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GB2224362B - A process and apparatus for forming a negative resist pattern with a resist containing a diazoquinone sensitiser - Google Patents

A process and apparatus for forming a negative resist pattern with a resist containing a diazoquinone sensitiser

Info

Publication number
GB2224362B
GB2224362B GB8924488A GB8924488A GB2224362B GB 2224362 B GB2224362 B GB 2224362B GB 8924488 A GB8924488 A GB 8924488A GB 8924488 A GB8924488 A GB 8924488A GB 2224362 B GB2224362 B GB 2224362B
Authority
GB
United Kingdom
Prior art keywords
diazoquinone
sensitiser
forming
resist pattern
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB8924488A
Other versions
GB2224362A (en
GB8924488D0 (en
Inventor
Iwao Numakura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yamatoya and Co Ltd
Original Assignee
Yamatoya and Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP27455988A external-priority patent/JPH02123363A/en
Priority claimed from JP28035888A external-priority patent/JPH02127646A/en
Priority claimed from JP17143288U external-priority patent/JPH0290847U/ja
Application filed by Yamatoya and Co Ltd filed Critical Yamatoya and Co Ltd
Publication of GB8924488D0 publication Critical patent/GB8924488D0/en
Publication of GB2224362A publication Critical patent/GB2224362A/en
Application granted granted Critical
Publication of GB2224362B publication Critical patent/GB2224362B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
GB8924488A 1988-11-01 1989-10-31 A process and apparatus for forming a negative resist pattern with a resist containing a diazoquinone sensitiser Expired - Fee Related GB2224362B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP27455988A JPH02123363A (en) 1988-11-01 1988-11-01 Formation of resist pattern
JP28035888A JPH02127646A (en) 1988-11-08 1988-11-08 Image forming method
JP17143288U JPH0290847U (en) 1988-12-30 1988-12-30

Publications (3)

Publication Number Publication Date
GB8924488D0 GB8924488D0 (en) 1989-12-20
GB2224362A GB2224362A (en) 1990-05-02
GB2224362B true GB2224362B (en) 1993-05-19

Family

ID=27323491

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8924488A Expired - Fee Related GB2224362B (en) 1988-11-01 1989-10-31 A process and apparatus for forming a negative resist pattern with a resist containing a diazoquinone sensitiser

Country Status (3)

Country Link
CA (1) CA2001852A1 (en)
DE (1) DE3936502A1 (en)
GB (1) GB2224362B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2305517B (en) * 1995-08-23 1999-07-28 Kodak Ltd Improvements in imaging systems

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1003857A (en) * 1961-07-28 1965-09-08 Kalle Ag Production of reversed images from light sensitive material containing diazo compounds
GB1492600A (en) * 1974-01-02 1977-11-23 Occidental Petroleum Corp Process for treating coal to produce a carbon char of low sulphur content
GB1501194A (en) * 1974-06-06 1978-02-15 Ibm Photoresist process
US4356255A (en) * 1979-06-28 1982-10-26 Fuji Photo Film Co., Ltd. Photosensitive members and a process for forming patterns using the same
GB2171530A (en) * 1985-02-27 1986-08-28 Imtec Products Inc Method for image enhancement in positive photoresist by vapor diffusion image reversal
GB2188448A (en) * 1986-03-13 1987-09-30 Horsell Graphic Ind Ltd Processing of lithographic printing plates

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5890636A (en) * 1981-11-24 1983-05-30 Fuji Photo Film Co Ltd Method for forming image with photosensitive material using photopolymerizable composition and developing unit
DE3325023A1 (en) * 1983-07-11 1985-01-24 Hoechst Ag, 6230 Frankfurt METHOD FOR PRODUCING NEGATIVE COPIES BY MEANS OF A MATERIAL BASED ON 1,2-CHINONDIAZIDES

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1003857A (en) * 1961-07-28 1965-09-08 Kalle Ag Production of reversed images from light sensitive material containing diazo compounds
GB1492600A (en) * 1974-01-02 1977-11-23 Occidental Petroleum Corp Process for treating coal to produce a carbon char of low sulphur content
GB1501194A (en) * 1974-06-06 1978-02-15 Ibm Photoresist process
US4356255A (en) * 1979-06-28 1982-10-26 Fuji Photo Film Co., Ltd. Photosensitive members and a process for forming patterns using the same
GB2171530A (en) * 1985-02-27 1986-08-28 Imtec Products Inc Method for image enhancement in positive photoresist by vapor diffusion image reversal
GB2188448A (en) * 1986-03-13 1987-09-30 Horsell Graphic Ind Ltd Processing of lithographic printing plates

Also Published As

Publication number Publication date
GB2224362A (en) 1990-05-02
GB8924488D0 (en) 1989-12-20
CA2001852A1 (en) 1990-05-01
DE3936502A1 (en) 1990-05-03

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GB2224362B (en) A process and apparatus for forming a negative resist pattern with a resist containing a diazoquinone sensitiser

Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19971031