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GB1154716A - Light-Sensitive Sheet - Google Patents

Light-Sensitive Sheet

Info

Publication number
GB1154716A
GB1154716A GB28644/66A GB2864466A GB1154716A GB 1154716 A GB1154716 A GB 1154716A GB 28644/66 A GB28644/66 A GB 28644/66A GB 2864466 A GB2864466 A GB 2864466A GB 1154716 A GB1154716 A GB 1154716A
Authority
GB
United Kingdom
Prior art keywords
photo
light
sensitive
image
systems
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB28644/66A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of GB1154716A publication Critical patent/GB1154716A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/685—Compositions containing spiro-condensed pyran compounds or derivatives thereof, as photosensitive substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Structure Of Transmissions (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

Abstract

1,154,716. Photo-sensitive materials. MINNESOTA MINING & MFG. CO. June 27, 1966 [June 28, 1965], No.28644/66. Heading G2C. A photo-sensitive material comprises a support coated with one or more layers containing two light-sensitive systems, the first system producing a positive or negative latent image and the second system producing a positive visible image on imagewise exposure to light; the second system comprising a molecularly dispersed photo-chromic spiropyran. Specified first systems are diazo resins and polyvinyl cinnamate so that an image wise exposure of the material the latent image is readily identified by the photo-chromic image and is then developed to produce a printing plate. The two systems may be in one layer, two adjacent layers or two layers separated by an oleophilic layer. The first light-sensitive system may also contain a dye, an acrylic resin or a vinyl polymer and may be coated on a support which has been chemically or physically treated to render it hydrophilic e.g. as disclosed in Specification 1,010,203.
GB28644/66A 1965-06-28 1966-06-27 Light-Sensitive Sheet Expired GB1154716A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US46725765A 1965-06-28 1965-06-28

Publications (1)

Publication Number Publication Date
GB1154716A true GB1154716A (en) 1969-06-11

Family

ID=23854995

Family Applications (1)

Application Number Title Priority Date Filing Date
GB28644/66A Expired GB1154716A (en) 1965-06-28 1966-06-27 Light-Sensitive Sheet

Country Status (6)

Country Link
JP (1) JPS446413B1 (en)
BE (1) BE683188A (en)
DE (2) DE1550705B2 (en)
GB (1) GB1154716A (en)
NL (1) NL151808B (en)
SE (1) SE347824B (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3964911A (en) * 1972-12-22 1976-06-22 La Cellophane Photographic reproduction processes using diazonium salts and substituted spiro[benzopyrane]
US4225661A (en) * 1978-05-10 1980-09-30 The Richardson Company Photoreactive coating compositions and photomechanical plates produced therewith
US4334003A (en) * 1979-06-01 1982-06-08 Richardson Graphics Company Ultra high speed presensitized lithographic plates
EP0230941A2 (en) * 1986-01-25 1987-08-05 Hoechst Aktiengesellschaft Photopolymerisable composition and photopolymerisable registration material containing it
US4863827A (en) * 1986-10-20 1989-09-05 American Hoechst Corporation Postive working multi-level photoresist
EP0363776A2 (en) * 1988-10-08 1990-04-18 Hoechst Aktiengesellschaft Light-sensitive composition and light-sensitive copy material produced therewith
WO2006103238A1 (en) * 2005-03-31 2006-10-05 Agfa-Gevaert Ag Protective material comprising reversible and irreversible photochemical functional constituents, and coating method

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2740991C3 (en) * 1977-09-12 1982-03-25 Voith Getriebe Kg, 7920 Heidenheim Hydrodynamic reverse gear
JP4396443B2 (en) 2004-08-18 2010-01-13 コニカミノルタエムジー株式会社 Method for producing and using photosensitive lithographic printing plate
JPWO2007052470A1 (en) 2005-11-01 2009-04-30 コニカミノルタエムジー株式会社 Lithographic printing plate material, lithographic printing plate, lithographic printing plate preparation method and lithographic printing plate printing method
EP2110253B1 (en) 2007-02-09 2018-09-12 Konica Minolta Medical & Graphic, Inc. Inkjet head, inkjet printer, and inkjet recording method
JP2010115791A (en) 2008-11-11 2010-05-27 Konica Minolta Ij Technologies Inc Image forming apparatus
US8814347B2 (en) 2010-12-10 2014-08-26 Konica Minolta, Inc. Inkjet recording device
EP2692776B1 (en) 2011-03-30 2017-02-22 Asahi Kasei Kabushiki Kaisha Organopolysiloxane, method for producing same, and curable resin composition containing organopolysiloxane
JP5954317B2 (en) 2011-04-27 2016-07-20 コニカミノルタ株式会社 Inkjet recording device
JP5867585B2 (en) 2012-03-01 2016-02-24 コニカミノルタ株式会社 Inkjet recording method
WO2013165003A1 (en) 2012-05-01 2013-11-07 コニカミノルタ株式会社 Image formation device
JP6941280B2 (en) 2018-06-26 2021-09-29 株式会社オートネットワーク技術研究所 In-vehicle temperature detection circuit

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE896757C (en) * 1935-12-31 1953-11-16 Zeiss Ikon Ag Process for producing photos that can be deleted

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3964911A (en) * 1972-12-22 1976-06-22 La Cellophane Photographic reproduction processes using diazonium salts and substituted spiro[benzopyrane]
US4225661A (en) * 1978-05-10 1980-09-30 The Richardson Company Photoreactive coating compositions and photomechanical plates produced therewith
US4334003A (en) * 1979-06-01 1982-06-08 Richardson Graphics Company Ultra high speed presensitized lithographic plates
EP0230941A2 (en) * 1986-01-25 1987-08-05 Hoechst Aktiengesellschaft Photopolymerisable composition and photopolymerisable registration material containing it
EP0230941A3 (en) * 1986-01-25 1987-10-28 Hoechst Aktiengesellschaft Photopolymerisable composition and photopolymerisable registration material containing it
US4780393A (en) * 1986-01-25 1988-10-25 Hoechst Aktiengesellschaft Photopolymerizable composition and photopolymerizable recording material containing same
US4863827A (en) * 1986-10-20 1989-09-05 American Hoechst Corporation Postive working multi-level photoresist
EP0363776A2 (en) * 1988-10-08 1990-04-18 Hoechst Aktiengesellschaft Light-sensitive composition and light-sensitive copy material produced therewith
EP0363776A3 (en) * 1988-10-08 1991-04-03 Hoechst Aktiengesellschaft Light-sensitive composition and light-sensitive copy material produced therewith
WO2006103238A1 (en) * 2005-03-31 2006-10-05 Agfa-Gevaert Ag Protective material comprising reversible and irreversible photochemical functional constituents, and coating method
EP1767988A1 (en) * 2005-03-31 2007-03-28 AgfaPhoto GmbH Security material with reversible and irreversible photochemical components and coating methods
US8119185B2 (en) 2005-03-31 2012-02-21 Philips-Universitaet Marburg Protective material comprising reversible and irreversible photochemical functional constituents

Also Published As

Publication number Publication date
NL151808B (en) 1976-12-15
DE1550705A1 (en) 1969-07-17
JPS446413B1 (en) 1969-03-19
DE1572207B1 (en) 1971-03-11
DE1550705B2 (en) 1975-05-22
BE683188A (en) 1966-12-27
SE347824B (en) 1972-08-14
NL6608487A (en) 1966-12-29

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