GB2111977A - Epoxy compounds containing N-diglycidyl groups - Google Patents
Epoxy compounds containing N-diglycidyl groups Download PDFInfo
- Publication number
- GB2111977A GB2111977A GB08227967A GB8227967A GB2111977A GB 2111977 A GB2111977 A GB 2111977A GB 08227967 A GB08227967 A GB 08227967A GB 8227967 A GB8227967 A GB 8227967A GB 2111977 A GB2111977 A GB 2111977A
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- United Kingdom
- Prior art keywords
- epoxy compound
- halogen
- group
- bis
- epoxy
- Prior art date
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- 239000004593 Epoxy Substances 0.000 title claims abstract description 87
- 150000001875 compounds Chemical class 0.000 title claims abstract description 81
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 51
- 150000002367 halogens Chemical class 0.000 claims abstract description 51
- 125000003118 aryl group Chemical group 0.000 claims abstract description 31
- 229910052794 bromium Inorganic materials 0.000 claims abstract description 4
- 239000000203 mixture Substances 0.000 claims description 20
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 15
- 229910052739 hydrogen Inorganic materials 0.000 claims description 13
- 229920000647 polyepoxide Polymers 0.000 claims description 13
- 229910052731 fluorine Inorganic materials 0.000 claims description 9
- 239000003822 epoxy resin Substances 0.000 claims description 8
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims description 6
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 4
- FJFBSRLZQMYDJI-UHFFFAOYSA-N 4-[[4-[bis(oxiran-2-ylmethyl)amino]-2-(trifluoromethyl)phenyl]methyl]-n,n-bis(oxiran-2-ylmethyl)-3-(trifluoromethyl)aniline Chemical compound FC(F)(F)C1=CC(N(CC2OC2)CC2OC2)=CC=C1CC(C(=C1)C(F)(F)F)=CC=C1N(CC1OC1)CC1CO1 FJFBSRLZQMYDJI-UHFFFAOYSA-N 0.000 claims description 3
- SLASXCJHHAQLNY-UHFFFAOYSA-N 4-[[4-[bis(oxiran-2-ylmethyl)amino]-2-bromophenyl]methyl]-3-bromo-n,n-bis(oxiran-2-ylmethyl)aniline Chemical compound BrC1=CC(N(CC2OC2)CC2OC2)=CC=C1CC(C(=C1)Br)=CC=C1N(CC1OC1)CC1CO1 SLASXCJHHAQLNY-UHFFFAOYSA-N 0.000 claims description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 3
- 239000002131 composite material Substances 0.000 claims description 3
- 239000000835 fiber Substances 0.000 claims description 3
- 239000011159 matrix material Substances 0.000 claims description 3
- LLVXVIUBQDHSHS-UHFFFAOYSA-N n,n-bis(oxiran-2-ylmethyl)-3,5-bis(trifluoromethyl)aniline Chemical compound FC(F)(F)C1=CC(C(F)(F)F)=CC(N(CC2OC2)CC2OC2)=C1 LLVXVIUBQDHSHS-UHFFFAOYSA-N 0.000 claims description 3
- XZHHMXJAOXVQPW-UHFFFAOYSA-N n,n-bis(oxiran-2-ylmethyl)-2-(trifluoromethyl)aniline Chemical compound FC(F)(F)C1=CC=CC=C1N(CC1OC1)CC1OC1 XZHHMXJAOXVQPW-UHFFFAOYSA-N 0.000 claims description 2
- DXRGIFCXGCSMLF-UHFFFAOYSA-N 4-[[4-[bis(oxiran-2-ylmethyl)amino]-2-chlorophenyl]methyl]-3-chloro-n,n-bis(oxiran-2-ylmethyl)aniline Chemical compound ClC1=CC(N(CC2OC2)CC2OC2)=CC=C1CC(C(=C1)Cl)=CC=C1N(CC1OC1)CC1CO1 DXRGIFCXGCSMLF-UHFFFAOYSA-N 0.000 claims 1
- 229910052801 chlorine Inorganic materials 0.000 abstract description 3
- 229920006158 high molecular weight polymer Polymers 0.000 abstract description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 42
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 28
- HTZCNXWZYVXIMZ-UHFFFAOYSA-M benzyl(triethyl)azanium;chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC1=CC=CC=C1 HTZCNXWZYVXIMZ-UHFFFAOYSA-M 0.000 description 26
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N N-phenyl amine Natural products NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 25
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 22
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 18
- 239000000243 solution Substances 0.000 description 16
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 13
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 10
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 8
- 238000007033 dehydrochlorination reaction Methods 0.000 description 8
- 238000002360 preparation method Methods 0.000 description 8
- DEWLEGDTCGBNGU-UHFFFAOYSA-N 1,3-dichloropropan-2-ol Chemical compound ClCC(O)CCl DEWLEGDTCGBNGU-UHFFFAOYSA-N 0.000 description 6
- 229960000583 acetic acid Drugs 0.000 description 6
- -1 aniline compound Chemical class 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 125000003700 epoxy group Chemical group 0.000 description 5
