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GB1504616A - Photopolymerisable material for the preparation of stable polymeric images and process for making them by photopolymerisation in a matrix - Google Patents

Photopolymerisable material for the preparation of stable polymeric images and process for making them by photopolymerisation in a matrix

Info

Publication number
GB1504616A
GB1504616A GB2503775A GB2503775A GB1504616A GB 1504616 A GB1504616 A GB 1504616A GB 2503775 A GB2503775 A GB 2503775A GB 2503775 A GB2503775 A GB 2503775A GB 1504616 A GB1504616 A GB 1504616A
Authority
GB
United Kingdom
Prior art keywords
photopolymerisation
matrix
preparation
making
stable polymeric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2503775A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of GB1504616A publication Critical patent/GB1504616A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
GB2503775A 1974-06-11 1975-06-11 Photopolymerisable material for the preparation of stable polymeric images and process for making them by photopolymerisation in a matrix Expired GB1504616A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH795774A CH604208A5 (de) 1974-06-11 1974-06-11

Publications (1)

Publication Number Publication Date
GB1504616A true GB1504616A (en) 1978-03-22

Family

ID=4332963

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2503775A Expired GB1504616A (en) 1974-06-11 1975-06-11 Photopolymerisable material for the preparation of stable polymeric images and process for making them by photopolymerisation in a matrix

Country Status (7)

Country Link
JP (1) JPS599895B2 (de)
BE (1) BE830050A (de)
CA (1) CA1062529A (de)
CH (1) CH604208A5 (de)
DE (1) DE2525673A1 (de)
FR (1) FR2274952A1 (de)
GB (1) GB1504616A (de)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4302527A (en) 1980-08-21 1981-11-24 Eastman Kodak Company Photoreactive compositions comprising a light sensitive compound and another compound with reactive site
US4422972A (en) 1980-08-21 1983-12-27 Eastman Kodak Company Novel light-sensitive compounds and photoreactable compositions comprising same
US4555474A (en) * 1984-02-02 1985-11-26 Fuji Photo Film Co., Ltd. Photopolymerizable composition
WO2011073429A1 (en) * 2009-12-17 2011-06-23 Dublin Institute Of Technology A photosensitive recording material

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5119718B2 (de) * 1973-09-22 1976-06-19
SE405404B (sv) * 1975-12-29 1978-12-04 Volvo Flygmotor Ab Saett och anlaeggning foer samtidig foerbraenning av flytande och gasformiga avfallsprodukter
US4542088A (en) * 1982-03-18 1985-09-17 Konishiroku Photo Industry Co., Ltd. Photopolymerizable compositions and image-forming materials using said compositions
GB2129953B (en) * 1982-04-07 1985-08-07 Sony Corp Image-forming photo-sensitive material
JPS5965840A (ja) * 1982-10-07 1984-04-14 Sanyo Kokusaku Pulp Co Ltd 着色画像の形成方法およびこれに使用するための着色画像形成用感光材料
GB8718528D0 (en) * 1987-08-05 1987-09-09 Ciba Geigy Ag Photopolymerisable composition
DE19519740B4 (de) * 1995-06-02 2005-04-21 Mann + Hummel Gmbh Wärmetauscher
JP7354529B2 (ja) * 2018-08-30 2023-10-03 株式会社リコー 活性エネルギー線硬化型液体、活性エネルギー線硬化型液体セット、造形物の製造方法、及び造形物製造装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4302527A (en) 1980-08-21 1981-11-24 Eastman Kodak Company Photoreactive compositions comprising a light sensitive compound and another compound with reactive site
US4422972A (en) 1980-08-21 1983-12-27 Eastman Kodak Company Novel light-sensitive compounds and photoreactable compositions comprising same
US4555474A (en) * 1984-02-02 1985-11-26 Fuji Photo Film Co., Ltd. Photopolymerizable composition
WO2011073429A1 (en) * 2009-12-17 2011-06-23 Dublin Institute Of Technology A photosensitive recording material

Also Published As

Publication number Publication date
CA1062529A (en) 1979-09-18
BE830050A (fr) 1975-12-10
FR2274952A1 (fr) 1976-01-09
FR2274952B1 (de) 1977-07-08
CH604208A5 (de) 1978-08-31
JPS5111433A (ja) 1976-01-29
DE2525673A1 (de) 1976-01-02
JPS599895B2 (ja) 1984-03-06

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee