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GB2381947B - Electron beam lithography machine - Google Patents

Electron beam lithography machine

Info

Publication number
GB2381947B
GB2381947B GB0126977A GB0126977A GB2381947B GB 2381947 B GB2381947 B GB 2381947B GB 0126977 A GB0126977 A GB 0126977A GB 0126977 A GB0126977 A GB 0126977A GB 2381947 B GB2381947 B GB 2381947B
Authority
GB
United Kingdom
Prior art keywords
electron beam
beam lithography
lithography machine
machine
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB0126977A
Other versions
GB0126977D0 (en
GB2381947A (en
Inventor
David Price
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vistec Lithography Ltd
Original Assignee
Vistec Lithography Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vistec Lithography Ltd filed Critical Vistec Lithography Ltd
Priority to GB0126977A priority Critical patent/GB2381947B/en
Publication of GB0126977D0 publication Critical patent/GB0126977D0/en
Priority to DE20216713U priority patent/DE20216713U1/en
Publication of GB2381947A publication Critical patent/GB2381947A/en
Application granted granted Critical
Publication of GB2381947B publication Critical patent/GB2381947B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682—Mask-wafer alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
GB0126977A 2001-11-09 2001-11-09 Electron beam lithography machine Expired - Fee Related GB2381947B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GB0126977A GB2381947B (en) 2001-11-09 2001-11-09 Electron beam lithography machine
DE20216713U DE20216713U1 (en) 2001-11-09 2002-10-30 Electron beam lithography machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB0126977A GB2381947B (en) 2001-11-09 2001-11-09 Electron beam lithography machine

Publications (3)

Publication Number Publication Date
GB0126977D0 GB0126977D0 (en) 2002-01-02
GB2381947A GB2381947A (en) 2003-05-14
GB2381947B true GB2381947B (en) 2004-01-07

Family

ID=9925505

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0126977A Expired - Fee Related GB2381947B (en) 2001-11-09 2001-11-09 Electron beam lithography machine

Country Status (2)

Country Link
DE (1) DE20216713U1 (en)
GB (1) GB2381947B (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61192434A (en) * 1985-02-19 1986-08-27 Toshiba Mach Co Ltd Stage apparatus
US5140242A (en) * 1990-04-30 1992-08-18 International Business Machines Corporation Servo guided stage system
EP0654813A1 (en) * 1993-10-28 1995-05-24 Mitsubishi Denki Kabushiki Kaisha Electron beam drawing apparatus and method of drawing with such apparatus
JPH11330209A (en) * 1998-05-15 1999-11-30 Hitachi Ltd Sample processing method and apparatus
EP1071112A2 (en) * 1999-07-19 2001-01-24 Jeol Ltd. Scanning charged-particle beam instrument

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61192434A (en) * 1985-02-19 1986-08-27 Toshiba Mach Co Ltd Stage apparatus
US5140242A (en) * 1990-04-30 1992-08-18 International Business Machines Corporation Servo guided stage system
EP0654813A1 (en) * 1993-10-28 1995-05-24 Mitsubishi Denki Kabushiki Kaisha Electron beam drawing apparatus and method of drawing with such apparatus
JPH11330209A (en) * 1998-05-15 1999-11-30 Hitachi Ltd Sample processing method and apparatus
EP1071112A2 (en) * 1999-07-19 2001-01-24 Jeol Ltd. Scanning charged-particle beam instrument

Also Published As

Publication number Publication date
GB0126977D0 (en) 2002-01-02
DE20216713U1 (en) 2003-02-06
GB2381947A (en) 2003-05-14

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20121109