GB2521819A - Particle optical arrangement for a charged particle optical system - Google Patents
Particle optical arrangement for a charged particle optical system Download PDFInfo
- Publication number
- GB2521819A GB2521819A GB1320658.6A GB201320658A GB2521819A GB 2521819 A GB2521819 A GB 2521819A GB 201320658 A GB201320658 A GB 201320658A GB 2521819 A GB2521819 A GB 2521819A
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- United Kingdom
- Prior art keywords
- field forming
- wall
- particle optical
- optical arrangement
- forming member
- Prior art date
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- 239000002245 particle Substances 0.000 title claims abstract description 170
- 230000003287 optical effect Effects 0.000 title claims abstract description 136
- 230000005291 magnetic effect Effects 0.000 claims abstract description 42
- 238000005520 cutting process Methods 0.000 claims abstract description 9
- 238000000034 method Methods 0.000 claims description 20
- 230000005284 excitation Effects 0.000 claims description 19
- 239000000463 material Substances 0.000 claims description 11
- VKYKSIONXSXAKP-UHFFFAOYSA-N hexamethylenetetramine Chemical compound C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 239000000696 magnetic material Substances 0.000 claims description 4
- 230000005684 electric field Effects 0.000 abstract description 11
- 238000000926 separation method Methods 0.000 abstract description 11
- 230000005672 electromagnetic field Effects 0.000 abstract 1
- 230000008569 process Effects 0.000 description 11
- 239000007788 liquid Substances 0.000 description 10
- 230000013011 mating Effects 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- 229910000679 solder Inorganic materials 0.000 description 5
- 239000012080 ambient air Substances 0.000 description 4
- 239000011164 primary particle Substances 0.000 description 4
- 239000004809 Teflon Substances 0.000 description 3
- 229920006362 Teflon® Polymers 0.000 description 3
- 230000004075 alteration Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 239000000356 contaminant Substances 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000001746 injection moulding Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 102100026403 Protrudin Human genes 0.000 description 2
- 101710141361 Protrudin Proteins 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 230000004069 differentiation Effects 0.000 description 2
- 230000005294 ferromagnetic effect Effects 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000010125 resin casting Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 102000004726 Connectin Human genes 0.000 description 1
- 108010002947 Connectin Proteins 0.000 description 1
- 239000006091 Macor Substances 0.000 description 1
- -1 Maeor Polymers 0.000 description 1
- 241000343235 Maso Species 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- RVZRBWKZFJCCIB-UHFFFAOYSA-N perfluorotributylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F RVZRBWKZFJCCIB-UHFFFAOYSA-N 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/16—Vessels; Containers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/04—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/06—Electron- or ion-optical arrangements
- H01J49/068—Mounting, supporting, spacing, or insulating electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/03—Mounting, supporting, spacing or insulating electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/03—Mounting, supporting, spacing or insulating electrodes
- H01J2237/032—Mounting or supporting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/03—Mounting, supporting, spacing or insulating electrodes
- H01J2237/038—Insulating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/16—Vessels
- H01J2237/166—Sealing means
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Micromachines (AREA)
Abstract
A particle optical arrangement 1 has a field forming member 15 with an electromagnetic field forming surface 5 shaped to forming a magnetic and/or electric field. The ion optical component further comprises a wall 2 having a cut-out or through-hole 10. The field forming member or electrode 15 is attached to the wall 2 to form a vacuum-tight and/or liquid-tight separation of a first side of the wall 8 from the other side 9. The field forming member or electrode (anode or cathode) 15 extends through the through-hole 10 such that the field forming surface 5 is arranged at the first side of the wall 8 and the field forming member is accessible from the second side of the wall 9. The electrode 15 may be a rigid body and may protrude 12 from the second side of the wall 9, which may be the exterior of a vacuum chamber. The arrangement may be manufactured by forming a structure comprising a number of electrodes 15, and cutting the structure in order to form separate electrodes.
Description
Field
The present invention relates to a particle optical arrangement for a particle optical system. More specifreally:, the invention concerns an arrangement of field forming members for electrodes and/o magnetic pole pieces, which allows to efficiently connect the field forming members to a voltage supply and/or to efficiently coupl the fiel forming members with excitation coils.
There ai :e particle optical systems known, which have elec ros!;a ie electrodes disposed in a vacuum space, through which th< 5 particle optical beam passes ?he .ectroQSi are connected via voltage supply cables to a voltage supply, which is typically disposed outside the vacuum chamber in ambient air. The voltage supply cables, which are disposed inside the vacuum chamber., are typically surrounded by an insulating sheath and are connected to the power supply by an electrical lead, which passes through, a vacuum feedthrough.
However,: it has been shown that the insulating sheaths tend to deteriorate the vacuum: pressure level in the vacuum space, where the particle optical beam is guided, This typically leads to system and sample contamination due to polymerisation of volatile contaminants.
Fur hermore, commercially available vacuum feedthroughs typically require, considerable mounting space, and hence, can severely limit design options for the particle optical system.
Hence, a need exists for a particle optical arrangement, which allows to efficiently arrange electric and/or magnetic field forming elements within the: vacuum space through which the particle beam passes.
The present invention relates to a particle optical arrangement for a particle optical system. More specifreally:, the invention concerns an arrangement of field forming members for electrodes and/o magnetic pole pieces, which allows to efficiently connect the field forming members to a voltage supply and/or to efficiently coupl the fiel forming members with excitation coils.
There ai elec ros!; which th<
:e particle optical systems known, which have a ie electrodes disposed in a vacuum space, through
5 particle optical beam passes
?he
.ectroQSi are connected via voltage supply cables to a voltage supply, which is typically disposed outside the vacuum chamber in ambient air. The voltage supply cables, which are disposed inside the vacuum chamber., are typically surrounded by an insulating sheath and are connected to the power supply by an electrical lead, which passes through, a vacuum feedthrough.
However,: it has been shown that the insulating sheaths tend to deteriorate the vacuum: pressure level in the vacuum space, where the particle optical beam is guided, This typically leads to system and sample contamination due to polymerisation of volatile contaminants.
Fur hermore, commercially available typically require, considerable mounting vacuum feedthroughs space, and hence, can severely limit design options for the particle optical system.
Hence, a need exists for a particle optical arrangement, which allows to efficiently arrange electric and/or magnetic field forming elements within the: vacuum space through which the particle beam passes. Summary
Embodiments provide a particle: optical arrangement. The particle optical arrangement may com rise a fiel forming member having a field forming surface. The field forming surface has a shape for forming a.magnetic and/or an electric field. The particle optical arrangement·may further comprise a wall having a cutou , The field forming member may be attached to the wall to form a vacuum--tight and/or liquid -tight separation Of a first side of the wall from a second side of the. il. The field forming member may extend through the cutout such tha the fiel forming surface is.arranged at the first aide o the wall and the field forming member is accessible from the second side of the wall.
The particle optical arrangement may be a component of a particle beam microscope. The particle beam microscope may be a scanning particle beam microscope. The scanning particle beam microscope may be. a scanning electron microscope and/or a focused ion beam microscope, Additionally or alternatively, the particle optical arrangement may be a component of a transmission,electron microscope..
A gas leak rate of the .separation formed by the wall and the field forming members may be less than .1 mbar*l/s* or less than 10<"1>tnbar*l/s, less than 1Q<~3>mbar»l/s, or less than 10<'>mbar»l/s, or less than 10“<8>bar*l/s. The gas leak race aay be measured by means of a he ium leak detector,
The cutout may be· a through-hole. The first side of the wall may face a first space of the particle optical chambe system and the second side of the wall may face a second space of the particle optical chamber system. The first space ma be a vacuum space through which the primary particle beam of the particle optical system passes. The second space may be a vacuum space, which has a higher vacuum pressure level than the first vacuum space. Alternatively, the secon space may be at an atmospheric pressure level or may fee filled with a liquid.
Embodiments provide a particle: optical arrangement. The particle optical arrangement may com rise a fiel forming member having a field forming surface. The field forming surface has a shape for forming a.magnetic and/or an electric field. The particle optical arrangement·may further comprise a wall having a cutou , The field forming member may be attached to the wall to form a vacuum--tight and/or liquid -tight separation Of a first side of the wall from a second side of the. il. The field forming member may extend through the cutout such tha the fiel forming surface is.arranged at the first aide o the wall and the field forming member is accessible from the second side of the wall.
The particle optical arrangement may be a component of a particle beam microscope. The particle beam microscope may be a scanning particle beam microscope. The scanning particle beam microscope may be. a scanning electron microscope and/or a focused ion beam microscope, Additionally or alternatively, the particle optical arrangement may be a component of a transmission,electron microscope..
A gas leak rate of the .separation formed by the wall and the field forming members may be less than .1 mbar*l/s* or less than 10<"1>tnbar*l/s, less than 1Q<~3>mbar»l/s, or less than 10<'>mbar»l/s, or less than 10“<8>bar*l/s. The gas leak race aay be measured by means of a he ium leak detector,
The cutout may be· a through-hole. The first side of the wall may face a first space of the particle optical chambe system and the second side of the wall may face a second space of the particle optical chamber system. The first space ma be a vacuum space through which the primary particle beam of the particle optical system passes. The second space may be a vacuum space, which has a higher vacuum pressure level than the first vacuum space. Alternatively, the secon space may be at an atmospheric pressure level or may fee filled with a liquid. The liquid may be a thermally conductive and electrically insulating liquid, ouch as Fluo inert {registered trademarh, manufac ured by 3M Corporation),
The field formin member may be a electrode and/or a.magnetic pole piece. The field forming member includes a field forming surfii.ce, which may be an electrode surface and/or magnetic pole ace:, The field forming surface has a shape, which is configured to form a magnetic and/or electric field.
The wall may be part, of a liner tube:. The first si e of the wall may face an interior of a vacuum; space through which a partiole beam passes*
Thereby, a particle optical arrangement is obtained, which allows to efficiently connect the field forming member to a voltage s: The voltage supply may be for example, arranged outside of the vacuum chamber in ambient air -atmosphere . By way of example, the voltage supply may be configure to supply high vo.1tage .
The particle optical component also allows td couple the field formin membe with a magnetic field in an efficient way. The magne ic field may be generated by one or more excitation coils. The excitation :o.lls nv be disponed xn a space of the vacuum chamber, to which the second side, of the wall faces.
Thereby, it is not necessary to dispose voltage supply cables or excitation coils within a vacuum space, within, which the field forming surface is disposed. This allows to dispose the field forming surface in an interior of the liner tube. Thereby, more freedom s provided in designing the particle optical arrangement such that optical requirements are met,
Furfchermore, since the field forming member is accessible from the second side of the vacuum--tight, and/or liquid-tight separation,. it Is no necessary to provide a separate feed hrough, which is vacuum -tight or liquid-tigh , Thereby,
Thereby, a particle optical arrangement is obtained, which allows to efficiently connect the field forming member to a voltage s:
The voltage supply may be for example, arranged outside of of example, vo.1tage . the vacuum chamber in ambient air -atmosphere . By way the voltage supply may be configure to supply high
The particle optical component also couple the field formin membe with efficient way. The magne ic field may more excitation coils. The excitation allows td a magnetic field in be generated by one :o.lls nv be disponed an or xn a space of the vacuum chamber, to which the second side, of the wall faces.
Thereby, it is not necessary to dispose voltage supply cables or excitation coils within a vacuum space, within, which the field forming surface is disposed. This allows to dispose the field forming surface in an interior of the liner tube. Thereby, more freedom s provided in designing the particle optical arrangement such that optical requirements are met,
Furfchermore, the second separation,. feed hrough, since the field forming member is accessible from side of the vacuum--tight, and/or liquid-tight it Is no necessary to provide a separate which is vacuum -tight or liquid-tigh , Thereby, tiie .-required,mounting space for connecting' the. field forming embe to an external voltage supply is reduce*
The field forming member may be integrally formed in one piece or may be pieced together from a: plurality of individual poEaponents, The fiel forming member may be conductive, The field forming member may' comprise a connecting rtion, which is connectable from the second side of the wall. Ihe connecting portion may be configured as a connector*
The wall may be fully conductive o fully insulating. Alternatively, the wail may comprise at least one insulating wall portion and at leas one conductive wall portion. By way of example-,., the insulating wall por ion ma be made of one or a combination of ceramic® plastics, resin, Maso.r, glass and Teflon .
According to an embodiment,, the field formin member is configure as a rigi body,
Accordin to a further embodiment, the field ffirming member is integrally formed in once piece.
According to a further embodiment, the field forming member is attached to an insulating wall portion of the wall,
The particle optical arrangement may be configured such that the insulating wall portion is insert-able into a-through hole, recess and/or cutout, w<;>ich is provided in. a. further wall portion. The further \all or ion:: ma be conductive or noncondue ive.
