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GB1408748A - Process for the electrolytic production of low-gloss nickel precipitates or nicel/cobalt precipitates on metallic surfaces - Google Patents

Process for the electrolytic production of low-gloss nickel precipitates or nicel/cobalt precipitates on metallic surfaces

Info

Publication number
GB1408748A
GB1408748A GB1899274A GB1899274A GB1408748A GB 1408748 A GB1408748 A GB 1408748A GB 1899274 A GB1899274 A GB 1899274A GB 1899274 A GB1899274 A GB 1899274A GB 1408748 A GB1408748 A GB 1408748A
Authority
GB
United Kingdom
Prior art keywords
precipitates
low
deposited
gloss
electro
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1899274A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Langbein Pfanhauser Werke AG
Original Assignee
Langbein Pfanhauser Werke AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Langbein Pfanhauser Werke AG filed Critical Langbein Pfanhauser Werke AG
Publication of GB1408748A publication Critical patent/GB1408748A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
    • C25D15/02—Combined electrolytic and electrophoretic processes with charged materials
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

1408748 Electro-deposition of low-gloss Ni or Ni-Co layers LANGBEIN-PFANHAUSER WERKE AG 1 May 1974 [1 June 1973] 18992/74 Heading C7B A low gloss electro-deposited layer of Ni or Ni-Co is cathodically deposited on a metallic substrate from a Ni or Ni-Co bath to which has been added at least one organic cation active or amphoteric substance together with at least one organic anion which will form a precipitate therewith, whereby the precipitate is co-deposited with the Ni or Ni-Co. The bath may be of the Watts, sulphamate or fluoborate type and preferably has a pH of 2.5-5.8. The cationic or amphoteric substance may be a quaternary ammonium salt, an imidazoline compound, an alkanolamine ester or an amino-carboxylic acid surfactant, e.g. cetyl-or coconut-trimethylammonium chloride, the oleic ester of triethanolamine, N- lauryl-N" carboxymethyl diethylene triamine or the imidazoline compound "Amine C". The anion may be derived from sulphonic, sulphatic, phosphatic, sulphinic, sulphonamide, sulphinamide or carboxylic compounds, e.g. saccharin, 2-ethyl hexyl sulphate, lauryl ether sulphate and 2-propyne sulphonic acid. Conventional lustering agents may be included e.g. 2-butyne-1, 4-diol A plating current of 0.5-20A/dm<SP>2</SP> at 15-70‹ C is specified.
GB1899274A 1973-06-01 1974-05-01 Process for the electrolytic production of low-gloss nickel precipitates or nicel/cobalt precipitates on metallic surfaces Expired GB1408748A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19732327881 DE2327881B2 (en) 1973-06-01 1973-06-01 Process for the galvanic deposition of matt-glossy nickel or nickel / cobalt deposits

Publications (1)

Publication Number Publication Date
GB1408748A true GB1408748A (en) 1975-10-01

Family

ID=5882747

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1899274A Expired GB1408748A (en) 1973-06-01 1974-05-01 Process for the electrolytic production of low-gloss nickel precipitates or nicel/cobalt precipitates on metallic surfaces

Country Status (6)

Country Link
JP (1) JPS5843469B2 (en)
BR (1) BR7404495D0 (en)
CA (1) CA1027893A (en)
DE (1) DE2327881B2 (en)
FR (1) FR2231772B1 (en)
GB (1) GB1408748A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1323848A1 (en) * 2001-12-28 2003-07-02 Shipley Co. L.L.C. Nickel electroplating solution
EP1323849A1 (en) 2001-12-28 2003-07-02 Shipley Co. L.L.C. Nickel electroplating solution
WO2011149330A1 (en) * 2010-05-26 2011-12-01 Mimos Berhad Method of electrodepositing nickel-cobalt alloy

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62142704A (en) * 1985-12-18 1987-06-26 Sumitomo Electric Ind Ltd Drill for printed circuit board
DE3909811A1 (en) * 1989-03-24 1990-09-27 Lpw Chemie Gmbh Use of at least one organic sulphinic acid and/or at least one alkali metal salt of an organic sulphinic acid as an agent ...
JP2626065B2 (en) * 1989-07-04 1997-07-02 上村工業株式会社 Satin nickel or nickel alloy plating bath and plating method
DE19540011C2 (en) * 1995-10-27 1998-09-10 Lpw Chemie Gmbh Process for the galvanic deposition of glare-free nickel or nickel alloy deposits
DE10025552C1 (en) 2000-05-19 2001-08-02 Atotech Deutschland Gmbh Acidic electroplating nickel bath and process for depositing a satin nickel or nickel alloy coating
DE10222962A1 (en) * 2002-05-23 2003-12-11 Atotech Deutschland Gmbh Acidic galvanic bath electrolyte and process for the electrolytic deposition of satin-shining nickel deposits
ATE507327T1 (en) * 2006-01-06 2011-05-15 Enthone ELECTROLYTE AND METHOD FOR DEPOSITING A MATTE METAL LAYER
JP2013129902A (en) * 2011-12-22 2013-07-04 Om Sangyo Kk Plated product and method for producing the same

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3255096A (en) * 1963-11-01 1966-06-07 Harshaw Chem Corp Electrodeposition of nickel
CH486564A (en) * 1967-03-21 1970-02-28 Hoeltgen Rolf Bath for the galvanic deposition of nickel

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1323848A1 (en) * 2001-12-28 2003-07-02 Shipley Co. L.L.C. Nickel electroplating solution
EP1323849A1 (en) 2001-12-28 2003-07-02 Shipley Co. L.L.C. Nickel electroplating solution
US6852211B2 (en) * 2001-12-28 2005-02-08 Shipley Company, L.L.C. Nickel electroplating solution
US6858122B2 (en) * 2001-12-28 2005-02-22 Shipley Company, L.L.C. Nickel electroplating solution
CN100424232C (en) * 2001-12-28 2008-10-08 希普雷公司 Nickel electric plating liquid
WO2011149330A1 (en) * 2010-05-26 2011-12-01 Mimos Berhad Method of electrodepositing nickel-cobalt alloy

Also Published As

Publication number Publication date
BR7404495D0 (en) 1975-09-23
DE2327881B2 (en) 1978-06-22
FR2231772B1 (en) 1979-02-16
JPS5843469B2 (en) 1983-09-27
JPS5020934A (en) 1975-03-05
FR2231772A1 (en) 1974-12-27
DE2327881A1 (en) 1975-01-02
CA1027893A (en) 1978-03-14
DE2327881C3 (en) 1979-02-08

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Legal Events

Date Code Title Description
PS Patent sealed
PE20 Patent expired after termination of 20 years

Effective date: 19940430