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GB8522530D0 - Electron beam apparatus - Google Patents

Electron beam apparatus

Info

Publication number
GB8522530D0
GB8522530D0 GB858522530A GB8522530A GB8522530D0 GB 8522530 D0 GB8522530 D0 GB 8522530D0 GB 858522530 A GB858522530 A GB 858522530A GB 8522530 A GB8522530 A GB 8522530A GB 8522530 D0 GB8522530 D0 GB 8522530D0
Authority
GB
United Kingdom
Prior art keywords
electron beam
beam apparatus
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB858522530A
Other versions
GB2164787A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Texas Instruments Ltd
Original Assignee
Texas Instruments Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Texas Instruments Ltd filed Critical Texas Instruments Ltd
Publication of GB8522530D0 publication Critical patent/GB8522530D0/en
Publication of GB2164787A publication Critical patent/GB2164787A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70375—Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3175—Projection methods, i.e. transfer substantially complete pattern to substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/047—Changing particle velocity
    • H01J2237/0473—Changing particle velocity accelerating
    • H01J2237/04735—Changing particle velocity accelerating with electrostatic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/049—Focusing means
    • H01J2237/0492—Lens systems
    • H01J2237/04928—Telecentric systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31777—Lithography by projection
    • H01J2237/31779—Lithography by projection from patterned photocathode

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Beam Exposure (AREA)
GB08522530A 1984-09-11 1985-09-11 Electron beam apparatus Withdrawn GB2164787A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB848422895A GB8422895D0 (en) 1984-09-11 1984-09-11 Electron beam apparatus

Publications (2)

Publication Number Publication Date
GB8522530D0 true GB8522530D0 (en) 1985-10-16
GB2164787A GB2164787A (en) 1986-03-26

Family

ID=10566539

Family Applications (2)

Application Number Title Priority Date Filing Date
GB848422895A Pending GB8422895D0 (en) 1984-09-11 1984-09-11 Electron beam apparatus
GB08522530A Withdrawn GB2164787A (en) 1984-09-11 1985-09-11 Electron beam apparatus

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GB848422895A Pending GB8422895D0 (en) 1984-09-11 1984-09-11 Electron beam apparatus

Country Status (1)

Country Link
GB (2) GB8422895D0 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8514390D0 (en) * 1985-06-07 1985-07-10 Turner D W Electron lithography
GB2282480B (en) * 1990-07-05 1995-07-26 Olivetti Systems & Networks S Integrated circuit structure analysis
US5395738A (en) * 1992-12-29 1995-03-07 Brandes; George R. Electron lithography using a photocathode
EP0881542A1 (en) * 1997-05-26 1998-12-02 Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno Lithography system
WO1999048129A1 (en) * 1998-03-20 1999-09-23 Etec Systems, Inc. Tandem optical scanner/stepper and photoemission converter for electron beam lithography
US6215128B1 (en) * 1999-03-18 2001-04-10 Etec Systems, Inc. Compact photoemission source, field and objective lens arrangement for high throughput electron beam lithography
US6376984B1 (en) * 1999-07-29 2002-04-23 Applied Materials, Inc. Patterned heat conducting photocathode for electron beam source
US6448568B1 (en) * 1999-07-30 2002-09-10 Applied Materials, Inc. Electron beam column using high numerical aperture photocathode source illumination
US6476401B1 (en) 1999-09-16 2002-11-05 Applied Materials, Inc. Moving photocathode with continuous regeneration for image conversion in electron beam lithography
AU2003224494A1 (en) 2002-03-19 2003-09-29 Mapper Lithography Ip B.V. Direct write lithography system
US7019312B2 (en) 2002-06-20 2006-03-28 Mapper Lithography Ip B.V. Adjustment in a MAPPER system
GB2443016B (en) * 2006-10-16 2009-08-26 Vistec Lithography Ltd Electron beam influencing in an electron beam lithography machine

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1055012A (en) * 1965-02-12 1967-01-11 Mullard Ltd Improvements in or relating to methods of manufacturing an article having a surface pattern
GB1199196A (en) * 1967-08-17 1970-07-15 Mini Of Technology London Improvements in or relating to Electron Sources for Cathode-Ray-Tubes and the like
GB2111299B (en) * 1981-11-30 1986-07-09 Thermo Electron Corp High current density photoelectron generators
GB2146168A (en) * 1983-09-05 1985-04-11 Philips Electronic Associated Electron image projector
GB2147141A (en) * 1983-09-26 1985-05-01 Philips Electronic Associated Electron image projector

Also Published As

Publication number Publication date
GB8422895D0 (en) 1984-10-17
GB2164787A (en) 1986-03-26

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)