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GB2171530B - Method of producing reversed photoresist images by vapour diffusion - Google Patents

Method of producing reversed photoresist images by vapour diffusion

Info

Publication number
GB2171530B
GB2171530B GB8518585A GB8518585A GB2171530B GB 2171530 B GB2171530 B GB 2171530B GB 8518585 A GB8518585 A GB 8518585A GB 8518585 A GB8518585 A GB 8518585A GB 2171530 B GB2171530 B GB 2171530B
Authority
GB
United Kingdom
Prior art keywords
vapour diffusion
photoresist images
producing reversed
producing
reversed photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB8518585A
Other versions
GB8518585D0 (en
GB2171530A (en
Inventor
Craig M Stauffer
Eric Alling
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
IMTEC PRODUCTS Inc
Original Assignee
IMTEC PRODUCTS Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by IMTEC PRODUCTS Inc filed Critical IMTEC PRODUCTS Inc
Publication of GB8518585D0 publication Critical patent/GB8518585D0/en
Publication of GB2171530A publication Critical patent/GB2171530A/en
Application granted granted Critical
Publication of GB2171530B publication Critical patent/GB2171530B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/265—Selective reaction with inorganic or organometallic reagents after image-wise exposure, e.g. silylation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
GB8518585A 1985-02-27 1985-07-23 Method of producing reversed photoresist images by vapour diffusion Expired GB2171530B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US70646485A 1985-02-27 1985-02-27

Publications (3)

Publication Number Publication Date
GB8518585D0 GB8518585D0 (en) 1985-08-29
GB2171530A GB2171530A (en) 1986-08-28
GB2171530B true GB2171530B (en) 1989-06-28

Family

ID=24837690

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8518585A Expired GB2171530B (en) 1985-02-27 1985-07-23 Method of producing reversed photoresist images by vapour diffusion

Country Status (4)

Country Link
JP (1) JPS61200537A (en)
DE (1) DE3541451A1 (en)
FR (1) FR2578065A1 (en)
GB (1) GB2171530B (en)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ZA872295B (en) * 1986-03-13 1987-09-22
JPS63165845A (en) * 1986-12-26 1988-07-09 Toshiba Corp Pattern forming method
JP2603935B2 (en) * 1987-03-04 1997-04-23 株式会社東芝 Method of forming resist pattern
AU610064B2 (en) * 1987-03-27 1991-05-16 Horsell Graphic Industries Limited Processing of exposed lithographic printing plates
JP2598059B2 (en) * 1987-03-27 1997-04-09 ホーセル グラフィック インダストリーズ リミッティッド Method of manufacturing exposure lithography
US5407786A (en) * 1988-08-09 1995-04-18 Kabushiki Kaisha Toshiba Method of forming a mask on a semiconductor substrate via photosensitive resin deposition, ammonia treatment and selective silylation
DE68927989T2 (en) * 1988-08-09 1997-09-18 Toshiba Kawasaki Kk Imaging processes
JPH0299960A (en) * 1988-10-06 1990-04-11 Matsushita Electric Ind Co Ltd Pattern forming method
CA2001852A1 (en) * 1988-11-01 1990-05-01 Iwao Numakura Process and apparatus for the formation of negative resist pattern
US4985374A (en) * 1989-06-30 1991-01-15 Kabushiki Kaisha Toshiba Making a semiconductor device with ammonia treatment of photoresist
IT1231108B (en) * 1989-08-10 1991-11-18 Sgs Thomson Microelectronics HIGH RESOLUTION LITHOGRAPHIC PROCEDURE FOR THE PRODUCTION OF MONOLITHIC INTEGRATED CIRCUITS.
DE3940911A1 (en) * 1989-12-12 1991-06-13 Hoechst Ag PROCESS FOR PRODUCING NEGATIVE COPIES
DE4004719A1 (en) * 1990-02-15 1991-08-22 Hoechst Ag RADIATION-SENSITIVE MIXTURE, RADIATION-RECESSED RECORDING MATERIAL PRODUCED HEREOF AND METHOD FOR PRODUCING CROSS-REFERENCES
EP0487794A1 (en) * 1990-11-27 1992-06-03 Sony Corporation Process for preparing resist patterns
GB2305517B (en) * 1995-08-23 1999-07-28 Kodak Ltd Improvements in imaging systems
KR100569542B1 (en) * 2000-06-13 2006-04-10 주식회사 하이닉스반도체 Photoresist pattern formation method using gaseous amine treatment process
US8582079B2 (en) 2007-08-14 2013-11-12 Applied Materials, Inc. Using phase difference of interference lithography for resolution enhancement
US20090117491A1 (en) * 2007-08-31 2009-05-07 Applied Materials, Inc. Resolution enhancement techniques combining interference-assisted lithography with other photolithography techniques
JP5107329B2 (en) * 2009-10-14 2012-12-26 東京エレクトロン株式会社 Development processing method
CN106707691B (en) * 2015-07-15 2018-10-16 上海微电子装备（集团）股份有限公司 Exposure device and method

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1003857A (en) * 1961-07-28 1965-09-08 Kalle Ag Production of reversed images from light sensitive material containing diazo compounds
GB1489167A (en) * 1975-06-30 1977-10-19 Ibm Method of making a negative photoresist image
GB1492620A (en) * 1974-02-01 1977-11-23 Fuji Photo Film Co Ltd Ortho-quinonediazide light-sensitive copying material
GB1501194A (en) * 1974-06-06 1978-02-15 Ibm Photoresist process

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1224147B (en) * 1963-08-23 1966-09-01 Kalle Ag Process for the reverse development of copying layers containing diazo compounds
JPS5636648A (en) * 1979-09-03 1981-04-09 Fuji Photo Film Co Ltd Photosensitive material and pattern forming method using it
US4307178A (en) * 1980-04-30 1981-12-22 International Business Machines Corporation Plasma develoment of resists
JPS5723937A (en) * 1980-07-17 1982-02-08 Matsushita Electric Ind Co Ltd Photographic etching method
DE3151078A1 (en) * 1981-12-23 1983-07-28 Hoechst Ag, 6230 Frankfurt METHOD FOR PRODUCING RELIEF IMAGES
JPS5917552A (en) * 1982-07-21 1984-01-28 Toray Ind Inc Method for processing image forming laminate
IT1169682B (en) * 1983-11-08 1987-06-03 I M G Ind Materiali Grafici Sp COMPOSITION FOR PHOTOS REPRODUCTIONS

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1003857A (en) * 1961-07-28 1965-09-08 Kalle Ag Production of reversed images from light sensitive material containing diazo compounds
GB1492620A (en) * 1974-02-01 1977-11-23 Fuji Photo Film Co Ltd Ortho-quinonediazide light-sensitive copying material
GB1501194A (en) * 1974-06-06 1978-02-15 Ibm Photoresist process
GB1489167A (en) * 1975-06-30 1977-10-19 Ibm Method of making a negative photoresist image

Also Published As

Publication number Publication date
DE3541451A1 (en) 1986-08-28
FR2578065A1 (en) 1986-08-29
JPS61200537A (en) 1986-09-05
GB8518585D0 (en) 1985-08-29
GB2171530A (en) 1986-08-28

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19920723