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GB2334598B - A charged beam pattern data generating method and a charged beam pattern data generating apparatus - Google Patents

A charged beam pattern data generating method and a charged beam pattern data generating apparatus

Info

Publication number
GB2334598B
GB2334598B GB9909814A GB9909814A GB2334598B GB 2334598 B GB2334598 B GB 2334598B GB 9909814 A GB9909814 A GB 9909814A GB 9909814 A GB9909814 A GB 9909814A GB 2334598 B GB2334598 B GB 2334598B
Authority
GB
United Kingdom
Prior art keywords
pattern data
data generating
beam pattern
charged beam
generating apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB9909814A
Other versions
GB9909814D0 (en
GB2334598A (en
Inventor
Koichi Moriizumi
Kinya Kamiyama
Makoto Kanno
Hironobu Taoka
Hiroomi Nakao
Kazuhiro Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP10576595A external-priority patent/JP3549282B2/en
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Publication of GB9909814D0 publication Critical patent/GB9909814D0/en
Publication of GB2334598A publication Critical patent/GB2334598A/en
Application granted granted Critical
Publication of GB2334598B publication Critical patent/GB2334598B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H01J37/3023—Programme control
    • H01J37/3026—Patterning strategy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30472—Controlling the beam
    • H01J2237/30483—Scanning
    • H01J2237/30494—Vector scan
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31761—Patterning strategy
    • H01J2237/31764—Dividing into sub-patterns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31776—Shaped beam

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Beam Exposure (AREA)
GB9909814A 1995-04-28 1996-04-26 A charged beam pattern data generating method and a charged beam pattern data generating apparatus Expired - Fee Related GB2334598B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP10576595A JP3549282B2 (en) 1995-04-28 1995-04-28 Method and apparatus for creating charged beam drawing data
GB9608723A GB2300281B (en) 1995-04-28 1996-04-26 Method and apparatus for producing a patterned mask, a patterned substrate or a semiconductor device having a patterned substrate, or control signals therefor

Publications (3)

Publication Number Publication Date
GB9909814D0 GB9909814D0 (en) 1999-06-23
GB2334598A GB2334598A (en) 1999-08-25
GB2334598B true GB2334598B (en) 1999-11-17

Family

ID=26309216

Family Applications (2)

Application Number Title Priority Date Filing Date
GB9909814A Expired - Fee Related GB2334598B (en) 1995-04-28 1996-04-26 A charged beam pattern data generating method and a charged beam pattern data generating apparatus
GB9909813A Expired - Fee Related GB2334597B (en) 1995-04-28 1996-04-26 A charged beam pattern data generating method and a charged beam pattern data generating apparatus

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB9909813A Expired - Fee Related GB2334597B (en) 1995-04-28 1996-04-26 A charged beam pattern data generating method and a charged beam pattern data generating apparatus

Country Status (1)

Country Link
GB (2) GB2334598B (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0066882A2 (en) * 1981-06-10 1982-12-15 Hitachi, Ltd. Electron beam exposure system
US4878177A (en) * 1987-02-16 1989-10-31 Kabushiki Kaisha Toshiba Method for drawing a desired circuit pattern using charged particle beam
US5159201A (en) * 1991-07-26 1992-10-27 International Business Machines Corporation Shape decompositon system and method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0066882A2 (en) * 1981-06-10 1982-12-15 Hitachi, Ltd. Electron beam exposure system
US4878177A (en) * 1987-02-16 1989-10-31 Kabushiki Kaisha Toshiba Method for drawing a desired circuit pattern using charged particle beam
US5159201A (en) * 1991-07-26 1992-10-27 International Business Machines Corporation Shape decompositon system and method

Also Published As

Publication number Publication date
GB9909814D0 (en) 1999-06-23
GB2334597B (en) 1999-11-17
GB2334598A (en) 1999-08-25
GB2334597A (en) 1999-08-25
GB9909813D0 (en) 1999-06-23

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20080426