GB797687A - Improvements in or relating to processes for the manufacture of semi-conductor rectifiers - Google Patents
Improvements in or relating to processes for the manufacture of semi-conductor rectifiersInfo
- Publication number
- GB797687A GB797687A GB21831/55A GB2183155A GB797687A GB 797687 A GB797687 A GB 797687A GB 21831/55 A GB21831/55 A GB 21831/55A GB 2183155 A GB2183155 A GB 2183155A GB 797687 A GB797687 A GB 797687A
- Authority
- GB
- United Kingdom
- Prior art keywords
- temperature
- alloying
- semi
- pellet
- indium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
- 238000005275 alloying Methods 0.000 abstract 4
- 239000012190 activator Substances 0.000 abstract 3
- 229910052738 indium Inorganic materials 0.000 abstract 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 abstract 3
- 239000008188 pellet Substances 0.000 abstract 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 abstract 2
- 239000001257 hydrogen Substances 0.000 abstract 2
- 229910052739 hydrogen Inorganic materials 0.000 abstract 2
- 239000001301 oxygen Substances 0.000 abstract 2
- 229910052760 oxygen Inorganic materials 0.000 abstract 2
- 229910052787 antimony Inorganic materials 0.000 abstract 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 abstract 1
- 230000005587 bubbling Effects 0.000 abstract 1
- 238000001816 cooling Methods 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 229910052732 germanium Inorganic materials 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 229910052759 nickel Inorganic materials 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
- 238000009736 wetting Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/24—Alloying of impurity materials, e.g. doping materials, electrode materials, with a semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electrodes Of Semiconductors (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
797,687. Semi-conductor devices. MARCONI'S WIRELESS TELEGRAPH CO., Ltd. May 28, 1956 [July 28, 1955], No. 21831/55. Drawings to Specification. Class 37. A method of making a PN junction rectifier comprises the following steps: placing a pellet of activator material characteristic of one conductivity type on a semi-conductor wafer of the opposite type, heating in vacuo or in an inert atmosphere to a temperature slightly above the melting-point and wetting temperature of the activator, forming an oxide skin on the activator, raising the temperature to the optimum temperature for alloying, and then cooling. In the embodiment an indium pellet is placed on a germanium wafer mounted on a nickel baseplate, and heated in a flow of oxygen-free hydrogen to 300 C. The flow of hydrogen is then replaced by a flow of nitrogen containing some oxygen and the assembly raised to the optimum alloying temperature of 510 C. The assembly is then cooled and, if desired, the oxide layer is removed from the indium by etching. The effect of the oxide film is to raise the surface tension so that the uncontrolled spread of indium over the germanium surface which would otherwise occur at the optimum alloying temperature is avoided. Sufficient oxygen may be introduced into the nitrogen by bubbling it through water. The method may also be used in alloying an antimony pellet to a wafer of silicon.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ES0230001A ES230001A1 (en) | 1955-07-28 | 1956-07-26 | Procedure for the manufacture of semiconductor rectifier (Machine-translation by Google Translate, not legally binding) |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB2183156 | 1956-05-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB797687A true GB797687A (en) | 1958-07-09 |
Family
ID=10169546
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB21831/55A Expired GB797687A (en) | 1955-07-28 | 1955-07-28 | Improvements in or relating to processes for the manufacture of semi-conductor rectifiers |
Country Status (3)
Country | Link |
---|---|
DE (1) | DE1015936B (en) |
FR (1) | FR1155086A (en) |
GB (1) | GB797687A (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1255822B (en) * | 1957-04-18 | 1967-12-07 | Siemens Ag | Alloying process for connecting a semiconductor body made of silicon with an electrode body made of gold |
US3015591A (en) * | 1958-07-18 | 1962-01-02 | Itt | Semi-conductor rectifiers and method of manufacture |
DE1174909B (en) * | 1962-02-05 | 1964-07-30 | Elektronik M B H | Method for the production of at least two alloy electrodes attached close to one another on a surface of the semiconductor body of a semiconductor component |
DE1236659B (en) * | 1962-06-29 | 1967-03-16 | Licentia Gmbh | Alloy process for the production of semiconductor components with a silicon body |
DE1514082C3 (en) * | 1964-02-13 | 1984-08-30 | Kabushiki Kaisha Hitachi Seisakusho, Tokio/Tokyo | Field effect transistor |
DE1216989B (en) * | 1964-06-24 | 1966-05-18 | Licentia Gmbh | Method for producing a semiconductor component with a silicon body |
-
1955
- 1955-07-28 GB GB21831/55A patent/GB797687A/en not_active Expired
-
1956
- 1956-07-19 DE DEM31154A patent/DE1015936B/en active Pending
- 1956-07-24 FR FR1155086D patent/FR1155086A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
DE1015936B (en) | 1957-09-19 |
FR1155086A (en) | 1958-04-22 |
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