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GB571107A - Improvements in photographic stencils - Google Patents

Improvements in photographic stencils

Info

Publication number
GB571107A
GB571107A GB179544A GB179544A GB571107A GB 571107 A GB571107 A GB 571107A GB 179544 A GB179544 A GB 179544A GB 179544 A GB179544 A GB 179544A GB 571107 A GB571107 A GB 571107A
Authority
GB
United Kingdom
Prior art keywords
image
developed
layer
exposed
etched
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB179544A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Ltd
Original Assignee
Kodak Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Ltd filed Critical Kodak Ltd
Priority to GB179544A priority Critical patent/GB571107A/en
Publication of GB571107A publication Critical patent/GB571107A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C19/00Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00Surface treatment of glass, not in the form of fibres or filaments, by etching
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/06Silver salts

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

571,107. Photographic wash-out reliefs; photo - mechanical printing surfaces. KODAK, Ltd., and STEVENS, G. W. W. Jan. 31, 1944, No. 1795. [Class 98 (ii)] In the preparation of a photographic stencil forming a etching resist, a silver salt emulsion layer is subjected to at least two separate image development steps and to at least two separate steps for imagewise removal of the layer. An image-development step may be performed simultaneously with an imagewise removal step. Two or more latent images may be printed into the layer before any one is developed or firstly one can be printed and developed and subsequently another can be printed and developed. With two images, one image may be developed and the layer removed imagewise and then a second image may be developed and the layer again removed imagewise, or the images ma.y be successively developed and then the layer successively removed imagewise. A developing solution comprising hydroquinone, potassium metabisulphate, potassium bromide, potassium hydroxide, and water used at 100-120‹ F. develops the exposed parts of the emulsion rapidly, tans the gelatine at those parts, and washes out the unexposed parts. In example 1, a silver-plated copper plate coated with an unhardened process-type gelatino-silver halide emulsion is exposed to a positive of an image to be deeply etched and is developed in non- tanning developer. The image is treated in a bleach-hardening bath, the unhardened gelatine is washed out in hot water, and the layer is dried in non-actinic light. The plate is etched deeply with alcoholic ferric nitrate and is washed. The emulsion is exposed to a negative image of the fine detail image, is developed to give a gelatine stencil containing a silver image, is treated in an etch-bleaching bath to imagewise remove the gelatine layer, and a shallow etching treatment is applied. In example 2, a glass plate coated with a hardened processtype emulsion is exposed to a negative image of the image to be deeply etched, is developed, washed, and treated in an etch-bleach bath. After washing, the layer is re-exposed to a negative image of the second desired image, is developed, dried, re-swollen in a solution of a loading agent, e.g. a 20 per cent aqueous solution of sugar or glycerine, the glass etched by sand-blasting, the layer washed, the second image etched from the layer by an etch-bleach bath, the layer retreated with a solution of a loading agent, and the glass given a further light sand-blasting. The cycle of operations may be repeated by washing, bleaching, washing, re-exposing, developing, and etch-bleaching. In example 3, a surface coated with unhardened emulsion is exposed, developed, treated in a bleach-hardening bath, re-exposed to the second image, developed in a non-tanning developer, the unhardened gelatine washed out to give a stencil of the first image only, the second image treated with an etch-bleaching bath, and the surface etched. The surface could also be partially etched between the two imagewise removal steps.
GB179544A 1944-01-31 1944-01-31 Improvements in photographic stencils Expired GB571107A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB179544A GB571107A (en) 1944-01-31 1944-01-31 Improvements in photographic stencils

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB179544A GB571107A (en) 1944-01-31 1944-01-31 Improvements in photographic stencils

Publications (1)

Publication Number Publication Date
GB571107A true GB571107A (en) 1945-08-07

Family

ID=9728146

Family Applications (1)

Application Number Title Priority Date Filing Date
GB179544A Expired GB571107A (en) 1944-01-31 1944-01-31 Improvements in photographic stencils

Country Status (1)

Country Link
GB (1) GB571107A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2854336A (en) * 1955-03-07 1958-09-30 Youngstown Arc Engraving Compa Method of forming a two-level photoengraved embossing plate or mold
US3023099A (en) * 1956-04-23 1962-02-27 Bjorksten Res Lab Inc Photographic process for etching scribing media
US3222175A (en) * 1961-11-29 1965-12-07 Eastman Kodak Co Process for forming metallic nonsilver images

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2854336A (en) * 1955-03-07 1958-09-30 Youngstown Arc Engraving Compa Method of forming a two-level photoengraved embossing plate or mold
US3023099A (en) * 1956-04-23 1962-02-27 Bjorksten Res Lab Inc Photographic process for etching scribing media
US3222175A (en) * 1961-11-29 1965-12-07 Eastman Kodak Co Process for forming metallic nonsilver images

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