The particle optical arrangement ay further be configured such that the fiel forming member can be pfe-assembled with the insulating wall portion to form a pre-.assemble component.
Then, the pre-assembled component can be assembled with further wall portion,: such as the conductive wall portio :.
According to an embodiment,, the field formin member is configure as a rigi body,
Accordin to a further embodiment, the field ffirming member is integrally formed in once piece.
According to a further embodiment, the field forming member is attached to an insulating wall portion of the wall,
The particle optical arrangement may be configured such that the insulating wall portion is insert-able into a-through hole, recess and/or cutout, w<;>ich is provided in. a. further wall portion. The further \all or ion:: ma be conductive or noncondue ive.
The particle opt that the fiel insulating wall ical arrangement ay further be configured such forming member can be pfe-assembled with the portion to form a pre-.assemble component.
Then, the pre-assembled component can be assembled with further wall portion,: such as the conductive wall portio :. The pro-assembling of the field forming member with the insulating wall portion ay comprise easting the insulating wall portion on the field forming member or casting the field forming member on the insulating wall portion.
By way of example, the easting-on process m y comprise an injection molding process, an insert molding process, a resin casting process and/or a metal easting process.
Alternatively , assembling of the fiel forming member with the insulating wall portion may comprise attaching the field forming member to the irsuiaL^ng wail portion by means of a bonding layer, The:bonding laye material may include adhesive and/o solder.
According to a further embodiment,, the cutout is formed in, the insulating wall portion.
According to a further embodiment, the particle optical arrangement further comprises a coil fo generating a magnetic fxeld. The coil may be attached to the wall, in particular' to the insulating wall portion.
Accordin to a further embodiment, the field, £orm.1ng me ber comprises a connecting portion, which a least par ially protrudes from the wall. The connecting portion may protrude toward the secon side of the wal1,
The protruding- portion may be configured as am electrical connector, mating electrical connector may fee provided, which is connectable to the electrical connector. The mating electrical connector may be electrically connec ed to a vol age supply .
According to a further embodiment. arrangement comprises an. excitation coil fo exciting the field forming mem e .
The pro-assembling of the field forming member with the insulating wall portion ay comprise easting the insulating wall portion on the field forming member or casting the field forming member on the insulating wall portion.
By way of example, the easting-on process m y comprise an injection molding process, an insert molding process, a resin casting process and/or a metal easting process.
Alternatively , assembling of the fiel forming member with the insulating wall portion may comprise attaching the field forming member to the irsuiaL^ng wail portion by means of a bonding layer, The:bonding laye material may include adhesive and/o solder.
According to a further embodiment,, the cutout is formed in, the insulating wall portion.
According to a further embodiment, the particle optical arrangement further comprises a coil fo generating a magnetic fxeld. The coil may be attached to the wall, in particular' to the insulating wall portion.
Accordin to a further embodiment, the field, comprises a connecting portion, which a protrudes from the wall. The connecting porti toward the secon side of the wal1,
£orm.1ng me ber least par ially on may protrude
The protruding- portion may be configured as am electrical connector, mating electrical connector may fee provided, which is connectable to the electrical connector. The mating electrical connector may be electrically connec ed to a vol age supply .
According to a
According to a further embodiment. arrangement comprises an. excitation coil fo exciting the forming mem e . embodiment. field The excitation coil ma foe attached to the insulating wall portion. The excitation coil ay foe configured to surround at least a portion of:the field forming member.
Embodiments provide a particle optical system which comprises the particle optical arrangement according t© the embodiments as described herein .
Embodiments provide a method of manufacturing a particle optical arrangement, The method may comprise forming a structure, which includes a plurality of field forming members, The metho may further comprise providing a wa.li, which comprises one or more cutouts. The method may further comprise attaching the structure to the wall such that each of the field forming members extends through one of the plurality of cutouts. The method may further comprise cutting the structure apart to .separate the structure into the plurality of field forming members. After the cutting of the structure into the plurality of field forming member's, each of the field forming members may have a field forming surface, which is arranged at a first side of the wal. Additionally or altern tiely, the field forming member may foe accessible fxom a second side of the wail
Brief Description of the Drawings
The forgoing as well as other advantageous features of the disclosure will foe more apparent f om the following detailed description of exemplar embodiments with reference to the accompanying drawings. It is noted that not all possible embodiments necessarily exhibit, each and every, or any, f the advantages identified herein.
Figure 1A is a schematic cross-sectional view showing a particle optical arrangement according to a first exemplary embodimen ;
Figure is .schematic cross-sectional view illustrating ow: the particle optical arrangement Of the first
Embodiments provide a particle optical system which comprises the particle optical arrangement according t© the embodiments as described herein .
Embodiments provide a method of manufacturing a particle optical arrangement, The method may comprise forming a structure, which includes a plurality of field forming members, The metho may further comprise providing a wa.li, which comprises one or more cutouts. The method may further comprise attaching the structure to the wall such that each of the field forming members extends through one of the plurality of cutouts. The method may further comprise cutting the structure apart to .separate the structure into the plurality of field forming members. After the cutting of the structure into the plurality of field forming member's, each of the field forming members may have a field forming surface, which is arranged at a first side of the wal. Additionally or altern tiely, the field forming member may foe accessible fxom a second side of the wail
Brief Description of the Drawings
The forgoing as well as other advantageous features of the disclosure will foe more apparent f om the following detailed description of exemplar embodiments with reference to the accompanying drawings. It is noted that not all possible embodiments necessarily exhibit, each and every, or any, f the advantages identified herein.
Figure 1A is a schematic cross-sectional view showing a particle optical arrangement according to a first exemplary embodimen ;
Figure is .schematic cross-sectional view illustrating ow: the particle optical arrangement Of the first exemplary embodimen is assembled;
Figure 2A Is a schematic cross-sectional, view showing a particle optical arrangement according to a second exemplary embodiment:;
Figure 2B is a schematic cross "sectional view:showing a particle optical arrangement according to a third exemplary embodiment and
Figure 3A is a schematic perspective view showing a particle optical arrangemen according to a fourth exemplary embodiment/and
Figure 38 is a schematic top showing the particle optical arrangement according fcO: the fourth exemplary:embodimen .
Description of Exemplary Embodiments
Figure 1ft is a schematic illustration of a particle optical arrangement 1 of a particle optical system according to a .first exemplary embodiment. The particle optical arrangement 1 is part of a liner tube through which a. primary Beam P of the particle optical system passes.
The liner tube comprises a conductive wall portion 2 and a plurality of insulating wall portions 3f3a, ’which together form a wall of the liner tube,
Άη inner diamete of the liner tube may have a value of between 2 millimeters:and 50 millimeters.
The liner tube allows to maintain a low vacuum pressure level along the beam path P of the primary beam as well as in the charged particle source assembly, which ip arranged in the particle optical system upstream of the liner tube.
Figure 2A Is a schematic cross-sectional, view showing a particle optical arrangement according to a second exemplary embodiment:;
Figure 2B is a schematic cross "sectional view:showing a particle optical arrangement according to a third exemplary embodiment and
Figure 3A is a schematic perspective view showing a particle optical arrangemen according to a fourth exemplary embodiment/and
Figure 38 is a schematic top showing the particle optical arrangement according fcO: the fourth exemplary:embodimen .
Description of Exemplary Embodiments
Figure 1ft is a schematic illustration of a particle optical arrangement 1 of a particle optical system according to a .first exemplary embodiment. The particle optical arrangement 1 is part of a liner tube through which a. primary Beam P of the particle optical system passes.
The liner tube comprises a conductive wall portion 2 and a plurality of insulating wall portions 3f3a, ’which together form a wall of the liner tube,
Άη inner diamete of the liner tube may have a value of between 2 millimeters:and 50 millimeters.
The liner tube allows to maintain a low vacuum pressure level along the beam path P of the primary beam as well as in the charged particle source assembly, which ip arranged in the particle optical system upstream of the liner tube. .Accordingly, scattering events of: the particle beam f>,. which are caused by the presence of molecules within the beam path are reduced. This allows to reduce system or sample contamination due to polymerization of volati<l>e contaminants.
Moreover, the line tube, is configured such chat the particle bea passes through at least a portion of the particle optical syste at a pre-defined kinetic energy, which is selected to be well above the landing energy of. the particles of the particle beam P oh the object surface. This in achieved in particular by setting a potential of the conductive tube portion 2 at a selecte electrical potential.
Thereby, it is possible to reduce aberrations of the primary charged particle beam . Furthermore, the increased hinefic energy of the particle beam P reduces interactions between the particles of the particle beam P at beam crossovers. Such interactions can lead to a degradation of he resolution.
The insulating 'wall portions 3, 3a are made of resin, ceramics, glass, Maeor, and/or Teflon. The insulating wall portions 3:, 3a. are fitted and glued and/or soldere into through holes 10,<'>10a of the conductive wall portion 2 by means of bonding layers 4a, By way of example, the material of the bonding layer .include solder and/or adhesive.
Attached to the insulati g wall portions 3, 3a are field forming members 5, 5a, The field forming members S, Sa are configured to form an electric field which is at least partially arranged in the interior of the liner tube an which acts on the particle beam ϋ,
It is also 'conceivable that the field forming members 5, 5a are configured as magnetic pole pieces for generating a magnetic field, which is at least partially arranged in the interior of the liner tube:and which acts on the particle beam.. By way of example, the magnetic pole pieces may be made of magnetic material and/or coupled to an excitation coil. This is described in detail with reference, to figure 2B . Each of the field forming members 5, 5a comprises· a field forming surface 7, 7 oh which field lines of the magnetic and/or electric field start or end. Thereby, the shape of the field forming surface 7, Ta. is configured to for the magnetic and/or electric field.
Each of the insulating wall portions 3, 3a comprises a throughhole 1 I6a. Each the field forming members S, 5;a extends through one of the through-holes 16, 16a>The field forming members 5a are attached to the insulating wall portions
3a by means of bonding layers 11, 11a. By way of example, the material of the bonding layers 1:1, 11a include solder and/or adhesive. Each of the through-holes 16, 16a has a narrow hole portion XT, 17a, into which a portion of the respective fiel forming member S, 5a is form-fittingly inserted. Thereby, accurate positions of the electric field for ing members 5, 5a are achieved..
Th,e field forming members S, 5a are attached to the wall so as to form a vacuum-tight and/or liquid-tight separation of the first side of the wail from the second side of the wall.
The separation separates a first space 8 from a second space 9, such that a first side of the wall faces the first space 8 and a. second side of the wall faces the second space 9. Ms can be seen from figure 1, the field forming surfaces· 7, 7a are arrange at the first side of the wall and the field forming members 5, 5a are accessible from the secon side of the wall.
The first space 8 is a vacuum space throug -which the primary particle beam P of the particle optical system:passes.
The second apace 9 may be a vacuum space, which has a higher vacuum pressure level than the first vacuum spac . Al ernatively, the second space 9 may be at an atmospheric pressure level or may be filled, with a liquid, The liquid may be a thermally conductive and electrically insulating fluid,
Each of the insulating wall portions 3, 3a comprises a throughhole 1
I6a. Each the field forming members S, 5;a extends through one of the through-holes 16, 16a>The field forming members
5a are attached to the insulating wall portions
3a by means of bonding layers 11, 11a. By way of example, the material of the bonding layers 1:1, 11a include solder and/or adhesive. Each of the through-holes 16, 16a has a narrow hole portion XT, 17a, into which a portion of the respective fiel forming member S, 5a is form-fittingly inserted. Thereby, accurate positions of the electric field for ing members 5, 5a are achieved..
Th,e field forming members S, 5a are attached to the wall so as to form a vacuum-tight and/or liquid-tight separation of the first side of the wail from the second side of the wall.
The separation separates a first space 8 from a second space 9, such that a first side of the wall faces the first space 8 and a. second side of the wall faces the second space 9. Ms can be seen from figure 1, the field forming surfaces· 7, 7a are arrange at the first side of the wall and the field forming members 5, 5a are accessible from the secon side of the wall.
The first space 8 is a vacuum space throug -which the primary particle beam P of the particle optical system:passes.
The second apace 9 may be a vacuum space, which has a higher vacuum pressure level than the first vacuum spac . Al ernatively, the second space 9 may be at an atmospheric pressure level or may be filled, with a liquid, The liquid may be a thermally conductive and electrically insulating fluid, such as Fluorinert (registered t a ewarfc,- manufac ured fey 3. ion.)
In the exemplary embodiment, whic is shown in figure 1, protrudin portions 12, 12a of the field forming members 5:fSa protrude from the wall a the second side of the wall. The protruding portions 12, 1.2a of the field forming members 5, 5a are configured as connectors 15, ISa., which can fee connected by mating connectors (not illus rated in figure lA); to connect the field forming members 5, 5a to voltage supply cables (not illustrated in.figure 1A). This allows to set the:field forming
<'>.members 5, 5a at pre-determine potentials. Thereby, the field forming members 5, 5a can act as elect os.featic electrodes for generating am electric field, which acts on the particle bea
Hence,. & particle optical arrangement is provided:, where connectors and voltage supply cables are arranged outside of the vacuum space 8, through which the particle beam P passes, ■Moreover* a separate vacuum feedthrough,may be dispensed with, since the fiel forming members 5, Sa also function as vacuum tight and/o liquid-tight feedthroughs. he particle optical arri it , whidh is shown in figure 1 allows to pre-assemble the field forming members 5 with the insulating wall portion 3 to form, a ro -assembled component. The pre-asserabled component can then fee assembled with the conductive wall portion 2. Thereby, the particle optical arrangement can be assembled,in an efficient manne .
The process of. assembling the particle optical arrangement 1 is illustrated, in figure IB, A structure is formed, which comprises the field forming members 5, Sa, and a connecting portion 28, which conneots the fie.1d forming;members 5, 5a. The field forming members 5, Sa an the connecting portion 28 may be integrally forme in one piece■
The Struc ure is pre··assembled wit the insulatin<■>wallportions· 3, 3a fey means. of bonding layers 11·,· 11a. This preion.)
In the exemplary embodiment, protrudin portions 12, 12a of protrude from the wall a the protruding portions 12, 1.2a of are configured as connectors 15 mating connectors (not illus ra field forming members 5, 5a whic is shown in figure 1, the field forming members 5:fSa second side of the wall. The the field forming members 5, 5a , ISa., which can fee connected by ted in figure lA); to connect the to voltage supply cables (not illustrated in.figure
1A). This allows to set the:field forming
<'>.members 5, 5a at pre-determine potentials. Thereby, the field forming members 5, 5a can act as elect os.featic electrodes for generating am electric field, which acts on the particle bea
Hence,. & particle optical arrangement is provided:, where connectors and voltage supply cables are arranged outside of the vacuum space 8, through which the particle beam P passes, ■Moreover* a separate vacuum feedthrough,may be dispensed with, since the fiel forming members 5, Sa also function as vacuum tight and/o liquid-tight feedthroughs. he particle optical arri it , whidh is shown in figure 1 allows to pre-assemble the field forming members 5 with the insulating wall portion 3 to form, a ro -assembled component. The pre-asserabled component can then fee assembled with the conductive wall portion 2. Thereby, the particle optical arrangement can be assembled,in an efficient manne .
The process of. assembling the particle optical arrangement 1 is illustrated, in figure IB, A structure is formed, which comprises the field forming members portion 28, which conneots the fie.1d field forming members 5, Sa an the be integrally forme in one piece■
5, Sa, and a connecting forming;members 5, 5a. The connecting portion 28 may
The Struc ure is pre··assembled wit the insulatin<■>wallportions· 3, 3a fey means. of bonding layers 11·,· 11a. This pre assembled component is then assembled with the conductive wall portion 2 by arranging the pro-assembled component relative to the conductive wall portion 2 in a manner as illustrated in figure IB, Then, bonding layers 4 and 4a (shown in figure lft are forme in the gaps 2.9, 29a between the insulating wall portions 3, 3a. and the conductive wall portion 2, Then, the connectin portion 28 is removed from the particle optical arrangement, thereby forming the configuration, as shown in figure lft.,.
Bicfure 2A schema ically illustrates a particle optical arrangement lb according to a sseeccoonndd exemplary embodiment, Components, which correspon to components of the particle optical arrangement show i figure 1ft and IB with regard to their composi ion, the r structure and/or function are generally designated with the same reference huroerals, which however have a letter "b” to sho differantration.
In the particle optical arrangement lb, as Shown in figure 2ft, the field forming membe 5b is loosely fitted i the through hole 16b of the insulating wall portion. Then, the field forming member 5b is attached to the insulating wall portion 3b. by means Of a bonding layer lib which is formed between the field forming member SB and a Side of the insulating wall portion.3b, which faces the first side of the wall (i.e, the side, wh ch faces the vacuum space 8}.
Additionally or alternatively, the bonding layer lib may be provided between the field forming member 5b and an other surface of the insulating wall portion 3b,. such as the inner circumferential surface of the through-hole 16b,
Since the field:formin member is loosely fitte i the through hole 16b, it is possible to position the field forming member 5 in a more flexible way when the particle optical arrangement lb is manufactured.. This allows to compensate for manufacturing tolerances of the conductive wall portion. 2b and/or the insula ing wall portion 3b.
Bicfure 2A schema ically illustrates a particle optical arrangement lb according to a sseeccoonndd exemplary embodiment, Components, which correspon to components of the particle optical arrangement show i figure 1ft and IB with regard to their composi ion, the r structure and/or function are generally designated with the same reference huroerals, which however have a letter "b” to sho differantration. sseeccoonndd
In the particle optical arrangement lb, as Shown in figure 2ft, the field forming membe 5b is loosely fitted i the through hole 16b of the insulating wall portion. Then, the field forming member 5b is attached to the insulating wall portion 3b. by means Of a bonding layer lib which is formed between the field forming member SB and a Side of the insulating wall portion.3b, which faces the first side of the wall (i.e, the side, wh ch faces the vacuum space 8}.
Additionally or alternatively, the bonding layer lib may be provided between the field forming member 5b and an other surface of the insulating wall portion 3b,. such as the inner circumferential surface of the through-hole 16b,
Since the field:formin member is loosely fitte i the through hole 16b, it is possible to position the field forming member 5 in a more flexible way when the particle optical arrangement lb is manufactured.. This allows to compensate for manufacturing tolerances of the conductive wall portion. 2b and/or the insula ing wall portion 3b. Figure 2B schematically illustrates a particle optical arrangement lc according to a third exemplary embodiment*Components, which correspond- to components of the particle optical arrangements:-shown in figures IA to 2A with regard to their composition, their structure and/or function are generally designated wi h the same reference numerals* which however ave a lette<)!>c<w>to show differentxatiQh,
The particle optical arrangement lc comprises a coil 14c. which is attached to the wall. In the exemplary embodiment, which is shown in figure 2B, the coil 14c is attached to the insulating wall portion 3e. However, it is also conceivable that the coil 14.o is a least partially attached to the conductive wall portion 2c.
