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GB2327280B - Fabrication method for uniform planar optical waveguide - Google Patents

Fabrication method for uniform planar optical waveguide

Info

Publication number
GB2327280B
GB2327280B GB9815126A GB9815126A GB2327280B GB 2327280 B GB2327280 B GB 2327280B GB 9815126 A GB9815126 A GB 9815126A GB 9815126 A GB9815126 A GB 9815126A GB 2327280 B GB2327280 B GB 2327280B
Authority
GB
United Kingdom
Prior art keywords
optical waveguide
fabrication method
planar optical
uniform planar
uniform
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB9815126A
Other versions
GB9815126D0 (en
GB2327280A (en
Inventor
Sun-Tae Jung
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of GB9815126D0 publication Critical patent/GB9815126D0/en
Publication of GB2327280A publication Critical patent/GB2327280A/en
Application granted granted Critical
Publication of GB2327280B publication Critical patent/GB2327280B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P11/00—Apparatus or processes specially adapted for manufacturing waveguides or resonators, lines, or other devices of the waveguide type
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P3/00—Waveguides; Transmission lines of the waveguide type
    • H01P3/10—Wire waveguides, i.e. with a single solid longitudinal conductor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Optical Integrated Circuits (AREA)
GB9815126A 1997-07-15 1998-07-14 Fabrication method for uniform planar optical waveguide Expired - Fee Related GB2327280B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019970032888A KR100509510B1 (en) 1997-07-15 1997-07-15 Fabrication for uniform planar waveguide

Publications (3)

Publication Number Publication Date
GB9815126D0 GB9815126D0 (en) 1998-09-09
GB2327280A GB2327280A (en) 1999-01-20
GB2327280B true GB2327280B (en) 1999-08-11

Family

ID=19514551

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9815126A Expired - Fee Related GB2327280B (en) 1997-07-15 1998-07-14 Fabrication method for uniform planar optical waveguide

Country Status (4)

Country Link
JP (1) JP2902640B2 (en)
KR (1) KR100509510B1 (en)
CN (1) CN1105927C (en)
GB (1) GB2327280B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2373343A (en) * 2001-03-16 2002-09-18 Bookham Technology Plc Rib waveguide for connection to an optical component
CN100356216C (en) * 2005-12-29 2007-12-19 天津大学 Method of preparing long period bar wave guide optical grating on optical glass surface
JP2009205112A (en) * 2008-02-29 2009-09-10 Sumitomo Electric Ind Ltd Optical waveguide and method of manufacturing the same
JP6004550B2 (en) * 2012-12-20 2016-10-12 日本碍子株式会社 Seed crystal substrate, composite substrate and functional element
JP2021504760A (en) * 2017-12-15 2021-02-15 エルジー・ケム・リミテッド Wearable device

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4086001A (en) * 1975-01-13 1978-04-25 Honeywell Inc. Planar optical waveguide
US4169009A (en) * 1977-03-30 1979-09-25 United Technologies Corporation Large area microstructure processing
JPS5540477A (en) * 1978-09-14 1980-03-21 Nec Corp Production of diffraction grating
JPS5930508A (en) * 1982-08-12 1984-02-18 Matsushita Electric Ind Co Ltd Optical waveguide
NL8701478A (en) * 1987-06-25 1989-01-16 Philips Nv METHOD FOR MANUFACTURING A PLANAR OPTICAL COMPONENT.
JPH0563296A (en) * 1991-09-03 1993-03-12 Mitsubishi Electric Corp Forming method for optical waveguide
US5613995A (en) * 1993-04-23 1997-03-25 Lucent Technologies Inc. Method for making planar optical waveguides
JPH0727937A (en) * 1993-07-09 1995-01-31 Sumitomo Electric Ind Ltd Method of manufacturing optical waveguide
JPH07294760A (en) * 1994-04-22 1995-11-10 Sumitomo Electric Ind Ltd Method of manufacturing optical waveguide
JP3674061B2 (en) * 1994-10-31 2005-07-20 株式会社日立製作所 Thin film multilayer circuit board and optical waveguide manufacturing method

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
None *

Also Published As

Publication number Publication date
JPH1172637A (en) 1999-03-16
KR19990010190A (en) 1999-02-05
KR100509510B1 (en) 2005-10-21
JP2902640B2 (en) 1999-06-07
CN1205444A (en) 1999-01-20
CN1105927C (en) 2003-04-16
GB9815126D0 (en) 1998-09-09
GB2327280A (en) 1999-01-20

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20070714