- 239000012362 glacial acetic acid Substances 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- 239000012044 organic layer Substances 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical group [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 4
- 239000001257 hydrogen Chemical group 0.000 description 4
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 3
- 150000001448 anilines Chemical class 0.000 description 3
- 150000001728 carbonyl compounds Chemical class 0.000 description 3
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 3
- 238000004128 high performance liquid chromatography Methods 0.000 description 3
- XIHJPXJLKOHUCV-UHFFFAOYSA-N n,n-bis(oxiran-2-ylmethyl)-3-(trifluoromethyl)aniline Chemical compound FC(F)(F)C1=CC=CC(N(CC2OC2)CC2OC2)=C1 XIHJPXJLKOHUCV-UHFFFAOYSA-N 0.000 description 3
- WFQDTOYDVUWQMS-UHFFFAOYSA-N 1-fluoro-4-nitrobenzene Chemical compound [O-][N+](=O)C1=CC=C(F)C=C1 WFQDTOYDVUWQMS-UHFFFAOYSA-N 0.000 description 2
- VIUDTWATMPPKEL-UHFFFAOYSA-N 3-(trifluoromethyl)aniline Chemical compound NC1=CC=CC(C(F)(F)F)=C1 VIUDTWATMPPKEL-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000003377 acid catalyst Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002953 preparative HPLC Methods 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 2
- CDIDGWDGQGVCIB-UHFFFAOYSA-N 3,5-bis(trifluoromethyl)aniline Chemical compound NC1=CC(C(F)(F)F)=CC(C(F)(F)F)=C1 CDIDGWDGQGVCIB-UHFFFAOYSA-N 0.000 description 1
- UQRLKWGPEVNVHT-UHFFFAOYSA-N 3,5-dichloroaniline Chemical compound NC1=CC(Cl)=CC(Cl)=C1 UQRLKWGPEVNVHT-UHFFFAOYSA-N 0.000 description 1
- DHYHYLGCQVVLOQ-UHFFFAOYSA-N 3-bromoaniline Chemical compound NC1=CC=CC(Br)=C1 DHYHYLGCQVVLOQ-UHFFFAOYSA-N 0.000 description 1
- PNPCRKVUWYDDST-UHFFFAOYSA-N 3-chloroaniline Chemical compound NC1=CC=CC(Cl)=C1 PNPCRKVUWYDDST-UHFFFAOYSA-N 0.000 description 1
- PTRAFBGJBNUUER-UHFFFAOYSA-N 4-[[4-[bis(oxiran-2-ylmethyl)amino]-3-bromophenyl]methyl]-2-bromo-n,n-bis(oxiran-2-ylmethyl)aniline Chemical compound C=1C=C(N(CC2OC2)CC2OC2)C(Br)=CC=1CC(C=C1Br)=CC=C1N(CC1OC1)CC1CO1 PTRAFBGJBNUUER-UHFFFAOYSA-N 0.000 description 1
- BVUCNROZGLEAKD-UHFFFAOYSA-N 4-[[4-[bis(oxiran-2-ylmethyl)amino]-3-chlorophenyl]methyl]-2-chloro-n,n-bis(oxiran-2-ylmethyl)aniline Chemical compound C=1C=C(N(CC2OC2)CC2OC2)C(Cl)=CC=1CC(C=C1Cl)=CC=C1N(CC1OC1)CC1CO1 BVUCNROZGLEAKD-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- VBQDSLGFSUGBBE-UHFFFAOYSA-N benzyl(triethyl)azanium Chemical compound CC[N+](CC)(CC)CC1=CC=CC=C1 VBQDSLGFSUGBBE-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000002301 combined effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000254 damaging effect Effects 0.000 description 1
- 230000006735 deficit Effects 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 238000000199 molecular distillation Methods 0.000 description 1
- JAYXSROKFZAHRQ-UHFFFAOYSA-N n,n-bis(oxiran-2-ylmethyl)aniline Chemical compound C1OC1CN(C=1C=CC=CC=1)CC1CO1 JAYXSROKFZAHRQ-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 239000003444 phase transfer catalyst Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000011208 reinforced composite material Substances 0.000 description 1
- 239000012779 reinforcing material Substances 0.000 description 1
- 238000010125 resin casting Methods 0.000 description 1
- 125000001174 sulfone group Chemical group 0.000 description 1
- XPDWGBQVDMORPB-UHFFFAOYSA-N trifluoromethane acid Natural products FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/32—Epoxy compounds containing three or more epoxy groups
- C08G59/3227—Compounds containing acyclic nitrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/36—Compounds containing oxirane rings with hydrocarbon radicals, substituted by nitrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/28—Di-epoxy compounds containing acyclic nitrogen atoms
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Epoxy Compounds (AREA)
- Epoxy Resins (AREA)
Abstract
