GB201002099D0 - Lithography apparatus and method - Google Patents

Lithography apparatus and method

Info

Publication number: GB201002099D0
Authority: GB; United Kingdom
Prior art keywords: lithography apparatus; lithography
Prior art date: 2010-02-09
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Ceased

Application number

GBGB1002099.8A

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

University of Sheffield

Original Assignee

University of Sheffield

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2010-02-09

Filing date

2010-02-09

Publication date

2010-03-24

2010-02-09 Application filed by University of Sheffield filed Critical University of Sheffield

2010-02-09 Priority to GBGB1002099.8A priority Critical patent/GB201002099D0/en

2010-03-24 Publication of GB201002099D0 publication Critical patent/GB201002099D0/en

2011-02-08 Priority to PCT/GB2011/050213 priority patent/WO2011098790A1/en

Status Ceased legal-status Critical Current

Priority Applications (2)

Application Number	Priority Date	Filing Date	Title
GBGB1002099.8A GB201002099D0 (en)	2010-02-09	2010-02-09	Lithography apparatus and method
PCT/GB2011/050213 WO2011098790A1 (en)	2010-02-09	2011-02-08	Lithography apparatus and method

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
GBGB1002099.8A GB201002099D0 (en)	2010-02-09	2010-02-09	Lithography apparatus and method

Publications (1)

Publication Number	Publication Date
GB201002099D0 true GB201002099D0 (en)	2010-03-24

Family

ID=42082703

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
GBGB1002099.8A Ceased GB201002099D0 (en)	2010-02-09	2010-02-09	Lithography apparatus and method

Country Status (2)

Country	Link
GB (1)	GB201002099D0 (en)
WO (1)	WO2011098790A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
EP3101477B1 (en)	2014-01-28	2018-12-05	Prismlab China Ltd.	Light-curing type 3d printing device and image exposure system thereof
CN106200276B (en) *	2016-07-19	2017-10-24	西安电子科技大学	Controllable sub-wavelength maskless lithography system and method based on random scattering media
CN107831639B (en) *	2017-11-20	2019-11-12	张家港奇点光电科技有限公司	A kind of novel big table top LED exposure machine
CN111766414B (en) *	2020-08-14	2020-12-25	强一半导体（苏州）有限公司	Probe positioning method for template burning of guide plate MEMS probe structure

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB0125133D0 (en)	2001-10-19	2001-12-12	Univ Manchester	Methods of patterning a monlayer
JP2006013216A (en) *	2004-06-28	2006-01-12	Canon Inc	Method for forming resist pattern by near-field exposure, a method for processing substrate using method for forming resist pattern, and method for manufacturing device
US7586583B2 (en) *	2005-09-15	2009-09-08	Franklin Mark Schellenberg	Nanolithography system

2010
- 2010-02-09 GB GBGB1002099.8A patent/GB201002099D0/en not_active Ceased
2011
- 2011-02-08 WO PCT/GB2011/050213 patent/WO2011098790A1/en active Application Filing

Also Published As

Publication number	Publication date
WO2011098790A1 (en)	2011-08-18

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Legal Events

Date	Code	Title	Description
2011-10-12	AT	Applications terminated before publication under section 16(1)