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GB1443917A - Formation of photoresist masks - Google Patents

Formation of photoresist masks

Info

Publication number
GB1443917A
GB1443917A GB383775A GB383775A GB1443917A GB 1443917 A GB1443917 A GB 1443917A GB 383775 A GB383775 A GB 383775A GB 383775 A GB383775 A GB 383775A GB 1443917 A GB1443917 A GB 1443917A
Authority
GB
United Kingdom
Prior art keywords
layer
photo
mask
depositing
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB383775A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1443917A publication Critical patent/GB1443917A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

1443917 Photo-resist masks INTERNATIONAL BUSINESS MACHINES CORP 29 Jan 1975 [28 Feb 1974] 3837/75 Heading G2X A photo-resist mask is formed on a substrate 11 by pre-exposing a liquid photo-resist material to light and then depositing it as a first layer 12 on the substrate 11, depositing a compatable non- photo-sensitive material 13 over the layer 12, depositing an outer layer 14 of photo-resist material over the layer 13, and selectively exposing and developing the mask in a desired pattern of lines. During development, the exposed parts of the layer 14 and the corresponding areas of the layers 13 and 12 are dissolved so as to expose the substrate surface in the desired pattern. A layer of electrically conductive material may be deposited over the mask, and the mask and superimposed portions of the conductive material removed to leave a pattern of electrically conductive lines suitable for a printed circuit.
GB383775A 1974-02-28 1975-01-29 Formation of photoresist masks Expired GB1443917A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH286974A CH584422A5 (en) 1974-02-28 1974-02-28

Publications (1)

Publication Number Publication Date
GB1443917A true GB1443917A (en) 1976-07-28

Family

ID=4243404

Family Applications (1)

Application Number Title Priority Date Filing Date
GB383775A Expired GB1443917A (en) 1974-02-28 1975-01-29 Formation of photoresist masks

Country Status (6)

Country Link
JP (1) JPS5527476B2 (en)
CH (1) CH584422A5 (en)
DE (1) DE2459183C2 (en)
FR (1) FR2262818B1 (en)
GB (1) GB1443917A (en)
IT (1) IT1027852B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4248960A (en) * 1978-01-23 1981-02-03 W. R. Grace & Co. Radiation responsive relief imageable plastic laminate
US4716097A (en) * 1986-02-03 1987-12-29 E. I. Du Pont De Nemours And Company Increased photopolymer photospeed employing yellow light preexposure
DE3626708A1 (en) * 1986-08-07 1988-02-11 Mania Gmbh Method for producing printed circuit boards

Also Published As

Publication number Publication date
IT1027852B (en) 1978-12-20
CH584422A5 (en) 1977-01-31
DE2459183A1 (en) 1975-09-04
FR2262818B1 (en) 1977-07-01
DE2459183C2 (en) 1983-02-24
FR2262818A1 (en) 1975-09-26
JPS5527476B2 (en) 1980-07-21
JPS50119971A (en) 1975-09-19

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Legal Events

Date Code Title Description
PS Patent sealed
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee