[go: up one dir, main page]

GB2590176B - Method and apparatus - Google Patents

Method and apparatus Download PDF

Info

Publication number
GB2590176B
GB2590176B GB2016920.7A GB202016920A GB2590176B GB 2590176 B GB2590176 B GB 2590176B GB 202016920 A GB202016920 A GB 202016920A GB 2590176 B GB2590176 B GB 2590176B
Authority
GB
United Kingdom
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
GB2016920.7A
Other versions
GB2590176A (en
GB202016920D0 (en
Inventor
Giacomo Robert Colosimo Nicholas
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BAE Systems PLC
Original Assignee
BAE Systems PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BAE Systems PLC filed Critical BAE Systems PLC
Publication of GB202016920D0 publication Critical patent/GB202016920D0/en
Publication of GB2590176A publication Critical patent/GB2590176A/en
Application granted granted Critical
Publication of GB2590176B publication Critical patent/GB2590176B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/15—Nano-sized carbon materials
    • C01B32/182—Graphene
    • C01B32/184—Preparation
    • C01B32/186—Preparation by chemical vapour deposition [CVD]
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/003—Coating on a liquid substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Carbon And Carbon Compounds (AREA)
GB2016920.7A 2019-10-29 2020-10-26 Method and apparatus Active GB2590176B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB201915674A GB201915674D0 (en) 2019-10-29 2019-10-29 Method and apparatus

Publications (3)

Publication Number Publication Date
GB202016920D0 GB202016920D0 (en) 2020-12-09
GB2590176A GB2590176A (en) 2021-06-23
GB2590176B true GB2590176B (en) 2022-05-04

Family

ID=68768989

Family Applications (2)

Application Number Title Priority Date Filing Date
GB201915674A Ceased GB201915674D0 (en) 2019-10-29 2019-10-29 Method and apparatus
GB2016920.7A Active GB2590176B (en) 2019-10-29 2020-10-26 Method and apparatus

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GB201915674A Ceased GB201915674D0 (en) 2019-10-29 2019-10-29 Method and apparatus

Country Status (1)

Country Link
GB (2) GB201915674D0 (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014148423A (en) * 2013-01-31 2014-08-21 Nagoya Institute Of Technology Method for producing single crystal graphene, and touch panel using single crystal graphene
GB2530337A (en) * 2014-09-22 2016-03-23 Bae Systems Plc Graphene Manufacture

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014148423A (en) * 2013-01-31 2014-08-21 Nagoya Institute Of Technology Method for producing single crystal graphene, and touch panel using single crystal graphene
GB2530337A (en) * 2014-09-22 2016-03-23 Bae Systems Plc Graphene Manufacture

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Journal of Materials Science & Technology, Vol. 34, No.10, February 2018, Chen et al., "Direct growth of graphene on vertically standing glass by a metal-free chemical vapor deposition method", pp. 1919 - 1924. *

Also Published As

Publication number Publication date
GB2590176A (en) 2021-06-23
GB201915674D0 (en) 2019-12-11
GB202016920D0 (en) 2020-12-09

Similar Documents

Publication Publication Date Title
SG11202107662TA (en) Apparatus and method for cybersecurity
GB2584677B (en) Method and apparatus for trajectory-planning
GB2595122B (en) Method and apparatus
GB201916079D0 (en) Apparatus and method
GB201912887D0 (en) Apparatus and method
GB202018312D0 (en) Method and apparatus
GB201910690D0 (en) Recognitaton apparatus and method
GB2590066B (en) Apparatus and method
GB201905795D0 (en) Apparatus and method
GB202008510D0 (en) Apparatus and method
KR102292770B9 (en) - Hybrid seawater-desalination apparatus and method
GB2582825B (en) Apparatus and method
GB201910463D0 (en) Apparatus and method
GB2591851B (en) Method and apparatus
GB2590176B (en) Method and apparatus
GB2594910B (en) Method and apparatus
GB2583098B (en) Apparatus and method
GB201918308D0 (en) Apparatus and method
GB201917418D0 (en) Apparatus and method
GB201917354D0 (en) Method and apparatus
GB201915676D0 (en) Method and apparatus
GB201914730D0 (en) Apparatus and method
GB201913996D0 (en) Apparatus and method
GB201913933D0 (en) Apparatus and method
GB201913529D0 (en) Method And Apparatus