GB1171141A - Asymmetric Ion Pump - Google Patents
Asymmetric Ion PumpInfo
- Publication number
- GB1171141A GB1171141A GB5330766A GB5330766A GB1171141A GB 1171141 A GB1171141 A GB 1171141A GB 5330766 A GB5330766 A GB 5330766A GB 5330766 A GB5330766 A GB 5330766A GB 1171141 A GB1171141 A GB 1171141A
- Authority
- GB
- United Kingdom
- Prior art keywords
- cathodes
- anode
- cathode
- chamber
- alloys
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
- H01J41/12—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
- H01J41/18—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of cold cathodes
- H01J41/20—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of cold cathodes using gettering substances
Landscapes
- Electron Tubes For Measurement (AREA)
Abstract
1,171,141. Ion pumps. ULTEK CORP. 29 Nov., 1966 [3 Dec., 1965], No. 53307/66. Heading H1D. In an electronic vacuum pump including a pump chamber 11, at least one anode 21 and two cathodes, one associated with each side of the anode, disposed in said chamber, and means 44 for applying a voltage between said cathodes and said anode, said cathodes are formed from materials having different sputtering rates, and at least one of said cathodes is formed from a material selected from Ti, V, Zr, Mo, W, Th, Hf, Nd, Ta and their alloys. The latter materials are reactive and are thus effective in pumping active gases such as nitrogen and oxygen. The net transfer of material from one cathode to the other improves the pumping of inert gases by preventing the re-emission of inert gas atoms from the cathode which gains material. One cathode may be made of a metal having a high sputter yield, e.g. Zn, Cd, Au, Ag, Cu and their alloys. Preferred metals are Ti for one cathode and Ta or Cu for the other. In the pump shown each anode is multicellular and forms with its associated cathodes an assembly which is mounted in a pocket 19 forming part of the chamber 11. Magnetic fields are provided by ferrite bar magnets 22 with polepieces 23.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US51151665A | 1965-12-03 | 1965-12-03 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1171141A true GB1171141A (en) | 1969-11-19 |
Family
ID=24035232
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB5330766A Expired GB1171141A (en) | 1965-12-03 | 1966-11-29 | Asymmetric Ion Pump |
Country Status (4)
| Country | Link |
|---|---|
| BE (1) | BE690567A (en) |
| DE (1) | DE1539139A1 (en) |
| FR (1) | FR1503209A (en) |
| GB (1) | GB1171141A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ITUB20160885A1 (en) * | 2016-02-19 | 2017-08-19 | Getters Spa | Non-porous sintered cathodes and ion vacuum pumps containing the same |
| GB2623856A (en) * | 2022-10-27 | 2024-05-01 | Edwards Vacuum Llc | Sputter ion pump |
-
1966
- 1966-11-29 GB GB5330766A patent/GB1171141A/en not_active Expired
- 1966-12-01 DE DE19661539139 patent/DE1539139A1/en active Pending
- 1966-12-01 BE BE690567D patent/BE690567A/xx unknown
- 1966-12-02 FR FR86063A patent/FR1503209A/en not_active Expired
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ITUB20160885A1 (en) * | 2016-02-19 | 2017-08-19 | Getters Spa | Non-porous sintered cathodes and ion vacuum pumps containing the same |
| WO2017140730A1 (en) * | 2016-02-19 | 2017-08-24 | Saes Getters S.P.A. | Sintered non-porous cathode and sputter ion vacuum pump containing the same |
| CN108475613A (en) * | 2016-02-19 | 2018-08-31 | 工程吸气公司 | The non-porous cathode of sintering and the sputter ion pump including it |
| JP2019517094A (en) * | 2016-02-19 | 2019-06-20 | サエス・ゲッターズ・エッセ・ピ・ア | Sintered non-porous cathode and sputter ion vacuum pump including the same |
| CN108475613B (en) * | 2016-02-19 | 2020-06-23 | 工程吸气公司 | Sintered non-porous cathode and sputter ion vacuum pump comprising same |
| US11056326B2 (en) | 2016-02-19 | 2021-07-06 | Saes Getters S.P.A. | Sintered non-porous cathode and sputter ion vacuum pump containing the same |
| GB2623856A (en) * | 2022-10-27 | 2024-05-01 | Edwards Vacuum Llc | Sputter ion pump |
| GB2623794A (en) * | 2022-10-27 | 2024-05-01 | Edwards Vacuum Llc | Sputter ion pump |
Also Published As
| Publication number | Publication date |
|---|---|
| FR1503209A (en) | 1967-11-24 |
| DE1539139A1 (en) | 1970-01-22 |
| BE690567A (en) | 1967-06-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4159909A (en) | Cathode target material compositions for magnetic sputtering | |
| US4404077A (en) | Integrated sputtering apparatus and method | |
| GB1420061A (en) | Sputtering method and apparatus | |
| GB1342560A (en) | Method for evaporation of metal and a device for carrying out the method | |
| GB1476079A (en) | Planar magnetron sputtering apparatus | |
| GB1311042A (en) | Rf sputtering apparatus | |
| GB1217685A (en) | Improvements in or relating to methods and apparatus for sputtering of materials | |
| GB1191223A (en) | Magnetically Confined Electrical Discharge Getter Ion Vacuum Pumps | |
| Sproul | Multi-cathode unbalanced magnetron sputtering systems | |
| GB1171141A (en) | Asymmetric Ion Pump | |
| GB1358411A (en) | Sputtering | |
| CN1057073A (en) | Arc-added glow ion implantation technique and equipment | |
| US3198422A (en) | Vacuum sputtering pump | |
| JPS5943546B2 (en) | sputtering equipment | |
| GB1339910A (en) | Alloy deposition by liquid phase sputtering | |
| GB1134231A (en) | Improvements in or relating to ion vacuum pumps | |
| GB1228207A (en) | ||
| US3405301A (en) | Apparatus for producing quiescent plasma | |
| GB1437289A (en) | Vacuum pump | |
| GB1182725A (en) | Vacuum Pumps Employing Ion Beams | |
| US3684401A (en) | Cathode-getter materials for sputter-ion pumps | |
| US3781133A (en) | Sputter ion pumps | |
| US3233823A (en) | Electron-discharge vacuum apparatus | |
| US2706554A (en) | Getter assembly | |
| JPS5743986A (en) | Film forming apparatus |