GB945735A - Process for etching semiconductors in the fabrication of miniature semiconductor networks comprising a single semiconductor block - Google Patents
Process for etching semiconductors in the fabrication of miniature semiconductor networks comprising a single semiconductor blockInfo
- Publication number
- GB945735A GB945735A GB1606660A GB1606660A GB945735A GB 945735 A GB945735 A GB 945735A GB 1606660 A GB1606660 A GB 1606660A GB 1606660 A GB1606660 A GB 1606660A GB 945735 A GB945735 A GB 945735A
- Authority
- GB
- United Kingdom
- Prior art keywords
- etched
- miniature
- fabrication
- semi
- edges
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 title abstract 5
- 238000005530 etching Methods 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000000463 material Substances 0.000 abstract 5
- 239000011248 coating agent Substances 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 2
- 230000000873 masking effect Effects 0.000 abstract 2
- MIMUSZHMZBJBPO-UHFFFAOYSA-N 6-methoxy-8-nitroquinoline Chemical compound N1=CC=CC2=CC(OC)=CC([N+]([O-])=O)=C21 MIMUSZHMZBJBPO-UHFFFAOYSA-N 0.000 abstract 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 abstract 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 abstract 1
- 229910052732 germanium Inorganic materials 0.000 abstract 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 abstract 1
- 235000011007 phosphoric acid Nutrition 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- 235000011149 sulphuric acid Nutrition 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3063—Electrolytic etching
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/02—Etching
- C25F3/12—Etching of semiconducting materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Landscapes
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electrochemistry (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Weting (AREA)
Abstract
<PICT:0945735/C3/1> Semi-conductor materials are etched selectively by coating with a photo-sensitive masking material which is then exposed to light through a stencil of the desired pattern, which is then developed removing areas of masking material, this is then etched mounting a positive electrode 23 in parallel alignment with the prepared surface of the semi-conductor 10 as shown in Fig. 5. By this means "under-cutting" at the edges of the mask is prevented, and the edges of the etched area are sharp. Preferably a germanium material is etched with 20% H3PO4 solution, and silicon with 20 to 40% H2SO4 containing a little ammonium bifluoride. Before the etching step the coated material may be washed and baked at 150 DEG C. to harden the patterned coating. The transistor produced has highly defined etch detail and may be used in the miniature net-works described in Specification 945,734.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US81129659A | 1959-05-06 | 1959-05-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB945735A true GB945735A (en) | 1964-01-08 |
Family
ID=25206147
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1606660A Expired GB945735A (en) | 1959-05-06 | 1960-05-06 | Process for etching semiconductors in the fabrication of miniature semiconductor networks comprising a single semiconductor block |
Country Status (3)
| Country | Link |
|---|---|
| GB (1) | GB945735A (en) |
| LU (1) | LU38604A1 (en) |
| MY (1) | MY6900297A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4096619A (en) * | 1977-01-31 | 1978-06-27 | International Telephone & Telegraph Corporation | Semiconductor scribing method |
-
1960
- 1960-05-05 LU LU38604A patent/LU38604A1/xx unknown
- 1960-05-06 GB GB1606660A patent/GB945735A/en not_active Expired
-
1969
- 1969-12-31 MY MY6900297A patent/MY6900297A/en unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4096619A (en) * | 1977-01-31 | 1978-06-27 | International Telephone & Telegraph Corporation | Semiconductor scribing method |
Also Published As
| Publication number | Publication date |
|---|---|
| MY6900297A (en) | 1969-12-31 |
| LU38604A1 (en) | 1960-07-05 |
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