[go: up one dir, main page]

GB8412497D0 - Solution for polishing copper - Google Patents

Solution for polishing copper

Info

Publication number
GB8412497D0
GB8412497D0 GB848412497A GB8412497A GB8412497D0 GB 8412497 D0 GB8412497 D0 GB 8412497D0 GB 848412497 A GB848412497 A GB 848412497A GB 8412497 A GB8412497 A GB 8412497A GB 8412497 D0 GB8412497 D0 GB 8412497D0
Authority
GB
United Kingdom
Prior art keywords
solution
polishing copper
polishing
copper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB848412497A
Other versions
GB2140039A (en
GB2140039B (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Akademia Gomiczo Hutnicza
Original Assignee
Akademia Gomiczo Hutnicza
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Akademia Gomiczo Hutnicza filed Critical Akademia Gomiczo Hutnicza
Publication of GB8412497D0 publication Critical patent/GB8412497D0/en
Publication of GB2140039A publication Critical patent/GB2140039A/en
Application granted granted Critical
Publication of GB2140039B publication Critical patent/GB2140039B/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F3/00Brightening metals by chemical means
    • C23F3/04Heavy metals
    • C23F3/06Heavy metals with acidic solutions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Surface Treatment Of Glass (AREA)
GB08412497A 1983-05-19 1984-05-16 Solution suitable for polishing copper and its alloys Expired GB2140039B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PL24204883A PL137972B1 (en) 1983-05-19 1983-05-19 Agent for polishing copper and its alloys

Publications (3)

Publication Number Publication Date
GB8412497D0 true GB8412497D0 (en) 1984-06-20
GB2140039A GB2140039A (en) 1984-11-21
GB2140039B GB2140039B (en) 1986-09-03

Family

ID=20017100

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08412497A Expired GB2140039B (en) 1983-05-19 1984-05-16 Solution suitable for polishing copper and its alloys

Country Status (3)

Country Link
DE (1) DE3418574C2 (en)
GB (1) GB2140039B (en)
PL (1) PL137972B1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6530824B2 (en) 2001-03-09 2003-03-11 Rodel Holdings, Inc. Method and composition for polishing by CMP
WO2002073681A1 (en) * 2001-03-12 2002-09-19 Rodel Holdings, Inc. Method and composition for polishing by cmp
PL246166B1 (en) 2023-03-01 2024-12-09 Akademia Gorniczo Hutnicza Im Stanislawa Staszica W Krakowie Polishing solution for copper and its alloys and polishing method

Also Published As

Publication number Publication date
PL137972B1 (en) 1986-08-30
GB2140039A (en) 1984-11-21
DE3418574A1 (en) 1984-11-22
DE3418574C2 (en) 1986-06-19
GB2140039B (en) 1986-09-03
PL242048A1 (en) 1984-12-03

Similar Documents

Publication Publication Date Title
GB8406235D0 (en) Holder
GB8614772D0 (en) Phenethanolamines
DE3467521D1 (en) Chuck
GB2149697B (en) Chuck
GB8413349D0 (en) Circuit means
GB2154857B (en) Holder
GB2139016B (en) Wiring holder
GB2141141B (en) Electrodepositing copper
GB8432621D0 (en) Circuit arrangement for strobscopes
GB8412497D0 (en) Solution for polishing copper
GB8405487D0 (en) Phenethanolamines
GB8332514D0 (en) Electrical components
GB8412467D0 (en) Holder
GB8324174D0 (en) Electrical components
GB2140038B (en) Solution for chemical polishing brasses
GB2132941B (en) Arrangement for enclosing substrates
GB8417576D0 (en) Interface circuit
GB8421075D0 (en) Polishing apparatus
GB8415771D0 (en) Toy-signboard components
PL242047A1 (en) Solution for chemically polishing brasses
KR850002445Y1 (en) Holder for feeding-bottle
KR850000622Y1 (en) Pipe-holder for wiretoy
BG49299A1 (en) Method for electroerrosion polishing
GB8322345D0 (en) Polishing devices
BG36489A1 (en) Commutator

Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee