GB2171713B - Radiation-polymerizable composition - Google Patents

Radiation-polymerizable composition

Info

Publication number: GB2171713B
Authority: GB; United Kingdom
Prior art keywords: radiation; polymerizable composition; polymerizable; composition
Prior art date: 1985-02-28
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

GB08604818A

Other versions

GB8604818D0 (en

GB2171713A (en

Inventor

John E Walls

Carlos Tellechea

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

CNA Holdings LLC

Original Assignee

American Hoechst Corp

Hoechst Celanese Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1985-02-28

Filing date

1986-02-27

Publication date

1988-05-25

1986-02-27 Application filed by American Hoechst Corp, Hoechst Celanese Corp filed Critical American Hoechst Corp

1986-04-03 Publication of GB8604818D0 publication Critical patent/GB8604818D0/en

1986-09-03 Publication of GB2171713A publication Critical patent/GB2171713A/en

1988-05-25 Application granted granted Critical

1988-05-25 Publication of GB2171713B publication Critical patent/GB2171713B/en

Status Expired legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
- G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
Engineering & Computer Science (AREA)
Architecture (AREA)
Structural Engineering (AREA)
General Physics & Mathematics (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Polymerisation Methods In General (AREA)

GB08604818A 1985-02-28 1986-02-27 Radiation-polymerizable composition Expired GB2171713B (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US70711085A	1985-02-28	1985-02-28

Publications (3)

Publication Number	Publication Date
GB8604818D0 GB8604818D0 (en)	1986-04-03
GB2171713A GB2171713A (en)	1986-09-03
GB2171713B true GB2171713B (en)	1988-05-25

Family

ID=24840382

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
GB08604818A Expired GB2171713B (en)	1985-02-28	1986-02-27	Radiation-polymerizable composition

Country Status (4)

Country	Link
JP (1)	JPS61201234A (en)
CA (1)	CA1300294C (en)
DE (1)	DE3605717A1 (en)
GB (1)	GB2171713B (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE3425328A1 (en) *	1984-07-10	1986-01-16	Hoechst Ag, 6230 Frankfurt	LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE RECORDING MATERIAL MADE THEREOF
JPH0766186B2 (en) *	1985-07-02	1995-07-19	富士写真フイルム株式会社	Photosensitive composition
JPS62238553A (en) *	1986-04-10	1987-10-19	Nippon Foil Mfg Co Ltd	Photosensitive resin composition
JPS63194111A (en) *	1987-02-06	1988-08-11	Hitachi Ltd	Gas fuel combustion method and device
DE3738863A1 (en) *	1987-11-16	1989-05-24	Hoechst Ag	LIGHT-SENSITIVE PRINTING PLATE FOR WATERLESS OFFSET PRINTING
JPH04362350A (en) *	1991-06-06	1992-12-15	Kubota Corp	Transmission lubricating structure
US5466789A (en) *	1992-01-21	1995-11-14	Du Pont (Uk) Limited	Polyunsaturated diazonium compounds
GB2263906B (en) *	1992-01-21	1995-11-08	Du Pont	Improvements in or relating to polyunsaturated diazonium compounds
US5534623A (en) *	1993-01-21	1996-07-09	Du Pont (Uk) Limited	Process for preparing a polyunsaturated diazonium compounds
US5858615A (en) *	1997-07-31	1999-01-12	Morton International, Inc.	Hardenable photoimageable compositions
US6689489B2 (en)	1999-10-07	2004-02-10	Isg Technologies, Inc.	Composition for controlling spangle size, a coated steel product, and a coating method
KR100495443B1 (en)	1999-10-07	2005-06-14	아이에스쥐 테크놀로지 인코포레이티드	A coating composition for steel product, a coated steel product, and a steel product coating method

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
NL8001085A (en) *	1979-02-27	1980-08-29	Minnesota Mining & Mfg	PHOTOSENSITIVE MATERIALS AND OBJECTS.
DE3120052A1 (en) *	1981-05-20	1982-12-09	Hoechst Ag, 6000 Frankfurt	POLYMERIZABLE MIXTURE BY RADIATION AND COPYING MATERIAL MADE THEREOF

1986
- 1986-02-22 DE DE19863605717 patent/DE3605717A1/en not_active Withdrawn
- 1986-02-27 CA CA000502905A patent/CA1300294C/en not_active Expired - Lifetime
- 1986-02-27 JP JP4052286A patent/JPS61201234A/en active Pending
- 1986-02-27 GB GB08604818A patent/GB2171713B/en not_active Expired

Also Published As

Publication number	Publication date
DE3605717A1 (en)	1986-08-28
CA1300294C (en)	1992-05-05
GB8604818D0 (en)	1986-04-03
GB2171713A (en)	1986-09-03
JPS61201234A (en)	1986-09-05

Publication	Publication Date	Title
GB8621580D0 (en)	1986-10-15	Composition
GB8531635D0 (en)	1986-02-05	Composition
GB2179338B (en)	1989-08-02	Composition
GB8514052D0 (en)	1985-07-10	Compositions
GB8508717D0 (en)	1985-05-09	Composition
GB8500862D0 (en)	1985-02-20	Composition
GB8509409D0 (en)	1985-05-15	Compositions
GB8622856D0 (en)	1986-10-29	Composition
GB2171713B (en)	1988-05-25	Radiation-polymerizable composition
GB8629991D0 (en)	1987-01-28	Fat-desensitizing composition
GB8604135D0 (en)	1986-03-26	Composition
EP0192630A3 (en)	1988-09-07	Aminomethylenephosphonate compositions
GB8513550D0 (en)	1985-07-03	Compositions
GB8514418D0 (en)	1985-07-10	Aminobenzylamine composition
PT83574A (en)	1986-11-01	Composition
EP0225309A3 (en)	1988-02-10	Aminomethylenephosphonate compositions
GB8606846D0 (en)	1986-04-23	Composition
GB8501400D0 (en)	1985-02-20	Compositions
GB8520289D0 (en)	1985-09-18	Compositions
EG17458A (en)	1989-09-30	Fungicial compositions
GB8616866D0 (en)	1986-08-20	Composition
GB8525829D0 (en)	1985-11-20	Composition
GB8506586D0 (en)	1985-04-17	Composition
BG40413A1 (en)	1986-12-15	Polyalkyl- 2 cyanacrylatic composition
GB8501023D0 (en)	1985-02-20	Antimist composition

Legal Events

Date	Code	Title	Description
1988-04-20	732	Registration of transactions, instruments or events in the register (sect. 32/1977)
1994-10-26	PCNP	Patent ceased through non-payment of renewal fee	Effective date: 19940227