Novel epoxy compounds have the general formula: <IMAGE> in which Y is selected from A and <IMAGE> each A being independently selected from halogen, halogen containing group and H, provided that at least one of the groups A per aromatic ring is a halogen or halogen containing group. In any one compound, when A is a halogen or halogen containing group, it is preferred that each A is the same. When the epoxy compound contains only one aromatic ring the group A may be a polyfluoroalkyl group in which case one or two such groups may be attached to the aromatic ring; or a polyfluoroalkoxy group, in which case only one such group is attached to the aromatic ring. When the epoxy compound contains two aromatic rings, the group A may be Cl, Br, or a polyfluoroalkyl group and one or two such groups may be attached to each aromatic ring. The epoxy compounds may be cured to form high molecular weight polymers with improved resistance to moisture.
Description
SPECIFICATION
Epoxy compounds
The present invention relates to epoxy compounds and to epoxy resins made from them.
Epoxy resins are used widely in fibre reinforced composites, in coatings, foams and as adhesives. However epoxies have the disadvantage that they are adversely affected by water.
Prolonged exposure to water leads to absorption of moisture by the resin. The moisture acts as a plasticiser lowering the glass transition temperature of the resin. Consequently the maximum service temperature of the resin is lowered when the resin absorbs moisture. In addition, the combined effects of water, temperature and stress can lead to the formation of cracks in the resin with a consequent decrease in mechanical properties. The damaging effects of water on the elevated temperature properties of epoxies prevents their full potential as matrix materials in fibre reinforced composites and as adhesives and coatings being realised.
The present invention provides epoxy compounds that may be cured to form high molecular weight polymers wich have improved resistance to moisture.
According to the present invention an epoxy compound includes one or two aromatic rings, one N-diglycidyl group per aromatic ring and one or two halogen or halogen-containing groups per aromatic ring, the epoxy compound having the general formula:
Formula 1 in which Y is selected from A and
each A being independently selected from halogen, halogen containing group and H, provided that at least one of the groups A per aromatic ring is a halogen or halogen containing group. In any one compound, when A is a halogen or halogen containing group and when more than one
A is present, it is preferred that each group A is the same.
Epoxy compounds according to the present invention may include one aromatic ring and only one halogen-containing group as shown in Formula 2.
Formula 2 where A is a halogen containing group or H, only one of the groups A being a halogen
containing group, which may be a polyfluoroalkyl group X(CF2)n- or a polyfluoroalkoxy group X(CF2)nCH20- in which X is either H or F and n is an integer between 1 and 10 inclusive. When
A is a polyfluoroalkyl group, for example -CF3, it is preferably attached to the aromatic ring at a
meta position with respect to the nitrogen atom. When A is a polyfluoroalkoxy group, for
example H(CF2)6CH20, it is preferably attached to the aromatic ring at the para position with
respect to the nitrogen atom.
Epoxy compounds according to the present invention may include one aromatic ring and two
halogen containing groups as shown in Formula 3:
Formula 3 where each A is a halogen containing group which may be a polyfluoroalkyl group X(CF2)n- in which X is either H or F and n is an integer between 1 and 10 inclusive. Preferably each A is the same and is preferably a trifluoromethyl group.
Epoxy compounds according to the present invention may include two aromatic rings and one halogen or halogen-containing group per aromatic ring as shown in Formula 4:
Formula 4 where each A is a halogen or halogen-containing group. Preferably A is chlorine, bromine or a polyfluoroalkyl group X(CF2)n- in which X is fluorine or hydrogen and n is an integer between 1 and 10 inclusive. Preferably the polyfluoroalkyl group is -CF3. Preferably each group A is the same.
Epoxy compounds according to the present invention may include two aromatic rings and two halogen or halogen-containing groups per aromatic ring as shown in Formula 5:
Formula 5 where each A is a halogen or halogen-containing group. A is preferably chlorine, bromine or a polyfluoroalkyl group (X(CF2)n- in which X is fluorine or hydrogen and n is an integer between 1 and 10 inclusive. It is preferred that the polyfluoroalkyl groups is -CF3. Preferably each group A is the same.
