate coherent detection light to an object mark to detect scattered light or diffracted light generated from the object mark, or can detect two diffracted lights (e.g., the order) generated from the object mark by interference can also be used alone or in appropriate combination.

Fig. 7 is a block diagram mainly configured by a control system of the exposure apparatus 10, and showing input/output relationships of the main controller 50 which integrally controls each unit. The main control device 50 includes a workstation (or a microcomputer) and the like, and integrally controls each component of the exposure apparatus 10.

Next, batch processing of the substrates P in the exposure apparatus 10 will be briefly described.

After a batch of a plurality of (e.g., 50 or 100) substrates P to be processed is pulled into a coating and developing machine (hereinafter, referred to as "C/D") (not shown) connected to the exposure apparatus 10, the substrates in the batch are sequentially coated with resist by a coater (resist coating apparatus) in the C/D and are transported to the exposure apparatus 10 by a transport system (not shown). Under the control of the main controller 50, the mask M is loaded onto the mask stage MST by a mask carrier (mask loader), not shown, and then the mask alignment is performed.

When the substrate P coated with the photoresist is loaded on the substrate holder PH, the main control device 50 uses the alignment inspection system AL₁～AL₆A reference mark on the substrate holder PH is detected, and a reference line measurement is performed.

Next, the master control device 50 uses the alignment detection system AL₁～AL₆A plurality of alignment marks transferred on the substrate P together with the pattern at the time of the previous exposure of the previous layer are detected to perform alignment of the substrate P.

After the alignment of the substrate P is completed, the main controller 50 performs a step-and-scan exposure operation for sequentially transferring the pattern of the mask M to a plurality of shot areas on the substrate P by the scanning exposure. Since the exposure operation is the same as that of the step-and-scan method which is conventionally performed, a detailed description thereof will be omitted.

In this case, the step-and-scan exposure is performed sequentially on a plurality of shot areas provided on the substrate P. The substrate P is driven at a constant speed in the X-axis direction by a predetermined stroke during the scanning operation (hereinafter, referred to as X-scanning operation), and is appropriately driven in the X-axis direction and/or the Y-axis direction during the stepping operation (during movement between irradiation regions) (hereinafter, referred to as X-stepping operation and Y-stepping operation, respectively).

In the case where substrate P is moved in the X-axis direction during the above-described X-scanning operation and X-stepping operation, substrate stage device PST drives X coarse movement stage 23X in the X-axis direction by a pair of (two) X linear motors XDM on Y coarse movement stage 23Y in accordance with an instruction based on the measurement values from X linear encoder system EX of main control device 50, and drives fine movement stage 21 in synchronization with X coarse movement stage 23X by a plurality of X voice coil motors 18X in accordance with an instruction based on the measurement values from substrate interferometer system 92 of main control device 50. When X coarse movement stage 23X moves in the X-axis direction, weight cancellation device 40 moves in the X-axis direction together with X coarse movement stage 23X as it is pulled by X coarse movement stage 23X. At this time, the weight cancellation device 40 moves on the X-ray member 102. In the X-scan operation and the X-step operation, fine movement stage 21 may be slightly driven in the Y-axis direction and/or θ z direction with respect to coarse X-movement stage 23X, but since the Y position of weight cancellation device 40 does not change, weight cancellation device 40 always moves only on X guide 102.

In contrast, in the Y step operation, in substrate stage device PST, Y coarse movement stage 23Y is driven in the Y axis direction by a predetermined stroke on a pair of base frames 14 by a plurality of Y linear motors YDM in accordance with an instruction based on the measurement value of Y linear encoder system EY from main control device 50, and X coarse movement stage 23X and Y coarse movement stage 23Y move in the Y axis direction together by the predetermined stroke. Further, weight cancellation device 40 moves in the Y axis direction by a predetermined stroke integrally with X coarse movement stage 23X. At this time, X guide 102 supported from below by weight removal device 40 is driven in synchronization with Y coarse movement stage 23Y. Therefore, the weight removing device 40 is constantly supported from below by the X-way member 102.

As described above, according to the exposure apparatus 10 of the present embodiment, the weight cancellation device 40 is constantly supported from below by the X guide 102 regardless of the position of the XY plane. Since X guide 102 is formed of a plate-like member having a narrow width extending in the scanning direction, substrate stage device PST can be made lighter than when using a guide (e.g., a table formed of stone) having a large guide surface that can cover the entire movement range of weight cancel device 40. Further, the guide having the large guide surface is difficult to process and convey in the case of a large substrate, but the X-guide 102 of the present embodiment is formed of a narrow plate-like member having a belt-like guide surface extending in the X-axis direction, and therefore, is easy to process and convey.

Further, since the X guide 102, which is a member extending in the X-axis direction, is supported from below at a plurality of places by the pair of bedsteads 12, bending due to the weight of the X guide 102 itself or the load of the weight cancellation device 40 can be suppressed. Further, since the number of the bedsteads 12 is two, the size and weight of each of the two bedsteads 12 can be reduced as compared with the case of one bedstead 12. Thus, the bottom bed 12 can be easily processed and transported, and workability in assembling the substrate stage device PST can be improved.

Further, since the X guide 102 and the pair of bedsteads 12 guiding the X guide 102 in the Y-axis direction are both of a rib structure, they are light in weight and easy to ensure rigidity in the Z-axis direction. Therefore, the assembling work of substrate stage device PST is also better than the case of using the guide having a large guide surface.

Further, since the weight cancellation device 40 is supported on the X guide 102 in a non-contact manner, vibration generated by the movement of the weight cancellation device 40 is not transmitted to the X guide 102. Thus, the vibration is not transmitted to, for example, projection optical system PL through X guide 102, the pair of base beds 12, substrate stage mount 19, and the like, and the exposure operation can be performed with high accuracy. Further, since X guide 102 is driven in the vicinity of the center of gravity in the Z-axis direction by a pair of Y linear motors 82 including Y stator 73 fixed to a pair of base frames 14, a moment (pitching moment) around the X-axis is not generated, and a reaction force of the driving force is not transmitted to substrate stage mount 19. Thus, the exposure operation can be performed with high accuracy.

Since the Y-axis direction movement of the X guide 102 is performed during the Y-step operation, which does not require a high degree of positioning accuracy, even if the frictional resistance of the linear guide device or the torque generated by the driving acts on the weight cancellation device 40 or the X guide 102, the vibration due to the torque can be converged before the X-scan operation after the Y-step operation. Also, the yaw motion (moment about the Z axis) caused by the Y-axis direction driving of the X guide 102 can be strictly controlled and suppressed by the driving force difference of the pair of Y linear motors 82 for driving the X guide 102.

Further, coarse movement stage 23(XY stage device) of the present embodiment has a configuration in which X coarse movement stage 23X is mounted on Y coarse movement stage 23Y, and therefore, compared with, for example, a conventional XY stage device having a configuration in which Y coarse movement stage is mounted on an X coarse movement stage, X coarse movement stage 23X that moves in the X axis direction of the scanning direction by a long stroke has a small inertial mass. Therefore, the driving reaction force received by the ground surface F through the coarse movement stage 23 during the X scanning operation is small. As a result, ground vibration affecting the entire apparatus can be suppressed during the X-scan operation. In contrast, although the drive mass and the drive reaction force when Y coarse movement stage 23Y moves in the Y axis direction are larger than those of the conventional XY stage device, since the Y step operation which does not require high-precision positioning is performed, the influence of ground vibration on the exposure operation is small.

Further, in coarse movement stage 23, since the pair of X columns 101 included in Y coarse movement stage 23Y are supported at the intermediate portion in the X direction by auxiliary guide frames 103 arranged between the pair of beds 12, respectively, it is possible to suppress bending due to the self weight or the load of X coarse movement stage 23X. Accordingly, the straightness accuracy of X linear guide 80A fixed to the pair of X columns 101 can be improved, and X coarse movement stage 23X can be guided straight in the X axis direction with high accuracy. Further, compared to the case of supporting only both ends, it is not necessary to make each of the pair of X columns 101 a strong structure (thin member) in order to secure bending rigidity, and weight reduction is possible.

EXAMPLE 2 embodiment

Next, embodiment 2 will be described with reference to fig. 8 to 13. Here, the same or similar constituent parts in embodiment 1 と are denoted by the same or similar reference numerals, and the detailed description thereof is simplified or omitted.

Fig. 8 schematically shows the structure of an exposure apparatus 110 according to embodiment 2. The exposure apparatus 110 is a so-called scanner (scanner) which is a projection exposure apparatus of a step-and-scan method using a substrate P used for a liquid crystal display device (flat panel display) as an exposure object.

Fig. 9 is a plan view showing substrate stage device PSTa of exposure apparatus 110 in fig. 8, and fig. 10 is a cross-sectional view taken along line D-D in fig. 9. Fig. 11 is a plan view of the substrate stage device with the fine movement stage removed (cross-sectional view taken along line E-E in fig. 10), and fig. 12 is a cross-sectional view taken along line F-F in fig. 9. Fig. 13 is a cross-sectional view of a weight cancellation device included in substrate stage device PSTa.

As is clear from comparison between fig. 8 to 13 and fig. 1 to 6 of embodiment 1, exposure apparatus 110 of embodiment 2 is different from exposure apparatus 10 in that substrate stage device PSTa is provided instead of substrate stage device PST.

Although the overall configuration of substrate stage device PSTa is the same as that of substrate stage device PST, the configuration of the point at which weight cancellation device 40' is provided instead of weight cancellation device 40 and the configuration of the drive system of X guide 102 are partially different from that of substrate stage device PST, and are different from substrate stage device PST. Hereinafter, the still image is detailed centering on the dissimilarity point.

As is clear from fig. 8, 10, and the like, substrate stage device PSTa partially overlaps the position (height position) of Y coarse movement stage 23Y and X guide 102 in the Z-axis direction (vertical direction).

Specifically, as shown in fig. 8 and 10, in substrate stage device PSTa, Y holder 75 is fixed to both side surfaces (lower surfaces near both ends) in the longitudinal direction of each of a pair of X columns 101. That is, Y coarse movement stage 23Y has, for example, four Y holders 75 in total. The upper surfaces of the two Y-holders 75 on the + X side are mechanically connected by a plate 76, and the upper surfaces of the two Y-holders 75 on the X side are also mechanically connected by a plate 76 in the same manner. In addition, the plate 76 is not illustrated in fig. 11 for easy understanding.

As the weight reducing device 40', for example, as shown in fig. 10, a device in which a Z slider 43 and a leveling device 57 are integrally fixed is used. Weight cancellation device 40' is mounted on X guide 102, and its lower half portion is inserted into the opening of X coarse movement stage 23X. In fig. 8, 10 to 12, in order to avoid the complication of the drawing, a weight cancellation device 40', a leveling device 57, and the like are schematically shown (the detailed configuration is shown in fig. 13).

The weight cancellation device 40' includes, as shown in fig. 13, a housing 41, an air spring 42, a Z slider 43, and the like. The housing 41 is formed of a bottomed cylindrical member having an opening on the + Z side. A plurality of base pads 44 having bearing surfaces facing the-Z side are mounted on the lower surface of the housing 41. A plurality of arm members 47 for supporting targets 46 of a plurality of Z sensors 52 fixed to the lower surface of the fine movement stage 21 are fixed to the outer wall surface of the housing 41. The air spring 42 is housed inside the housing 41. Pressurized gas is supplied to the air spring 42 from the outside. The Z-slide 43 is formed of a cylindrical member extending in the Z-axis direction and having a height lower than that of the Z-slide used in embodiment 1. The Z slider 43 is inserted into the housing 41 and mounted on the air spring 42. The Z-slide 43 is connected to the inner wall surface of the housing 41 by a pair of parallel plate spring devices 48 including plate springs parallel to the XY plane, which are arranged apart in the Z-axis direction. The parallel plate spring devices 48 are provided in plural numbers (e.g., three or four) at substantially equal intervals around the outer periphery (θ Z direction) of the Z slider 43, for example. The Z-slide 43 moves along the XY plane integrally with the housing 41 by the rigidity (tensile rigidity) of the plurality of leaf springs in the direction parallel to the horizontal plane. On the other hand, the Z slider 43 is capable of being moved slightly in the Z-axis direction with respect to the housing 41 by the flexibility of the plate spring. Since the pair of plate springs included in the parallel plate spring device 48 are separated in the Z-axis direction, the Z-slider 43 is prevented from falling (rotating in the θ x or θ y direction), and can move substantially only in the Z-axis direction with a minute stroke relative to the housing 41.

The leveling device 57 supports the fine movement stage 21 so as to be tiltable (swingable in the θ x and θ y directions with respect to the XY plane), and the upper half portion is inserted into the fine movement stage 21 through an opening 21a formed in the lower surface of the fine movement stage 21. The weight cancellation device 40' cancels (cancels) the weight of the system including the fine movement stage 21 (downward force in the direction of gravity) by the upward force in the direction of gravity generated by the air spring 42 through the Z slider 43 and the leveling device 57, thereby reducing the load on the plurality of Z voice coil motors 18Z.

The leveling device 57 includes a leveling cup 49 formed of a cup member having an opening on the + Z side, a polygonal member 64 inserted into the inner diameter side of the leveling cup 49, and a plurality of air bearings 65 attached to the inner wall surface of the leveling cup 49. The lower surface of the leveling cup 49 is integrally fixed to the upper surface of the Z slider 43 through a plate 68. Further, a plurality of falling-off prevention devices 200 for preventing the leveling cups 49 from falling off are mounted on the top surface of the fine movement stage 21. The polygonal member 64 is a triangular pyramidal member, and the tip end thereof is inserted into the leveling cup 49. The bottom surface (surface facing the + Z side) of the polyhedron member 64 is fixed to the top surface of the fine movement stage 21 through the spacer 51. The air bearings 65 are provided, for example, three at substantially equal intervals around θ z on the inner wall surface of the leveling cup 49. The leveling device 57 supports the fine movement stage 21 in a non-contact manner with a slight gap (clearance) therebetween as a rotation center at a center of gravity CG of a system including the fine movement stage 21 by jetting pressurized gas from a plurality of air bearings 65 to the side surfaces of the polygonal member 64. Also, for ease of understanding, a cross section of, for example, two of the three air bearings 65 is shown in fig. 13 (i.e., in the case of the leveling device 57, fig. 13 is a cross section of a section not parallel to the YZ plane).

Here, when the fine movement stage 21 moves in the direction parallel to the XY plane, the polyhedral member 64 is integrated with the fine movement stage 21 in the direction parallel to the XY plane. At this time, the air bearing 65 is pressed against the polyhedral member 64 by the rigidity (static pressure) of the gas film formed between the bearing surface of the air bearing 65 and the polyhedral member 64, and thereby the fine movement stage 21 and the leveling cup 49, that is, the fine movement stage 21 integrally move in the same direction. Since the leveling cup 49 and the Z-slide 43 are fixed via the plate 68, the fine movement stage 21 and the Z-slide 43 move integrally in a direction parallel to the horizontal plane. Further, as described above, since the Z slider 43 and the housing 41 are connected by the plurality of parallel plate spring devices 48, the fine movement stage 21 and the housing 41 move integrally in a direction parallel to the horizontal plane. In this way, the fine movement stage 21 and the weight cancellation device 40' always move in a direction parallel to the XY plane, including a case where they are fine-driven by the plurality of voice coil motors 18X and 18Y. Therefore, in embodiment 2, the coupling device 45 is not provided between weight cancellation device 40' and X coarse movement stage 23X.

In embodiment 2, the dimension of the guide body 102a in the Z-axis direction is set to be equal to the dimension of the X-column 101 in the Z-axis direction. As can be seen from fig. 9, 10 and 12, the guide body 102a is inserted between the pair of X-pillars 101. That is, the position of X guide 102 (the position in the vertical direction) and the Z position of Y coarse movement stage 23Y partially overlap.

The other parts of substrate stage device PSTa are configured in the same manner as substrate stage device PST.

In exposure apparatus 110 configured as described above, substrate stage device PSTa moves substrate P in the X-axis direction during the step-and-scan exposure operation, the X-scan operation, and the X-step operation, and basically, the drive of X coarse movement stage 23X on Y coarse movement stage 23Y, the synchronous drive of fine movement stage 21 and X coarse movement stage 23X, and the like in the above-described embodiment 1 are performed in accordance with instructions from main control device 50. However, in substrate stage device PSTa, weight cancellation device 40' is not pulled by X coarse movement stage 23X, but moves in the X-axis direction together with fine movement stage 21. In the X scanning operation and the X stepping operation, although the Y position of weight cancellation device 40 'may be slightly changed by fine movement stage 21 being slightly driven in the Y axis direction with respect to X coarse movement stage 23X, the dimension in the width direction of X guide 102 is set so that base pad 44 does not fall off from X guide 102 even if weight cancellation device 40' is slightly driven in the Y axis direction.

In the Y step operation, substrate stage device PSTa basically drives Y coarse movement stage 23Y and X coarse movement stage 23X in the Y axis direction and synchronously drives X coarse movement stage 23X and fine movement stage 21 in the same manner as in embodiment 1, in accordance with an instruction from main control device 50. However, in substrate stage device PSTa, weight cancellation device 40' moves in the Y-axis direction together with fine movement stage 21. At this time, X guide 102 supporting weight removing device 40' from below is driven in synchronization with Y coarse movement stage 23Y. Therefore, the weight cancellation device 40' is constantly supported from below by the X guide 102.

According to the exposure apparatus 110 of embodiment 2 described above, the same effects as those of the exposure apparatus 10 of embodiment 1 can be obtained. In addition, according to exposure apparatus 110, since the Z position (vertical direction position) of X guide 102 and the Z position of Y coarse movement stage 23Y partially overlap, the dimension in the Z axis direction of weight cancellation apparatus 40 'can be shortened as compared with the case where weight cancellation apparatus 40' is mounted on a guide having a large guide surface, for example. In this case, the dimension in the Z-axis direction of the housing 41 and the Z-slider 43 can be reduced, and therefore the weight reducing device 40' can be reduced in weight. In addition, when the weight canceling device 40' is reduced in weight, the actuators (the plurality of linear motors and the plurality of voice coil motors) for fine movement of the stage 21 are also reduced in size.

Further, since weight cancellation device 40' is vibrationally separated from coarse movement stage 23, transmission of vibration from coarse movement stage 23 can be completely cancelled, and control performance can be improved. Further, since the weight cancellation device 40' is integrated with the fine movement stage 21 and the structure is simplified, the weight can be further reduced, the manufacturing cost can be reduced, and the failure rate can be reduced. Further, since the integration of the weight cancellation device 40' and the fine movement stage 21 lowers the center of gravity CG of the fine movement stage 21, even if the substrate holder PH is increased in size, the increase in the center of gravity can be suppressed.

Further, according to the exposure apparatus 110, since the X guide 102 as a member extending in the X-axis direction is supported from below at a plurality of places by the pair of beds 12, it is possible to suppress bending due to the self weight of the X guide 102 or the load of the fine movement stage 21 including the weight cancellation device 40.

Since weight cancellation device 40' is separated from coarse movement stage 23, vibration caused by movement of weight cancellation device 40 is not transmitted to X guide 102. Thus, the vibration is not transmitted to, for example, the projection optical system via the X guide 102, the pair of beds 12, the substrate stage mount 19, and the like, and the exposure operation can be performed with high accuracy.

Embodiment 3

Next, embodiment 3 will be described with reference to fig. 14 to 16. Substrate stage device PSTb according to embodiment 3 has substantially the same configuration as substrate stage device PSTa according to embodiment 2 described above (see fig. 9 and the like) except for the driving method of X guide 102, and therefore the same or similar components as those in embodiment 2 are given the same or similar reference numerals, and the description thereof is simplified or omitted.

In contrast to the above embodiment 2, the Y holder 75 is fixed to both side surfaces of the X column 101, and in the present embodiment 3, as shown in fig. 15, the Y holder 75 is fixed to the lower surface of the X column 101 in the same manner as the exposure apparatus 10. Therefore, the height of the base frame 14 (for convenience, the same reference numerals are used) is lower than that of the embodiment 2. Accordingly, the configuration of substrate stage device PSTb can be further simplified.

In contrast to the embodiments 1 and 2 in which the X guide 102 is electromagnetically driven by the pair of Y linear motors 82, in the embodiment 3, the X guide 102 is mechanically connected to the X column 101 through a pair of devices called flexure devices 107 in the vicinity of both ends in the longitudinal direction via connecting members 199, as shown in fig. 14. For easy understanding, the pair of plate pieces 76 (see fig. 9) and the fine movement stage 21 (see fig. 8) that connect the pair of X columns 101 in fig. 14 are not shown.

Each flexure 107 includes a thin steel plate (e.g., a plate spring) arranged parallel to the XY plane and extending in the Y-axis direction, and is erected between the X column 101 and the X guide 102 via a hinge means such as a ball joint. Each flexure device 107 connects the X column 101 and the X guide 102 in the Y-axis direction with high rigidity by the rigidity of the steel plate in the Y-axis direction. Therefore, X guide 102 is pulled by one of the pair of X columns 101 through flexure device 107 and is integrated with Y coarse movement stage 23Y in the Y axis direction. On the other hand, each flexure device 107 is configured to allow the X guide 102 to be free from constraint with respect to the X column 101 in the 5-degree-of-freedom direction other than the Y-axis direction by the flexibility (or flexibility) of the steel plate and the action of the hinge device, and therefore vibration is not easily transmitted to the X guide 102 through the X column 101. In addition, a plurality of flexure devices 107 connect the pair of X columns 101 and the X guide 102 in a plane parallel to the XY plane including the position of the center of gravity of the X guide 102. Therefore, when the X guide 102 is pulled, no moment in the θ X direction acts on the X guide 102.

In addition to the advantages obtained by substrate stage device PSTa of embodiment 2, substrate stage device PSTb of embodiment 3 is configured to pull X guide 102 by X column 101 through flexure device 107, and therefore is lower in cost than the case where an actuator for driving X guide 102 is provided, for example. In addition, a measurement system (e.g., a linear encoder) for obtaining the positional information of the X guide 102 is not required. Further, the dimension of the X guide 102 in the X-axis direction can be reduced as compared with embodiment 2, and therefore, the cost can be reduced. Further, since the pair of base frames 14 are disposed on both inner sides in the X-axis direction as compared with the embodiment 2, the apparatus can be simplified.

Further, since flexure device 107 has a structure (shape and material) with extremely low rigidity in the direction other than the Y-axis direction, vibration due to transmission of force in the direction other than the Y-axis direction is not easily transmitted to X guide 102, and controllability of fine movement stage 21 is excellent. Even if vibration in the Y-axis direction enters X guide 102, X guide 102 and weight cancellation device 40 'are not transmitted in the horizontal direction of force by base pad 44 of the aerostatic bearing provided under weight cancellation device 40', and therefore fine movement stage 21 is not affected. Further, since the X guide 102 and the bed 12 are restrained from continuing the force in the Y axis direction by the Y linear guide 71A (the force in the Y axis direction is released), the bed 12 (the apparatus main body) is not affected. Similarly, it is needless to say that the pair of X columns 101 and the X guide 102 of the substrate stage device PST according to embodiment 1 may be connected to each other by using the pair of flexure devices 107.

EXAMPLE 4 embodiment

Next, embodiment 4 will be described with reference to fig. 17. Substrate stage device PSTc according to embodiment 4 has substantially the same configuration as substrate stage device PSTa according to embodiment 2 described above (see fig. 9 and the like) except for the difference in the driving method of X guide 102, and therefore the same or similar reference numerals are used for the same or similar components as those in embodiment 2, and the description thereof is simplified or omitted.

As shown in fig. 17, in substrate stage device PSTc, two push (pushers) devices 108 are provided on the facing surfaces of the pair of X columns 101 facing each other, respectively, so as to be separated in the X-axis direction. That is, the propulsion devices 108 are provided with four in total. Each pusher 108 has a steel ball facing the + Y-side surface or the-Y-side surface of the X guide 102. In general, the steel ball is separated from X guide 102, and when Y coarse movement stage 23Y is driven in the Y axis direction in substrate stage device PSTc, Y coarse movement stage 23Y and X guide 102 move in the Y axis direction integrally by being pressed by pusher 108 and pressing X guide 102. The respective pushing devices 108 are not necessarily provided on the X column 101, and may be provided on the inner side in the X axis direction and the inner side in the Y axis direction of the Y holder 75, for example, to press the X guide 102.

Further, in substrate stage device PSTc, after Y coarse movement stage 23Y has moved X guide 102Y step by step to a predetermined position, it is driven in a direction away from X guide 102 to prevent vibration transmission, and thus Y coarse movement stage 23Y is separated from X guide 102 in terms of vibration. As a method of separating Y coarse movement stage 23Y from X guide 102 in terms of vibration, for example, X column 101 may be suitably micro-driven, or an actuator such as an unillustrated air cylinder that micro-drives a steel ball in the Y axis direction may be provided in propulsion device 108. Further, as the propulsion device, instead of the steel ball, a rotation ellipsoid that can rotate about 90 ° around the Z axis or the X axis may be provided, and by appropriately rotating the rotation ellipsoid, the gap in the Y axis direction between the X guide 102 and the Y coarse movement stage 23Y may be changed (the contact state and the non-contact state are switched by the rotation amount of the rotation ellipsoid).

In embodiment 4, the mechanical connection between the X column 101 and the X guide 102 is not present during exposure operations other than the movement of the X guide 102 in the scanning cross direction, and the entry of interference into the X guide 102 can be completely prevented. Similarly, in substrate stage device PST according to embodiment 1, it is needless to say that pusher 108 may be provided to either one of pair of X column 101 and X guide 102.

The configuration of the substrate stage device provided in the exposure apparatus according to embodiments 1 to 4 is merely an example, and the configuration is not limited thereto. Next, a modified example of the weight cancellation device and the leveling device provided in the substrate stage device will be described. In the following description, for the sake of simplicity of description and convenience of illustration, only the leveling device and the weight canceling device will be described, and the same reference numerals as those in embodiment 2 are given to those having the same configuration as in embodiment 2, and the description thereof will be omitted.

Modification 1

Fig. 18 shows a weight cancellation device 40A and a leveling device 57A included in the substrate stage device according to modification 1. In modification 1, the leveling device 57A and the weight cancellation device 40A have the same configuration as in embodiment 2, but the leveling device 57A is disposed so as to support the weight cancellation device 40A from below (that is, the leveling device 57 and the weight cancellation device 40' in embodiment 2 are disposed so as to be vertically interchanged). Specifically, the lower surface of the housing 41 is connected to the upper surface of the polyhedral member 64. Although not shown in fig. 18, fine movement stage 21 is fixed to the upper surface of Z slider 43 of weight cancellation device 40A through spacer 51.

In the substrate stage apparatus according to modification 1, compared to the above-described embodiments, since the weight cancellation device 40A is provided above the leveling device 57A, the number of parts between the polyhedron member 64 and the base pad 44 is reduced, the inertial mass of the polyhedron member 64 or less (from the polyhedron member 64 to the base pad 44) during horizontal movement such as during scanning is reduced, the gravity center position thereof is close to the drive point (the contact point between the polyhedron member 64 and the air bearing 65), the rigidity in the θ x and θ y directions is increased (the swing is not easily generated), and the controllability is improved.

Modification 2

Fig. 19 shows a weight cancellation device 40B and a leveling device 57B included in the substrate stage device according to modification 2. The modification 2 has the same configuration as the modification 1 (see fig. 18) except that the positions of the air spring 42 and the Z slider 43 (including the parallel plate spring device 48) are vertically interchanged. In the weight cancellation device 40B, the housing 41B is formed of a bottomed cylindrical member having an open lower surface, and an upper surface thereof is integrally fixed to the fine movement stage 21 (not shown in fig. 19).

In addition to the effects obtainable by the substrate stage apparatus of modification 2, the substrate stage apparatus of modification 1 is configured such that the position of the parallel plate spring device 48 is lowered and is disposed closer to the center of gravity of the weight cancellation device 40B, and therefore, the stability of the exposure operation is improved.

Modification 3

Fig. 20 shows a weight cancellation device 40C included in the substrate stage device according to modification 3. The weight cancellation device 40C is composed of a main body 41C of a bottomed cylindrical member having an open upper surface, an air spring 42 housed in the main body 41C, a leveling cup 49 connected to the upper surface of the air spring 42, a plurality of air bearings 65, a polyhedral member 64 fixed to the fine movement stage 21, not shown, and the like. In modification 3, the lower surface of the leveling cup 49 is directly pressed in the Z-axis direction by the air spring 42, excluding the Z-slider. A plurality of arm members 47 for supporting the target 46 are fixed to the outer wall surface of the main body 41C.

The leveling cup 49 has the same function as that of the above-described embodiment 2 and the like, and also has the function of the Z slider 43 (see fig. 13) in the above-described embodiment 2 and the like. Therefore, a plurality of (for example, four in each of the upper end surface and the lower end surface, which are equal in the circumferential direction) parallel plate springs 67e are connected to the upper end surface and the lower end surface of the outer peripheral portion of the leveling cup 49 (the parallel plate springs 67e disposed on the ± X side are not shown in order to avoid complication of the drawing). In this way, the leveling cup 49 is restricted from being horizontally opposed to the main body 41C and can slide only vertically.

In comparison with the above embodiments, the substrate stage device according to modification 3 does not require a Z-slider, so that the weight cancellation device 40C has a simple structure, is light in weight, and is inexpensive in cost.

Further, the upper and lower end faces of the leveling cup 49, which is provided at the lower part of the polygonal member 64 and has a large dimension in the Z-axis direction among the components that swing (vibrate) during operation, are connected by the parallel plate spring 67e so as to be immovable in the horizontal direction with respect to the main body 41C, so that rigidity in the θ x and θ y directions at the lower part of the polygonal member 64 is increased, and vibration of the lower part of the polygonal member 64 due to inertia during horizontal movement is suppressed, thereby improving controllability.

Further, since the leveling cup 49 moves only in the Z direction while maintaining high straightness with respect to the main body 41C due to the action of the parallel plate spring 67e, the bottom surface of the leveling cup 49 and the upper surface (metal plate) of the air spring 42 are not fixed to each other, and therefore, assembly and disassembly can be easily performed, and workability can be improved.

Further, since the Z-axis direction driving by the air spring 42 and the leveling driving (θ x, θ y) by the polygonal member 64 can be controlled independently (without interference), the controllability is excellent.

Further, the weight canceling devices 40A to 40C of the above-described modifications are not limited to the XY dual-axis stage, and may be applied to a single-axis stage in one direction of the X axis (or the Y axis), or a conventional XY dual-axis stage device in which a Y coarse movement stage is mounted on an X coarse movement stage.

In the above-described embodiments 2 to 4 (and the above-described modifications), the Z slider 43 or the leveling cup 49 of the weight cancellation device can move only in the Z-axis direction because a plurality of parallel plate spring devices 48 are arranged, but the present invention is not limited thereto, and for example, an air bearing, a rolling guide, or the like may be used.

Further, although embodiments 2 to 4 (and the above-described modifications) have a configuration in which X coarse movement stage 23X is mounted on Y coarse movement stage 23Y, the present invention is not limited to this configuration, and coarse movement stage 23Y may be mounted on X coarse movement stage 23X in the same manner as in the conventional device if only the miniaturization of weight cancellation device 40 and the integration with fine movement stage 21 are aimed at. At this time, in a member (in the case of a Y guide) in which the X guide 102 used in the present embodiment is disposed so as to have the Y axis direction as the longitudinal direction, the weight cancellation device 40 moves in steps in the Y axis direction or moves entirely with the Y guide in the X axis direction of the scanning direction.

In the embodiments 2 to 4 (and the modifications described above), X guide 102 is provided on substrate stage mount 19 that is a part of the apparatus main body (main body) through a pair of beds 12, but the present invention is not limited to this, and a plurality of Y linear guides 71A may be directly fixed to substrate stage mount 19 as in substrate stage device PSTd shown in fig. 22. Thus, the bed 12 (see fig. 8) can be omitted, the weight of the entire exposure apparatus can be reduced, and the overall height (dimension in the Z-axis direction) can be reduced. The same applies to embodiment 1.

In each of the embodiments 1 to 4 (hereinafter, referred to as embodiments), the X guide 102 is supported from below by two beds 12, but the number of the beds 12 may be three or more. In this case, the auxiliary guide frame 103 disposed between the adjacent bed 12 may be added. When the amount of movement of the base plate P in the X-axis direction is small (or when the base plate P itself is small), one bed 12 may be used. The shape of the bed 12 is set such that the length in the Y-axis direction is longer than the length in the X-axis direction, but the shape is not limited thereto, and the length in the X-axis direction may be longer. Furthermore, the plurality of beds may be separated in the X-axis, and/or Y-axis directions.

In the case where the curvature of the X guide 102 is negligibly small, the auxiliary guide frame 103 may not be provided.

In each of the above embodiments, the plural Y linear guides 71A are fixed to the pair of bed 12, and the X guide 102 moves in the Y axis direction along the plural Y linear guides 71A, but the present invention is not limited thereto, and for example, a plurality of rolling bodies such as a gas hydrostatic bearing or a roller may be provided on the lower surface of the X guide 102 to move on the bed 12 with low friction. However, in order to keep the distance between the Y mover 72A and the Y stator 73 constant, it is preferable to provide some means for restricting the movement of the X guide 102 in the X axis direction with respect to the pair of bed frames 12. As a means for restricting the movement of the X guide 102 in the X axis direction, for example, a hydrostatic gas bearing, a mechanical uniaxial guide, or the like can be used. Thus, the position adjustment work for arranging the plurality of Y linear guides 71A in parallel to each other is not necessary, and the assembly of the substrate stage device becomes easy.

Further, a device (a backlash device) for relatively moving the X guide 102 and the Y slider 71B by a small distance in the X-axis direction may be provided between the X guide 102 and the Y slider 71B, for example. In this case, even if the plurality of Y linear guides 71A are not arranged in parallel with each other, the X guide 102 can smoothly move straight in the Y axis direction on the plurality of Y linear guides 71A. As a device capable of relatively moving the X guide 102 and the Y slider 71B in the X-axis direction, for example, a hinge device or the like can be used. The same relief device may be provided in other linear guides. Further, a device for relatively moving the pair of X columns 101 and the Y holder 75 by a small distance in the X-axis direction may be similarly provided. In this case, even if the pair of base frames 14 are not arranged in parallel, the pair of X columns 101 can be guided smoothly straight in the Y-axis direction.

As shown in fig. 21(a), in embodiment 1 or 2, a pair of Y holders 83 having J-shaped and inverted J-shaped XZ-sections may be attached to both ends of the X guide 102, and the Y movable members 72A may be fixed to the respective Y holders 83. In this case, the magnetic attraction force between the magnet unit of the Y stator 73 (see fig. 1, fig. 8) and the coil unit of the Y mover 72A acts on the base frame 14 uniformly, and the base frame 14 is prevented from falling. In addition, the thrust force for moving the X-way 102 is also elevated. In the above embodiments 1 and 2, the plurality of linear motors are all of the moving coil type, but the present invention is not limited thereto, and may be of the moving magnet type. In the embodiments other than embodiment 2, the driving device for driving the Y holder 75 in the Y axis direction is not limited to the linear motor, and for example, a ball screw type driving device, a belt type driving device, a rack and pinion type driving device, or the like can be used.

In embodiments 1 and 2, Y stator 73 (see fig. 1 and 8) fixed to base frame 14 is used in common for the Y linear motor for driving X guide 102 and the Y linear motor for driving Y coarse movement stage 23Y, but each Y linear motor may be configured separately. Further, a Y stator of a Y linear motor for driving Y coarse movement stage 23Y may be fixed to auxiliary guide frame 103, and a Y mover may be attached to auxiliary holder 78.

In the above-described embodiments 1 and 2, the pair of X-pillars 101 are mechanically connected at both ends in the X direction by, for example, the plate pieces 76, but the pair of X-pillars 101 are not limited thereto, and may be connected by, for example, a member having a cross-sectional area similar to that of the X-pillars 101. Further, the Z-axis dimension of the X guide 102 (guide body 102a) may be larger than the Z-axis dimension of each of the pair of X columns 101. In this case, the Z-axis dimension of the weight cancellation device 40 can be further shortened.

In addition, although two (four in total) Y holders 75 are provided on the + X side and the-X side of Y coarse movement stage 23Y in the above-described embodiments 1 and 2, respectively, Y holders 75 may be provided on the + X side and the-X side of Y coarse movement stage 23Y, respectively, for example, one Y holder 75 may be provided. In this case, if the length of the Y holder 75 is set to be equal to the plate 76, the plate 76 is not necessary. In this case, the Y holder is formed with a notch into which the Y movable element 72A attached to both end surfaces of the X guide 102 in the X axis direction is inserted.

In the above embodiments, the pair of X columns 101 are mechanically connected, but the present invention is not limited thereto, and may be mechanically separated. In this case, the pair of X columns 101 may be controlled synchronously.

In the above-described embodiment 4, the X guide 102 is pressed against the X column 101 in a contact state by the pusher 108, but the present invention is not limited thereto, and the X guide 10 may be pressed against the X column 101 in a non-contact state. For example, as shown in fig. 21B, a thrust (thrust) type air bearing 109 (air cushion) may be attached to the X column 101 (or the X guide 102), and the X guide 102 may be pressed in a non-contact manner by the static pressure of the gas ejected from the bearing surface. Alternatively, as shown in fig. 21C, permanent magnets 100a and 100b (a set of permanent magnets 100) may be attached to the X column 101 and the X guide 102 so that the magnetic poles of the facing portions are the same, and the X guide 102 may be pressed in a non-contact manner by repulsive force (repulsive force) generated between the facing permanent magnets 100a and 100 b. In the case of using the set of permanent magnets 100, since it is not necessary to supply pressurized gas, electricity, or the like, the configuration of the apparatus is simple. The thrust air bearing 109 and the set of permanent magnets 100 are provided in plural numbers (for example, two numbers) separately in the X-axis direction between the X column 101 and the X guide 102 on the + Y side and between the X column 101 and the X guide 102 on the-Y side, respectively.

EXAMPLE 5 embodiment

Next, embodiment 5 will be described with reference to fig. 23 to 28.

The exposure apparatus according to embodiment 5 has the same configuration as exposure apparatus 10 according to embodiment 1, except that substrate stage device PSTe is provided instead of substrate stage device PST.

Hereinafter, description will be given centering on substrate stage device PSTe. Here, the same or similar reference numerals are used for the same or similar components as those of the exposure apparatus 10 according to embodiment 1, and the description thereof is simplified or omitted.

In the exposure apparatus according to embodiment 5, instead of the substrate stage having the coarse/fine movement structure, as shown in fig. 23 and 24, a substrate stage PSTe is used which includes a so-called gantry (gantry) type biaxial stage (substrate stage) ST having a beam (beam) -shaped X stage STX which moves in the X axis direction and has a long side in the Y axis direction and a Y stage STY which holds a substrate (sheet) P on the X stage STX and moves in the Y axis direction. Substrate stage device PSTe is not shown, but is disposed below (-Z side) projection optical system PL (see fig. 23 and 24, see fig. 1) in the same manner as substrate stage device PST described above.

Substrate stage device PSTe includes substrate stage ST, and substrate stage drive system PSD (not shown in fig. 23 and 24, see fig. 25) that drives substrate stage ST. As shown in fig. 24 and 25, the substrate stage drive system PSD includes a pair of X-axis drive units XD1 and XD2 for driving the X stage STX in the X-axis direction, and a Y-axis drive unit YD for driving the Y stage STY in the Y-axis direction on the X stage STX. The Y stage STY holding the substrate P is driven in the X-axis direction and the Y-axis direction by a predetermined stroke by the substrate stage driving system PSD.

More specifically, as shown in fig. 23 and 24, substrate stage device PSTe includes a total of six legs 61a to 61F arranged in an XY two-dimensional direction on a floor surface F of a clean room in which an exposure apparatus is installed, two base blocks 62a and 62b supported by the three legs 61a to 61c and 61d to 61F, a pair (two) of X-axis drive units XD1 and XD2 provided on the two base blocks 62a and 62b, an X stage STX driven in the X-axis direction by the two X-axis drive units XD1 and XD2, a Y-axis drive unit YD provided on the X stage STX, a Y stage STY driven in the Y-axis direction by the Y-axis drive unit YD, and the like.

The legs 61a to 61c are arranged at predetermined intervals in the X-axis direction as shown in fig. 23. Similarly, the legs 61d to 61f are arranged at predetermined intervals in the X-axis direction on the + Y side (inside of the paper surface in fig. 23) of the legs 61a to 61c, respectively. Four adjusting tools 61a are provided on the skirt portions of the legs 61a to 61f₀～61f₀. As can be seen from fig. 23 and 24, for example, two adjusting tools 61b are provided on the skirt portion of the leg portion 61b on the ± Y side surfaces thereof₀。

The leg portions 61a to 61c and 61d to 61f support base piers 62a and 62b arranged in parallel with each other with a predetermined distance in the Y-axis direction with the longitudinal direction thereof being the X-axis direction, respectively. For example, the adjusting tool 61a provided on each of the legs 61a to 61f is appropriately adjusted by using a level₀～61f₀The base piers 62a and 62b are supported so as to be parallel to a plane (parallel to the horizontal plane) perpendicular to the ground axis (gravity direction) and at the same height from the ground surface F.

As shown in fig. 24, the base piers 62a and 62b are respectively provided with X-axis drive units XD1 and XD 2. X-axis drive units XD1 and XD2 support the-Y side end and the + Y side end of X stage STX from below, respectively, and drive X stage STX in the X-axis direction.

As shown in fig. 23 and 24, one (-Y side) X-axis drive unit XD1 includes a plurality of fixed members 63 and one movable member 84, a pair of linear motors XDM1 and XDM2 for generating a driving force in the X-axis direction, a pair of guide devices XG1 and XG2 for restricting the movement of the X stage STX in the X-axis direction, and a linear encoder EX1 (see fig. 25) for measuring the position of the movable member (X stage STX) in the X-axis direction with respect to the fixed member 63 (base block 62 a).

As shown in fig. 23 and 24, a plurality of (ten in the present embodiment) fixing members 63 arranged in the X-axis direction are fixed to the ± Y-side end portions of the base pier 62 a. For easy understanding, a part of the plurality of fixing members 63 (including a later-described fixer XD12) on the-Y side is not shown in FIG. 23, or is shown in a broken state. Each fixing member 63 is provided with a fixing tool (bolt) 63₀the-Z end is secured to the side of the base pier 62 a. Here, as shown in FIG. 26, the inner side surface of each fixing member 63 is inclined inward at an angle of π/2- θ with respect to the XZ plane (an angle θ is formed with respect to the XY plane). As a result, the YZ cross-sectional shape of the member formed by combining the base block 62a and the fixing member 63 is substantially U-shaped with the + Z-side opening (however, the interval between the pair of facing surfaces is narrower on the + Z side (opening side) than on the-Z side).

As shown in fig. 24, the movable member 84 is composed of a rectangular pillar member having a YZ cross section of an equilateral trapezoid, and is disposed such that the upper and lower surfaces thereof are horizontal (parallel to the XY plane) and the longitudinal direction thereof is the movable direction (X-axis direction). The movable member 84 is attached to the fixture 66 by a bolt through a block 85 having a rectangular YZ cross section and fixed to the upper surface thereof₀And a fixing plate 66 fixed to the lower surface (Z surface) of the X-stage STX near the-Y end.

The movable member 84 is disposed in a space formed by the base 62a and the fixed member 63. Here, the + -Y side of the movable member 84 is inclined at an angle of pi/2-theta to the XZ plane (forming an angle of theta to the XY plane). That is, the surface on the + Y side of the movable member 84 is parallel to and opposed to the surface on the-Y side of the fixed member 63 on the + Y side with a predetermined gap therebetween, and the surface on the-Y side of the movable member 84 is parallel to and opposed to the surface on the + Y side of the fixed member 63 on the-Y side with a predetermined gap therebetween. The movable member 84 is a hollow structure in an amount of . It is not necessary that the. + -.X end faces of movable member 84 be parallel to each other. In addition, the YZ cross section is not necessarily trapezoidal. When the surfaces to which the movable elements XD11 and XD21 described later are fixed are formed to be inclined at an angle of pi/2-theta to the XZ plane (Z axis), the corners of the movable member 84 may be chamfered.

As shown in fig. 24, the linear motor XDM1 is composed of a movable element XD11 and a fixed element XD12, and the linear motor XDM2 is composed of a movable element XD21 and a fixed element XD 22.

As shown in fig. 24, the pair of the fixing elements XD12 and XD22 are fixed to the inner surfaces of the ± Y-side fixing members 63, respectively, and extend in the X-axis direction as shown in fig. 23 (the fixing element XD12 is not shown in fig. 23). As shown in fig. 23, the most + X-side and most-X-side fixing members 63 are not fixed with the anchors XD12, XD22 (anchor XD12 is not shown in fig. 23). The pair of movable elements XD11 and XD21 are fixed to both ± Y-side surfaces of the movable member 84, respectively, and face the fixed elements XD12 and XD22 fixed to the fixed member 63, which are opposed to both the surfaces, at an angle θ with respect to the Z axis (XZ plane) with a slight gap therebetween.

In addition, although not shown, a plurality of coil units (each including a plurality of coils each having a coil wound around a core) are arranged in the X-axis direction inside each of the movable pieces XD11 and XD 21. Inside each of the stators XD12 and XD22, a plurality of magnet units (each including a plurality of permanent magnets) are arranged in the X-axis direction. In embodiment 5, the movable element XD11 and the fixed element XD12 form a moving-coil linear motor XDM1, and the movable element XD21 and the fixed element XD22 form a moving-coil XDM 2.

The guide device XG1, as shown in fig. 23 and 24, includes an X-axis linear guide (rail) XGR1 and two sliders XGs 1. Similarly, the guide device XG2 includes an X-axis linear guide (rail) XGR2 and two sliders XGs 2.

Specifically, a groove having a predetermined depth extending in the X-axis direction is provided in the upper surface of the base pier 62a, and X-axis linear guides XGR1 and XGR2 extending in the X-axis direction are fixed in parallel to each other at positions substantially distant from the ± Y sides from the center in the Y-axis direction of the inner bottom surface of the groove. Two sliders XGS1 and XGS2 are fixed to the lower surface of the movable member 84 at positions facing the X-axis linear guides XGR1 and XGR2, respectively. Here, the sliders XGS1 and XGS2 have an inverted U-shaped cross section, two sliders XGS1 on the-Y side are engaged with the X-axis linear guide XGR1, and two sliders XGS2 on the + Y side are engaged with the X-axis linear guide XGR 2. As shown in fig. 23, stop devices 88 and 89 for preventing an over distance (over run) of X stage STX are provided near ± X ends of X-axis linear guides XGR1 and XGR 2.

As shown in fig. 24, the linear encoder EX1 includes a head EXh1 and a scale EXs 1. The scale EXs1 has a reflection-type diffraction grating formed on the surface thereof with the X-axis direction as the periodic direction, and is extended parallel to the X-axis linear guides XGR1 and XGR2 at the center of the groove inner bottom surface of the base 62a in the Y-axis direction. Head EXh1 is provided on the lower surface (or the + X side (or-X side)) of movable member 84. The head EXh1 is opposed to the scale EXs1 in the X-axis direction movement stroke of the movable member 84(X stage STX), and measures the position information of the movable member 84 (the-Y end of the X stage STX) relative to the base 62a in the X-axis direction by irradiating the scale EXs1 with the measurement light and receiving the reflected diffracted light from the scale EXs 1. The measurement result is sent to the main control device 50 (see fig. 25).

The other (+ Y side) X-axis drive unit XD2 has substantially the same configuration as the X-axis drive unit XD 1. However, the movable member 84 included in the X-axis driving unit XD2 is mounted on the fixture 66 through a parallel plate spring 86 provided in place of the raising block 85₀And a fixing plate 66 fixed to the lower surface (the-Z surface) of the X stage STX in the vicinity of the + Y end. The parallel plate spring 86 is composed of a pair of plate springs having a longitudinal direction in the X-axis direction parallel to the XZ plane and a predetermined distance in the Y-axis direction. The fixed plate 66 and the movable member 84 are allowed to move relatively in a minute stroke in the Y-axis direction by the parallel plate spring 86. Therefore, even if the parallelism of the base pier 62a and the base pier 62b is reduced, the load on the guide device XG3 (constituted by the slider XGs3 and the X-axis linear guide (rail) XGR 3) described later can be reduced by the parallel plate spring 86.

As described above, the cover 87 is attached to the upper surface of the fixed member 63 so as to cover the upper surface opening while allowing the parallel plate spring 86 to deform when the fixed plate 66 and the movable member 84 move relatively in the Y-axis direction by a minute stroke. Similarly, a cover 87 is attached to the upper surface of the fixing member 63 on the X-axis drive unit XD1 side to cover the upper surface opening while allowing the movement of the raising block 85 in the Y-axis direction in accordance with the deformation of the parallel plate spring 86. The covers 87 prevent heat generated from the coil units in the pair of movable elements XD11 and XD21 included in each of the X-axis drive units XD2 and XD1 from being diffused to the outside of the X-axis drive units XD2 and XD 1.

As shown in fig. 24, the X-axis drive unit XD2 is provided with only one guide device XG3, which is composed of one X-axis linear guide XGR3 and two sliders XGs3 engaged therewith, similarly to the guide devices XG1 and XG 2. The X-axis drive unit XD2 is provided with a linear encoder EX2 including a head EXh2 and a scale EXs2, similar to the linear encoder EX 1. The linear encoder EX2 measures positional information of the movable member 84 relative to the base block 62b in the X-axis direction. The measurement result is sent to the main control device 50 (see fig. 25).

Further, as shown in fig. 23, each of the X-axis drive units XD1 and XD2 has a fan 70A and a fan 70B at the-X-side end and the + X-side end, respectively. The fan 70A is an air supply fan for supplying outside air (air) to the inner space of the X-axis drive unit (the space between the base (62a or 62B) and the pair of fixing members 63), and the fan 70B is an exhaust fan for exhausting the air passing through the inner space of the X-axis drive unit to the outside. By these fans 70A, 70B, the coil units in the pair of movable elements XD11, XD21 provided in the internal space of each of the X-axis drive units XD1, XD2 can be cooled efficiently.

Here, the load (and the inertial force accompanying the movement) of the X stage STX and the Y stage STY supported thereon is applied to the X-axis drive units XD1 and XD 2. Further, the linear motors XDM1 and XDM2 included in the X-axis drive units XD1 and XD2 have magnetic attraction forces that are several times larger than the driving forces between the respective movers and the stator. Here, the magnetic attraction force acting on the mover with respect to the stator acts as a buoyancy (a force in the antigravity direction) on the movable member 84. The X-axis drive units XD1 and XD2 substantially cancel the load by the magnetic attraction force (buoyancy), and support and drive the X stage STX without applying a large load (and inertial force) to the guide devices XG1 to XG 3. The cancellation (balance) between the load of the X stage STX or the like at the X-axis drive unit XD1(XD2) and the magnetic attraction force (buoyancy) from the linear motors XDM1 and XDM2 will be described later in detail.

As shown in fig. 23, the Y stage STY is supported on the X stage STX via a guide device YG constituting a part of the Y-axis drive unit YD. The substrate P is held on the Y stage STY.

As shown in fig. 23, the Y-axis drive unit YD includes a linear motor YDM that generates a drive force in the Y-axis direction, a guide device YG that restricts movement of the Y stage STY in directions other than the Y-axis direction, and a linear encoder EY (see fig. 25) that measures the position of the Y stage STY with respect to the X stage STX in the Y-axis direction.

The linear motor YDM includes a movable element YD1 and a fixed element YD2 as shown in fig. 23. Stator YD2 extends in the Y-axis direction at the center in the X-axis direction on the X stage STX. The movable element YD1 is opposite to the fixed element YD2 in the Z-axis direction and fixed at the center of the bottom surface of the Y stage STY in the X-axis direction.

The guide device YG includes a pair of Y-axis linear guides (rails) YGR and four slider YGs (not shown in fig. 23). The pair of Y-axis linear guides YGR are provided in the Y-axis direction in parallel with each other near the-X side and + X side ends of the upper surface of the X stage STX. The four sliders YGS are fixed near the four corners of the lower surface of the Y stage STY, respectively. Here, the four sliders YGS have an inverted U-shaped XZ cross section, and among the four sliders, two sliders YGS located on the-X side are engaged with the Y-axis linear guide YGR located on the-X side on the X stage STX, and two sliders YGS located on the + X side are engaged with the Y-axis linear guide YGR located on the + X side (see fig. 24).

The linear encoder EY (see fig. 25) is composed of a head and a scale. A scale (not shown) having a reflection-type diffraction grating whose periodic direction is the Y-axis direction formed on the surface thereof, and extending on the X stage STX in parallel to the Y-axis linear guide YGR. The heads (not shown) are provided on the lower surface (or the + Y side (or-Y side)) of the Y stage STY. The head faces the scale in the Y-axis direction movement stroke of the Y stage STY, and measures the position information of the Y stage STY relative to the X stage STX in the Y-axis direction by irradiating the scale with the measurement light and receiving the reflected diffracted light from the scale. This measurement result is sent to the main control device 50 (see fig. 25).

Position information (including yaw (rotation amount in θ z direction)) of the substrate stage ST (Y stage STY) in the XY plane is measured at any time by an encoder system 20 (see fig. 25) including linear encoders EX1 and EX2 included in the X-axis drive units XD1 and XD2, and a linear encoder EY included in the Y-axis drive unit YD.

Further, independently of the encoder system 20, the substrate interferometer system 92 measures positional information (including θ Z) of the Y stage STY (substrate stage ST) in the XY plane and tilt amount information (pitching (amount of rotation in the θ x direction) and rolling (amount of rotation in the θ Y direction)) with respect to the Z axis through a reflection surface (not shown) provided on (or formed on) the Y stage STY. The measurement results of the substrate interferometer system 92 are supplied to the main control device 50 (refer to fig. 25).

The main controller 50 controls the driving of the substrate stage ST (Y stage STY and X stage STX) based on the measurement results of the encoder system 20 and/or the substrate interferometer system 92 through the substrate stage drive system PSD (see fig. 25), more precisely, through the linear motors XDM1, XDM2, and YDM constituting a part of each of the X-axis drive units XD1, XD2, and Y-axis drive unit YD.

Fig. 25 is a block diagram showing the input/output relationship of the main controller 50 which is configured mainly by the control system of the exposure apparatus according to embodiment 5 and which integrally controls each part. The main control device 50 includes a workstation (or a microcomputer) and the like, and integrally controls each component of the exposure device.

Next, the balance between the load of the X stage STX and the like of the X-axis drive unit XD1(XD2) and the magnetic attraction force (buoyancy) from the linear motors XDM1 and XDM2 will be described. Since the balance between the load and the buoyancy is the same as that of the X-axis drive unit XD1 and the X-axis drive unit XD2, the X-axis drive unit XD1 will be described below.

As shown in fig. 26, in a state where X stage STX (see fig. 24) is stationary, a load W of about 1/2 of the total weight of X stage STX, Y stage STY, and the like, which is directed downward in the vertical direction (in the direction indicated by the white arrows), acts on movable member 84 of X-axis drive unit XD 1. At the same time, the magnetic attraction force F1 generated between the movable element XD11 and the fixed element XD12 constituting the linear motor XDM1 acts on the movable member 84 in the direction of the angle θ with respect to the Z axis, and the magnetic attraction force F2 generated between the movable element XD21 and the fixed element XD22 constituting the linear motor XDM2 acts on the movable member 84 in the direction of the angle — θ with respect to the Z axis. When the Y stage STY is located at the center of its movable range, for example, although a load W of about half the total weight of the X stage STX, the Y stage STY, and the like acts on the movable member 84 of the X-axis drive unit XD1 and the X-axis drive unit XD2 substantially equally, strictly speaking, a load (load) acting on the movable member 84 in the vertical direction changes with the position of the Y stage STY.

Here, it is assumed that the magnetic attractive forces F1 and F2 generated in the linear motors XDM1 and XDM2 are equal to each other (i.e., F1 ═ F2 ═ F). Therefore, the resultant force P of the magnetic attraction forces F1 and F2 generated by the linear motors XDM1 and XDM2 in the vertical direction is Fz1+ Fz2 (2 Fcos θ), and acts on the movable member 84 upward in the vertical direction (in the direction indicated by the black arrow). The resultant force P is set to an angle theta substantially equal to the load W. Therefore, a load (residual force) | W-P | much smaller than the load W acts on the guide devices XG1, XG 2. Further, in the horizontal direction (Y-axis direction), since the horizontal direction components Fy1 and Fy2 of the magnetic attractive forces F1 and F2 are cancelled, the resultant force does not act on the movable member 84 (zero resultant force action). Further, since the relative movement of the fixed member 63 and the movable member 84 in the Z-axis direction (+ Z direction and-Z direction) is restricted by the guide devices XG1 and XG2, the relationship between the resultant force P and the load W may be P < W or P > W.

In the X-axis drive unit XD1(XD2) configured as described above, the inclination (inclination angle θ) of the side surfaces of the movable member 84 and the fixed member 63 facing each other is appropriately determined depending on the load capacity of the guide devices XG1 and XG2, and the load W acting in the vertical direction can be cancelled out without applying a force in the horizontal direction to the movable member 84 by the magnetic attraction forces F1 and F2 of the linear motors XDM1 and XDM 2.

On the other hand, a magnetic attractive force (-F1) generated by the linear motor XDM1 in the θ direction with respect to the Z axis acts on the fixing member 63 fixed to the-Y side of the base pier 62 a. This attractive force imparts shear and bending moments to the securing member 63. Similarly, a magnetic attractive force (-F2) generated by the linear motor XDM2 in the- θ direction with respect to the Z axis acts on the fixing member 63 fixed to the + Y side of the base pier 62 a. This attractive force imparts shear and bending moments to the securing member 63. Accordingly, the two fixed members 63 are bent inward with respect to the fixed ends of the base piers 62a, and as a result, the size of the gap between the sides of the fixed members 63 and the movable member 84 facing each other can be varied.

The variation of the gap size due to the bending of the fixing member 63 can be suppressed by optimizing the thickness (width in the Y-axis direction) of the fixing member 63.

For example, when the driving force (thrust force) of X stage STX is small and the load W is large with respect to magnetic attraction forces F1 and F2 (to be precise, the resultant force P in the vertical direction is 2Fcos θ) (W > P), the inclination angle θ is set small. As a result, the resultant force P, that is, the buoyancy applied to the movable member 84 increases, and the load (residual force) | W-P | applied to the guide devices XG1 and XG2 decreases. In this case, since the magnetic attraction force is small, the shearing force and the bending moment acting on the fixing member 63 are also small. Thereby, the thickness of the fixing member 63 can be set small.

On the other hand, when the driving force (thrust force) of X stage STX is large and load W is small with respect to magnetic attraction forces F1 and F2 (the resultant force P in the vertical direction is 2Fcos θ) (W < P), inclination angle θ is set to be large. Thus, the balance of the resultant force P is obtained. In this case, the magnetic attractive force is large relative to the large inclined angle θ, so the shear moment acting on the fixing member 63 also becomes large. Thus, the thickness of fixing member 63 is set to be large.

Next, a method of determining the thickness (width in the Y-axis direction) h of the fixing member 63 will be described with reference to fig. 27. As shown in fig. 27, the width of the movable members XD11 and XD21 and the fixed members XD12 and XD22 is s (projection length a in the Y axis direction is scos θ), the gap size between the side surfaces of the movable member 84 and the fixed member 63 facing each other is c (projection length d in the Y axis direction is csin θ), the length of the fixed member 63 in the X axis direction is b, and the height of the fixed member 63 from the fixed end to the center of the inner side surface (the center of the fixed members XD12 and XD22) (distance in the Z axis direction) is L (s/2) sin θ + α. Wherein α is a size margin. Further, it is assumed that the magnetic attraction force is F1 ═ F2 ═ F, that is, the buoyancy acting on the movable member 84 is P ═ 2(Fcos θ). When the young's modulus (longitudinal modulus of elasticity) and the deflection of the fixing member 63 are denoted as E and W, respectively, the thickness h of the fixing member 63 can be obtained as the following formula (1) using a relational expression of the deflection when a perpendicular force acts on the tip of the simple cantilever.

In order to miniaturize the X-axis drive unit XD1 (specifically, to shorten the Y-axis width of the X-axis drive unit XD 1), the inclination angle θ of a + d + h may be selected to be small.

However, as described above, the guide devices XG1 and XG2 are provided between the fixed member 63 and the movable member 84 to suppress the errors in the straightness (the Y translational error and the Z translational error) and the errors in the rotation and the inclination of the movable member 84, the reaction force generated by the movement of the Y stage STY, and the like. Therefore, the load W applied to the movable member 84 is not completely offset by the buoyancy P from the linear motors XDM1 and XDM 2.

For example, the average of s is 100mm, b is 500mm, c is 50mm, and E is 16000Kgf/mm²Relationships among α mm, F2000 Kgf, W0.1 mm, W800 Kgf, θ, a, d, h, a + d + h, and the buoyancy P (═ 2Fcos θ) can be determined as shown in table 1 below.

[ TABLE 1]

According to table 1, the angle θ is preferably set to 70 to 85 degrees. The buoyancy P is 1368.1 to 348.6Kgf relative to the load W of 800Kgf, that is, the residual force acting on the guide devices XG1 and XG2 is-568.1 to +451.4Kgf, and the load W can be substantially offset. Further, since the remaining force can be adjusted to a minimum, the guide devices XG1 and XG2 can be miniaturized. Accordingly, the frictional resistance between the X-axis linear guide and the slider constituting the guide devices XG1 and XG2 is also reduced. That is, the thrust force required to drive movable member 84(X stage STX) is also small, and for example, movable member 84 can be moved manually, so that the work efficiency of maintenance of X stage STX and the like is improved. Further, by setting the inclination angle θ to be large, the fixing member 63, that is, the X-axis drive unit XD1 can be miniaturized.

In addition, the X-axis drive units XD1 and XD2 configured as described above can easily adjust the gap between the movable sub XD11 and XD21 and the fixed sub XD12 and XD22 without using an adjustment plate such as a spacer. The adjustment procedure is described below with reference to fig. 28. In adjustment, the operator first fixes the movable member 84 to the base pier 62a using an appropriate fixture. Next, the operator attaches nonmagnetic blocks 69 having a thickness g larger than the movers XD11, XD21 by an appropriate gap amount to both side surfaces of the movable member 84. Next, the operator uses the fixing tool (bolt) 63 in a state where the stators XD12, XD22 fixed to the inner surface of the fixing member 63 are in contact with the nonmagnetic block 69₀The fixing member 63 is fixed to the base pier 62 a. Here, since the fixing surface (the surface parallel to the XZ plane) is not parallel to the inner surface (the surface inclined by ± θ with respect to the Z axis) of the fixing member 63, the fixing position (height) can be adjusted by sliding the fixing member 63 in the vertical direction shown by the white arrows in fig. 28, thereby adjusting the size of the gap. Here, to enable this adjustment, a fixing tool (bolt) 63 is formed on the fixing portion 63₀Slot capable of sliding up and down, XZ section and circle longer than Z axis direction。

Next, the operator fixes all the fixed members 63 (except the most + X-end and the most-X-end fixed members 63) to the base pier 62a in the same manner while changing the X position of the movable member 84. Finally, the operator replaces the nonmagnetic block 69 with the movers XD11, XD21 in a state where the movable member 84 is retracted to the + X end (or-X end), and then fixes the fixing member 63 at the + X end to the base pier 62 a.

Accordingly, the stators XD12 and XD22 can be firmly fixed to the inner surface of the fixed member 63 over a wide range, and the gap between the stators XD11 and XD21 can be adjusted in volume. Further, the X-axis drive units XD1 and XD2 are economical because the machining accuracy of the structures can be relatively imprecise. As a result, substrate stage device PSTe with high driving accuracy can be configured at low cost. Further, since the stator elements XD12 and XD22 (magnet elements) are fixed to the inner sides (inner side surfaces of the fixing members 63) of the X-axis drive elements XD1 and XD2, the magnetic elements are not attracted even when they approach the outer side surfaces of the fixing members 63.

The exposure apparatus according to embodiment 5 configured as described above performs batch processing in the same procedure as the exposure apparatus 10 according to embodiment 1, although detailed description thereof is omitted.

As described above, according to the exposure apparatus of embodiment 5, the resultant force P of the vertical component force of the attraction force Fz1 generated between the 1 ST movable sub XD11 and the 1 ST fixed sub XD12 and the attraction force Fz2 generated between the 2 nd movable sub XD21 and the 2 nd fixed sub XD22, which are provided in each of the pair of X-axis drive units XD1 and XD2 capable of driving the substrate stage ST (X stage STX) in the X-axis direction, is utilized as a buoyancy to reduce the load applied to the base blocks 62a and 62b including the weight of the substrate stage ST itself, and the drive control of the substrate stage ST (X stage STX) can be performed without impairing the high accuracy and the drive performance.

Further, according to the exposure apparatus of embodiment 5, since the substrate stage ST holding the substrate P (to be precise, the X stage STX holding the substrate P through the Y stage STY) can be driven with high accuracy at the time of scanning exposure of the substrate P, high-accuracy exposure of the substrate P can be performed.

In the above-described embodiment 5, the X-axis drive unit XD1(XD2) is configured by using the movable member 84 having an equilateral trapezoidal cross section, but instead of this, the X-axis drive unit XD1(XD2) may be configured by using the movable member 84 having a trapezoidal cross section other than an equilateral trapezoid as shown in the following modifications 1 and 2.

Fig. 29 shows the structure of an X-axis drive unit XD1(XD2) according to modification 1 (for convenience, the same reference numerals are given to the base block 62a, the fixed member 63, and the movable member 84 as in embodiment 5). In the configuration of fig. 29, the inclination angles of the ± Y-side surfaces of the movable member 84 are different from each other (θ)₁＞θ₂). Therefore, the horizontal direction components of the magnetic attractive forces F1 and F2 of the linear motors XDM1 and XDM2 do not cancel each other, and the resultant force Py in the-Y direction acts on the movable member 84.

In the configuration of the X-axis drive unit XD1(XD2) shown in fig. 29, thrust type hydrostatic gas bearing devices XG3a and XG4 are used as guide devices. Guide surfaces XGG3 and XGG4 (guide surfaces XGG3 and XGG4 each having two guide surfaces in which the groove bottom surface and the side surface are orthogonal) having high flatness are formed on the inner bottom surface and the both side surfaces of the groove of the base pier 62 a. Air pads XGP3 and XGP4 of a plurality of static pressure gas bearings having bearing surfaces facing the guide surfaces XGG3 and XGG4, respectively, are attached to the bottom surface of the movable member 84. The air cushions XGP3, 4 blow high pressure air through valves (compensation elements) into the small gaps (bearing gaps) between the bearing surfaces and the guide surfaces XGG3, 4. Here, each of the air cushions XGP3, XGP4 has a function of restricting two air cushions of pitching motion and yawing motion of the movable member 84.

In the thrust type static pressure gas bearing devices XG3a and XG4, the rigidity of the air film (air pad) in the gap can be improved by applying an external force to the movable member 84 to press the bearing surfaces of the air pads XGP3 and XGP4 against the guide surfaces XGG3 and XGG 4. Therefore, the inclination angle θ of the ± Y-side surface of the movable member 84 is appropriately determined₁、θ₂And adjusting linearityThe resultant force Pz of the vertical component and the resultant force Py of the horizontal component of the magnetic attractive forces F1 and F2 of the motors XDM1 and XDM2 can be adjusted to adjust the vertical load and the horizontal load applied to the air cushions XGP3 and XGP4, that is, the rigidity of each air cushion can be arbitrarily adjusted.

Further, the inclination angle θ of the + -Y-side surface of the movable member 84 is appropriately determined₁、θ₂By adjusting the resultant force Py and adjusting the horizontal loads applied to the air cushions XGP3, XGP4, the rigidity of one of the air cushions XGP3, XGP4 can be made extremely higher than the rigidity of the other. In this way, the movable member 84 can be moved along one guide surface. Therefore, when the parallelism of the guide surfaces XGG3 and XGG4 formed on both side surfaces of the groove is poor, the movable member 84 can be moved along the guide surface facing the air cushion having high rigidity. Further, when one of the guide surfaces XGG3 and XGG4 formed on both side surfaces of the groove is poor in straightness, the movable member 84 can be moved along the guide surface having a good straightness facing the air pad having a high rigidity by increasing the rigidity of the air pad facing the other of the guide surfaces XGG3 and XGG 4.

Fig. 30 shows a modification 2 of the X-axis drive unit XD1(XD2) (for convenience, the same reference numerals are given to the base block 62a, the fixed member 63, and the movable member 84 as in the embodiment 5). In the structure shown in fig. 30, the guide surface XGG3 is formed on the bottom surface and the side surface of the groove on the-Y side, but the guide surface XGG 4' is formed only on the bottom surface of the groove on the + Y side. And air pads XGP3, XGP4 'having bearing surfaces respectively opposed to the guide surfaces XGG3, XGG 4' are mounted on the bottom surface of the movable member 84. In this case, as in the case of the above-described modification 1, the movable member 84 can be moved along the guide surface XGG3 facing the air cushion XGP 3.

Further, since it is generally not easy to form highly flat guide surfaces on both sides of the groove of the base block 62a, the base block 62a may be configured by using a plurality of divided members, and the guide surfaces may be provided on both sides of the groove.

In the above-described embodiment 5, the case where the magnetic attraction force is generated between the stator (XD11, XD21) and the mover (XD12, XD22) in each of the linear motors XDM1, XDM2 provided in the two X-axis drive units XD1, XD2, and the vertical direction component of the attraction force is the direction in which the mover is pulled up from the stator side has been described. However, the present invention is not limited to this, and for example, in each of the linear motors XDM1 and XDM2 of embodiment 5, the positions of the stator (XD11 and XD21) and the mover (XD12 and XD22) may be changed. In this case, a magnetic repulsive force is generated between the stator (XD11, XD21) and the movable element (XD12, XD22) when the X-axis direction of the X stage STX is driven, and the vertical direction component of the repulsive force is a direction in which the movable element is pushed up from the stator side. Even in this case, the resultant force of the vertical components of the forces generated between the stator (XD11, XD21) and the mover (XD12, XD22) can be used as the buoyancy, and the same effect as in embodiment 5 can be obtained. In addition, instead of this, or in addition to the magnetic force between the fixed member (XD11, XD21) and the movable member (XD12, XD22), another suction force (for example, vacuum suction force) or a repulsive force (for example, gas static pressure) may be applied at least when driving in the X-axis direction of the X stage STX. In such a case, the vertical component of the suction force or the repulsive force can be used as the buoyancy.

Further, in embodiment 5 described above, although the substrate P is mounted on the Y stage STY, a fine movement stage capable of being driven in a direction of 6 degrees of freedom with respect to the Y stage STY may be provided as in the stage device disclosed in, for example, U.S. patent application publication No. 2010/0018950, and the substrate P may be mounted on the fine movement stage. In this case, the fine movement stage may be supported from below by providing the weight cancellation device disclosed in the above-mentioned U.S. patent application publication No. 2010/0018950.

In the exposure apparatus of each of the above embodiments, the illumination light may be ultraviolet light such as ArF excimer laser light (wavelength 193nm) and KrF excimer laser light (wavelength 248nm), or F₂Vacuum ultraviolet light such as laser light (wavelength 157 nm). Further, as the illumination light, for example, an infrared band or a visible band emitted from a DFB semiconductor laser or a fiber laser may be usedSingle wavelength laser light is amplified, for example, by an optical fiber amplifier doped with erbium (or both erbium and ytterbium), wavelength converted to a harmonic of ultraviolet light using nonlinear optical crystallization. Furthermore, solid-state lasers (wavelength: 355nm, 266nm) and the like can also be used.

In the above embodiments, the description has been made of the case where the projection optical system PL is a multi-lens type projection optical system including a plurality of projection optical units, but the number of projection optical units is not limited to this, and may be one or more. Further, the present invention is not limited to the projection optical system of the multi-lens system, and may be a projection optical system using an offner type large mirror, for example.

The projection optical system in the exposure apparatus according to each of the above embodiments is not limited to the equal magnification system, and may be any of a reduction system and an enlargement system, and may be any of a catadioptric system, a reflection system, and a refraction system. The projection image may be an inverted image or an erect image.

In the above embodiment, a light transmissive mask in which a predetermined light shielding pattern (or phase pattern or light reduction pattern) is formed on a light transmissive mask substrate is used, but instead of this mask, for example, an electronic mask (variable forming mask) in which a transmissive pattern, a reflective pattern or a light emitting pattern is formed based on electronic data of a pattern to be exposed as disclosed in U.S. Pat. No. 6,778,257, for example, a variable forming mask of DMD (Digital Micro-mirror Device) which is a kind of non-light emitting type image display Device (also called a spatial light modulator) may be used.

The exposure apparatus according to each of the above embodiments is particularly effective for exposing a substrate having a size (including at least one of an outer diameter, a diagonal line, and a side) of 500mm or more, for example, a large-sized substrate for a Flat Panel Display (FPD) such as a liquid crystal display device.

Further, the above embodiments can be applied to an exposure apparatus of step & stick (step & stick) system. In particular, the embodiment 5 can be applied to, for example, a stationary exposure apparatus.

The application of the exposure apparatus is not limited to the liquid crystal exposure apparatus for transferring a liquid crystal display element pattern onto a square glass plate, and can be widely applied to, for example, an exposure apparatus for semiconductor manufacturing, an exposure apparatus for manufacturing a thin film magnetic head, a micromachine, a DNA wafer, or the like. The present invention is applicable not only to microdevices such as semiconductor device elements, but also to exposure apparatuses that transfer a circuit pattern onto a glass substrate, a silicon wafer, or the like in order to manufacture masks or reticles used in light exposure apparatuses, EUV exposure apparatuses, X-ray exposure apparatuses, electron beam exposure apparatuses, and the like. The object to be exposed is not limited to a glass plate, but may be other objects such as a wafer, a ceramic substrate, a thin film member, and a mask substrate (mask blank). When the exposure target is a substrate for a flat panel display, the thickness of the substrate is not particularly limited, and for example, a film (flexible sheet member) is also included.

Further, the disclosures of all publications, international publications, U.S. patents, and U.S. patent application publications on exposure apparatuses cited in the above description are incorporated as part of the present specification.

Method for manufacturing device

Next, a method for manufacturing a microdevice using the exposure apparatus according to each of the above embodiments in a lithography process will be described. The exposure apparatus of each of the above embodiments can also form a liquid crystal display device as a micro device by forming a predetermined pattern (circuit pattern, electrode pattern, etc.) on a plate (glass substrate).

Pattern formation step

First, a so-called photolithography process is performed in which a pattern image is formed on a photosensitive substrate (e.g., a glass substrate coated with a resist) using the exposure apparatus according to each of the above embodiments. By this photolithography process, a predetermined pattern including a plurality of electrodes is formed on the photosensitive substrate. Then, the exposed substrate is subjected to a developing step, an etching step, a photoresist stripping step, and the like to form a predetermined pattern on the substrate.

Color filter forming step

Next, a plurality of color filters arranged in a matrix corresponding to three points of r (red), g (green), and b (blue), or a plurality of color filters arranged in the horizontal scanning line direction forming R, G, B filters with three lines are formed.

Unit assembling procedure

Next, a liquid crystal panel (liquid crystal cell) is assembled using the substrate having the predetermined pattern obtained in the pattern forming step, the color filter obtained in the color filter forming step, and the like. For example, a liquid crystal panel (liquid crystal cell) is manufactured by injecting liquid crystal between a substrate having a predetermined pattern obtained in the pattern forming step and a color filter obtained in the color filter forming step.

Module assembling procedure

Then, the liquid crystal display element is completed by mounting various components such as a circuit for performing a display operation of the assembled liquid crystal panel (liquid crystal cell) and a backlight unit

In this case, in the pattern forming step, since the plate can be exposed with high productivity and high accuracy by using the exposure apparatus of each of the above embodiments, the productivity of the liquid crystal display device can be improved.

Industrial applicability

As described above, the exposure apparatus of the present invention is suitable for moving an object to be exposed in a scanning direction by a predetermined stroke with respect to an exposure energy beam during exposure processing. The mobile body apparatus of the present invention is very suitable for driving a mobile body. In addition, the manufacturing method of the flat panel display of the present invention is very suitable for manufacturing the flat panel display. The component manufacturing method of the present invention is suitable for the production of microcomponents.

Claims (55)

1. A scanning exposure apparatus for moving an object to be exposed in a 1 st direction parallel to a horizontal plane by a predetermined 1 st stroke with respect to an energy beam for exposure during exposure processing, comprising:

a 1 st moving body movable in the 1 st direction by at least the predetermined 1 st stroke;

a 2 nd movable body that guides movement of the 1 st movable body in the 1 st direction and is movable in the 2 nd stroke in the 2 nd direction orthogonal to the 1 st direction in the horizontal plane together with the 1 st movable body;

an object holding member that can hold the object and move together with the 1 st moving body at least in a direction parallel to the horizontal plane;

a weight removing device that supports the object holding member from below to remove the weight of the object holding member; and

a support member extending in the 1 st direction, supporting the weight removing device from below and capable of moving in the 2 nd direction by the 2 nd stroke in a state where the weight removing device is supported from below.

2. The exposure apparatus according to claim 1, wherein the 2 nd movable body is driven in the 2 nd direction by a 1 st linear motor including a stator provided at a predetermined fixed member and a mover provided at the 2 nd movable body;

the support member is driven in the 2 nd direction by a 2 nd linear motor including the stator and a mover provided in the support member.

3. The exposure apparatus according to claim 2, wherein the support member is vibrationally separated from the stator.

4. The exposure apparatus according to any one of claims 1 to 3, wherein the support member is mechanically coupled to the 2 nd movable body with a coupling device, and is moved in the 2 nd direction by being pulled by the 2 nd movable body through the coupling device when the 2 nd movable body moves.

5. The exposure apparatus according to claim 4, wherein the other direction of the connection means has lower rigidity than the 2 nd direction.

6. The exposure apparatus according to claim 4 or 5, wherein the connection means is connected to the support member on an axis parallel to the 2 nd direction passing through a position of a center of gravity of the support member.

7. The exposure apparatus according to any one of claims 1 to 3, wherein the support member is provided to the 2 nd movable body, and is pressed by a plurality of pressing devices in point contact with the support member to move in the 2 nd direction.

8. The exposure apparatus according to claim 7, wherein the plurality of pressing means are separated from the support member when the movable body moves in the 1 st direction by a predetermined stroke.

9. The exposure apparatus according to any one of claims 1 to 3, further comprising a hydrostatic gas bearing for gas ejected from one of the support member and the 2 nd movable body to the other;

when the 2 nd moving body moves in the 2 nd direction, the support member moves in the 2 nd direction by being pressed by the 2 nd moving body in a non-contact state through the gas.

10. The exposure apparatus according to claim 1, wherein the support member has a 1 st magnet;

the 2 nd moving body has the 2 nd magnet that is set up opposite to the 1 st magnet in the 2 nd direction, and the same magnetic pole as the 1 st magnet in the opposite part; and

when the 2 nd moving body moves in the 2 nd direction, the supporting member is pressed by the 2 nd moving body in the 2 nd direction in a non-contact state due to the repulsive force generated between the 1 st and 2 nd magnets.

11. The exposure apparatus according to any one of claims 1 to 10, further comprising a guide including elements of a uniaxial guide device that mechanically guides the movement of the support member in the 2 nd direction; and

the guide is separated from the 1 st and 2 nd moving bodies in terms of vibration.

12. The exposure apparatus according to claim 11, wherein the uniaxial guiding means is provided in plural at a predetermined interval in the 2 nd direction.

13. The exposure apparatus according to any one of claims 11 or 12, wherein the guides are disposed in plural spaced apart from each other along the 2 nd direction; and

the support member is mounted so as to extend over the plurality of guides.

14. The exposure apparatus according to claim 13, wherein an intermediate support member that supports the 2 nd movable body from below is disposed between the plurality of guides.

15. The exposure apparatus according to any one of claims 11 to 14, wherein the guide comprises a main body portion composed of a hollow member, and a reinforcing member provided inside the main body portion to increase vertical rigidity of the main body portion.

16. The exposure apparatus according to any one of claims 1 to 15, wherein the support member is constituted by a member having a rib structure on which the weight cancellation device is mounted and on which a plurality of ribs for reinforcement are provided on a lower surface thereof.

17. The exposure apparatus according to any one of claims 1 to 15, wherein the support member is formed of a solid stone.

18. The exposure apparatus according to any one of claims 1 to 17, wherein the weight cancellation device is mounted on the support member in a non-contact state.

19. The exposure apparatus according to any one of claims 1 to 18, wherein the object holding member is capable of fine movement relative to the 1 st movable body at least in the 1 st direction, the 2 nd direction, and a direction around an axis orthogonal to the horizontal plane.

20. The exposure apparatus according to claim 19, wherein the object holding member is further capable of fine movement relative to the 1 st movable body in a direction orthogonal to the horizontal plane and about an axis parallel to the horizontal plane.

21. The exposure apparatus according to any one of claims 1 to 20, wherein the 1 st movable body is driven in the 1 st direction by the 1 st stroke by a linear motor including a stator provided to the 2 nd movable body and a mover provided to the 1 st movable body.

22. The exposure apparatus according to any one of claims 1 to 21, further comprising a swing support device that supports the object holding member to be swingable around an axis parallel to the horizontal plane.

23. The exposure apparatus according to claim 22, wherein the swing support device supports the object holding member in a non-contact manner.

24. The exposure apparatus according to claim 22 or 23, wherein the swing support means is supported from below by the weight removal means; and

the weight eliminating device is mounted on the supporting member in a non-contact state.

25. The exposure apparatus according to claim 22 or 23, wherein the swing support device is movable integrally with the object holding member in a direction parallel to the horizontal plane; and

the weight eliminating device is mechanically connected to the swing support device and moves in a direction parallel to the horizontal plane integrally with the object holding member and the swing support device.

26. The exposure apparatus according to claim 22 or 23, wherein the swing support device is mounted on the support member in a non-contact state; and

the weight cancellation device is supported from below by the swing support device.

27. The exposure apparatus according to claim 26, wherein the weight cancellation device includes a force generation device that generates a force that is raised in a vertical direction; and

the force generating device is supported from below by the swing support device and is arranged above a swing member that swings integrally with the object holding member about an axis parallel to the horizontal plane.

28. The exposure apparatus according to any one of claims 22 to 27, wherein the weight removal device comprises a force generation device that generates a vertically-raised force; and

the swing supporting device is arranged to be movable in a direction orthogonal to the horizontal plane and transmits the force generated by the force generating device to the object holding member.

29. The exposure apparatus according to any one of claims 1 to 28, wherein at least a part of a position of the 2 nd mobile body in a direction orthogonal to the horizontal plane and the support member in the direction orthogonal to the horizontal plane are repeated with each other.

30. The exposure apparatus according to any one of claims 1 to 29, wherein the object system is used for manufacturing a substrate for a flat panel display.

31. A method of manufacturing a flat panel display, comprising:

an operation of exposing the substrate using the exposure apparatus according to claim 30; and

and developing the substrate after exposure.

32. A device manufacturing method, comprising:

an act of exposing the object using the exposure apparatus according to any one of claims 1 to 30; and

and developing the exposed object.

33. A mobile device is provided with:

a movable body which moves at least in a 1 st direction parallel to a 1 st axis within a plane parallel to a horizontal plane;

a base for supporting the movable body; and

a driving device including a 1 st movable element and a 2 nd movable element provided on the movable body in a 1 st predetermined direction and a 2 nd predetermined direction intersecting with the 1 st predetermined direction, and a 1 st stator and a 2 nd stator provided on the base so as to extend in the 1 st direction, respectively, the driving device driving the movable body in the 1 st direction with respect to the base by using the 1 st direction driving force generated between the 1 st movable element and the 1 st stator and between the 2 nd movable element and the 2 nd stator, respectively;

wherein at least one of the 1 st predetermined direction and the 2 nd predetermined direction is a direction in which a 2 nd axis orthogonal to the 1 st axis and a 3 rd axis orthogonal to the horizontal plane intersect in the horizontal plane; and

at least during the driving of the movable body in the 1 st direction, the forces in the 1 st predetermined direction and the 2 nd predetermined direction act between the 1 st movable element and the 1 st stator, and between the 2 nd movable element and the 2 nd stator, respectively.

34. The movable body apparatus according to claim 33 wherein attractive forces act as the forces between the 1 st movable element and the 1 st stator, and between the 2 nd movable element and the 2 nd stator.

35. The movable body apparatus according to claim 34 wherein the 1 st movable element and the 2 nd movable element are disposed below the 1 st stator and the 2 nd stator, respectively, in opposition.

36. The movable body apparatus according to any one of claims 33 to 35 wherein the 1 st predetermined direction and the 2 nd predetermined direction are determined based on a magnitude of a 1 st force in the 1 st predetermined direction acting between the 1 st movable element and the 1 st fixed element, a magnitude of a 2 nd force in the 2 nd predetermined direction acting between the 2 nd movable element and the 2 nd fixed element, and a weight of the movable body.

37. The movable body apparatus according to claim 36 wherein a component of the 1 st force in a direction parallel to the 2 nd axis and a component of the 2 nd force in a direction parallel to the 2 nd axis substantially cancel each other out.

38. The movable body apparatus according to any one of claims 33 to 37 wherein at least one rail member constituting a guide apparatus for guiding the movable body in the 1 st direction on the base is extended in the 1 st direction; and

the moving body is provided with a slider which is engaged with the rail member to slide and constitutes the guide device.

39. The movable body apparatus according to any one of claims 33 to 37 wherein the base has a guide surface that guides the movable body in the 1 st direction; and

an air cushion is provided on the movable body in a gap formed between the movable body and the guide surface so as to support the movable body in at least the vertical direction.

40. The movable body apparatus according to any one of claims 33 to 39 wherein the movable body comprises a body and a movable member fixed to the body; thereby to obtain

The 1 st movable element and the 2 nd movable element are arranged on the movable component; and

the 1 st stator and the 2 nd stator are fixed members provided on the base covering the movable member excluding a portion of the movable member.

41. The movable body apparatus according to claim 40 wherein the movable member is a corner post member having a trapezoidal cross section extending in the 1 st direction.

42. The movable body apparatus according to any one of claims 40 and 41 wherein the fixed member is constituted by a plurality of members fixed to the base.

43. The movable body apparatus according to any one of claims 40 to 42 wherein a cover is provided on the fixed member to cover the movable member.

44. The movable body apparatus according to any one of claims 40 to 43 further comprising a cooling device for cooling the drive device by sending a gas into a space surrounded by the fixed member.

45. The movable body apparatus according to any one of claims 33 to 44 wherein the drive means is provided on one side of the movable body in a direction parallel to the 2 nd axis; and

on the other side of the moving body in the direction parallel to the 2 nd axis, another driving device different from the driving device that drives the moving body in the 1 st direction is provided.

46. The movable body apparatus according to claim 45 wherein the another drive apparatus is constructed similarly to the drive apparatus.

47. The movable body apparatus according to claim 45 or 46 wherein a spring member that moves the movable body in a direction parallel to the 2 nd axis is provided on at least one of one side and the other side of the movable body in the direction parallel to the 2 nd axis.

48. The movable body apparatus according to any one of claims 33 to 47 further comprising a position measurement device that measures a position of the movable body relative to the base.

49. The movable body apparatus according to claim 48 further comprising a control device for driving and controlling the movable body by the drive device based on a position measurement result from the position measurement device.

50. The movable body apparatus according to any one of claims 33 to 49 further comprising another movable body supported by the movable body and movable in a direction parallel to at least the 2 nd axis in the predetermined plane.

51. An exposure apparatus for forming a pattern on an object by irradiating an energy beam, comprising:

the movable body apparatus according to claim 50 wherein the object is held on the other movable body.

52. An exposure apparatus includes:

a movable body for holding the object to move at least in a 1 st direction parallel to a 1 st axis within a plane parallel to a horizontal plane;

a base for supporting the movable body;

a driving device including a 1 st movable element and a 2 nd movable element provided on the movable body in a 1 st predetermined direction and a 2 nd predetermined direction intersecting the 1 st predetermined direction, and a 1 st stator and a 2 nd stator provided on the base so as to extend in the 1 st direction, respectively, facing the 1 st movable element and the 2 nd movable element, for driving the movable body in the 1 st direction with respect to the base, and using, at the time of the driving, a force in the 1 st predetermined direction and a force in the 2 nd predetermined direction acting between the 1 st movable element and the 1 st stator and between the 2 nd movable element and the 2 nd stator, respectively, as a buoyancy of the movable body; and

a pattern generating device that irradiates an energy beam on the object to generate a pattern on the object.

53. The exposure apparatus of any one of claims 51 or 52, wherein the system is used to manufacture a substrate for a flat panel display.

54. A method of manufacturing a flat panel display, comprising:

exposing the substrate using the exposure apparatus according to claim 53; and

and developing the substrate after exposure.

55. A device manufacturing method, comprising:

an act of exposing the object using the exposure apparatus according to any one of claims 51 to 53; and

and developing the exposed object.