GB2062949B - Single filament semiconductor laser with large emitting area - Google Patents
Single filament semiconductor laser with large emitting areaInfo
- Publication number
- GB2062949B GB2062949B GB8014175A GB8014175A GB2062949B GB 2062949 B GB2062949 B GB 2062949B GB 8014175 A GB8014175 A GB 8014175A GB 8014175 A GB8014175 A GB 8014175A GB 2062949 B GB2062949 B GB 2062949B
- Authority
- GB
- United Kingdom
- Prior art keywords
- semiconductor laser
- emitting area
- single filament
- large emitting
- filament
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2232—Buried stripe structure with inner confining structure between the active layer and the lower electrode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2232—Buried stripe structure with inner confining structure between the active layer and the lower electrode
- H01S5/2234—Buried stripe structure with inner confining structure between the active layer and the lower electrode having a structured substrate surface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2232—Buried stripe structure with inner confining structure between the active layer and the lower electrode
- H01S5/2234—Buried stripe structure with inner confining structure between the active layer and the lower electrode having a structured substrate surface
- H01S5/2235—Buried stripe structure with inner confining structure between the active layer and the lower electrode having a structured substrate surface with a protrusion
Landscapes
- Physics & Mathematics (AREA)
- Geometry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US8438779A | 1979-10-12 | 1979-10-12 |
Publications (2)
Publication Number | Publication Date |
---|---|
GB2062949A GB2062949A (en) | 1981-05-28 |
GB2062949B true GB2062949B (en) | 1983-08-10 |
Family
ID=22184652
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB8014175A Expired GB2062949B (en) | 1979-10-12 | 1980-04-30 | Single filament semiconductor laser with large emitting area |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS5661190A (en) |
DE (1) | DE3021104A1 (en) |
GB (1) | GB2062949B (en) |
IT (1) | IT1193534B (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2129211B (en) * | 1982-10-21 | 1987-01-14 | Rca Corp | Semiconductor laser and a method of making same |
FR2535121B1 (en) * | 1982-10-25 | 1989-01-06 | Rca Corp | SEMICONDUCTOR LASER AND MANUFACTURING METHOD THEREOF |
JPH0732278B2 (en) * | 1982-10-27 | 1995-04-10 | アールシーエー コーポレーシヨン | Semiconductor laser |
US4523316A (en) * | 1982-10-29 | 1985-06-11 | Rca Corporation | Semiconductor laser with non-absorbing mirror facet |
JPS62188220A (en) * | 1986-02-13 | 1987-08-17 | Sharp Corp | Method of liquid-phase epitaxy |
CN114150367B (en) * | 2021-11-26 | 2023-07-04 | 华中科技大学 | Laser cladding repair method and repair system for high-temperature alloy single crystal defect |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4166253A (en) * | 1977-08-15 | 1979-08-28 | International Business Machines Corporation | Heterostructure diode injection laser having a constricted active region |
IT1121922B (en) * | 1978-07-31 | 1986-04-23 | Rca Corp | SEMICONDUCTOR LASER, EMISSING A SINGLE BEAM OF LIGHT |
-
1980
- 1980-04-30 GB GB8014175A patent/GB2062949B/en not_active Expired
- 1980-05-14 IT IT22046/80A patent/IT1193534B/en active
- 1980-06-04 DE DE19803021104 patent/DE3021104A1/en not_active Withdrawn
- 1980-06-11 JP JP7957180A patent/JPS5661190A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
IT1193534B (en) | 1988-07-08 |
IT8022046A0 (en) | 1980-05-14 |
GB2062949A (en) | 1981-05-28 |
DE3021104A1 (en) | 1981-04-23 |
JPS5661190A (en) | 1981-05-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |