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GB2428885B - Method of identifying the presence and severity of defects In a semiconductor material - Google Patents

Method of identifying the presence and severity of defects In a semiconductor material

Info

Publication number
GB2428885B
GB2428885B GB0614880A GB0614880A GB2428885B GB 2428885 B GB2428885 B GB 2428885B GB 0614880 A GB0614880 A GB 0614880A GB 0614880 A GB0614880 A GB 0614880A GB 2428885 B GB2428885 B GB 2428885B
Authority
GB
United Kingdom
Prior art keywords
severity
defects
identifying
semiconductor material
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
GB0614880A
Other versions
GB2428885A (en
GB0614880D0 (en
Inventor
William Duncan Semion Scott
Yvonne Janet Simmonds
Alan Robert Stevenson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Handotai Europe Ltd
Original Assignee
Shin Etsu Handotai Europe Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Handotai Europe Ltd filed Critical Shin Etsu Handotai Europe Ltd
Publication of GB0614880D0 publication Critical patent/GB0614880D0/en
Publication of GB2428885A publication Critical patent/GB2428885A/en
Application granted granted Critical
Publication of GB2428885B publication Critical patent/GB2428885B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/91Investigating the presence of flaws or contamination using penetration of dyes, e.g. fluorescent ink
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501Semiconductor wafers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30604Chemical etching

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Pathology (AREA)
  • Immunology (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
GB0614880A 2005-07-28 2006-07-27 Method of identifying the presence and severity of defects In a semiconductor material Active GB2428885B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB0515480.2A GB0515480D0 (en) 2005-07-28 2005-07-28 Product

Publications (3)

Publication Number Publication Date
GB0614880D0 GB0614880D0 (en) 2006-09-06
GB2428885A GB2428885A (en) 2007-02-07
GB2428885B true GB2428885B (en) 2010-07-28

Family

ID=34976739

Family Applications (3)

Application Number Title Priority Date Filing Date
GBGB0515480.2A Ceased GB0515480D0 (en) 2005-07-28 2005-07-28 Product
GBGB0614202.0A Ceased GB0614202D0 (en) 2005-07-28 2006-07-18 Method of identifying the presence and severity of defects in a semiconductor material
GB0614880A Active GB2428885B (en) 2005-07-28 2006-07-27 Method of identifying the presence and severity of defects In a semiconductor material

Family Applications Before (2)

Application Number Title Priority Date Filing Date
GBGB0515480.2A Ceased GB0515480D0 (en) 2005-07-28 2005-07-28 Product
GBGB0614202.0A Ceased GB0614202D0 (en) 2005-07-28 2006-07-18 Method of identifying the presence and severity of defects in a semiconductor material

Country Status (1)

Country Link
GB (3) GB0515480D0 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2226374B1 (en) * 2009-03-06 2012-05-16 S.O.I. TEC Silicon Etching composition, in particular for silicon materials, method for characterizing defects of such materials and process of treating such surfaces with etching composition
WO2015150156A1 (en) * 2014-04-01 2015-10-08 Atotech Deutschland Gmbh Composition and process for metallizing nonconductive plastic surfaces
CA3082211A1 (en) * 2020-06-02 2021-12-02 Techinsights Inc. Contrast-enhancing staining system and method and imaging methods and systems related thereto

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0281115A2 (en) * 1987-03-04 1988-09-07 Kabushiki Kaisha Toshiba Etching solution for evaluating crystal faults
KR960013499B1 (en) * 1988-04-30 1996-10-05 엘지반도체 주식회사 Corrosion method for observing vertical structure of semiconductor device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0281115A2 (en) * 1987-03-04 1988-09-07 Kabushiki Kaisha Toshiba Etching solution for evaluating crystal faults
KR960013499B1 (en) * 1988-04-30 1996-10-05 엘지반도체 주식회사 Corrosion method for observing vertical structure of semiconductor device

Also Published As

Publication number Publication date
GB2428885A (en) 2007-02-07
GB0614202D0 (en) 2006-08-23
GB0614880D0 (en) 2006-09-06
GB0515480D0 (en) 2005-08-31

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