The preferred embodiments of the present invention are 3-(trifluoromethyl)-N,N-bis(2,3epoxypropyl)aniline (Formula 6), 4-(1,1,7-trihydryl-Sheptyloxy-N,N-bis(2,3-epoxypropyl)aniline (Formula 7), bis2-(trifluornmethyl)-4-bis(2, 3-epoxyprnpyl)aminophenyljmethane (Formula 8), bisr2-chlorn-4-bis(2, 3-epoxypropyl)aminophenyljmethane (Formula 9), bis[2-bromo-4-bis(2,3epoxypropyl)minophenyl]methane (Formula 10), bis(2, 6-chloro, -4-bis(2,3-epoxypropyl)aminophenyl]methane (Formula 11) and 3, 5-bis(trifluoromethyl)-N, N-bis(2, 3-epoxypropyl)aniline (Formula 12).
Formula 6
Formula 7
Formula 8
Formula 9
Formula 10
Formula 11
Formula 1 2
Expoxy compounds of the present invention and according to Formulas 2 and 3 may be prepared by reaction between a parent aniline compound and epichlorhydrin to form a dichlorohydrin intermediate which is then dehydrochlorinated to form an epoxy compound. By parent aniline compound is meant the aniline compound which includes the halogen-containing group or groups desired in the epoxy compound being made, such group or groups being located at the appropriate positions on the aromatic ring. Reaction between epichlorhydrin and a parent aniline may be conducted in a neutral solvent. When the parent aniline contains a polyfluoroalkoxy substituent in the para position the reaction with epichlorhydrin proceeds readily.However a suitable catalyst may be required when the parent aniline contains a polyfluoroalkyl substituent in a meta position, as for example in the preparation of 3 (trifluoromethyl)-N, N-bis(2, 3-epoxypropyl)aniline, where the parent aniline, 3-(trifluoromethyl)aniline does not readily form a dichlorohydrin intermediate. The choice of catalyst is important since whereas for example the strong acid catalyst trifluoromethane sulphonic acid promotes the formation of a dichlorohydrin intermediate, the weaker acid catalyst trifluoroacetic acid favours the formation of a monochlorohydrin compound.
Excess epichlorhydrin may be distilled off prior to dehydrochlorination. The latter may be carried out by the action of sodium hydroxide solution in the presence of a phase transfer catalyst such as benzyltriethylammonium chloride and may be allowed to proceed at room temperature.
The epoxy compounds of the present invention and according to Formulas 2 and 3 may also be prepared by the method described in US patent 3449375 in which acetic acid is used as the reaction solvent.
The parent anilines for 4-(a,a,-trihydril-Ralkoxy)-N,N-bis)2,3 epoxy propyl)anilines are 4 (a,a,-trihydril-Ralkoxy)anilines which may be prepared from 4-fluoronitrobenzene and a,oc,- trihydril-Ralkanols. The reaction may be carried out in sodium hydroxide solution in the presence of benzyltriethyl-ammonium chloride, the product being 4-(a,a,co.trihydryl-F-alkoxy)ni- trobenzene which may be reduced with hydrogen in the presence of 10% palladium on charcoal to give the appropriate aniline compound.
Epoxy compounds of the present invention and according to either Formula 4 or Formula 5 may be prepared by reaction between a parent aniline compound (as hereinbefore defined) with epichlorhydrin to produce a dichlorohydrin intermediate which is then reacted with a carbonyl compound, the product of which is dehydrochlorinated to an epoxy compound.
The formation of the dichlorohydrin intermediate and dehydrochlorination may be carried out as previously described. Reaction of the dichlorohydrin intermediate with a carbonyl compound may be carried out in the presence of an acid, for example concentrated hydrochloric acid and preferably after excess epichlorhydrin has been distilled off. The choice of carbonyl compound depends on the epoxy compound being made. The reaction may be aided by raising the temperature and it is preferable to allow the reaction to cool prior to dehydrochlorination.
Epoxy compounds of the present invention may be cured to form high molecular weight polymers by conventional techniques using conventional curing agents for example bis(4aminophenyl)sulphone, bis(4-aminophenyl)methane and 1,3-diaminobenzene. An epoxy compound according to the present invention may be cured on its own, or combined in a mixture of other epoxy compounds and the mixtured cured. Such a mixture may include two or more epoxy compounds of the present invention, and one or more known epoxy compounds. Any such mixture may be tailored to the requirements of the end use to which the cured epoxy is to be put.
High molecular weight epoxy resins made from epoxy compounds of the present invention have improved resistance to water and are less susceptible to water induced impairment of performance.
Reinforced composite materials may be made with suitable reinforcing materials by known techniques, using the epoxy compounds of the present invention in any of the above combinations to form the polymer matrix.
Embodiments of the present invention will now be described by way of example.
EXAMPLE 1
Preparation of 3-(trifluoromethyl)-N, N-bis(2, 3-apoxypropyl)aniline.
A solution of 3-(trifluoromethane)aniline 48.3g) and trifluoromethane sulphonic acid (29) in benzene was prepared. To this solution was added 1109 epichlorhydrin and the whole was stirred and heated to about 70"C for about 24 hours. The product was cooled to about 10-15"C and 29 of benzyltriethylammonium chloride was added, followed by a solution consisting of 60g of sodium hydroxide in 759 of water. The reaction was allowed to proceed at about room temperature. The mixture was finally heated at about 70"C for 3 hour. Water was then added and the product extracted with ether. Distrillation gave 41 g of 3-(trifluoromethyl)
N,N-bis(2,3-epoxypropyl)aniline, having a boiling point of 109-111 C/0.07 Torr.
EXAMPLE 2
Preparation of 4-(1,1 ,7-trihydryl-F-heptyloxy)aniline.
A solution of sodium hydroxide (7.19) in water (7.19) and benzyltriethylammonium chloride (0.49) was added to a mixture of 4-fluoronitrobenzene (14.19) and 1,1,7-trihydryl-Sheptanol (369). The whole was stirred and heated at about 60"C for about 6 hours. The product was recrystallised from an ethanol/petroleum ether mixture to give 4-(1,1,7-trihydryl-Shepyloxy)ni- trobenzene (37.29), having a melting point of 51-53'C.
A solution of the product (1 5.0g) in ethanol (1009) was reduced with hydrogen in the presence of 10% palladium on charcoal (0.39) to give, after distillation under reduced pressure 4-(1,1,7-trihydryl-Sheptyloxy)aniline (11.79), having a melting point of 29-31"C.
EXAMPLE 3
Preparation of 4-(1,1,7-trihydryl- Sheptyloxy)-N, N-bis(2,3-epoxypropyl)aniline.
Epichlorhydrin (36.39) was added to a stirred solution of 4-(1,1,7-trihydryl-Sheptyloxy)aniline (56g) in benzene (629) and water (9g) and the mixture was heated at a reflux temperature for about 48 hours. The product was cooled to about 10-15 C and benzyltriethylammonium chloride (1g) was added, followed by a solution of sodium hydroxide (239) in water (239). After about 20 hours at about room temperature was added and the product extracted with ether.
Molecular distillation gave 4-(1,1,7-trihydryl- Sheptyloxy)-N, N-bis(2,3-epoxypropyl)aniline (55.29).
EXAMPLE 4
Preparation of bis[2-(trifluoromethyl)-4-bis(2, 3-epoxypropyl)aminophenyllmethane.
Epichlorhydrin (749) was added to 3-(trifluoromethyl)aniline (16.19) in glacial acetic acid (1 0.6g) and the mixture was stirred at a temperature of about 110"C for about 2+ hours. Excess epichlorhydrin was distilled off under reduced pressure. Water (20 cm3), concentrated hydrochloric acid (10.39) and formaldehyde (4.4g of 37% wt/wt solution) were added to the residue and the mixture was stirred at a temperature of about 1 00'C for 1 8 hours. It was then cooled to about 60"C and benzyltriethylammonium chloride (0.3g), followed by sodium hydroxide (249) in water (56g) were added.After 10 minutes the aqueous layer was decanted and the product again treated with benzyltriethylammonium chloride (0.39) and sodium hydroxide (129) in water (289) to effect complete dehydrochlorination. After about 21 hours, at about 65"C, 100 cm3 water were added and the product extracted with ether.
After removing the solvent, the product was purified by preparative high performance liquid chromatography (HPLC) to give 10.09 of bis[2-(trifluoromethyl)-4-bis 2,3-epoxypropyl)aminophe nyljmethane.
EXAMPLE 5
Preparation of [bis 3, 5-dichloro-4-bis(2, 3-epoxypropyl)aminophenyl]methane.
