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GB9902993D0 - Low pressure chemical vapour deposition of titanium dioxide - Google Patents

Low pressure chemical vapour deposition of titanium dioxide

Info

Publication number
GB9902993D0
GB9902993D0 GBGB9902993.6A GB9902993A GB9902993D0 GB 9902993 D0 GB9902993 D0 GB 9902993D0 GB 9902993 A GB9902993 A GB 9902993A GB 9902993 D0 GB9902993 D0 GB 9902993D0
Authority
GB
United Kingdom
Prior art keywords
low pressure
titanium dioxide
vapour deposition
pressure chemical
chemical vapour
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
GBGB9902993.6A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of Strathclyde
Original Assignee
University of Strathclyde
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of Strathclyde filed Critical University of Strathclyde
Priority to GBGB9902993.6A priority Critical patent/GB9902993D0/en
Publication of GB9902993D0 publication Critical patent/GB9902993D0/en
Priority to PCT/GB2000/000432 priority patent/WO2000047797A1/en
Ceased legal-status Critical Current

Links

GBGB9902993.6A 1999-02-11 1999-02-11 Low pressure chemical vapour deposition of titanium dioxide Ceased GB9902993D0 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GBGB9902993.6A GB9902993D0 (en) 1999-02-11 1999-02-11 Low pressure chemical vapour deposition of titanium dioxide
PCT/GB2000/000432 WO2000047797A1 (en) 1999-02-11 2000-02-11 Low pressure chemical vapour deposition of titanium dioxide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB9902993.6A GB9902993D0 (en) 1999-02-11 1999-02-11 Low pressure chemical vapour deposition of titanium dioxide

Publications (1)

Publication Number Publication Date
GB9902993D0 true GB9902993D0 (en) 1999-03-31

Family

ID=10847479

Family Applications (1)

Application Number Title Priority Date Filing Date
GBGB9902993.6A Ceased GB9902993D0 (en) 1999-02-11 1999-02-11 Low pressure chemical vapour deposition of titanium dioxide

Country Status (2)

Country Link
GB (1) GB9902993D0 (en)
WO (1) WO2000047797A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI118129B (en) 2002-09-19 2007-07-13 Mikkelin Ammattikorkeakouluyht Method, apparatus and coating material for coating a metal surface
KR100773537B1 (en) 2003-06-03 2007-11-07 삼성전자주식회사 Non-volatile memory device including one switching element and one resistor, and manufacturing method thereof
ITPR20040059A1 (en) 2004-08-06 2004-11-06 Vacuum Surtec Srl PROCEDURE FOR DEPOSITING THIN LAYERS OF TITANIUM DIOXIDE ON SUPPORT SURFACES AND MANUFACTURES REALIZED BY THAT PROCEDURE.
KR100682926B1 (en) * 2005-01-31 2007-02-15 삼성전자주식회사 Nonvolatile Memory Device Using Resistor and Manufacturing Method Thereof
CN119800323B (en) * 2025-03-13 2025-06-03 中北大学 Method for manufacturing anti-reflection magnesium oxide nano structure

Also Published As

Publication number Publication date
WO2000047797A1 (en) 2000-08-17

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Legal Events

Date Code Title Description
AT Applications terminated before publication under section 16(1)