GB1494394A - Selective electroplating of gold onto composite surfaces - Google Patents
Selective electroplating of gold onto composite surfacesInfo
- Publication number
- GB1494394A GB1494394A GB709175A GB709175A GB1494394A GB 1494394 A GB1494394 A GB 1494394A GB 709175 A GB709175 A GB 709175A GB 709175 A GB709175 A GB 709175A GB 1494394 A GB1494394 A GB 1494394A
- Authority
- GB
- United Kingdom
- Prior art keywords
- plating
- gold
- feb
- regions
- optionally
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010931 gold Substances 0.000 title abstract 8
- 229910052737 gold Inorganic materials 0.000 title abstract 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 title abstract 4
- 239000002131 composite material Substances 0.000 title abstract 2
- 238000009713 electroplating Methods 0.000 title abstract 2
- 229910052763 palladium Inorganic materials 0.000 abstract 3
- 238000007747 plating Methods 0.000 abstract 3
- 229910052697 platinum Inorganic materials 0.000 abstract 3
- 229940075397 calomel Drugs 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- ZOMNIUBKTOKEHS-UHFFFAOYSA-L dimercury dichloride Chemical compound Cl[Hg][Hg]Cl ZOMNIUBKTOKEHS-UHFFFAOYSA-L 0.000 abstract 1
- 230000006911 nucleation Effects 0.000 abstract 1
- 238000010899 nucleation Methods 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/288—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
- H01L21/2885—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition using an external electrical current, i.e. electro-deposition
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/48—Electroplating: Baths therefor from solutions of gold
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/482—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body (electrodes)
- H01L23/485—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body (electrodes) consisting of layered constructions comprising conductive layers and insulating layers, e.g. planar contacts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/241—Reinforcing the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/243—Reinforcing the conductive pattern characterised by selective plating, e.g. for finish plating of pads
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/244—Finish plating of conductors, especially of copper conductors, e.g. for pads or lands
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Computer Hardware Design (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Organic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Manufacturing & Machinery (AREA)
- Electroplating Methods And Accessories (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
1494394 Selective gold electro-plating WESTERN ELECTRIC CO Inc 19 Feb 1975 [19 Feb 1974(2)] 7091/75 Heading C7B [Also in Division H1] A composite surface comprising regions of Ti and regions of Pt, Pd and/or Au is selectively gold electro-plated on the latter by controlling the cathodic potential of the surface below that at which gold deposition occurs on the Ti, by which is meant less than 50000 Au nucleation sites per cm<SP>2</SP> on the Ti. Conventional baths are used, with optionally 20 ppb to 2 ppm of Pb present. Details of plating onset potentials for Pd, Pt and Au in relation to Ti are given, and control may be effected via a calomel electrode and potentiostat, although two-electrode systems are possible. The potential may be increased stepwise or continuously during plating. The Ti may be a layer on a conventional semi-conductor substrate, e.g. based on Si, and bear a printed circuit pattern of the Pt, Pd and/or Au. It may optionally be protected with a photo-resist during plating.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US443624A US3926747A (en) | 1974-02-19 | 1974-02-19 | Selective electrodeposition of gold on electronic devices |
US443625A US3873428A (en) | 1974-02-19 | 1974-02-19 | Preferential gold electroplating |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1494394A true GB1494394A (en) | 1977-12-07 |
Family
ID=27033593
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB709175A Expired GB1494394A (en) | 1974-02-19 | 1975-02-19 | Selective electroplating of gold onto composite surfaces |
Country Status (7)
Country | Link |
---|---|
JP (1) | JPS5440056B2 (en) |
DE (1) | DE2506990C3 (en) |
FR (1) | FR2261352B1 (en) |
GB (1) | GB1494394A (en) |
IT (1) | IT1031886B (en) |
NL (1) | NL160034C (en) |
SE (1) | SE446751B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1533837A1 (en) * | 1997-03-10 | 2005-05-25 | Asahi Kasei Kabushiki Kaisha | Selective electroplating method |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4226167C2 (en) * | 1992-08-07 | 1996-10-24 | Sel Alcatel Ag | Method for electrically conductive connection using flip-chip technology |
-
1975
- 1975-02-18 NL NL7501908A patent/NL160034C/en not_active IP Right Cessation
- 1975-02-18 SE SE7501777A patent/SE446751B/en not_active IP Right Cessation
- 1975-02-19 JP JP2080875A patent/JPS5440056B2/ja not_active Expired
- 1975-02-19 DE DE19752506990 patent/DE2506990C3/en not_active Expired
- 1975-02-19 IT IT2045275A patent/IT1031886B/en active
- 1975-02-19 GB GB709175A patent/GB1494394A/en not_active Expired
- 1975-02-19 FR FR7505153A patent/FR2261352B1/fr not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1533837A1 (en) * | 1997-03-10 | 2005-05-25 | Asahi Kasei Kabushiki Kaisha | Selective electroplating method |
Also Published As
Publication number | Publication date |
---|---|
NL160034B (en) | 1979-04-17 |
DE2506990A1 (en) | 1975-08-28 |
SE446751B (en) | 1986-10-06 |
DE2506990B2 (en) | 1979-01-25 |
NL7501908A (en) | 1975-08-21 |
NL160034C (en) | 1979-09-17 |
SE7501777L (en) | 1975-08-20 |
IT1031886B (en) | 1979-05-10 |
JPS5440056B2 (en) | 1979-12-01 |
JPS50124841A (en) | 1975-10-01 |
DE2506990C3 (en) | 1979-09-13 |
FR2261352A1 (en) | 1975-09-12 |
FR2261352B1 (en) | 1978-04-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |