GB1189680A - Monitoring of Vapor Density by Emission Spectroscopy. - Google Patents
Monitoring of Vapor Density by Emission Spectroscopy.Info
- Publication number
- GB1189680A GB1189680A GB47167/67A GB4716767A GB1189680A GB 1189680 A GB1189680 A GB 1189680A GB 47167/67 A GB47167/67 A GB 47167/67A GB 4716767 A GB4716767 A GB 4716767A GB 1189680 A GB1189680 A GB 1189680A
- Authority
- GB
- United Kingdom
- Prior art keywords
- vapour
- photo
- density
- electron beam
- furnace
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004993 emission spectroscopy Methods 0.000 title 1
- 238000012544 monitoring process Methods 0.000 title 1
- 238000010894 electron beam technology Methods 0.000 abstract 3
- 239000002184 metal Substances 0.000 abstract 2
- 229910052751 metal Inorganic materials 0.000 abstract 2
- 230000005855 radiation Effects 0.000 abstract 2
- 238000001739 density measurement Methods 0.000 abstract 1
- 238000000151 deposition Methods 0.000 abstract 1
- 238000001704 evaporation Methods 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 150000002739 metals Chemical class 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/544—Controlling the film thickness or evaporation rate using measurement in the gas phase
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
- H01J41/02—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas
- H01J41/04—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas with ionisation by means of thermionic cathodes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Abstract
1,189,680. Photo-electric vapour density measurement. AIR REDUCTION CO. Inc. Oct. 17, 1967 [Oct.31, 1966], No.47167/67. Heading G1A. The density of a vapour or a component of a vapour in a furnace for depositing vapour on a substrate is determined by ionizing the vapour and measuring the intensity of radiation subsequently emitted. In an electron beam furnace for evaporating metals, shown in Fig. 1, the vapour 15 is ionized by the heating electron beam generated at 42 and deflected by a magnetic field on to the metal 14 in a crucible. A photo-multiplier 26 receives via tube 53 radiation emitted by the vapour and at a frequency, characteristic of a particular element, selected by one of a number of filters mounted upon a disc driven by a programmer 84. The photo-electric signal indicative of the density of the particular element in the vapour operates a meter 70, such as a C.R.O., or a multi-channel recorder operated in synchronizm with the filters. The photo-electric signal may be compared with a reference voltage 74, the resulting error signal controlling the intensity of the electron beam to vary the density of the vapour. Different parts of the vapour can be examined by moving the light tube 53 with the aid of a ball and socket joint 90. A light trap 92 opposite the tube 53 avoids reflections off the wall of the furnace from reaching the photo-multiplier.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US59073666A | 1966-10-31 | 1966-10-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1189680A true GB1189680A (en) | 1970-04-29 |
Family
ID=24363478
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB47167/67A Expired GB1189680A (en) | 1966-10-31 | 1967-10-17 | Monitoring of Vapor Density by Emission Spectroscopy. |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US3609378A (en) |
| AT (1) | AT296657B (en) |
| BE (1) | BE705816A (en) |
| CH (1) | CH487264A (en) |
| DE (1) | DE1648808C3 (en) |
| GB (1) | GB1189680A (en) |
| LU (1) | LU54739A1 (en) |
| NL (1) | NL6714765A (en) |
| SE (1) | SE348620B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4304612A1 (en) * | 1993-02-16 | 1994-08-18 | Fraunhofer Ges Forschung | Process for measuring the material composition of the vapor of a melt in a vacuum |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4988871A (en) * | 1989-05-08 | 1991-01-29 | Leybold Inficon, Inc. | Gas partial pressure sensor for vacuum chamber |
| DE3921040C2 (en) * | 1989-06-27 | 1994-03-10 | Balzers Hochvakuum | Method and arrangement for controlling the evaporation of material from a target object by a beam of charged particles and use, and method and measuring arrangement for selectively measuring an amount of vaporized particles to carry out the method |
| DE3929475A1 (en) * | 1989-09-05 | 1991-03-14 | Balzers Hochvakuum | METHOD AND DEVICE FOR DEFLECTING A RAY |
| US6542831B1 (en) | 2001-04-18 | 2003-04-01 | Desert Research Institute | Vehicle particulate sensor system |
| US7320733B2 (en) * | 2003-05-09 | 2008-01-22 | Sukegawa Electric Co., Ltd. | Electron bombardment heating apparatus and temperature controlling apparatus and control method thereof |
| US7719681B2 (en) * | 2007-10-12 | 2010-05-18 | Inficon | Apparatus and method for measuring vapor flux density |
| DE102013106788B4 (en) * | 2013-06-28 | 2019-07-11 | VON ARDENNE Asset GmbH & Co. KG | Vacuum treatment plant with vacuum chamber feedthrough |
-
1966
- 1966-10-31 US US590736A patent/US3609378A/en not_active Expired - Lifetime
-
1967
- 1967-10-17 GB GB47167/67A patent/GB1189680A/en not_active Expired
- 1967-10-25 LU LU54739D patent/LU54739A1/xx unknown
- 1967-10-26 SE SE14662/67A patent/SE348620B/xx unknown
- 1967-10-30 BE BE705816D patent/BE705816A/xx unknown
- 1967-10-30 CH CH1521767A patent/CH487264A/en not_active IP Right Cessation
- 1967-10-31 NL NL6714765A patent/NL6714765A/xx unknown
- 1967-10-31 AT AT985867A patent/AT296657B/en not_active IP Right Cessation
- 1967-10-31 DE DE1648808A patent/DE1648808C3/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4304612A1 (en) * | 1993-02-16 | 1994-08-18 | Fraunhofer Ges Forschung | Process for measuring the material composition of the vapor of a melt in a vacuum |
Also Published As
| Publication number | Publication date |
|---|---|
| DE1648808C3 (en) | 1974-04-04 |
| LU54739A1 (en) | 1968-01-26 |
| CH487264A (en) | 1970-03-15 |
| SE348620B (en) | 1972-09-04 |
| US3609378A (en) | 1971-09-28 |
| DE1648808B2 (en) | 1973-08-30 |
| BE705816A (en) | 1968-03-01 |
| DE1648808A1 (en) | 1972-04-06 |
| NL6714765A (en) | 1968-05-01 |
| AT296657B (en) | 1972-02-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PLNP | Patent lapsed through nonpayment of renewal fees |