Attaching the coil 14c to,the insulating wall portion 3c allows to pre-assemble the. coil 14c, the insulating wall portion 3c and the field forming member 5c to for a pre-asse hled component. The pre-assembled component can then be assembled with the conductive wall portion 2e, This can be performed in a way as has been described with reference to figure IB. Thereby, it is possible to assemble the particle optical arrangement, lc in ah efficient manner.
In the particle optical arrangement ie, the insulating 'wall portion 3c is cast on the field forming member 5c and/or the coil 14c, The connection between the insulating wall portion 3c and the field forming member 5c may be vacuum-tight. Additionally or alternatively, the connection between the insulating wail portion 3c and the coil 14e may be vacuumtight.
By way oi example, the insulating wall portion 3c may oe made of resin or may be formed by an injection molding process and/or an insert molding process, This allows to:position the field formin members Sc and/or the coil 14c with: high accuracy, since<'>the field forming member 3c and/or the coil 14c is connected to the conductive wall portion 2 only via a single bonding layer 4c , Moreover, since the insulating wall portion is east on the field forming member Be, a high degree of vacuum.·tightness and/or liquid-tightness can he achieved.
In the particle optical arrangement ,ic the:coil 14c is an airdore coil and the field forming member So is at least partially made fro nonmagnetic material,
It is also conceivable that the coil 14c is n excitation coil, 'which is configured to excite the field forming member 5c, which serves as a pole piece, In such a configuration,, the field forming member Sc may be at least partially made from: magnetic {i,t3⁄4 .ferromagnetic) material.
It is: further conceivable: that the particle arrangemext Ic comprises a plurality of field forming·members, each of whic serving as a magnetic pole piece. At least two of these field forming members may be connected to each other by a. magnetic connection member to guide the magnetic flux between these two field forming member's. The. magnetic 'connection member may be disposed outside the vacuum space 0.
Figures 3ft and.3S schematically illustrate a particle optical arrangement Id according to a fourth exemplary embodiment, Components, which correspond to components of the particle. op ical arrangements, shown in figures 1A to 2B, with regard to their composition, their structure and/or function aio generally designated with the same reference numerals which however have a letter to show differentiation.
Figure 3a is a perspective view of the particle.: optical arrangement i and figure IB is a to view of the particle optical arra-gement Id. In figure 3B, the axis of the beam path of the part:icle beam P is oriented perpendicular to the paper plane
It is also conceivable that the 'which is configured to excite which serves as a pole piece, field forming member Sc may be coil 14c is n excitation coil, the field forming member 5c, In such a configuration,, the at least partially made from: magnetic {i,t3⁄4 .ferromagnetic) material.
It is: further conceivable: that the particle arrangemext Ic comprises a plurality of field forming·members, each of whic serving as a magnetic pole piece. At least two of these field forming members may be connected to each other by a. magnetic connection member to guide the magnetic flux between these two field forming member's. The. magnetic 'connection member may be disposed outside the vacuum space 0.
Figures 3ft and.3S schematically illustrate a particle optical arrangement Id according to a fourth exemplary embodiment, Components, which correspond to components of the particle. op ical arrangements, their composition, shown in figures 1A to 2B, with regard to their structure and/or function aio generally designated with the same reference numerals which however have a letter to show differentiation.
Figure 3a arrangement optical arr of the part is a perspective view of the particle.: optical i and figure IB is a to view of the particle a-gement Id. In figure 3B, the axis of the beam path :icle beam P is oriented perpendicular to the paper plane The ar icle: optical arrangement Id hah wal1 22d, which is formed from insulating material. The insulating material may e for example glass,, ceramics, Macor and/or Teflon.
The wall 22d forms a tube, section 21d of a line tube. The tube section 2Id surrounds the particle beam P< The Wall 22d, comprises connecting portions 19d, 20d for connecting the cube section 2Id to further components of the liner tube, One or both of the connecting portions 19d, 20d.ma he configured as connecting flanges,
The wall 2 d comprises a plurality of protruding portions 37cL Each of the protruding portions 17d protrudes outward from an outer su face:27d of the wall 22d in a radial direction.
The particle optical arrangement Id further comprises a plurality of coils 14d. Each of the coils 14d surrounds one of the protruding portions l?d of the wall 21d. Furthermore, for each of the coils 14d, an axis of the respective coil :14d may be oriented substantially along a radial direction relative to the axis of the particle beam P, The coils 14d are configured as air-core coils, which generate a magnetic field acting on the particle bea P.
The particle optical arrangement id further comprises a plurality of field forming members I5d, which extend through openings 23d in the wall 21d, The field forming members I5d form electric electrodes, which can be individually set a a respective electric potential. The field forming members 15d are made of non'-magne c materials.
It is also conceivable that at. least a part of the fieid forming members 15d are configured as magnetic pole pieces and the coils, which surround the magnetic- pole pieces are configured as excitation coils for the magnetic pole, pieces. The magnetic pole pieces may be made of magnetic material.
The field forming members 15d are assembled from two parts, A first part 23d extends through the·wall and has a protruding
The wall 22d forms a tube, section 21d of a line tube. The tube section 2Id surrounds the particle beam P< The Wall 22d, comprises connecting portions 19d, 20d for connecting the cube section 2Id to further components of the liner tube, One or both of the connecting portions 19d, 20d.ma he configured as connecting flanges,
The wall 2 d comprises a plurality of protruding portions 37cL Each of the protruding portions 17d protrudes outward from an outer su face:27d of the wall 22d in a radial direction.
The particle optical arrangement Id further comprises a plurality of coils 14d. Each of the coils 14d surrounds one of the protruding portions l?d of the wall 21d. Furthermore, for each of the coils 14d, an axis of the respective coil :14d may be oriented substantially along a radial direction relative to the axis of the particle beam P, The coils 14d are configured as air-core coils, which generate a magnetic field acting on the particle bea P.
The particle optical arrangement id further comprises a plurality of field forming members I5d, which extend through openings 23d in the wall 21d, The field forming members I5d form electric electrodes, which can be individually set a a respective electric potential. The field forming members 15d are made of non'-magne c materials.
It is also conceivable that at. least a part of the f forming members 15d are configured as magnetic pole pieces the coils, which surround the magnetic- pole pieces configured as excitation coils for the magnetic pole, pie The magnetic pole pieces may be made of magnetic material. ieid and are ces.
The field forming members 15d are assembled from two parts, A first part 23d extends through the·wall and has a protruding portion 25di:which protrudes Into the interior of the tube section 2id. 3⁄4 second part 24d is disposed, ih the interior of the tube section 2Id and is connected to the protruding portion 25d. The second part 24 has the field forming surface ?d. The first part 23 has a connecting portion 26d, which configured as an electrical connector.
The: first and second parts 23d, 2 d may be: ma e from same or different isaterials. By way of example, the first and second parts ay be made of coppe and/or titanium .
The second parts 24d of the field forming: members I5d are configured such that an inner surface 18 of the tube wall 22d is substantially not visible from locations oh the axis of the particle beam P. Thereby, the particle beam P is shielde from the electric: potential of the inner surface :l8 , unwanted aberrations of the particle heapv P are prevented .
The: first and second parts 23d, 2 d may be: ma e from same or different isaterials. By way of example, the first and second parts ay be made of coppe and/or titanium .
The second parts 24d of the field forming: members I5d are configured such that an inner surface 18 of the tube wall 22d is substantially not visible from locations oh the axis of the particle beam P. Thereby, the particle beam P is shielde from the electric: potential of the inner surface :l8 , unwanted aberrations of the particle heapv P are prevented .
Claims (1)
- ClAlias<'> A particle optical arrangement (1)fcomprising : field forming member (5) barring a fiel forming surface: (7), wherein the field forming surface {7) has a shape for forming a magnetic and/or an electri field; a wall having a cutout {16}; wherein the field forming member is Attached to the all to form a vacuum- ight and/or liguid-tight sepa ation of a first aide of the:wall fro a second side of the wall; wherein the field farmin member (5) extends through the cutout {16} such that the fiel forming surface (T) is arranged at the first side of the wall an the field forming member is accessible from the second side of the wall , The partiole:optical arrangement (1) according to claim 1, wherein the field forming member {5) is a.rigid body. The particle optical arrangement (1) according to claim 1 or 2, wherein the field forming member (Si is integrally formed in once piece . The particle optical arrangement (1} according to any one of the preceding claims., wherein the field forming member (5) is attached to an insulating wall portion (3) of the wall, 5 The particle optical arrangement tie) according to claim 4/wherein the cutout (16c) is formed in the insulating wall portion (3c), A particle optical arrangement (1)fcomprising : field forming member (5) barring a fiel forming surface: (7), wherein the field forming surface {7) has a shape for forming a magnetic and/or an electri field; comprising : a wall having a cutout {16}; wherein the field forming member is Attached to form a vacuum- ight and/or liguid-tight sepa the all ation of to a first aide of the:wall fro a second side of the wall; wherein the field farmin member (5) extends through the cutout {16} such that the fiel forming surface (T) is arranged at the first side of the wall an the field forming member is accessible from the second side of the wall , The partiole:optical arrangement (1) according to claim 1, wherein the field forming member {5) is a.rigid body. The particle optical arrangement (1) according to claim 1 or 2, wherein the field forming member (Si is integrally formed in once piece . The particle optical arrangement (1} according to any one of the preceding claims., wherein the field forming member (5) is attached to an insulating wall portion (3) of the wall, 5 The particle optical arrangement tie) according to claim 4/wherein the cutout (16c) is formed in the insulating wall portion (3c), 6, The ps rbicle optical arrangement (lc) according to claim 4 or 5, furthe comprising a coil (14c) for generating a magneti.c field; wherein the coil (14c) is attached to the: insulat;ing wall portion (3c)» 7, The particle optical arrangement (lc) according to any one of claims 4 to 6, wherein the insulating wall portion (3c) is cast, on the fiel forming member (5c) or the field forming member (5c) is cast on the insulating wall portion 8 , The particle optical arrangement {1} according to any one of the preceding claims, wherein the field forming member (5) comprises a connecting portion: (15), .which protrudes from:the wall, The par icle. or cal arrangement -c) according to one of the preceding claims, further comprising an excitation coil (14c) for exciting the field forming member (5c}. 10 The particle optical arrangement (1) according to any one of the preceding claims, wherein the field forming member {S} is made of a magnetic or a substa tially ae magnetic material, 11. A particle optical system comprising ah electrode arrangement. (1) of any one of the preceding claims . or 5, magneti insulat furthe comprising a coil (14c) .c field; wherein the coil (14c) ;ing wall portion (3c)» for generating a is attached to the: 7, The particle optical arrangement (lc) according to any one of claims 4 to 6, wherein the insulating wall portion (3c) is cast, on the fiel forming member (5c) or the field forming member (5c) is cast on the insulating wall portion 8 , The particle optical arrangement {1} according to any one of the preceding claims, wherein the field forming member (5) comprises a connecting portion: (15), .which protrudes from:the wall, The par icle. or cal arrangement -c) according to one of the preceding claims, f coil (14c) for exciting the further field comprising an excitation forming member (5c}. 10 The particle optical arrangement of the preceding claims, wherein {S} is made of a magnetic or a material, (1) according to any one the field forming member substa tially ae magnetic 11. A particle optical system comprising ah electrode arrangement. (1) of any one of the preceding claims . 12*A method of manufacturing a particle optical arrangement (1}, the method comprising:; forming a structure comprising a plurality of field forming members (5, 5a); providing a wall, which comprises one or more cutouts fit, 16a); attaching the structure to the wall such tha each of the field forming members (5, 5a); extends through one of the pluralit of cutouts (16, 16a),·■ cutting the structure apart to separate ? the structure into the plurality of field forming members\tr , o r~ t>r wherein after the cutting of the structure into the plurality of fiel formin members (5, 5a)·, each of the field forming members has a field forming surface £?