GB201113808D0 - Methods for forming an organic layer on a substrate - Google Patents
Methods for forming an organic layer on a substrateInfo
- Publication number
- GB201113808D0 GB201113808D0 GBGB1113808.8A GB201113808A GB201113808D0 GB 201113808 D0 GB201113808 D0 GB 201113808D0 GB 201113808 A GB201113808 A GB 201113808A GB 201113808 D0 GB201113808 D0 GB 201113808D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- substrate
- methods
- forming
- organic layer
- organic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB1113808.8A GB201113808D0 (en) | 2011-08-11 | 2011-08-11 | Methods for forming an organic layer on a substrate |
PCT/GB2012/000626 WO2013021149A2 (en) | 2011-08-11 | 2012-07-31 | Methods for forming an organic layer on a substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB1113808.8A GB201113808D0 (en) | 2011-08-11 | 2011-08-11 | Methods for forming an organic layer on a substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
GB201113808D0 true GB201113808D0 (en) | 2011-09-21 |
Family
ID=44735737
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GBGB1113808.8A Ceased GB201113808D0 (en) | 2011-08-11 | 2011-08-11 | Methods for forming an organic layer on a substrate |
Country Status (2)
Country | Link |
---|---|
GB (1) | GB201113808D0 (en) |
WO (1) | WO2013021149A2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP4287240A4 (en) * | 2021-02-01 | 2024-07-17 | Central Glass Company, Limited | Substrate, selective film deposition method, deposition film of organic matter, and organic matter |
CN115747721B (en) * | 2022-10-31 | 2024-12-27 | 浙江大学杭州国际科创中心 | Single-layer organic nano film and preparation and characterization methods thereof |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6391803B1 (en) * | 2001-06-20 | 2002-05-21 | Samsung Electronics Co., Ltd. | Method of forming silicon containing thin films by atomic layer deposition utilizing trisdimethylaminosilane |
DE102004005082B4 (en) | 2004-02-02 | 2006-03-02 | Infineon Technologies Ag | A capacitor comprising a self-assembled monolayer organic compound dielectric and a method of making the same |
KR100589062B1 (en) * | 2004-06-10 | 2006-06-12 | 삼성전자주식회사 | Thin film formation method of atomic layer stacking method and capacitor formation method of semiconductor device using same |
US8758512B2 (en) * | 2009-06-08 | 2014-06-24 | Veeco Ald Inc. | Vapor deposition reactor and method for forming thin film |
-
2011
- 2011-08-11 GB GBGB1113808.8A patent/GB201113808D0/en not_active Ceased
-
2012
- 2012-07-31 WO PCT/GB2012/000626 patent/WO2013021149A2/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2013021149A3 (en) | 2013-06-20 |
WO2013021149A2 (en) | 2013-02-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
AT | Applications terminated before publication under section 16(1) |