GB1334599A - Vacuum deposition of vapourized metals or metal compounds - Google Patents
Vacuum deposition of vapourized metals or metal compoundsInfo
- Publication number
- GB1334599A GB1334599A GB2022771A GB2022771A GB1334599A GB 1334599 A GB1334599 A GB 1334599A GB 2022771 A GB2022771 A GB 2022771A GB 2022771 A GB2022771 A GB 2022771A GB 1334599 A GB1334599 A GB 1334599A
- Authority
- GB
- United Kingdom
- Prior art keywords
- vapour
- deposit
- varied
- input
- deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052751 metal Inorganic materials 0.000 title abstract 4
- 239000002184 metal Substances 0.000 title abstract 4
- 150000002736 metal compounds Chemical class 0.000 title abstract 2
- 150000002739 metals Chemical class 0.000 title abstract 2
- 238000001771 vacuum deposition Methods 0.000 title abstract 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 abstract 4
- 238000000151 deposition Methods 0.000 abstract 3
- 230000008878 coupling Effects 0.000 abstract 2
- 238000010168 coupling process Methods 0.000 abstract 2
- 238000005859 coupling reaction Methods 0.000 abstract 2
- 230000008021 deposition Effects 0.000 abstract 2
- 238000010894 electron beam technology Methods 0.000 abstract 2
- 229910052763 palladium Inorganic materials 0.000 abstract 2
- 239000000523 sample Substances 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 239000003054 catalyst Substances 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 238000001816 cooling Methods 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- Toxicology (AREA)
- Plasma & Fusion (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
1334599 Program controlled vapour deposition ROBERT BOSCH GmbH 19 April 1971 [30 Jan 1970] 20227/71 Heading C7F In a process for vacuum deposition of metals or metal compounds on substrates in which the vapour is produced by electron beam heating, the vapour density of the metal or compound is varied by a varying programmed control input superimposed on a basic input to vary the energy or intensity of the electron beam so as to achieve a specific rate of growth or layer structure of the deposit. As shown, Fig.1, a vacuum vessel 10 encloses a substrate 13, a crucible 11 containing a metal 12, such as palladium, to be evaporated, an electron gun 16 and a probe 22 connected to current measuring instrument 24. Basic input to the gun is supplied from high-voltage D.C. unit 18 by way of coupling element 19. Variable input is supplied from source of potential 21 through a programme controller 20 to the coupling element 19. The input is varied to compensate for undesired variations in vapour density due to adventitious fluctuations in the conditions by measuring the ionization current from probe 22 and applying this current to a regulator 25. When depositing palladium, the course of deposition may be controlled to give a layer of high internal stress which cracks on cooling giving a deposit of large surface area useful as a catalyst, or to produce deposits of low stress and good adhesion for use as mirrors. The deposit may be formed of two different materials evaporated from separate crucibles, one being deposited at constant vapour density while the vapour density of the other is varied.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19702004184 DE2004184C3 (en) | 1970-01-30 | Method and device for the vapor deposition of metals or metal compounds on a carrier in a vacuum with the aid of an electron beam gun |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1334599A true GB1334599A (en) | 1973-10-24 |
Family
ID=5760947
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB2022771A Expired GB1334599A (en) | 1970-01-30 | 1971-04-19 | Vacuum deposition of vapourized metals or metal compounds |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS5123950B1 (en) |
| CH (1) | CH544157A (en) |
| FR (1) | FR2075059A5 (en) |
| GB (1) | GB1334599A (en) |
| NL (1) | NL7101237A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2264718A (en) * | 1992-03-04 | 1993-09-08 | Univ Hull | Vapour deposited coatings having at least three transitions in structure |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60225422A (en) * | 1984-04-24 | 1985-11-09 | Hitachi Ltd | Forming method of thin film and equipment thereof |
| WO2019225540A1 (en) | 2018-05-21 | 2019-11-28 | 旭化成株式会社 | Polycarbonate diol |
-
1970
- 1970-11-09 JP JP9797470A patent/JPS5123950B1/ja active Pending
- 1970-12-16 CH CH1862970A patent/CH544157A/en not_active IP Right Cessation
- 1970-12-18 FR FR7045865A patent/FR2075059A5/fr not_active Expired
-
1971
- 1971-01-29 NL NL7101237A patent/NL7101237A/xx unknown
- 1971-04-19 GB GB2022771A patent/GB1334599A/en not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2264718A (en) * | 1992-03-04 | 1993-09-08 | Univ Hull | Vapour deposited coatings having at least three transitions in structure |
| GB2264718B (en) * | 1992-03-04 | 1995-04-26 | Univ Hull | Coatings produced by vapour deposition |
Also Published As
| Publication number | Publication date |
|---|---|
| NL7101237A (en) | 1971-08-03 |
| FR2075059A5 (en) | 1971-10-08 |
| DE2004184B2 (en) | 1975-07-03 |
| DE2004184A1 (en) | 1971-08-05 |
| JPS5123950B1 (en) | 1976-07-20 |
| CH544157A (en) | 1973-11-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| 746 | Register noted 'licences of right' (sect. 46/1977) | ||
| PCNP | Patent ceased through non-payment of renewal fee |