> 7a), which is arranged at a first a Ldc of the wall and the field forming member (S 5a) is accessible from a second side Of the wall. 13, A particl optical arrangement substantially as hereinbefore described with reference to and as illustrated in the accompanying drawings, 14, A method, of manufacturing a particle optical arrangement substantia ly as hereinbefore described with reference to and as illustrated in the accompanying drawings. cutting the structure apart to separate the plurality of field forming members ? the \tr , o r~ t structure into >r wherein after the cutting of the structure into the plurality of fiel formin members (5, 5a)·, each of the field forming members has a field forming surface £?> 7a), which is arranged at a first a Ldc of the wall and the field forming member (S 5a) is accessible from a second side Of the wall. 13, A particl optical arrangement substantially as hereinbefore described with reference to and as illustrated in the accompanying drawings, 14, A method, of manufacturing a particle optical arrangement substantia ly as hereinbefore described with reference to and as illustrated in the accompanying drawings.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB1320658.6A GB2521819A (en) | 2013-11-22 | 2013-11-22 | Particle optical arrangement for a charged particle optical system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB1320658.6A GB2521819A (en) | 2013-11-22 | 2013-11-22 | Particle optical arrangement for a charged particle optical system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| GB201320658D0 GB201320658D0 (en) | 2014-01-08 |
| GB2521819A true GB2521819A (en) | 2015-07-08 |
Family
ID=49918067
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1320658.6A Withdrawn GB2521819A (en) | 2013-11-22 | 2013-11-22 | Particle optical arrangement for a charged particle optical system |
Country Status (1)
| Country | Link |
|---|---|
| GB (1) | GB2521819A (en) |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11158482B2 (en) | 2018-02-16 | 2021-10-26 | Carl Zeiss Multisem Gmbh | Multi-beam particle microscope |
| US11164715B2 (en) | 2018-05-21 | 2021-11-02 | Carl Zeiss Multisem Gmbh | Charged particle beam system |
| US11239054B2 (en) | 2018-02-16 | 2022-02-01 | Carl Zeiss Multisem Gmbh | Multi-beam particle beam system |
| US11239053B2 (en) | 2018-02-27 | 2022-02-01 | Carl Zeiss Multisem Gmbh | Charged particle beam system and method |
| US11521827B2 (en) | 2019-01-24 | 2022-12-06 | Carl Zeiss Multisem Gmbh | Method of imaging a 2D sample with a multi-beam particle microscope |
| US11562880B2 (en) | 2018-09-27 | 2023-01-24 | Carl Zeiss Multisem Gmbh | Particle beam system for adjusting the current of individual particle beams |
| US11645740B2 (en) | 2018-09-21 | 2023-05-09 | Carl Zeiss Multisem Gmbh | Method for detector equalization during the imaging of objects with a multi-beam particle microscope |
| US11657999B2 (en) | 2015-02-06 | 2023-05-23 | Carl Zeiss Multisem Gmbh | Particle beam system and method for the particle-optical examination of an object |
| US11735393B2 (en) | 2018-09-28 | 2023-08-22 | Carl Zeiss Multisem Gmbh | Method for operating a multi-beam particle beam microscope |
| US11935721B2 (en) | 2019-01-24 | 2024-03-19 | Carl Zeiss Multisem Gmbh | System comprising a multi-beam particle microscope and method for operating the same |
| US12057290B2 (en) | 2019-07-31 | 2024-08-06 | Carl Zeiss Multisem Gmbh | Method for operating a multiple particle beam system while altering the numerical aperture, associated computer program product and multiple particle beam system |
| US12249478B2 (en) | 2019-06-13 | 2025-03-11 | Carl Zeiss Multisem Gmbh | Particle beam system for azimuthal deflection of individual particle beams and method for azimuth correction in a particle beam system |
| US12255040B2 (en) | 2018-10-01 | 2025-03-18 | Carl Zeiss Multisem Gmbh | Multi-beam particle beam system and method for operating same |
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| US4806765A (en) * | 1985-10-12 | 1989-02-21 | Leybold-Heraeus Gmbh | Method and apparatus for checking the signal path of a measuring system |
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2013
- 2013-11-22 GB GB1320658.6A patent/GB2521819A/en not_active Withdrawn
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4806765A (en) * | 1985-10-12 | 1989-02-21 | Leybold-Heraeus Gmbh | Method and apparatus for checking the signal path of a measuring system |
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11657999B2 (en) | 2015-02-06 | 2023-05-23 | Carl Zeiss Multisem Gmbh | Particle beam system and method for the particle-optical examination of an object |
| US11239054B2 (en) | 2018-02-16 | 2022-02-01 | Carl Zeiss Multisem Gmbh | Multi-beam particle beam system |
| US11158482B2 (en) | 2018-02-16 | 2021-10-26 | Carl Zeiss Multisem Gmbh | Multi-beam particle microscope |
| US11239053B2 (en) | 2018-02-27 | 2022-02-01 | Carl Zeiss Multisem Gmbh | Charged particle beam system and method |
| US11164715B2 (en) | 2018-05-21 | 2021-11-02 | Carl Zeiss Multisem Gmbh | Charged particle beam system |
| US11562881B2 (en) | 2018-05-21 | 2023-01-24 | Carl Zeiss Multisem Gmbh | Charged particle beam system |
| US11645740B2 (en) | 2018-09-21 | 2023-05-09 | Carl Zeiss Multisem Gmbh | Method for detector equalization during the imaging of objects with a multi-beam particle microscope |
| US11562880B2 (en) | 2018-09-27 | 2023-01-24 | Carl Zeiss Multisem Gmbh | Particle beam system for adjusting the current of individual particle beams |
| US12094683B2 (en) | 2018-09-28 | 2024-09-17 | Carl Zeiss Multisem Gmbh | Method for operating a multi-beam particle beam microscope |
| US11735393B2 (en) | 2018-09-28 | 2023-08-22 | Carl Zeiss Multisem Gmbh | Method for operating a multi-beam particle beam microscope |
| US12255040B2 (en) | 2018-10-01 | 2025-03-18 | Carl Zeiss Multisem Gmbh | Multi-beam particle beam system and method for operating same |
| US11935721B2 (en) | 2019-01-24 | 2024-03-19 | Carl Zeiss Multisem Gmbh | System comprising a multi-beam particle microscope and method for operating the same |
| US11521827B2 (en) | 2019-01-24 | 2022-12-06 | Carl Zeiss Multisem Gmbh | Method of imaging a 2D sample with a multi-beam particle microscope |
| US12249478B2 (en) | 2019-06-13 | 2025-03-11 | Carl Zeiss Multisem Gmbh | Particle beam system for azimuthal deflection of individual particle beams and method for azimuth correction in a particle beam system |
| US12057290B2 (en) | 2019-07-31 | 2024-08-06 | Carl Zeiss Multisem Gmbh | Method for operating a multiple particle beam system while altering the numerical aperture, associated computer program product and multiple particle beam system |
| US12119204B2 (en) | 2019-07-31 | 2024-10-15 | Carl Zeiss Multisem Gmbh | Particle beam system and the use thereof for flexibly setting the current intensity of individual particle beams |
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| Publication number | Publication date |
|---|---|
| GB201320658D0 (en) | 2014-01-08 |
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