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GB1330343A - Method of and apparatus for light-writing mask patterns - Google Patents

Method of and apparatus for light-writing mask patterns

Info

Publication number
GB1330343A
GB1330343A GB4902970A GB4902970A GB1330343A GB 1330343 A GB1330343 A GB 1330343A GB 4902970 A GB4902970 A GB 4902970A GB 4902970 A GB4902970 A GB 4902970A GB 1330343 A GB1330343 A GB 1330343A
Authority
GB
United Kingdom
Prior art keywords
boundaries
writing
light spot
knives
mask patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4902970A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Philips Electronics UK Ltd
Original Assignee
Philips Electronic and Associated Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Electronic and Associated Industries Ltd filed Critical Philips Electronic and Associated Industries Ltd
Publication of GB1330343A publication Critical patent/GB1330343A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Projection-Type Copiers In General (AREA)

Abstract

1330343 Photographic projection printing PHILIPS ELECTRONIC & ASSOCIATED INDUSTRIES Ltd 15 Oct 1970 [18 Oct 1969] 49029/70 Heading G2A A method of, and apparatus for, writing mask patterns on a photographic material 1 by means of light spot is characterized in that the length of the light spot in the direction of writing X is determined by two separately controlled boundaries A<SP>1</SP>, B<SP>1</SP>. The boundaries are controlled so that, for each infinitesimal element of a pattern element to be written, the time lag between the passages of the boundaries is constant. irrespective of accelerations on decelerations in the movement of the light spot relative to the material 1. The boundaries A<SP>1</SP>, B<SP>1</SP> are images of knives A, B, one of which is stationary with respect to a condenser 5 and a disc 6 and the other of which is movable with respect to the first. The dise 6 contains a number of transparent slits one of which is aligned with the gap between the knives A, B, thereby defining the transverse boundaries of the light spot, which is substantially rectangular. After passing through the gap between the knives A, B, light is reflected by a mirror 11 and a prism 10 through a lens 7 on to the material 1. The mirror 11 and prism 10 are mounted in a rotatable drum 9 so that writing may be effected in any desired direction by rotating A<SP>1</SP> and B<SP>1</SP>. Movement of the knife B is controlled by a device 8 in response to signals supplied thereto. The apparatus may be used to make photomasks for integrated circuits, on for the direct writing of mask patterns on a semiconductor material.
GB4902970A 1969-10-18 1970-10-15 Method of and apparatus for light-writing mask patterns Expired GB1330343A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL6915794A NL6915794A (en) 1969-10-18 1969-10-18

Publications (1)

Publication Number Publication Date
GB1330343A true GB1330343A (en) 1973-09-19

Family

ID=19808166

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4902970A Expired GB1330343A (en) 1969-10-18 1970-10-15 Method of and apparatus for light-writing mask patterns

Country Status (10)

Country Link
US (1) US3688655A (en)
JP (1) JPS5128189B1 (en)
AT (1) AT307068B (en)
BE (1) BE757658A (en)
CH (1) CH515529A (en)
ES (1) ES384612A1 (en)
FR (1) FR2066104A5 (en)
GB (1) GB1330343A (en)
NL (1) NL6915794A (en)
SE (1) SE354526B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3710702A (en) * 1971-06-01 1973-01-16 Ibm Optical exposure head
US3848520A (en) * 1972-07-24 1974-11-19 Gerber Scientific Instr Co Line drawing photoexposure device with image rotating means
US3836916A (en) * 1973-02-26 1974-09-17 Ibm Apparatus for exposing lines on a photosensitive surface
US3975705A (en) * 1974-02-11 1976-08-17 Seiscom Delta Inc. Color display of geophysical and other data
US4070187A (en) * 1974-02-11 1978-01-24 Seiscom Delta Inc. Color display of data
US4573779A (en) * 1983-12-30 1986-03-04 International Business Machines Corporation Variable size circular aperture camera
KR101589938B1 (en) 2008-04-11 2016-02-12 칼 짜이스 에스엠테 게엠베하 Optical aperture device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1107981A (en) * 1963-06-06 1968-03-27 Barr & Stroud Ltd Apparatus for automatically drawing lines
US3330182A (en) * 1965-10-01 1967-07-11 Gerber Scientific Instr Co Device for exposing discrete portions of a photosensitive surface to a variable intensity light beam

Also Published As

Publication number Publication date
NL6915794A (en) 1971-04-20
FR2066104A5 (en) 1971-08-06
SE354526B (en) 1973-03-12
US3688655A (en) 1972-09-05
ES384612A1 (en) 1973-01-16
DE2050422A1 (en) 1971-04-29
BE757658A (en) 1971-04-16
CH515529A (en) 1971-11-15
AT307068B (en) 1973-05-10
DE2050422B2 (en) 1976-04-22
JPS5128189B1 (en) 1976-08-17

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee