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GB1331286A - Diazonaphthalene compounds - Google Patents

Diazonaphthalene compounds

Info

Publication number
GB1331286A
GB1331286A GB4910670A GB1331286DA GB1331286A GB 1331286 A GB1331286 A GB 1331286A GB 4910670 A GB4910670 A GB 4910670A GB 1331286D A GB1331286D A GB 1331286DA GB 1331286 A GB1331286 A GB 1331286A
Authority
GB
United Kingdom
Prior art keywords
compounds
represent
diazonaphthalene
oct
different
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4910670A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Ltd
Original Assignee
Kodak Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Ltd filed Critical Kodak Ltd
Publication of GB1331286A publication Critical patent/GB1331286A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

1331286 Diazonaphthalene compounds KODAK Ltd 7 Oct 1971 [15 Oct 1970] 49106/70 Heading C2C [Also in Division G2] The invention comprises diazoketo-naphthalene compounds having the general formula wherein A and B are different and represent a diazo group or an oxygen atom and X and Y are different and represent a hydrogen atom or the group in which R 1 and R 2 each represent a hydrogen atom or an optionally substituted alkyl, aryl or aralkyl radical, n represents a positive integer and Z represents a halogen atom. They may be prepared by reacting the appropriate sulphonyl halide and trihaloalcohol. The compounds of the invention may be used as photosensitizers.
GB4910670A 1970-10-15 1970-10-15 Diazonaphthalene compounds Expired GB1331286A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB4910670 1970-10-15

Publications (1)

Publication Number Publication Date
GB1331286A true GB1331286A (en) 1973-09-26

Family

ID=10451166

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4910670A Expired GB1331286A (en) 1970-10-15 1970-10-15 Diazonaphthalene compounds

Country Status (3)

Country Link
US (1) UST900030I4 (en)
FR (1) FR2111292A5 (en)
GB (1) GB1331286A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0468531A1 (en) * 1990-07-27 1992-01-29 Fuji Photo Film Co., Ltd. 2-Diazo-1,2-quinone compounds and image forming materials prepared using the compounds
US8715543B2 (en) 2011-03-31 2014-05-06 Ocv Intellectual Capital, Llc Microencapsulated curing agent
US9315655B2 (en) 2011-12-08 2016-04-19 Ocv Intellectual Capital, Llc Fiber reinforced resin molding compound and manufacturing method for fiber reinforced resin molded article therefrom

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0468531A1 (en) * 1990-07-27 1992-01-29 Fuji Photo Film Co., Ltd. 2-Diazo-1,2-quinone compounds and image forming materials prepared using the compounds
US5312905A (en) * 1990-07-27 1994-05-17 Fuji Photo Film Co., Ltd. 2-diazo-1,2-naphthoquinone compounds
US5384227A (en) * 1990-07-27 1995-01-24 Fuji Photo Film Co., Ltd. Image forming materials prepared using 2-diazo-1,2-naphthoquinone compounds having fluorine atom containing substituent groups
US5514518A (en) * 1990-07-27 1996-05-07 Fuji Photo Film Co., Ltd. Method of improving delamination in an image forming material utilizing 2-diazo-1,2-quinone compounds having fluorine containing substituent groups
US8715543B2 (en) 2011-03-31 2014-05-06 Ocv Intellectual Capital, Llc Microencapsulated curing agent
US9725575B2 (en) 2011-03-31 2017-08-08 Ocv Intellectual Capital, Llc Microencapsulated curing agent
US9315655B2 (en) 2011-12-08 2016-04-19 Ocv Intellectual Capital, Llc Fiber reinforced resin molding compound and manufacturing method for fiber reinforced resin molded article therefrom

Also Published As

Publication number Publication date
UST900030I4 (en) 1972-07-25
FR2111292A5 (en) 1972-06-02

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLNP Patent lapsed through nonpayment of renewal fees