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Exposure And Positioning Against Photoresist Photosensitive Materials
(AREA)
Abstract
UN METODO PARA LITOGRAFIA TRIDIMENSIONAL, CARACTERIZADA PORQUE INCLUYE LOS PASOS DE: PROVEER UN SUBSTRATO QUE TIENE SUPERFICIES QUE SE EXTIENDEN EN TRES DIMENSIONES Y UN REVESTIMIENTO SENSIBLE A LA LUZ; E ILUMINAR EL SUBSTRATO ATRAVEZ DEUNA MASCARILLA CON LUZ QUE CHOCA SOBRE LA SUPERFICIE A UN ANGULO NO PERPENDICULAR CON RESPECTO A ELLAS.A METHOD FOR THREE-DIMENSIONAL LITHOGRAPHY, CHARACTERIZED BECAUSE IT INCLUDES THE STEPS OF: PROVIDING A SUBSTRATE THAT HAS SURFACES THAT EXTEND IN THREE DIMENSIONS AND A LIGHT SENSITIVE COATING; AND ILLUMINATE THE SUBSTRATE THROUGH A MASK WITH A LIGHT THAT HITS OVER THE SURFACE AT A NON-PERPENDICULAR ANGLE WITH RESPECT TO THEM.
GT199400067A1994-09-021994-10-19
METHOD AND APPARATUS FOR PRODUCING INTEGRATED CIRCUIT DEVICES
GT199400067A
(en)