Epichlorhydrin (749) was added to 3,5-dichloroaniline (16.29) in glacial acetic acid (10.6g) and the mixture stirred at about 90"C for about 4+ hours. Excess epichlorhydrin was distilled off under reduced pressure. Water (20 cm3), concentrated hydrochloric acid (10.39, weight per cm3 1.18) and formaldehyde (5.0g of 37% wt/wt aqueous solution) were added to the residue and the mixture stirred at about 96"C for about 9+ hours. The solution was cooled and benzyltriethylammonium chloride (0.3g), benzene )100 cm3) and aqueous sodium hydroxide (80 cm3 of 30% wt/vol) were added.After about 10 minutes at about 50"C, the aqueous layer was decanted and the product again treated with benzyltriethylammonium cloride (0.39) and aqueous sodium hydroxide (80 cm3 of 30% wt/vol) at about 65"C for about 90 minutes to effect complete dehydrochlorination. The organic layer was separated and after removal of solvent is was purified by HPLC techniques to give pure bis[3,5-dichloro-4-bis(2,3-epoxypropy I)aminophenyl]methane (13.79).
EXAMPLE 6
Preparation of bis[3-chloro-4-bis(2, 3-epoxypropyl)aminophenyl]methane.
Epichlorhydrin (749) was added to 3-chloroaniline (12.75g) in glacial acetic acid (10.69) and the mixture stirred at 95"C for about 11 hours. Excess epichlorhydrin was distilled off under reduced pressure. Water (20 cm3), concentrated hydrochloric acid (10.39 wt per cm3 1.18) and formaldehyde (5.0g of 37% wt/wt aqueous solution) were added to the residue and the mixture stirred at about 85"C for about 4 hours. The solution was cooled and benzyltriethylammonium chloride (0.3g) benzene (100 cm3) and aqueous sodium hydroxide (80 cm3 of 30% weight/vol) were added.After about 5 minutes at about 50"C, the aqueous layer was decanted and the organic layer treated three times with benzyltriethylammonium chloride (0.29) and aqueous sodium hydroxide (40 cm3 of 30% wt/vol solution) at about 75"C for about > hour, 1 hour and 17 hours respectively, to effect complete dehydrochlorination. The organic layer was separated and after solvent removal it was purified by HPLC techniques to give pure bis[3-chloro-4-bis(2,3- epoxypropyl)aminophenyllmethane (1 5.1 g).
EXAMPLE 7
Preparation of bis[3-bromo-4-bis(2, 3-epoxypropyl)aminophenyl]methane.
Epichlorhydrin (749) was added to 3-bromoaniline (17.29) in glacial acetic acid (1 0.6g) and the mixture stirred at about 88"C for about 5 hours. The excess epichlorhydrin was distilled off under reduced pressure and to the residue were added water (20 cm3), concentrated hydrochloric acid (10.39, wt/cm3 1.18) and formaldehyde (5g of 37% wt/vol aqueous solution). The mixture was stirred at about 76"C for about 1 7 hours. To the cooled solution benzyltriethylammonium chloride (0.39), benzene (100 cm3) and sodium hydroxide (80 cm3 of 30% wt/vol aqueous solution) were added.After about 10 minutes at about 50"C the aqueous layer was decanted, and the organic layer again treated with benzyltriethylammonium chloride (0.3g) and sodium hydroxide (80 cm3 of 30% wt/vol aqueous solution) at about 75"C for about 1+ hours to effect complete dehydrochlorination. The organic layer was separated and after removal of solvent, purified by HPLC techniques to give 18.49 of pure bis[3-bromo--4-bis(2,3-epoxypropy- I)aminophenyl]methane.
EXAMPLE 8
A solution of 3,5-bis(trifluoromethyl)aniline (22.99) and epichlorohydrin (379) in glacial acetic acid (10.6g) were heated at about 100"C for about 11 hours. Excess epichlorohydrin was distilled off under reduced pressure. Benzene (100 cm3), a solution of sodium hydroxide (89) in water (30 cm3) and benzyltriethylammonium chloride (0.39) was added to the residue and the mixture stirred at about room temperature for about 1 5 minutes at about 60"C. The aqueous layer was discarded. The dehydrochlorination procedure was repeated three times in order to effect complete conversion.The solvent was removed and the product was purified by preparative high performance liquid chromatography to give 1 9.5g of 3,5-bis(trifluoromethyl)
N, N-bis(2, 3-epoxypropyl)aniiine.
EXAMPLE 9
Epoxy resin castings of approximately 0.025 cm thickness were prepared from the epoxy compounds prepared in Example 1 and Examples 3 to 8, using amine hardeners under the following conditions:
a. 1,3-diaminobenzene (stoichiometric amount based on epoxy equivalent), 16 hours at 80"C, followed by 6 hours at 160"C.
b. Bis(4-aminophe'nyl)sulphone (60% stoichiometric amount based on epoxy equivalent, 1
hour at 150"C, followed by 5 hours at 180"C.
c. 1,3-diaminobenzene (75% of stoichiometric amount based on epoxy equivalent), 16 hours
at 80"C followed by 6 hours at 160"C.
Known epoxy compounds and mixtures of known epoxy compounds and epoxy compounds of the present invention were cured in the same conditions. Water absorbtion tests were carried out on the castings in water at 20"C at yt/d = 200 (time tin days and thickness d in cm).
Water absorbtion was not Fichian and did not reach a constant value, but continued to increase very slowly with time.
The results of the water absorbition tests are given in Table 1.
TABLE 1
Amine Water Absorption (w%)
Epoxy Compound and cure of resin N,N-bis(2,3-epoxypropyl)aniline (I) A 4.5 3-(trifluoromethyl)-N, N-bis (2,3-epoxypropyl)aniline (Il) A 2.7 4-(1,1,7-trihydryk- hepytoxy) -N,N-bis(2m3-epoxypropyl)aniline (III) A 1.2 tetraglycidyl ether of bis(4-aminophenyl)methane (IV) A 7.2 (IV) and (II) (1 :1 by weight) A 4.5 (IV) and (Il) (2:1 by weight) A 5.3 (IV) and (III) (1:1 by weight) A 3.8 (IV) and (Ill) (2::1 by weight) A 4.9 diglycidyl ether of 2,2-bis(4-hydroxyphenyl)propane (V) A 3.5 (V) and (II) (1:1 by weight) A 3.1 (IV) B 5.6 bis[2-chloro-4-bis(2, 3-epoxypropyl) aminophenyllmethane (Vl) B 3.8 bis[2-bromo-4-bis(2, 3-epoxypropyl) aminophenyl]methane (VII) B 3.2 bis[2-(trifluoromethyl)-4-bis(2,3- epoxypropyl)aminophenyl]methane (VIII) B 2.9 bis[2, 6-chloro-4-bis(2, 3-epoxypropyl) aminophenyl]methane (IX) B 2.9 3, 5-bis(trifluoromethyl)-N, N-bis(2,3epoxypropyl)aniline (X) C 1.6
N,N,-bis(2,3-epoxypropyl)aniline (I) C 4.0
Comparison between the water absorbtion figures for the cured epoxy compounds of the present invention (ill, Ill, VI, VII, VIII, IX, X on Table 1) and those for cured known epoxy compounds (I, IV, V in Table 1) show that the cured epoxy compounds of the present invention have superior resistance to water than cured known epoxy compounds. When known epoxies were mixed with epoxies of the present invention and the mixtures cured, the resistance to water of the mixtures was superior to the water resistance of the cured known epoxies alone.
Claims (26)
1. An epoxy compound including one or two aromatic rings, one N-diglycidyl group per aromatic ring and one or two halogen or halogen-containing groups per aromatic ring, the epoxy compound having the general formula:
in which Y is selected from A and
each A being independently selected from halogen, halogen containing group and H, at least one of the groups A per aromatic ring being a halogen or halogen-containing group.
2. An epoxy compound as claimed in claim 1 and wherein the epoxy compound includes only one aromatic ring and only one halogen-containing group, the epoxy compound, having the general formula:
in which A is a halogen containing group or H, at least one group A being a halogen containing group.
3. An epoxy compound as claimed in claim 2 and wherein the halogen containing group is a polyfluoroalkyl group (X(CF2)n in which X is either F or H and n is an integer between 1 and 10 inclusive, the polyfluoroalkyl group being attached to the aromatic ring at a meta position with respect to the nitrogen atom.
4. An epoxy compound as claimed in claim 2 and wherein the halogen containing group is a polyfluoroalkoxy group X(CF2)nCH20- in which X is either F or H and n is an integer between 1 and 10 inclusive, the polyfluoroalkoxy group being attached to the aromatic ring at the para position with respect to the nitrogen atom.
5. An epoxy compound as claimed in claim 3 and wherein the epoxy compound is 3 (trifluoromethyl)-N, N-bis(2, 3-epoxypropyl)aniline.
6. An epoxy compound as claimed in claim 4 and wherein the epoxy compound is 4-(1,1,7trihydryl- Fheptyloxy)-N, N-bis(2, 3-epoxypropyl)aniline.
7. An epoxy compound as claimed in claim 1 and wherein the epoxy compound includes one aromatic ring and two halogen containing groups, the epoxy compound having the general formula:
in which A is a halogen containing group.
8. An epoxy compound as claimed in claim 7 and wherein each group A is the same.
9. An epoxy compound as claimed in claim 7 or claim 8 and wherein the halogen containing group is a polyfluoroalkyl group X(CF2)n- in which X is either F or H and n is an integer between 1 and 10 inclusive.
10. An epoxy compound as claimed in claim 9 and wherein the epoxy compound is 3,5 bis(trifluoromethyl)-N,N-bis(2,3-epoxy propyl) aniline.
11. An epoxy compound as claimed in claim 1 and wherein the epoxy compound includes two aromatic rings and one halogen or halogen-containing group per aromatic ring, the epoxy compound having the general formula:
in which A is a halogen or halogen-containing group.
1 2. An epoxy compound as claimed in claim 10 and wherein each group A is the same.
1 3. An epoxy compound as claimed in claim 11 or claim 1 2 and wherein the halogen containing group is a polyfluoroalkyl group X(CF2)n- in which X is either F or H and n is an integer between 1 and 10 inclusive.
14. An epoxy compound as claimed in claim 11 or claim 1 2 and wherein the epoxy compound is bis[2-chloro-4-bis(2, 3-epoxypropyl)aminophenyl]methane.
1 5. An epoxy compound as claimed in claim 11 or claim 1 2 and wherein the epoxy compound is bis[2-bromo-4-bis(2, 3-epoxypropyl)aminophenyl]methane.
1 6. An epoxy compound as claimed in claim 1 3 and wherein the epoxy compound is bis[2 (trifluoromethyl)-4-bis(2, 3-epoxypropyl)aminophenyl]methane.
1 7. An epoxy compound as claimed in claim 1 and wherein the epoxy compound includes two aromatic rings and two halogen or halogen-containing groups per aromatic ring, the epoxy compound having the general formula:
in which A is a halogen or halogen-containing group.
1 8. An epoxy compound as claimed in claim 1 5 and wherein each group A is the same.
1 9. An epoxy compound as claimed in claim 1 7 or claim 1 8 and wherein the halogencontaining group is a polyfluoroalkyl group X(CF2)n- in which X is F or H and n is an integer between 1 and 10 inclusive.
20. An epoxy compound as claimed in claim 1 9 and wherein the polyfluoroalkyl group is -CF3.
21. An epoxy compound as claimed in claim 1 7 or claim 1 8 and wherein the group A is bromine.
22. An epoxy compound as claimed in claim t7 or claim 18 and wherein the epoxy compound is bis[2, 6-chloro-4-bis(2, 3-epoxypropyl)aminophenyl]methane.
23. An epoxy compound as claimed in any one preceding claim as hereinbefore described and with reference to the Examples.
24. An epoxy resin including a cured epoxy compound as claimed in ay one preceding claim.
25. An epoxy resin including a cured mixture of epoxy compounds including at least one epoxy compound as claimed in any one preceding claim.
26. An epoxy resin as claimed in claim 24 or claim 25 and wherein the epoxy resin is a matrix of a fibre reinforced composite.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB8129618 | 1981-10-01 | ||
GB8224407 | 1982-08-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB2111977A true GB2111977A (en) | 1983-07-13 |
Family
ID=26280865
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB08227967A Withdrawn GB2111977A (en) | 1981-10-01 | 1982-09-30 | Epoxy compounds containing N-diglycidyl groups |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB2111977A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4540769A (en) * | 1983-09-29 | 1985-09-10 | Ciba-Geigy Corporation | Preparation of N-glycidyl compounds |
EP0456603A1 (en) * | 1990-05-05 | 1991-11-13 | Ciba-Geigy Ag | Tetra-N-glycedyl compound and its hardenable mixtures |
US5149841A (en) * | 1990-05-07 | 1992-09-22 | Ciba-Geigy Corporation | N,n,n',n'-tetraclycidyl-4,4'-diaminodiphenylmethanes |
-
1982
- 1982-09-30 GB GB08227967A patent/GB2111977A/en not_active Withdrawn
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4540769A (en) * | 1983-09-29 | 1985-09-10 | Ciba-Geigy Corporation | Preparation of N-glycidyl compounds |
EP0456603A1 (en) * | 1990-05-05 | 1991-11-13 | Ciba-Geigy Ag | Tetra-N-glycedyl compound and its hardenable mixtures |
US5280069A (en) * | 1990-05-05 | 1994-01-18 | Ciba-Geigy Corporation | N-glycidyl compound |
US5362849A (en) * | 1990-05-05 | 1994-11-08 | Ciba-Geigy Corporation | N-glycidyl compound |
US5149841A (en) * | 1990-05-07 | 1992-09-22 | Ciba-Geigy Corporation | N,n,n',n'-tetraclycidyl-4,4'-diaminodiphenylmethanes |
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